Abstract: The present document relates to a scanning probe microscopy system comprising a sample support structure, a sensor head including a probe, a deflection sensor unit, and actuators including a Z-motion actuator and a scanning actuator. The system further comprises a control unit, able to receive the deflection sensor signal and control the actuators. The control unit comprises multiple signal processing units, each enabling to: receive the deflection signal, provide a processed signal, and cooperating with a triggering unit which compares the processed signal against a predefined triggering condition, and generates a trigger when the condition is met.

Abstract: Atomic Force Microscope (AFM) device and method of operating the same An atomic force microscopy (AFM) device (1) is disclosed that comprises at least one scan head for scanning a sample (9). A cantilever deflection detector (30) measures a deflection (d) of the probe relative to the scan head during said scanning, and provides an output signal indicative of the deflection. A controller (40) of the AFM-device receives and analyzes the output signal from the cantilever deflection detector for measuring a deflection of the probe and automatically adapts one or more imaging parameters during said scanning in accordance with information about sample properties near the location of the sample currently being scanned.

Abstract: The present invention relates to a method of performing subsurface imaging of embedded structures in a substrate underneath a substrate surface, the method comprising the steps of applying, using a signal application actuator, an acoustic input signal to the substrate, detecting, using a vibration sensor, a return signal from the substrate and analyzing the return signal for obtaining information on the embedded structures, for enabling imaging thereof wherein the step of applying the acoustic input signal comprises applying a discontinuous signal of an acoustic signal component to the substrate, the acoustic signal component having a frequency above 1 gigahertz, such that the return signal includes a scattered fraction of the discontinuous signal scattered from the embedded structures. The invention further relates to a system.

Abstract: The present disclosure concerns a z-position motion stage for use in a scanning probe microscopy system, a scanning probe microscopy system, and a method of operating the motion stage. The motion stage (1) comprises, a scanner body (10) and a driving dither (30) for driving a cantilever (51) of a probe (50) associated to the driving dither in an oscillating motion (31). The stage further comprises at least a first force balancing means (60), that acts onto the scanner body at a position opposite the driving dither (30) across a neutral center (N) of the motion stage (1), wherein the force balancing means (60) comprises at least a first balance dither (61) configured to oscillate in harmony with the driving dither.

Abstract: A grid plate encoder based positioning system (1) for positioning of an element is provided, the positioning system (1) comprises a grid plate (2) with a grid plate surface (21); an encoder unit (3) with one or more optical sensors (31) for sensing a grid plate surface pattern (23) of the grid plate surface (21); an input (7) to receive coordinates (Xd, Yd) specifying a desired position of the element; a mapping unit (8) to compute compensated coordinate data (Xa, Ya) corresponding to estimated position data expected from the encoder unit (3) when the element is positioned at a desired position (Xd, Yd) specified by the setpoint coordinates; a feedback control unit (9) providing the compensated coordinate data (Xa, Ya) as a setpoint (Xs, Ys) to a positioning unit (12), with feedback control based on the estimated position data obtained from the encoder unit. Additionally, a grid plate encoder based positioning method and a method for computing compensation data are provided.

Abstract: The invention is directed at a method of refurbishing a probe for use in a scanning probe microscopy device, wherein the probe is a used or damaged probe and includes a cantilever and a probe tip. The method comprises receiving the probe, determining an existing probe structure of the probe and mapping the existing probe structure for obtaining existing probe structure data. The method further includes identifying, based on the existing probe structure data, a deviation from an original probe structure of the probe prior to said using or damaging thereof. Based on the deviation, structural modification data indicative of a structural modification for modifying the probe will be determined, and, in accordance with the structural modification data, the existing probe structure will be modified by at least one of a precision material deposition process or precision material removal process, for performing said refurbishing of the probe.

Abstract: A laser diode arrangement is provided that comprises a laser diode, a driver (EPS) to provide an AC-electric power to the laser diode, a first feedback component (FB1) and a second feedback component (FB2). The first feedback component (FB1) is configured to sense an optical output of the laser diode and comprises an optical power control module (OPCM) to control a first waveform characteristic of the AC-electric power to maintain the sensed optical output (PM) close to a first desired value (PD). The second feedback component (FB2) is configured to estimate a temperature (TEST) of the laser diode by sensing a voltage-current characteristic of the laser diode and comprises a temperature control module (TCM) that is configured to control a second waveform characteristic of the AC-electric power, different from the first waveform characteristic to maintain the estimated temperature (TEST) close to a second desired value (TOPT).

Abstract: An atomic force microscopy tool (AFM) configured for receiving a plate including a coordinate reference pattern on the plate, for providing a position reference for the AFM: and a device for qualifying a coordinate reference pattern in the AFM, comprising a fixed reference frame, a pattern encoder for reading the reference pattern, an actuation stage for relatively moving the plate and the pattern encoder parallel to the plate, a displacement measurement system for measuring a displacement of the plate or pattern encoder relative to the fixed reference frame, and a controller for controlling the actuation stage, the encoder, and the measurement system, arranged to identify imperfections in the coordinate reference pattern and their locations by controlling the displacement measurement system; and arranged for storing each imperfection coupled to the location determined.

Abstract: The invention is directed at a fiducial marker design, a fiducial marker, a scanning probe microscopy device and a method of calibrating a position of a probe tip. The fiducial marker design may be used as a fiducial marker for providing a positioning reference, and comprises at least one first reference pattern including at least one first reference element for enabling determination of a relative position of the fiducial marker with respect to a first sensor. The first sensor is configured for operating at a first scale of dimension. The fiducial marker further comprises a second reference pattern, which comprises a regular arrangement of markings, structured or shaped such as to encode therein surface coordinate information. This enables determination of a relative position of each marking with respect to a second sensor configured for operating at a second scale of dimension smaller than the first scale of dimension.

Abstract: The present document relates to a method of calibrating, in a scanning probe microscopy system, an optical microscope. The optical microscope is configured for providing a reference data for positioning a probe tip on a surface of a substrate. The calibration is performed using a calibration structure being a spatial structure including features at different Z-levels relative to a Z-axis, the Z-axis being perpendicular to the surface of the substrate. The method comprises a step of obtaining, with the optical microscope, at least two images of at least a part of the calibration structure. The at least two images are focused in at least two different levels of the Z-levels. The method further comprises a step of determining a lateral shift, in a direction perpendicular to the Z-axis, of the calibration structure as depicted in the at least two images focused in the at least two different levels.

Abstract: An optical microscope (1) is provided herewith that is configured to provide an image in an image plane (3) of an object in an object plane (5). The optical microscope comprises in an order along an optical axis (6) from the object plane to the image plane, a first lens (7), a second lens (11) and a third lens (14). The first lens (7) has a first lens surface (8) at the side of the object plane and a second lens surface (9) at a side of the image plane, the first lens surface having a first semi-reflective coating (10). The second lens (11) has a third lens surface (12) at the side of the object plane and a fourth lens surface (13) at a side of the image plane. The third lens (14) has a fifth lens surface (15) at the side of the object plane and a sixth lens surface (16) at a side of the image plane, the sixth lens surface having a second semi-reflective coating (17).

Abstract: The present document describes a lithographic patterning method for creating features on a surface of a substrate. The patterning method includes the steps of applying a resist material to the substrate surface for providing a resist material layer, selectively exposing, dependent on a location and based on patterning data, the resist material layer to a surface treatment step for chemically modifying the resist material of the resist material layer, and developing, based on the chemical modification of the resist material, the resist material layer such as to selectively remove the resist material. In particular, prior to the step of developing, the method comprises a step of scanning at least a part of the surface using an acoustic scanning probe microscopy method for determining a local contact stiffness of the substrate surface at a plurality of locations, for measuring one or more critical dimensions of the features to be formed on the surface.

Abstract: The present disclosure relates to a method of operating an SPM system including a landing procedure. The landing procedure comprises a first landing stage including a first translation over a first actuation distance by a coarse translation means to bring a probe tip held by an SPM head from an initial separation from a substrate to be probed to a second, more proximal, separation as defined by a characteristic transitional response of the probe tip in proximity to the substrate. Following the first stage a second translation is applied, over a second actuation distance by a fine translation means under feedback control to bring the probe tip to a working separation. Prior to applying the first (coarse) actuation distance an initial optical distance is determined which is indicative of the initial separation, using a detector, preferably a mark sensor. The measured initial optical distance is related to a reference distance so as to determine a deviation.

Abstract: The present invention relates to a heterodyne scanning probe microscopy method for imaging structures on or below the surface of a sample, the method including applying, using a transducer, an acoustic input signal to the sample sensing, using a probe including a probe tip in contact with the surface, an acoustic output signal, wherein the acoustic output signal is representative of acoustic surface waves induced by the acoustic input signal wherein the acoustic input signal comprises at least a first signal component having a frequency above 1 gigahertz, and wherein for detecting of the acoustic output signal the method comprises a step of applying a further acoustic input signal to at least one of the probe or the sample for obtaining a mixed acoustic signal, the further acoustic input signal including at least a second signal component having a frequency above 1 gigahertz, wherein the mixed acoustic signal comprises a third signal component having a frequency equal to a difference between the first frequen

Abstract: Aspects of the present disclosure pertain to a probe cassette for holding a probe, e.g. an atomic force microscopy, at a predefined holding position for automated pickup. The probe cassette comprises a main body 3 including a support face 1 for supporting the probe; and one or more physical confinement elements 50 formed or affixed along said support face, said one or more physical confinement elements providing a plurality of engagement faces disposed along a perimeter of the predefined holding position, said engagement faces extending in a direction out of the support face, so as to define a pocket 9 for holding the probe, wherein the pocket is dimensioned to restrict a lateral shift of the probe in any direction along the support face.

Abstract: An alignment system and method for aligning an object (O) having an object marker. An image of the object marker is projected onto an imaging sensor (11) having sensor elements. At least one reference marker is projected onto the imaging sensor (11). Based on image output (111) from the imaging sensor (11), respective subsets of sensor elements are determined. Based on a first subset of the sensor elements, a marker position is determined where the image of the object marker is projected onto the imaging sensor (11). Based on a second subset (Sr) of the sensor elements, a reference position is determined where the reference marker is projected onto the imaging sensor (11). The marker position correlates with a position (Xm,Ym) of the object (O) whereas the reference position does not. The object position (Xm,Ym) is determined based on the marker position relative to the reference position.

Abstract: The invention is directed at an arrangement for determining cantilever deflection in a scanning probe microscopy system. The system includes a scan head supporting a probe, including the cantilever and a probe tip, comprising a specular reflective surface. The arrangement comprises an optical source for providing an optical beam. The optical beam is impinged onto the specular reflective surface. An optical sensor receives the reflected beam from the specular reflected surface, forming a light spot on the sensor. The optical sensor provides a sensor signal from which location information of the light spot on the sensor is obtainable. The optical sensor comprises an array of photo diode elements. Each photo diode element is configured for providing a photo diode signal to be included in the sensor signal, and comprises a photo sensitive surface having an effective area dimension in a plane transverse to the beam direction which is smaller than the cross sectional area of the reflective beam.

Abstract: A method for measuring damage (D) of a substrate (1) caused by an electron beam (2). The method comprises using an atomic force microscope (AFM) to provide a measurement (S2) of mechanical and/or chemical material properties (P2) of the substrate (1) at an exposure area (1a) of the electron beam (2). The method further comprises calculating a damage parameter (Sd) indicative for the damage (D) based on the measurement (S2) of the material properties (P2) at the exposure area (1a).

Abstract: The invention relates to a probe cassette for storing, transporting and handling one or more probe devices for a probe based system, the cassette including: a cassette body having at least one probe receptacle arranged to accommodate a probe device, a lid connectable to the cassette body, and a clamping unit configured to retain the probe device at the receptacle by exerting a clamping force on said probe device when the lid is in a closed position, wherein the clamping unit includes an adjustment member for adjusting the clamping force, wherein the clamping unit is selectively operable from a first position, in which the clamping force is insufficient to provide clamping, to a plurality of second positions, in which the clamping force is sufficient to an extent at which movement of the probe device at the receptacle is prevented.

Abstract: A probe cassette for storing, transporting and handling one or more probe devices for a probe based system, the cassette including a body having at least one probe receptacle arranged to accommodate a probe device, wherein, at the probe receptacle, a vacuum clamping member is arranged for selectively holding the probe device under a retaining force, wherein the receptacle includes at least one aperture which is, during selective holding of the probe device, connectable to a vacuum pressure through a passageway arranged in the cassette body, wherein the cassette includes a first fluid port connectable to a first source of vacuum for delivering the vacuum pressure.