Patents by Inventor Geun-young Yeom
Geun-young Yeom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20130049592Abstract: A method for controlling synchronization of pulsed plasma by applying a DC power is provided. The method includes repeatedly generating and extinguishing the plasma by adjusting an ON-period and an OFF-period of a pulsed RF power being applied to a source electrode part. And the method also includes alternately applying a DC power to a bias electrode part in accordance with the ON-period and the OFF-period.Type: ApplicationFiled: August 24, 2012Publication date: February 28, 2013Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITYInventors: Geun Young YEOM, Se Koo KANG, Min Hwan JEON, Jong Yun PARK, Byoung Jae PARK, Je Kwan YEON
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Patent number: 8293069Abstract: A inductively coupled plasma apparatus includes reaction chamber in which a substrate is loaded, and a double comb type antenna structure including first linear antennas and second linear antennas respectively arranged horizontally to pass through the reaction chamber inside the reaction chamber. The first and second linear antenna are alternately aligned each other. First ends the first linear antennas are protruded out of the reaction chamber and coupled to each other so as to be coupled to a first induced RF power, and first ends of the second linear antennas are protruded out of the reaction chamber in opposition to the first ends of the first linear antennas and coupled to each other so as to be coupled to a second induced RF power. Plasma uniformity is improved and superior plasma uniformity is maintained by adjusting a distance between antennas according to a size of the substrate.Type: GrantFiled: December 10, 2008Date of Patent: October 23, 2012Assignee: Sungkyunkwan UniversityInventors: Geun-Young Yeom, Kyong-Nam Kim, Seung-Jae Jung
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Publication number: 20120129347Abstract: An apparatus and method for processing a surface of a substrate using neutral beams are provided to repeatedly process an oxide layer using the neutral beams having low energy to minimize electrical damage to the oxide layer and improve characteristics of the oxide layer. The apparatus is mounted in a plasma generating chamber, and includes: an ion beam generating gas inlet, which injects a gas for generating ion beams; an ion source, which generates the ion beams having a polarity from the gas introduced through the ion beam generating gas inlet; a grid assembly, which is installed on one end of the ion source; a reflector, which is aligned with the grid assembly and converts the ion beams to the neutral beams; and a stage, on which the substrate is placed on a traveling path of the neutral beams.Type: ApplicationFiled: November 10, 2011Publication date: May 24, 2012Inventors: Geun-Young Yeom, Byoung-Jae Park, Sung-Woo Kim
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Publication number: 20110192820Abstract: An atomic layer etching apparatus using reactive radicals and neutral beams and an etching method using the same are provided.Type: ApplicationFiled: February 25, 2010Publication date: August 11, 2011Applicant: SUNGKYUNKWAN UNIVERSITY Foundation for Corporate CollaborationInventors: Geun-Young Yeom, Woong-Sun Lim, Sang-Duk Park, Yi-Yeon Kim, Byoung-Jae Park, Je-Kwan Yeon
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Publication number: 20110162581Abstract: Disclosed are an atomic layer deposition apparatus using a neutral beam and a method of depositing an atomic layer using the apparatus, capable of converting an ion beam into a neutral beam and radiating it onto a substrate to be treated. The method uses an apparatus for supplying a first reaction gas containing a material that cannot be chemisorbed onto a substrate to be treated into a reaction chamber in which the substrate is loaded, and forming a first reactant adsorption layer containing a material that cannot be chemisorbed onto the substrate; and radiating a neutral beam generated by the second reaction gas onto the substrate on which the first reactant adsorption layer is formed, and removing a material not chemisorbed onto the substrate from the first reactant adsorption layer to form a second reactant adsorption layer.Type: ApplicationFiled: March 17, 2011Publication date: July 7, 2011Inventors: Geun-Young Yeom, Do-Haing Lee, Byoung-Jae Park, Kyeong-Joon Ahn
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Patent number: 7919142Abstract: Disclosed are an atomic layer deposition apparatus using a neutral beam and a method of depositing an atomic layer using the apparatus, capable of converting an ion beam into a neutral beam and radiating it onto a substrate to be treated. The method uses an apparatus for supplying a first reaction gas containing a material that cannot be chemisorbed onto a substrate to be treated into a reaction chamber in which the substrate is loaded, and forming a first reactant adsorption layer containing a material that cannot be chemisorbed onto the substrate; and radiating a neutral beam generated by the second reaction gas onto the substrate on which the first reactant adsorption layer is formed, and removing a material not chemisorbed onto the substrate from the first reactant adsorption layer to form a second reactant adsorption layer.Type: GrantFiled: February 7, 2006Date of Patent: April 5, 2011Assignee: Sungkyunkwan University Foundation for Corporate CollaborationInventors: Geun-Young Yeom, Do-Haing Lee, Byoung-Jae Park, Kyeong-Joon Ahn
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Patent number: 7842159Abstract: A plasma processing apparatus for a very large area using a dual frequency is provided.Type: GrantFiled: July 5, 2006Date of Patent: November 30, 2010Assignee: Sungkyunkwan University Foundation for Corporate CollaborationInventors: Geun-Young Yeom, Kyong-Nam Kim
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Patent number: 7799706Abstract: A neutral beam-assisted atomic layer chemical vapor deposition (ALCVD) apparatus is provided for uniformly depositing an oxide layer filling a planarization layer or a trench to increase uniformity and density of the oxide layer using neutral beams generated by a neutral beam generator without a seam or void occurring in an atomic layer deposition (ALD) or ALD-like chemical vapor deposition (CVD) process, thereby solving problems on the void or seam and low density occurring when a high-density planarization layer or a shallow trench having a width of 65 nm or less is formed, and improving a next generation oxide layer isolation process.Type: GrantFiled: February 14, 2008Date of Patent: September 21, 2010Assignee: Sungkyunkwan University Foundation for Corporate CollaborationInventors: Geun-young Yeom, Byoung-jae Park, Sung-woo Kim, Jong-tae Lim
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Patent number: 7777178Abstract: A plasma generating apparatus and method using a neutral beam, capable of readily generating plasma at the same gas flow rate by changing the structure of an ion gun, without a separate ignition device, are provided. The apparatus includes a plasma generating part formed of a quartz cup, a radio frequency (RF) applying antenna disposed at the periphery of the plasma generating part, a cooling water supply part disposed at the periphery of the plasma generating part, and an igniter in direct communication with the plasma generating part, wherein a gas for generating plasma is supplied into the igniter, and the igniter has a higher local pressure than the plasma generating part at the same gas flow rate. The ion gun is also cheaper to manufacture since it does not require a separate power supply.Type: GrantFiled: March 23, 2006Date of Patent: August 17, 2010Assignee: Sungyunkwan University Foundation for Corporate CollaborationInventors: Geun-Young Yeom, Sang-Duk Park, Chang-Kwon Oh
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Publication number: 20100117096Abstract: The invention provides a reliable technique to fabricate a new vertical structure compound semiconductor devices with highly improved light output. An exemplary embodiment of a method of fabricating light emitting semiconductor devices comprising the steps of forming a light emitting layer, and forming an undulated surface over light emitting layer to improve light output. In one embodiment, the method further comprises the step of forming a lens over the undulated surface of each of the semiconductor devices. In one embodiment, the method of claim further comprises the steps of forming a contact pad over the semiconductor structure to contact with the light emitting layer, and packaging each of the semiconductor devices in a package including an upper lead frame and lower lead frame. Advantages of the invention include an improved technique for fabricating semiconductor devices with great yield, reliability and light output.Type: ApplicationFiled: January 19, 2010Publication date: May 13, 2010Applicant: VERTICLE, INC.Inventors: Myung Cheol Yoo, Dong Woo Kim, Geun Young Yeom
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Publication number: 20090203221Abstract: An apparatus and method for incorporating a composition into a substrate using neutral beams are provided to repeatedly process an oxide layer using the neutral beams having low energy to minimize electrical damage to the oxide layer and improve characteristics of the oxide layer. The apparatus is mounted in a plasma generating chamber, and includes: an ion beam generating gas inlet, which injects a gas for generating ion beams; an ion source, which generates the ion beams having a polarity from the gas introduced through the ion beam generating gas inlet; a grid assembly, which is installed on one end of the ion source; a reflector, which is aligned with the grid assembly and converts the ion beams to the neutral beams; and a stage, on which the substrate is placed on a traveling path of the neutral beams. Formation of the oxide layer and application of the neutral beams are repeatedly performed on the substrate so as to improve the characteristics of the oxide layer.Type: ApplicationFiled: February 14, 2008Publication date: August 13, 2009Applicant: SUNGKYUNKWAN UNIVERSITY FoundationInventors: Geun-young YEOM, Byoung-jae Park, Sung-woo Kim
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Publication number: 20090203226Abstract: A neutral beam-assisted atomic layer chemical vapor deposition (ALCVD) apparatus is provided for uniformly depositing an oxide layer filling a planarization layer or a trench to increase uniformity and density of the oxide layer using neutral beams generated by a neutral beam generator without a seam or void occurring in an atomic layer deposition (ALD) or ALD-like chemical vapor deposition (CVD) process, thereby solving problems on the void or seam and low density occurring when a high-density planarization layer or a shallow trench having a width of 65 nm or less is formed, and improving a next generation oxide layer isolation process.Type: ApplicationFiled: February 14, 2008Publication date: August 13, 2009Applicant: SUNGKYUNKWAN UNIVERSITY Foundation for Corporate CollaborationInventors: Geun-young Yeom, Byoung-jae Park, Sung-woo Kim, Jong-tae Lim
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Publication number: 20090173445Abstract: An inductively coupled plasma processing apparatus for a large area processing includes a reaction chamber and a bending type antenna structure. The bending type antenna structure includes bending type linear antennas. Each of the bending type linear antennas has a first end, a second end and a bended portion. The bending type linear antennas are arranged horizontally in parallel with the substrate to pass through the reaction chamber inside the reaction chamber. The bending type linear antennas are spaced apart from each other. A bended portion of a bending type linear antenna is protruded out of the reaction chamber, a first end of each of the bending type linear antennas is protruded out of the reaction chamber and is coupled to an RF power, and a second end of each of the bending type linear antennas is protruded out of the reaction chamber and is coupled to a ground.Type: ApplicationFiled: December 11, 2008Publication date: July 9, 2009Inventors: Geun-Young Yeom, Young-Joon Lee, Kyong-Nam Kim
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Publication number: 20090133840Abstract: A inductively coupled plasma apparatus includes reaction chamber in which a substrate is loaded, and a double comb type antenna structure including first linear antennas and second linear antennas respectively arranged horizontally to pass through the reaction chamber inside the reaction chamber. The first and second linear antenna are alternately aligned each other. First ends the first linear antennas are protruded out of the reaction chamber and coupled to each other so as to be coupled to a first induced RF power, and first ends of the second linear antennas are protruded out of the reaction chamber in opposition to the first ends of the first linear antennas and coupled to each other so as to be coupled to a second induced RF power. Plasma uniformity is improved and superior plasma uniformity is maintained by adjusting a distance between antennas according to a size of the substrate.Type: ApplicationFiled: December 10, 2008Publication date: May 28, 2009Inventors: Geun-Young Yeom, Kyong-Nam Kim, Seung-Jae Jung
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Publication number: 20080315188Abstract: In a thin film depositing apparatus, a first reaction gas, a second reaction gas, and a non-volatile gas are supplied to a reaction chamber in order to form a protective layer, in which an organic layer and an inorganic layer are alternately stacked, on a process substrate. The first reaction gas is supplied to the reaction chamber only while the inorganic layer is formed on the process substrate, and the second reaction gas and the non-volatile gas are supplied to the reaction chamber through while the inorganic and organic layers are formed on the process substrate. Thus, the discontinuous surfaces may be prevented from being formed between the organic layer and the inorganic layer, thereby preventing the peeling of the organic and inorganic layers and increasing light transmittance.Type: ApplicationFiled: December 3, 2007Publication date: December 25, 2008Inventors: Tae-Hyung Hwang, Geun-Young Yeom, Chang-Hyun Jeong, June-Hee Lee
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Patent number: 7397099Abstract: Provided is a method of manufacturing a nano-sized MTJ cell in which a contact in the MTJ cell is formed without forming a contact hole. The method of forming the MTJ cell includes forming an MTJ layer on a substrate, forming an MTJ cell region by patterning the MTJ layer, sequentially depositing an insulating layer and a mask layer on the MTJ layer, exposing an upper surface of the MTJ cell region by etching the mask layer and the insulating layer at the same etching rate, and depositing a metal layer on the insulating layer and the MTJ layer.Type: GrantFiled: February 26, 2007Date of Patent: July 8, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Soon-won Hwang, I-hun Song, Geun-young Yeom, Seok-jae Chung
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Patent number: 7338577Abstract: An inductively coupled plasma processing apparatus for a large area processing, the inductively coupled plasma processing apparatus comprising: a reaction chamber; a plurality of linear antennas horizontally arranged at an inner upper portion of the reaction chamber while being spaced from each other by a predetermined distance for receiving induced RF power, the linear antennas being coupled to each other at an outer portion of the reaction chamber, the linear antennas including at least one bending antenna formed by connecting first ends of adjacent antennas, which are exposed to the outer portion of the reaction chamber, to each other; and at least one magnet positioned adjacent to the linear antennas for creating a magnetic field perpendicularly crossing an electric field created by the linear antennas in such a manner that electrons perform a spiral movement.Type: GrantFiled: May 15, 2003Date of Patent: March 4, 2008Assignee: Sungkyukwan UniversityInventors: Geun-Young Yeom, Young-Joon Lee, Kyong-Nam Kim
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Publication number: 20070221833Abstract: A plasma generating apparatus and method using a neutral beam, capable of readily generating plasma at the same gas flow rate by changing the structure of an ion gun, without a separate ignition device, are provided. The apparatus includes a plasma generating part formed of a quartz cup, a radio frequency (RF) applying antenna disposed at the periphery of the plasma generating part, a cooling water supply part disposed at the periphery of the plasma generating part, and an igniter in direct communication with the plasma generating part, wherein a gas for generating plasma is supplied into the igniter, and the igniter has a higher local pressure than the plasma generating part at the same gas flow rate. The ion gun is also cheaper to manufacture since it does not require a separate power supply.Type: ApplicationFiled: March 23, 2006Publication date: September 27, 2007Applicant: SUNGKYUNKWAN UNIVERSITY Foundation for Corporate CollaborationInventors: Geun-Young YEOM, Sang-Duk PARK, Chang-Kwon OH
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Publication number: 20070164338Abstract: Provided is a method of manufacturing a nano-sized MTJ cell in which a contact in the MTJ cell is formed without forming a contact hole. The method of forming the MTJ cell includes forming an MTJ layer on a substrate, forming an MTJ cell region by patterning the MTJ layer, sequentially depositing an insulating layer and a mask layer on the MTJ layer, exposing an upper surface of the MTJ cell region by etching the mask layer and the insulating layer at the same etching rate, and depositing a metal layer on the insulating layer and the MTJ layer.Type: ApplicationFiled: February 26, 2007Publication date: July 19, 2007Applicant: Samsung Electronics Co., Ltd.Inventors: Soon-won Hwang, I-hun Song, Geun-young Yeom, Seok-jae Chung
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Patent number: 7220601Abstract: Provided is a method of manufacturing a nano-sized MTJ cell in which a contact in the MTJ cell is formed without forming a contact hole. The method of forming the MTJ cell includes forming an MTJ layer on a substrate, forming an MTJ cell region by patterning the MTJ layer, sequentially depositing an insulating layer and a mask layer on the MTJ layer, exposing an upper surface of the MTJ cell region by etching the mask layer and the insulating layer at the same etching rate, and depositing a metal layer on the insulating layer and the MTJ layer.Type: GrantFiled: January 13, 2005Date of Patent: May 22, 2007Assignee: Samsung Electronics Co., Ltd.Inventors: Soon-won Hwang, I-hun Song, Geun-young Yeom, Seok-jae Chung