Abstract: A method for forming a dual damascene pattern includes preparing a multi-functional hard mask composition including a silicon resin as a base resin, wherein the silicon resin comprises about 20 to 45% silicon molecules by weight, based on a total weight of the resin; forming a deposition structure by sequentially forming a self-arrangement contact (SAC) insulating film, a first dielectric film, an etching barrier film, and a second dielectric film over a hardwiring layer; etching the deposition structure to expose the hardwiring layer, thereby forming a via hole; coating the multi-functional hard mask composition over the second dielectric film and in the via hole to form a multi-functional hard mask film; and etching the resulting structure to expose a part of the first dielectric film using a photoresist pattern as an etching mask, thereby forming a trench having a width greater than that of the via hole.

Abstract: A method for forming a pattern of a semiconductor device includes: forming a first mask film and a second mask film over an underlying layer; partially etching the first and second mask films using a photoresist mask pattern as an etching mask to form a intermediate mask pattern having a protrusion shape and including first and second mask film layers, over a remaining portion of the first mask film; forming a first spacer at sidewalls of the intermediate mask pattern etching the remaining portion of the first mask film and the first mask film layer of the intermediate mask pattern using the first spacer and the second mask film layer of the intermediate mask pattern as an etching mask to expose the underlying layer and form a mask pattern having first and second mask film layers; forming a second spacer at sidewalls of the mask pattern; and removing the mask pattern to form a symmetrical spacer pattern.

Abstract: An image-forming apparatus includes a print head unit including a plurality of head chips disposed in a widthwise direction of a supplied printing medium to eject ink to form an image, a wiping unit including a plurality of wiper members disposed in the widthwise direction of the printing medium, and a support member supporting the plurality of wiper members and located below the print head unit to move upwardly and downwardly. The image-forming apparatus also includes an ink discharging unit which accommodates and discharges ink spitted from the print head unit, an elevating driving unit which moves the wiping unit upwardly and downwardly between at least two positions of a first forward position which is a wiping standby position, a second forward position which is a scrapping position, and a retracted position, and a widthwise direction driving unit which reciprocates the wiping unit positioned in the first or second forward positions by the elevating driving unit.

Abstract: An inkjet image forming apparatus includes a main body frame, a medium supplying unit which is coupled to the main body frame and supplying a print medium, an image forming cartridge which is coupled to the main body frame, forms an image on the supplied print medium, and including a nozzle to eject ink, and a wiping assembly which wipes the nozzle. The wiping assembly includes a wiping sheet storage unit in which the wiping sheet is stored as being wound, a transfer shuttle which moves along arrangement of the nozzle by a driving force of a driving source, a pressing member which is provided in the transfer shuttle and presses a region of the wiping sheet against the nozzle to perform wiping using the wiping sheet, and a wiping sheet support unit which is provided in the transfer shuttle and restricts move of the wiping sheet while the nozzle is wiped.

Abstract: A scrapping unit and an image forming apparatus having the same, and cleaning methods thereof to improve a maintenance performance. The scrapping unit cleans a polluted member disposed in an image forming apparatus and stained by a polluting material. The scrapping unit may include an endless belt to circulate between an exposed position where a surface of the endless belt is exposed toward the polluted member, and a non-exposed position where the surface of the endless belt is not exposed with respect to the polluted member, and a belt support frame which includes a belt support surface to support the endless belt so that the endless belt can be unfolded in the exposed position, and a storing space to store the endless belt so that the endless belt can be folded in the non-exposed position.

Abstract: A method for forming a dual damascene pattern includes preparing a multi-functional hard mask composition including a silicon resin as a base resin, wherein the silicon resin comprises about 20 to 45% silicon molecules by weight, based on a total weight of the resin; forming a deposition structure by sequentially forming a self-arrangement contact (SAC) insulating film, a first dielectric film, an etching barrier film, and a second dielectric film over a hardwiring layer; etching the deposition structure to expose the hardwiring layer, thereby forming a via hole; coating the multi-functional hard mask composition over the second dielectric film and in the via hole to form a multi-functional hard mask film; and etching the resulting structure to expose a part of the first dielectric film using a photoresist pattern as an etching mask, thereby forming a trench having a width greater than that of the via hole.

Abstract: A method for forming a dual damascene pattern includes preparing a multi-functional hard mask composition including a silicon resin as a base resin; forming a deposition structure including a self-arrangement contact insulation film, a first dielectric film, an etching barrier film, and a second dielectric film over a hardwiring layer; etching the deposition structure to expose the hardwiring layer, thereby forming a via hole; forming the multi-functional hard mask composition on the second dielectric film and in the via hole to form a multi-functional hard mask film; and etching the resulting structure to expose a part of the first dielectric film, thereby forming a trench having a width wider than that of the via hole; and removing the multi-functional hard mask film.

Abstract: Provided is an inkjet printer having an improved wiper cleaning function, the inkjet printer including a tool to directly scrape ink on a wiper, suctioning the ink, and collecting the ink into a waste ink can.

Abstract: An inkjet image forming apparatus and a method of printing an image using the same includes determining the positions and number of defective nozzles incapable of properly spraying ink. It is determined whether the array head is in a printable state or a restoration procedure to restore the defective nozzles to a normal state is required, based on the determined positions and number of the defective nozzles. When the array head is in the printable state, a printing operation may be performed. When the restoration procedure to restore the defective nozzles to a normal state is required, the restoration procedure is performed, the positions and number of the defective nozzles are predetermined, and it is predetermined whether the array head is in the printable state.

Abstract: An inkjet printer having a suction function and a method of operating the inkjet printer includes a suction instrument that applies a suction force toward a platen so as to closely attach a printing medium to the platen during a printing operation and to suck spitted ink in a printing standby state.

Abstract: A method for forming a pattern of a semiconductor device includes: forming a first mask film and a second mask film over an underlying layer; partially etching the first and second mask films using a photoresist mask pattern as an etching mask to form a intermediate mask pattern having a protrusion shape and including first and second mask film layers, over a remaining portion of the first mask film; forming a first spacer at sidewalls of the intermediate mask pattern etching the remaining portion of the first mask film and the first mask film layer of the intermediate mask pattern using the first spacer and the second mask film layer of the intermediate mask pattern as an etching mask to expose the underlying layer and form a mask pattern having first and second mask film layers; forming a second spacer at sidewalls of the mask pattern; and removing the mask pattern to form a symmetrical spacer pattern.

Abstract: A method for manufacturing a semiconductor device includes forming an etch-target layer over a semiconductor substrate having a lower structure, forming a first mask pattern over the etch-target layer, forming a spacer material layer with a uniform thickness over the etch-target layer including the first mask pattern, forming a second mask pattern on an indented region of the space material layer, and etching the etch-target layer with the first mask pattern and the second mask pattern as an etch mask to form a fine pattern.

Abstract: An image forming apparatus having a hybrid inkjet head and an inkjet head wiping device includes an array type inkjet head, the first guide part, a carrier, a shuttle type inkjet head, a paper delivery unit, a controller, and a wiping device. The array type inkjet head prints an image onto a printing medium at a stationary state and has the first nozzle unit. The first guide part is spaced apart from the array type inkjet head to dace the array type inkjet head, and the carrier is movably coupled with the first guide part and reciprocates in a width direction of the printing medium. The shuttle type inkjet head has the second nozzle unit and the paper-delivery unit delivers the printing medium to the inkjet heads. The controller controls operations of the inkjet heads and the paper-delivery unit, and the wiping device contacts a surface of the first nozzle unit to wipe out residual ink from the first nozzle unit.

Abstract: A print head cleaning device and an ink-jet image forming apparatus having the same are disclosed. The ink-jet image forming apparatus includes a print head having a nozzle part to eject an ink, and a print head cleaning device to clean the nozzle part. The print head cleaning device includes a cleaning liquid tank to store a cleaning liquid, a cleaning bath mounted below the nozzle part to be supplied with the cleaning liquid from the cleaning liquid tank, a connecting tube to connect the cleaning liquid tank to the cleaning bath, a pump connected to the connecting tube to circulate the cleaning liquid, a sensing tube mounted in a portion of the connecting tube and provided with a flow passage through which the cleaning liquid flows, a moving member mounted within the flow passage of the sensing tube so as to move by the flow of the cleaning liquid, and a sensor to sense the movement of the moving member.

Abstract: A method for forming a dual damascene pattern includes preparing a multi-functional hard mask composition including a silicon resin as a base resin; forming a deposition. structure including a self-arrangement contact insulation film, a first dielectric film, an etching barrier film, and a second dielectric film over a hardwiring layer; etching the deposition structure to expose the hardwiring layer, thereby forming a via hole; forming the multi-functional hard mask composition on the second dielectric film and in the via hole to form a multi-functional hard mask film; and etching the resulting structure to expose a part of the first dielectric film, thereby forming a trench having a width wider than that of the via hole; and removing the multi-functional hard mask film.

Abstract: An image forming apparatus and a method of controlling a driving of the image forming apparatus. The image forming apparatus includes an ink cartridge including a plurality of printheads which form an image on a printing material, a capping unit movable between a first position to cover the printheads and a second position which is located away from the printheads, a wiping unit which moves in a direction of printing material conveyance, and wipes the printheads, and a cleaning member provided in the capping unit to clean an ink of the wiping unit.

Abstract: An image forming apparatus having a hybrid inkjet head and an inkjet head wiping device includes an array type inkjet head, the first guide part, a carrier, a shuttle type inkjet head, a paper delivery unit, a controller, and a wiping device. The array type inkjet head prints an image onto a printing medium at a stationary state and has the first nozzle unit. The first guide part is spaced apart from the array type inkjet head to dace the array type inkjet head, and the carrier is movably coupled with the first guide part and reciprocates in a width direction of the printing medium. The shuttle type inkjet head has the second nozzle unit and the paper-delivery unit delivers the printing medium to the inkjet heads. The controller controls operations of the inkjet heads and the paper-delivery unit, and the wiping device contacts a surface of the first nozzle unit to wipe out residual ink from the first nozzle unit.