Patents by Inventor Gordon A. Shaw

Gordon A. Shaw has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5814282
    Abstract: A polycondensation reactor for polyesters, polyamides or polyarylates, for example, in which a low viscosity material is introduced into the reactor and a relative high viscosity polymer exits the reactor. The reactor has at least two longitudinally intersecting cylindrical interior chambers, each with a rotating shaft through its length. Each shaft has a plurality of stirrers and spacers designed to wipe all interior surfaces of the reactor. The stirrers can be shaped as a cycloid or involute profile, for example. Generally the stirrers on each shaft are indexed from one another preferably by 90.degree. and intermesh with stirrers on the adjacent shaft. Stirring the low viscosity material by rotating the stirrers (on the shafts) spreads the material into a plurality of thin films. At the temperature and vacuum conditions of the reactor, a volatile component is removed, thus causing the material to polymerize, by condensation, forming a relatively high viscosity polymer.
    Type: Grant
    Filed: January 15, 1997
    Date of Patent: September 29, 1998
    Inventors: Hans Lohe, Hartmut Hey, Gordon Shaw, W. Jeffrey Stikeleather
  • Patent number: 5624429
    Abstract: A distinctive article can include an elastomerically stretchable side panel having a longitudinal dimension and a lateral dimension. A member of hook material is operably connected to a first, laterally outboard edge portion of the side panel, and each member of hook material includes a hook base layer which has an appointed fastening region and an appointed grip region. The fastening region has a plurality of hook elements which are integrally formed with the base layer and extend away from a base plane of the hook base layer. The hook elements are configured to operably engage a selected, cooperating loop material. The grip region has a relatively lower density of the hook elements per unit area, as compared to the fastening region. The fastening region is interposed between the side panel and the grip region. The grip region provides a laterally terminal edge of the article.
    Type: Grant
    Filed: March 6, 1996
    Date of Patent: April 29, 1997
    Assignee: Kimberly-Clark Corporation
    Inventors: Andrew M. Long, Andrew E. Huntoon, Sang V. Tran, Lori A. Roocks, Patrick R. Lord, Gordon A. Shaw
  • Patent number: 5599507
    Abstract: A polycondensation reactor for processing low viscosity polyester or another polymer into relatively highly viscosity polymer comprises a substantially cylindrical horizontal reactor vessel with a polymer inlet and a polymer outlet adjacent its opposite ends and a vapor exhaust opening in the upper side of the vessel at its outlet end. A polymer agitator is rotated axially within the chamber and includes plural alternating annular overflow and underflow baffles and multiple perforated film-forming screens disposed therebetween in parallel spaced relation to one another. The overflow baffles are in peripheral polymer-sealing relation to the vessel while the underflow baffles have multiple underflow recesses in their outer peripheries, whereby the baffles define a tortuous polymer flow path alternately through their respective polymer overflow and underflow openings to control residence time, distribution and viscosity growth as the polymer flows between the baffles.
    Type: Grant
    Filed: November 9, 1994
    Date of Patent: February 4, 1997
    Inventors: Gordon Shaw, Rainer A. Schaller, W. Jeffrey Stikeleather, Michael D. Melton, Harmut Hey, Roland Schmidt, Rolf Hartmann, Hans Lohe
  • Patent number: 5212108
    Abstract: A method for fabricating polysilicon resistors of intermediate high value for use as cross-coupling or =ingle event upset (SEU) resistors in memory cells. A thin polysilicon film is implanted with arsenic ions to produce a predetermined resistivity. The thin film is then implanted with fluorine ions to stabilize the grain boundaries and thereby the barrier height. Reducing the variation in barrier height from run to run of wafers allows the fabrication of reproducible SEU resistors.
    Type: Grant
    Filed: December 13, 1991
    Date of Patent: May 18, 1993
    Assignee: Honeywell Inc.
    Inventors: Michael S. Liu, Gordon A. Shaw, Jerry Yue
  • Patent number: 4958042
    Abstract: Acrylonitrile is dimerized in a homogenious liquid phase comprising a phosphinite or phosphonite catalyst, a proton donating solvent and an aromatic and aliphatic hydrocarbon solvent, the aromatic solvent, unconverted acrylonitrile and proton donating solvent is distilled from the product and a mixture is left which separates into two phases, one comprising the catalyst and the other the dinitrile.
    Type: Grant
    Filed: October 26, 1988
    Date of Patent: September 18, 1990
    Assignee: Imperial Chemical Industries PLC
    Inventors: Gordon Shaw, Jose Lopez-Merono
  • Patent number: 4751321
    Abstract: Phosphinites or phosphonites are produced by reacting potassium or sodium aryls with compounds of formula ROPClX in which X is an R'O, Cl or aryl group, R and R' being alkyl or cycloalkyl groups at a temperature of at most 10.degree. C.
    Type: Grant
    Filed: February 3, 1987
    Date of Patent: June 14, 1988
    Assignee: Imperial Chemical Industries PLC
    Inventors: Jonathan Mann, Gordon Shaw