Abstract: Plasma processing systems and methods are disclosed. The system may include at least one modulating supply that modulates plasma properties where the modulation of the plasma properties has a repetition period, T. A synchronization module configured to send a synchronization signal with a synchronization-signal-repetition-period that is an integer multiple of T to at least one piece of equipment connected to the plasma processing system. A waveform-communication module communicates characteristics of a characterized waveform to at least one piece of equipment connected to the plasma system to enable synchronization of pieces of equipment connected to the plasma processing system. The characterized waveform may contain information about the modulation of the plasma or information about a desired waveform of a piece of equipment connected to the plasma processing system.

Abstract: Bias supplies, plasma processing systems, and associated methods are disclosed. One bias supply comprises a first inductor coupled between a first node of a switch and an output node where a first node of a second inductor is coupled to one of the output node or the first node of the switch. A voltage source is coupled between a second node of the switch and a second node of the second inductor. A connection is made between the return node and one of the second node of the switch and the second node of the second inductor. The bias supply also comprises a controller configured to cause an application of the periodic voltage between the output node and the return node by repeatedly closing the switch so current through the switch completes a full cycle.

Abstract: Bias supplies, plasma processing systems, and associated methods are disclosed. One bias supply comprises a first inductor coupled between a first node of a switch and an output node where a first node of a second inductor is coupled to one of the output node or the first node of the switch. A voltage source is coupled between a second node of the switch and a second node of the second inductor. A connection is made between the return node and one of the second node of the switch and the second node of the second inductor. The bias supply also comprises a controller configured to cause an application of the periodic voltage between the output node and the return node by repeatedly closing the switch so current through the switch completes a full cycle.

Abstract: Input impedance networks and associated methods are disclosed. An input impedance network comprises a source-terminal-pair configured to couple to a power source, a recovered-power-terminal-pair configured to couple to a power sink, a transmission line coupled to the source-terminal-pair that comprises M sections, and N clamping circuits. Each of the N clamping circuits is configured to clamp at least one of voltage or current in one of the M sections, and a power recovery circuit is coupled to the N clamping circuits to enable recovered energy to be applied to the recovered-power-terminal-pair.

Abstract: Various embodiments are directed to a switch circuit comprising: two terminal nodes, comprising an upper node and a lower node; a plurality of switch modules, connected in series between the upper node and the lower node, wherein each of the switch modules comprises a switch, a rectifier, and a capacitor; a connecting circuit, coupled to the switch modules; and a power converter, coupled to the connecting circuit and to a power sink. The switch circuit is configured to limit a voltage or a component of a voltage in the switch circuit, and to recover power from the limiting of the voltage, wherein recovering the power comprises diverting power from the switch modules via the connecting circuit to the power converter, and the power converter outputting the power to the power sink.

Abstract: Plasma processing systems and methods are disclosed. The system may include at least one modulating supply that modulates plasma properties where the modulation of the plasma properties has a repetition period, T. A synchronization module configured to send a synchronization signal with a synchronization-signal-repetition-period that is an integer multiple of T to at least one piece of equipment connected to the plasma processing system. A waveform-communication module communicates characteristics of a characterized waveform to at least one piece of equipment connected to the plasma system to enable synchronization of pieces of equipment connected to the plasma processing system. The characterized waveform may contain information about the modulation of the plasma or information about a desired waveform of a piece of equipment connected to the plasma processing system.

Abstract: Plasma processing and power supply systems and methods are disclosed. The plasma processing system comprises a high-frequency generator configured to deliver power to a plasma chamber and a low-frequency generator configured to deliver power to the plasma chamber. A filter is coupled between the plasma chamber and the high-frequency generator, and the filter suppresses mixing products of high frequencies produced by the high-frequency generator and low frequencies produced by the low-frequency generator. The plasma processing system also comprises means for frequency tuning the high-frequency generator using a probe signal that is concurrently applied with the power applied to the plasma chamber at the primary frequency.

Abstract: Plasma processing systems and methods are disclosed. The system may include at least one modulating supply that modulates plasma properties where the modulation of the plasma properties has a repetition period, T. A synchronization module configured to send a synchronization signal with a synchronization-signal-repetition-period that is an integer multiple of T to at least one piece of equipment connected to the plasma processing system. A waveform-communication module communicates characteristics of a characterized waveform to at least one piece of equipment connected to the plasma system to enable synchronization of pieces of equipment connected to the plasma processing system. The characterized waveform may contain information about the modulation of the plasma or information about a desired waveform of a piece of equipment connected to the plasma processing system.

Abstract: Various embodiments are directed to a switch circuit comprising: two terminal nodes, comprising an upper node and a lower node; a plurality of switch modules, connected in series between the upper node and the lower node, wherein each of the switch modules comprises a switch, a rectifier, and a capacitor; a connecting circuit, coupled to the switch modules; and a power converter, coupled to the connecting circuit and to a power sink. The switch circuit is configured to limit a voltage or a component of a voltage in the switch circuit, and to recover power from the limiting of the voltage, wherein recovering the power comprises diverting power from the switch modules via the connecting circuit to the power converter, and the power converter outputting the power to the power sink.

Abstract: This disclosure describes systems, methods, and apparatuses for a power system comprising a generator connected to a solid-state match network and a synchronization module connected to the generator and the solid-state match network, wherein the synchronization module is configured to synchronize a power delivered by the generator to the match network with the opening and closing of switches in the solid-state matching network.

Abstract: This disclosure describes systems, methods, and apparatuses for a two-stage solid state match having a load side and a source side; a first coarse stage and a second precision stage, wherein the first coarse stage is coupled between the second precision stage and the load side, and wherein the second precision stage is coupled between the source side and an input of the first coarse stage; the coarse first stage comprising at least one switched variable reactance element, wherein the coarse first stage is configured to map a load impedance connected to the load side to a first number of intermediate impedances at the input of the first coarse stage; and wherein the second precision stage is configured to map at least one of the intermediate impedances to a second number of input impedances at the source side.

Abstract: Various embodiments are directed to a voltage clamp system comprising: a rectifier; a protected node, a reference node, and one or more internal nodes, coupled to the rectifier; a power converter, coupled to the rectifier via the one or more internal nodes; and one or more output nodes coupled to the power converter and configured to couple to a power sink. The rectifier and the power converter are configured to output power via one or more output nodes coupled to the rectifier, and to limit a component of the voltage between the protected node and the reference node.

Abstract: This disclosure describes systems, methods, and apparatuses for a PIN diode switch comprising series connected PIN diodes, the series connected PIN diodes comprising two or more PIN diodes connected in series, wherein each of the two or more PIN diodes comprises a first node and a second node; and an internal node positioned where a first node of a first PIN diode connects to a second node of a second, adjacent PIN diode; a RF bypass capacitor connected between a reference node and a first end of the series connected PIN diodes, and wherein a second end of the series connected PIN diodes is connected to the reference node; an RF circuit connected between the reference node and the internal node; and a PIN diode driver connected across the RF bypass capacitor.

Abstract: A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern based on measurements taken one or more repetition periods in the past. A variable impedance match network may control the impedance presented to a radio frequency generator while the generator produces the output that follows the prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling variable impedance elements in the match during sections of the pattern based on measurements taken one or more repetition periods in the past.

Abstract: This disclosure describes systems, methods, and apparatus for a two-stage PIN diode driver. The first stage can charge and discharge the PIN diode via a resonant circuit, for instance via a power supply in series with switches and an inductor or other inductive component, while the second stage, or holding stage includes both a first holding supply for maintaining a forward bias current through the PIN diode and a second holding supply for maintaining a reverse bias voltage over the PIN diode.

Abstract: A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern based on measurements taken one or more repetition periods in the past. A variable impedance match network may control the impedance presented to a radio frequency generator while the generator produces the output that follows the prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling variable impedance elements in the match during sections of the pattern based on measurements taken one or more repetition periods in the past.

Abstract: Plasma processing systems and methods are disclosed. The plasma processing system includes a high-frequency generator configured to deliver power to a plasma chamber and a low-frequency generator configured to deliver power to the plasma chamber. A filter is coupled between the plasma chamber and the high-frequency generator, and the filter suppresses mixing products of high frequencies produced by the high-frequency generator and low frequencies produced by the low-frequency generator.

Abstract: A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern based on measurements taken one or more repetition periods in the past. A variable impedance match network may control the impedance presented to a radio frequency generator while the generator produces the output that follows the prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling variable impedance elements in the match during sections of the pattern based on measurements taken one or more repetition periods in the past.

Abstract: Plasma processing systems and methods are disclosed. The plasma processing system includes a high-frequency generator configured to deliver power to a plasma chamber and a low-frequency generator configured to deliver power to the plasma chamber. A filter is coupled between the plasma chamber and the high-frequency generator, and the filter suppresses mixing products of high frequencies produced by the high-frequency generator and low frequencies produced by the low-frequency generator.

Abstract: Various embodiments are directed to a voltage clamp system comprising: a rectifier; a protected node, a reference node, and one or more internal nodes, coupled to the rectifier; a power converter, coupled to the rectifier via the one or more internal nodes; and one or more output nodes coupled to the power converter and configured to couple to a power sink. The rectifier and the power converter are configured to output power via one or more output nodes coupled to the rectifier, and to limit a component of the voltage between the protected node and the reference node.