Patents by Inventor Hans-Juergen Rostalski
Hans-Juergen Rostalski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9057964Abstract: Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.Type: GrantFiled: September 20, 2011Date of Patent: June 16, 2015Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Claus Zahlten, Christoph Menke, Marco Pretorius, Wilhelm Ulrich, Hans-Juergen Rostalski
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Publication number: 20140368801Abstract: An imaging optical unit (7) serves for imaging an object field (4) in an object plane (5) into an image field (8) in an image plane (9). The imaging optical unit (7) has a plurality of components (M1 to M6, GI) which guide imaging light (3). The imaging optical unit (7) is embodied as a pupil-obscured system. The imaging optical unit (7) has at least one mirror (GI) for grazing incidence of the imaging light (3). The result is an imaging optical unit having a handleable combination of low imaging aberrations and compact construction.Type: ApplicationFiled: June 17, 2013Publication date: December 18, 2014Inventors: Hans-Juergen Rostalski, Sascha Migura, Thomas Schicketanz
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Patent number: 8605257Abstract: In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.Type: GrantFiled: June 3, 2005Date of Patent: December 10, 2013Assignee: Carl Zeiss SMT GmbHInventors: Alexandra Pazidis, Reiner Garreis, Michael Totzeck, Heiko Feldmann, Paul Graeupner, Hans-Juergen Rostalski, Wolfgang Singer, Guenter Scheible, Sigrid Scheible
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Patent number: 8451458Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |??| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.Type: GrantFiled: March 19, 2012Date of Patent: May 28, 2013Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Rostalski, Heiko Feldmann
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Patent number: 8345350Abstract: An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength ? includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion ?ni=ni(?0)?ni(?0+1 pm) for a wavelength variation of 1 pm from a wavelength ?0. The objective satisfies the relation ? ? i = 1 N ? ? ? ? n i ? ( s i - d i ) ? ? 0 ? NA 4 ? A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.Type: GrantFiled: November 18, 2009Date of Patent: January 1, 2013Assignee: Carl Zeiss SMT GmbHInventors: Alexander Epple, Heiko Feldmann, Hans-Juergen Rostalski
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Publication number: 20120176670Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |??| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.Type: ApplicationFiled: March 19, 2012Publication date: July 12, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Juergen Rostalski, Heiko Feldmann
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Patent number: 8164759Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |??| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.Type: GrantFiled: March 12, 2010Date of Patent: April 24, 2012Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Rostalski, Heiko Feldmann
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Publication number: 20120075602Abstract: The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.Type: ApplicationFiled: September 19, 2011Publication date: March 29, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Juergen Rostalski, Tilman Schwertner, Alexander Epple
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Publication number: 20120069315Abstract: Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.Type: ApplicationFiled: September 20, 2011Publication date: March 22, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Claus Zahlten, Christoph Menke, Marco Pretorius, Wilhelm Ulrich, Hans-Juergen Rostalski
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Patent number: 8068276Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.Type: GrantFiled: October 6, 2010Date of Patent: November 29, 2011Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple, Hans-Juergen Rostalski
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Patent number: 7969663Abstract: A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size.Type: GrantFiled: June 21, 2010Date of Patent: June 28, 2011Assignee: Carl Zeiss SMT GmbHInventors: Aurelian Dodoc, Wilhelm Ulrich, Hans-Juergen Rostalski
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Patent number: 7965453Abstract: A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |?|<1. The optical elements form a dry objective adapted with regard to aberrations to a gaseous medium with refractive index n?<1.01 filling an image space of finite thickness between an exit surface of the projection objective and the image surface. The optical elements include a largest lens having a maximum lens diameter Dmax and are configured to provide an image-side numerical aperture NA<1 in an effective image field having a maximum image field height Y?. With COMP=Dmax/(Y?·(NA/n?)2) the condition COMP<15.8 holds.Type: GrantFiled: January 4, 2010Date of Patent: June 21, 2011Assignee: Carl Zeiss SMT GmbHInventors: Wilhelm Ulrich, Aurelian Dodoc, Heiko Feldmann, Hans-Juergen Rostalski
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Publication number: 20110026110Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.Type: ApplicationFiled: October 6, 2010Publication date: February 3, 2011Applicant: CARL ZEISS SMT AGInventors: Heiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple, Hans-Juergen Rostalski
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Publication number: 20100323299Abstract: A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size.Type: ApplicationFiled: June 21, 2010Publication date: December 23, 2010Applicant: Carl Zeiss SMT AGInventors: Aurelian DODOC, Wilhelm Ulrich, Hans-Juergen Rostalski
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Patent number: 7834981Abstract: A projection exposure apparatus for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask that is arranged in the region of an object surface of the projection objective has a light source for emitting ultraviolet light from a wavelength band having a bandwidth ??>10 pm around a central operating wavelength ?>200 nm; an illumination system for receiving the light from the light source and for directing illumination radiation onto the pattern of the mask; and a projection objective for the imaging of the structure of the mask onto a light-sensitive substrate.Type: GrantFiled: May 11, 2007Date of Patent: November 16, 2010Assignee: Carl Zeiss SMT AGInventors: Hans-Juergen Rostalski, Heiko Feldmann, Wilhelm Ulrich
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Patent number: 7835073Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.Type: GrantFiled: January 15, 2008Date of Patent: November 16, 2010Assignee: Carl Zeiss SMT AGInventors: Heiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple, Hans-Juergen Rostalski
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Publication number: 20100214565Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |??| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.Type: ApplicationFiled: March 12, 2010Publication date: August 26, 2010Applicant: CARL ZEISS SMT AGInventors: Hans-Juergen Rostalski, Heiko Feldmann
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Publication number: 20100172019Abstract: A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |?|<1. The optical elements form a dry objective adapted with regard to aberrations to a gaseous medium with refractive index n?<1.01 filling an image space of finite thickness between an exit surface of the projection objective and the image surface. The optical elements include a largest lens having a maximum lens diameter Dmax and are configured to provide an image-side numerical aperture NA<1 in an effective image field having a maximum image field height Y?. With COMP=Dmax/(Y?·(NA/n?)2) the condition COMP<15.8 holds.Type: ApplicationFiled: January 4, 2010Publication date: July 8, 2010Applicant: CARL ZEISS SMT AGInventors: WILHELM ULRICH, AURELIAN DODOC, HEIKO FELDMANN, HANS-JUERGEN ROSTALSKI
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Patent number: 7751129Abstract: A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups in the case of which a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power are provided. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size.Type: GrantFiled: October 22, 2003Date of Patent: July 6, 2010Assignee: Carl Zeiss SMT AGInventors: Aurelian Dodoc, Wilhelm Ulrich, Hans-Juergen Rostalski
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Patent number: 7738188Abstract: A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |?|<1. The optical elements form a dry objective adapted with regard to aberrations to a gaseous medium with refractive index n?<1.01 filling an image space of finite thickness between an exit surface of the projection objective and the image surface. The optical elements include a largest lens having a maximum lens diameter Dmax and are configured to provide an image-side numerical aperture NA<1 in an effective image field having a maximum image field height Y?. With COMP=Dmax/(Y?·(NA/n?)2) the condition COMP<15.8 holds.Type: GrantFiled: March 23, 2007Date of Patent: June 15, 2010Assignee: Carl Zeiss SMT AGInventors: Wilhelm Ulrich, Aurelian Dodoc, Heiko Feldmann, Hans-Juergen Rostalski