Abstract: Provided is a method of fabricating a semiconductor device. The method includes providing a substrate, forming a photo acid generator (PAG) layer on the substrate, exposing the PAG layer to radiation, and forming a photoresist layer on the exposed PAG layer. The exposed PAG layer generates an acid. The acid decomposes a portion of the formed photoresist layer. In one embodiment, the PAG layer includes organic BARC. The decomposed portion of the photoresist layer may be used as a masking element.

Abstract: A semiconductor device is fabricated to include one or more sets of calibration patterns used to measure line pitch and line focus.

Abstract: A method for etching an ultra thin film is provided which includes providing a substrate having the ultra thin film formed thereon, patterning a photosensitive layer formed over the ultra thin film, etching the ultra thin film using the patterned photosensitive layer, and removing the patterned photosensitive layer. The etching process includes utilizing an etch material with a diffusion resistant carrier such that the etch material is prevented from diffusing to a region underneath the photosensitive layer and removing portions of the ultra thin film underneath the photosensitive layer.

Abstract: The method of patterning a photosensitive layer includes providing a substrate including a first layer formed thereon, treating the substrate including the first layer with cations, forming a first photosensitive layer over the first layer, patterning the first photosensitive layer to form a first pattern, treating the first pattern with cations, forming a second photosensitive layer over the treated first pattern, patterning the second photosensitive layer to form a second pattern, and processing the first layer using the first and second patterns as a mask.

Abstract: The present invention is to provide a barbecue grill transmission device includes a grill platen having a grill shelf mounted at the top thereof, and a pair of grooves at two sides of the grill shelf for pivotally a rolling shaft, which is used to string up food to be roasted, wherein one end of the rolling shaft is connected to a spiral spring, whose releasing speed is reduced by a reduction gear. Further, the spring is connected to a detector, which receives a signal related to the releasing of the spring and then transmits a signal to a beeper for generating a sound to warn the completely releasing of the spring, thereby automatically rolling the food strung on the rolling shaft to roll on the grill shelf, so as to achieve power saving.

Abstract: A patio heater is disclosed comprising a cylindrical catalytic heating chamber mounted on a base. The patio heater of the present invention comprises a base to physically support a cylindrical catalytic heater chamber which is mounted inside a fuel vapor cavity. The catalytic heater chamber provides a cylindrical heating zone capable of heating a nearby human form the knee to the face. The fuel vapor chamber surrounds the catalytic heating chamber and acts to accumulate sufficient fuel and air mixture to ignite to provide uniform and sufficient heat to the catalyst surface to attain catalytic ignition on start up. The base offers physical stability for the assembly and storage space for a fuel tank and houses the fuel deliver system and ignitor controls.

Abstract: Provided is a method of fabricating a semiconductor device. The method includes providing a substrate, forming a photo acid generator (PAG) layer on the substrate, exposing the PAG layer to radiation, and forming a photoresist layer on the exposed PAG layer. The exposed PAG layer generates an acid. The acid decomposes a portion of the formed photoresist layer. In one embodiment, the PAG layer includes organic BARC. The decomposed portion of the photoresist layer may be used as a masking element.

Abstract: An immersion lithography process is described as follows. A photoresist layer and a protective layer are sequentially formed on a material layer, and then an immersion exposure step is performed to define an exposed portion and an unexposed portion in the photoresist layer. A solubilization step is conducted to solubilize the protective layer on the exposed portion of the photoresist layer, and then a development step is conducted to remove the exposed portion of the photoresist layer and the protective layer thereon. Since the photoresist layer is covered with the protective layer, the chemicals in the photoresist layer do not diffuse into the immersion liquid to cause contamination. The protective layer can be patterned simultaneously in the development step, and no extra step is required to remove the protective layer. Therefore, the whole lithography process is not complicated.

Abstract: Contrast enhancing exposure apparatus and method for use in semiconductor fabrication are described. In one embodiment, a method for forming a pattern on a substrate, wherein the substrate includes a photoresist layer comprising photoacid generators (“PAGs”) and photobase generators (“PBGs”), is described.

Abstract: System and method for enhancing optical lithography methodology for hole patterning in semiconductor fabrication are described. In one embodiment, a photolithography system comprises an illumination system for conditioning light from a light source, the illumination system producing a three-pore illumination pattern; a reticle comprising at least a portion of a pattern to be imaged onto a substrate, wherein the three-pore illumination pattern produced by the illumination system is projected through the reticle; and a projection lens disposed between the reticle and the substrate.

Abstract: A stainless steel for a fume extractor which has a main body formed by stamping and soldering includes a stainless steel base board of a selected thickness. The stainless steel base board has the surface treated to form a coarse surface. Then the surface of the stainless steel base board is coated with a transparent lacquer to form a protection layer to prevent rusting and corrosion when submerged in a chemical detergent or exposed in a salty environment. Such a structure also facilitates wiping of filthy materials smeared on the surface.

Abstract: A method of measuring the overlay accuracy of a multi-exposure process is provided. The characteristic of this invention is utilizing a scanning electron microscope for monitoring the overlay accuracy real-time during the multi-exposure processes in stead of the conventional optical measurement method.

Abstract: A patterned hardmask and method for forming the same, the method including providing a substrate comprising an overlying resist sensitive to activating radiation; forming an overlying hardmask insensitive to the activating radiation; exposing the resist through the hardmask to the activating radiation; baking the resist and the hardmask; and, developing the hardmask and resist to form a patterned resist and patterned hardmask.

Abstract: A semiconductor device is fabricated to include one or more sets of calibration patterns used to measure line pitch and line focus.

Abstract: The invention discloses a working platform of a tool cabinet, and the working platform is turned over on the tool cabinet, so that two working sides on different sides of the working platform can be used alternately, so as to maximize the utility of the limited space of the tool cabinet. Besides, the working side can install at least one accessory manufacture device which can be changed by a user, and thus making the working platform multifunctional.

Abstract: A slipping-proof kit drawer structure includes a hollow chest which has an opening directing forwards and at least a pair of sliding tracks on two side walls to allow a drawer to straddle and slid thereon for drawing out and retracting. The inner wall of the chest and the outer side of the drawer are interposed by an elastic latch assembly to form an anchoring condition. Thus a latch function can be achieved to prevent the drawer from slipping out even in a tilted condition during moving of the chest.

Abstract: Photolithography processing methods by which a photoresist layer is deposited, a portion of the photoresist layer is exposed to electromagnetic radiation to transfer a reticle pattern thereto, and the exposed portion of the photoresist layer is treated with thermal energy while being subjected to an electric field, wherein the electric field is configured to substantially limit diffusion of the exposed photoresist layer portion to anisotropic diffusion.

Abstract: A capital structure is provided for use in association with shares of an issuer, such as shares of common stock. The capital structure may include a share-purchasing entity structured to issue at least one security to the issuer and to receive proceeds in return for the security. In addition, the share-purchasing entity may have a business purpose limited to issuing the security to the issuer, owning the shares of the issuer, or purchasing the shares of the issuer. The share-purchasing entity may also be structured to use proceeds received from issuance of the security, or from dividends paid on the shares of the issuer, for purchasing shares of the issuer.