Abstract: A router is used to produce a first integrated circuit structure according to an engineering change order. An initial detail routing topology is imported for the first integrated circuit structure. An engineering change order is received instructing the router to change a portion of the initial detail routing topology for the first integrated circuit structure. A global routing operation is performed which routes global wires for the portion of the initial detail routing topology for the first integrated circuit structure. For each global wire which is routed, a specific global wiring track is selected for the global wire within each edge of a set of global tiles in a routing topology for the first integrated circuit.

Abstract: Various embodiments include computer-implemented methods, computer program products and systems for aligning a set of orthogonal circuit elements in an integrated circuit (IC) layout. In some embodiments, a computer-implemented method for aligning a set of orthogonal circuit elements in an IC layout includes: classifying each orthogonal circuit element in the set of orthogonal circuit elements as including a first space-designated edge and a second space-designated edge; and aligning each orthogonal circuit element on an edge placement grid according to the first space-designated edge and the second space-designated edge, the edge placement grid having a first set of space-designated grid lines separated by a first distance, and a second set of space-designated grid lines separated by a second distance, wherein the first set of space-designated grid lines is separated from the second set of space-designated grid lines by an offset distance.

Abstract: Methods of the present disclosure can include: using a computing device to perform actions including: applying a design rule check (DRC) on a proposed integrated circuit (IC) layout, wherein the DRC applies a set of restrictive design rules (RDRs) in response to the proposed IC layout being a contact area (CA) layout; computing a conflict graph for the proposed IC layout in response to one of the IC layout being a metal layer layout and the set of RDRs being satisfied; determining whether the IC layout is one of non-colorable, indeterminate, partially colorable, and fully colorable; and partially coloring the IC layout and identifying non-colorable nodes in response to the IC layout being indeterminate or partially colorable.

Abstract: A mechanism is provided in a data processing system for timing-driven routing for noise reduction in integrated circuit design. Responsive to performing timing driving routing on an integrated circuit design, the mechanism identifies a set of noise-critical nets in the integrated circuit design. The mechanism performs timing driven routing on the integrated circuit design with noise constraints based on the set of noise-critical nets.

Abstract: Various embodiments include computer-implemented methods, computer program products and systems for aligning a set of orthogonal circuit elements in an integrated circuit (IC) layout. In some embodiments, a computer-implemented method for aligning a set of orthogonal circuit elements in an IC layout includes: classifying each orthogonal circuit element in the set of orthogonal circuit elements as including a first space-designated edge and a second space-designated edge; and aligning each orthogonal circuit element on an edge placement grid according to the first space-designated edge and the second space-designated edge, the edge placement grid having a first set of space-designated grid lines separated by a first distance, and a second set of space-designated grid lines separated by a second distance, wherein the first set of space-designated grid lines is separated from the second set of space-designated grid lines by an offset distance.

Abstract: Solutions for efficiently implementing a via into a multi-level integrated circuit layout are disclosed. In various embodiments, a method of creating a multi-level integrated circuit layout with at least one via is disclosed, the method including: providing at least two layers of the multi-level integrated circuit layout; and selecting a via for connecting the at least two layers, wherein the selecting includes retrieving the via from a via library including a plurality of via types, the plurality of via types prioritized in the via library according to a predicted manufacturing yield for each of the plurality of vias.

Abstract: Solutions for efficiently implementing a via into a multi-level integrated circuit layout are disclosed. In various embodiments, a method of creating a multi-level integrated circuit layout with at least one via is disclosed, the method including: providing at least two layers of the multi-level integrated circuit layout; and selecting a via for connecting the at least two layers, wherein the selecting includes retrieving the via from a via library including a plurality of via types, the plurality of via types prioritized in the via library according to a predicted manufacturing yield for each of the plurality of vias.

Abstract: A method receives an initial circuit design. The circuit design includes at least one path having at least one beginning point comprising a source, at least one ending point comprising a sink, and one or more circuit elements between the source and the sink. The method evaluates timing performance parameter sensitivities to manufacturing variations of each of the elements to identify how much each element will increase or decrease the timing performance parameter of the path for each change in each manufacturing variable associated with manufacturing the elements. Further, the method alters the elements within the path until elements that produce positive changes to the timing performance parameter for a given manufacturing variable change approximately equals (in magnitude) elements that produce negative changes to the timing performance parameter for the given manufacturing variable change, to produce an altered circuit design.

Abstract: A computer implemented method, data processing system, and computer program product for reworking a plurality of cells initially placed in a circuit design. An expander allocates cells to tiles, wherein some tiles have cells. The expander determines a high detailed routing cost tile class, wherein the high detailed routing cost tile class is a class of tiles that are high detailed routing cost tiles. The expander selects a cell within a tile of the high detailed routing cost tile class to form a selected cell and a selected tile. The expander places an expanded bounding box around the selected cell, wherein the bounding box extends to at least one tile adjacent the selected tile. The expander expands the selected cell within the bounding box to form a modified design, determines an aggregate routing cost among other steps, and affirms the modified design for further processing.

Abstract: Disclosed are embodiments of a method, service, and computer program product for performing yield-aware IC routing for a design. The method performs an initial global routing which satisfies wiring congestion constraints. Next, the method performs wire spreading and wire widening on the global route, layer by layer, based on, for example, a quadratic congestion optimization. Following this, timing closure is performed on the global route using results of the wire spreading and wire widening. Post-routing wiring width and wire spreading adjustments are made using the critical area yield model. In addition, the method allows for the optimization of already-routed data.

Abstract: A computer implemented method, data processing system, and computer program product for reworking a plurality of cells initially placed in a circuit design. An expander allocates cells to tiles, wherein some tiles have cells. The expander determines a high detailed routing cost tile class, wherein the high detailed routing cost tile class is a class of tiles that are high detailed routing cost tiles. The expander selects a cell within a tile of the high detailed routing cost tile class to form a selected cell and a selected tile. The expander places an expanded bounding box around the selected cell, wherein the bounding box extends to at least one tile adjacent the selected tile. The expander expands the selected cell within the bounding box to form a modified design, determines an aggregate routing cost among other steps, and affirms the modified design for further processing.

Abstract: In a first aspect, an inventive apparatus for imaging a chip on a wafer includes a combined diamond chip image and kerf image having a plurality of sloped sides. The combined diamond chip image and kerf image includes a diamond chip image comprising a plurality of chip image rows that are parallel to at least one diagonal of the diamond chip image, and includes a kerf image adjacent to the diamond chip image. The kerf image comprises at least one kerf image row that is parallel to the at least one diagonal of the diamond chip image. The apparatus further includes a blocking material extending from the combined diamond chip image and kerf image to at least a periphery of an exposure field of a stepper. In a second aspect the imaging apparatus comprises an n-sided polygon-shaped combined chip image and kerf image. Also provided are inventive methods of manufacturing chips, and wafers manufactured in accordance with the inventive methods.

Abstract: A method receives an initial circuit design. The circuit design includes at least one path having at least one beginning point comprising a source, at least one ending point comprising a sink, and one or more circuit elements between the source and the sink. The method evaluates timing performance parameter sensitivities to manufacturing variations of each of the elements to identify how much each element will increase or decrease the timing performance parameter of the path for each change in each manufacturing variable associated with manufacturing the elements. Further, the method alters the elements within the path until elements that produce positive changes to the timing performance parameter for a given manufacturing variable change approximately equals (in magnitude) elements that produce negative changes to the timing performance parameter for the given manufacturing variable change, to produce an altered circuit design.

Abstract: A method for designing a chip a priori for design subsetting, feature analysis, and yield learning. The method includes identifying a plurality of signal paths within a chip design that can be readily identified from chip fail data and removing a fraction of the plurality of signal paths that have physical design constraints to generate a subset of the plurality of signal paths. The method further includes constructing a physical implementation of each of the signal paths in the subset, identifying one or more signal paths in the subset that are not constructed consistently with the respective physical implementation, and removing those signal paths from the subset.

Abstract: Three-dimensional structures are provided which improve manufacturing yield for certain structures in semiconductor devices. The three-dimensional structures take into account the interaction between an upper layer and a lower layer where the lower layer has a tendency to form a non-planar surface due to its design. Accordingly, design changes are performed to make structures more likely to function, either by forming a more planar surface on the lower layer or by compensating in the upper layer for the lack of planarity. The changes to improve manufacturing yield are made at the design stage rather than at the fabrication stage.

Abstract: Three-dimensional structures are provided which improve manufacturing yield for certain structures in semiconductor devices. The three-dimensional structures take into account the interaction between an upper layer and a lower layer where the lower layer has a tendency to form a non-planar surface due to its design. Accordingly, structures built on a layer above the lower layer are formed on a more planar surface and thus are more likely to function properly. The changes to improve manufacturing yield are made at the design stage rather than at the fabrication stage.

Abstract: Disclosed are embodiments of a method, service, and computer program product for performing yield-aware IC routing for a design. The method performs an initial global routing which satisfies wiring congestion constraints. Next, the method performs wire spreading and wire widening on the global route, layer by layer, based on, for example, a quadratic congestion optimization. Following this, timing closure is performed on the global route using results of the wire spreading and wire widening. Post-routing wiring width and wire spreading adjustments are made using the critical area yield model. In addition, the method allows for the optimization of already-routed data.

Abstract: Disclosed are embodiments of a method, service, and computer program product for performing yield-aware IC routing for a design. The method performs an initial global routing which satisfies wiring congestion constraints. Next, the method performs wire spreading and wire widening on the global route, layer by layer, based on, for example, a quadratic congestion optimization. Following this, timing closure is performed on the global route using results of the wire spreading and wire widening. Post-routing wiring width and wire spreading adjustments are made using the critical area yield model. In addition, the method allows for the optimization of already-routed data.

Abstract: A method for designing a chip a priori for design subsetting, feature analysis, and yield learning. The method includes identifying a plurality of signal paths within a chip design that can be readily identified from chip fail data and removing a fraction of the plurality of signal paths that have physical design constraints to generate a subset of the plurality of signal paths. The method further includes constructing a physical implementation of each of the signal paths in the subset, identifying one or more signal paths in the subset that are not constructed consistently with the respective physical implementation, and removing those signal paths from the subset.

Abstract: Three-dimensional structures are provided which improve manufacturing yield for certain structures in semiconductor devices. The three-dimensional structures take into account the interaction between an upper layer and a lower layer where the lower layer has a tendency to form a non-planar surface due to its design. Accordingly, design changes are performed to make structures more likely to function, either by forming a more planar surface on the lower layer or by compensating in the upper layer for the lack of planarity. The changes to improve manufacturing yield are made at the design stage rather than at the fabrication stage.