Patents by Inventor Franz Sorg
Franz Sorg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140254036Abstract: Disclosed is an optical module for a lens, especially a microlithographic apparatus, comprising a first holding device with an inner circumference that extends in a first circumferential direction, and at least one first supporting device which is fastened to the inner circumference of said first holding device and is used for supporting a first optical element, an annular circumferential first assembly space being defined by displacing the first supporting device once in a revolving manner along the first circumferential direction. At least one second supporting device which is fixed to the inner circumference of the first holding device is provided for supporting a second optical element, an annular circumferential second assembly space being defined by displacing the second supporting device once in a revolving manner along the first circumferential direction. The first assembly space intersects the second assembly space.Type: ApplicationFiled: March 6, 2014Publication date: September 11, 2014Applicant: Carl Zeiss SMT GmbHInventors: Jens Kugler, Franz Sorg, Yim-Bun Patrick Kwan
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Patent number: 8711331Abstract: There is provided an optical module for an objective. The optical module includes (a) a first holding device with an inner circumference, which extends in a first circumferential direction, (b) at least one first supporting device for supporting a first optical element and being fixed at said inner circumference of said first holding device, (c) an annular circumferential first assembly space being defined by displacing said first supporting device once in a revolving manner along said first circumferential direction, (d) at least one second supporting device being provided for supporting a second optical element and being fixed at said inner circumference of said first holding device, and (e) an annular circumferential second assembly space being defined by displacing said second supporting device once in a revolving manner along said first circumferential direction. The first assembly space intersects the second assembly space.Type: GrantFiled: May 24, 2005Date of Patent: April 29, 2014Assignee: Carl Zeiss SMT GmbHInventors: Jens Kugler, Franz Sorg, Yim-Bun Patrick Kwan
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Publication number: 20140063628Abstract: The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount. The optical element is connected to the mount at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount and optical element. The mount is provided with at least three support feet distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points.Type: ApplicationFiled: October 28, 2013Publication date: March 6, 2014Applicant: Carl Zeiss SMT GmbHInventors: Franz Sorg, Andreas Wurmbrand, Thomas Petasch, Dirk Schaffer, Siegfried Wahl
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Patent number: 8659745Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.Type: GrantFiled: June 19, 2013Date of Patent: February 25, 2014Assignee: Carl Zeiss SMT GmbHInventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
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Patent number: 8582081Abstract: The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (12). The optical element is connected to the mount (12) at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount (12) and optical element. The mount (12) is provided with at least three support feet (14) distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount (12) is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points (15).Type: GrantFiled: November 20, 2008Date of Patent: November 12, 2013Assignee: Carl Zeiss SMT GmbHInventors: Franz Sorg, Andreas Wurmbrand, Thomas Petasch, Dirk Schaffer, Siegfried Wahl
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Publication number: 20130278911Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.Type: ApplicationFiled: June 19, 2013Publication date: October 24, 2013Inventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
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Publication number: 20130279029Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: ApplicationFiled: June 18, 2013Publication date: October 24, 2013Inventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Patent number: 8542346Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.Type: GrantFiled: March 24, 2009Date of Patent: September 24, 2013Assignee: Carl Zeiss SMT GmbHInventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
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Patent number: 8488104Abstract: A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along an imaging beam path of the projection objective. Each of the optical elements has an optical useful region lying in the imaging beam path and an edge region lying outside the optical useful region. At least one holding element of the holding device assigned to the optical element acts at the edge region in the region of a contact zone. At least one of the optical elements is assigned a diaphragm arrangement with a false light diaphragm arranged directly upstream of the optical element and a second false light diaphragm arranged directly downstream of the optical element.Type: GrantFiled: May 13, 2011Date of Patent: July 16, 2013Assignee: Carl Zeiss SMT GmbHInventors: Nils Dieckmann, Alexander Wolf, Christian Holland, Ulrich Loering, Franz Sorg
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Patent number: 8488261Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: GrantFiled: June 28, 2011Date of Patent: July 16, 2013Assignee: Carl Zeiss SMT GmbHInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Patent number: 8330935Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.Type: GrantFiled: February 9, 2010Date of Patent: December 11, 2012Assignee: Carl Zeiss SMT GmbHInventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
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Publication number: 20120176591Abstract: The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.Type: ApplicationFiled: March 19, 2012Publication date: July 12, 2012Applicant: Carl Zeiss SMT GmbHInventors: Franz Sorg, Peter Deufel, Toralf Gruner
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Patent number: 8159648Abstract: The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and components.Type: GrantFiled: July 11, 2008Date of Patent: April 17, 2012Assignee: Carl Zeiss SMT GmbHInventors: Franz Sorg, Peter Deufel, Toralf Gruner
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Publication number: 20110285979Abstract: A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along an imaging beam path of the projection objective. Each of the optical elements has an optical useful region lying in the imaging beam path and an edge region lying outside the optical useful region. At least one holding element of the holding device assigned to the optical element acts at the edge region in the region of a contact zone. At least one of the optical elements is assigned a diaphragm arrangement with a false light diaphragm arranged directly upstream of the optical element and a second false light diaphragm arranged directly downstream of the optical element.Type: ApplicationFiled: May 13, 2011Publication date: November 24, 2011Applicant: CARL ZEISS SMT GMBHInventors: Nils Dieckmann, Alexander Wolf, Christian Holland, Ulrich Loering, Franz Sorg
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Publication number: 20110255181Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: ApplicationFiled: June 28, 2011Publication date: October 20, 2011Applicant: CARL ZEISS SMT GMBHInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Patent number: 7995296Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: GrantFiled: July 6, 2010Date of Patent: August 9, 2011Assignee: Carl Zeiss SMT GmbHInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Patent number: 7959536Abstract: A method of shifting an automatic transmission of a motor vehicle having a hydrodynamic converter (6). The method comprising the steps of detecting a presence of predetermined stopping conditions; determining that a driver of the motor vehicle intends to cause the motor vehicle to change from a driving state to a stopped state, based on the presence of one of the predetermined stopping conditions; and automatically shifting the automatic transmission (8) into a standby mode, before the driving state has concluded. The shifting into the standby mode typically occurs when a rotational speed of the hydrodynamic converter (6) decreases to less than a rotational speed (120) of a motor and the retarder apparatus (10), of the automatic transmission, is disengaged no later than a time by which shifting into the standby mode occurs.Type: GrantFiled: June 7, 2006Date of Patent: June 14, 2011Assignee: ZF Friedrichshafen AGInventors: Markus Eisele, Franz Sorg, Harry Nolzen, Jürgen Blaser, Thomas Vogt
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Publication number: 20100271716Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: ApplicationFiled: July 6, 2010Publication date: October 28, 2010Applicant: CARL ZEISS SMT AGInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Patent number: 7768723Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.Type: GrantFiled: March 10, 2009Date of Patent: August 3, 2010Assignee: Carl Zeiss SMT AGInventors: Jens Kugler, Franz Sorg, Andreas Wurmbrand, Thomas Schletterer, Thomas Ittner
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Patent number: 7760327Abstract: There is provided an optical element comprising an optical element body, a reflecting area and an optical passageway. The optical element body defines an axis of rotational symmetry. The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.Type: GrantFiled: March 31, 2006Date of Patent: July 20, 2010Assignee: Carl Zeiss SMT AGInventors: Hans-Jürgen Scherle, Yim-Bun Patrick Kwan, Stefan Xalter, Johannes Lippert, Ulrich Weber, Bernhard Geuppert, Bernhard Gellrich, Jens Kugler, Franz Sorg, Willi Heintel, Harald Kirchner, Wolfgang Keller, Andreas Frommeyer, Fraser G. Morrison