Patents by Inventor Hans-Juergen Rostalski
Hans-Juergen Rostalski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7277231Abstract: A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.Type: GrantFiled: April 1, 2005Date of Patent: October 2, 2007Assignee: Carl Zeiss SMT AGInventors: Karl-Heinz Schuster, Hans-Juergen Rostalski, Aurelian Dodoc
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Publication number: 20070109659Abstract: A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L?0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.Type: ApplicationFiled: January 4, 2007Publication date: May 17, 2007Applicant: CARL ZEISS SMT AGInventors: Hans-Juergen Rostalski, Aurelian Dodoc, Alexander Epple, Helmut Beierl
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Patent number: 7190527Abstract: Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D1/D2<1.1.Type: GrantFiled: September 1, 2004Date of Patent: March 13, 2007Assignee: Carl Zeiss SMT AGInventors: Hans-Juergen Rostalski, Karl-Heinz Schuster, Russell Hudyma, Wilhelm Ulrich, Rolf Freimann
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Patent number: 7187503Abstract: A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L?0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.Type: GrantFiled: December 15, 2004Date of Patent: March 6, 2007Assignee: Carl Zeiss SMT AGInventors: Hans-Juergen Rostalski, Aurelian Dodoc, Alexander Epple, Helmut Beierl
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Publication number: 20070019170Abstract: A projection objective of a microlithographic projection exposure apparatus has a last optical element on the image side which is plane on the image side and which, together with an image plane of the projection objective, delimits an immersion space in the direction of an optical axis of the projection objective. This immersion space can be filled with an immersion liquid. At least one liquid or solid volume having plane-parallel interfaces can be introduced into the beam path of the projection objective, the optical thickness of the at least one volume being at least substantially equal to the optical thickness of the immersion space. By introducing and removing the volume, it is possible to convert the projection objective from dry operation to immersed operation in a straightforward way, without extensive adjustments to the projection objective or alignment work.Type: ApplicationFiled: July 28, 2006Publication date: January 25, 2007Applicant: CARL ZEISS SMT AGInventors: Hans-Juergen Rostalski, Aurelian Dodoc
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Publication number: 20060187430Abstract: A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.Type: ApplicationFiled: November 23, 2005Publication date: August 24, 2006Inventors: Aurelian Dodoc, Karl Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski, Hubert Holderer, Bernhard Gellrich, Juergen Fischer, Susanne Beder, Andreas Wurmbrand, Ulrich Loering, Albrecht Ranck
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Publication number: 20050231813Abstract: Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D1/D2<1.1.Type: ApplicationFiled: September 1, 2004Publication date: October 20, 2005Inventors: Hans-Juergen Rostalski, Karl-Heinz Schuster, Russell Hudyma, Wilhelm Ulrich, Rolf Freimann
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Publication number: 20050231814Abstract: A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.Type: ApplicationFiled: March 22, 2005Publication date: October 20, 2005Inventors: Hans-Juergen Rostalski, Wilhelm Ulrich
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Publication number: 20050219707Abstract: A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.Type: ApplicationFiled: April 1, 2005Publication date: October 6, 2005Applicant: Carl Zeiss SMT AGInventors: Karl-Heinz Schuster, Hans-Juergen Rostalski, Aurelian Dodoc
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Publication number: 20050190455Abstract: A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L?0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.Type: ApplicationFiled: December 15, 2004Publication date: September 1, 2005Inventors: Hans-Juergen Rostalski, Aurelian Dodoc, Alexander Epple, Helmut Beierl
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Patent number: 6906866Abstract: According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.Type: GrantFiled: October 15, 2003Date of Patent: June 14, 2005Assignee: Carl Zeiss SMT AGInventors: Russell Hudyma, Wilhelm Ulrich, Hans-Juergen Rostalski
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Patent number: 6891596Abstract: A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.Type: GrantFiled: March 6, 2003Date of Patent: May 10, 2005Assignee: Carl Zeiss SMT AGInventors: Hans-Juergen Rostalski, Wilhelm Ulrich
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Publication number: 20050083583Abstract: According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.Type: ApplicationFiled: October 15, 2003Publication date: April 21, 2005Inventors: Russell Hudyma, Wilhelm Ulrich, Hans-Juergen Rostalski
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Patent number: 6728036Abstract: A diffractive optical element has a plurality of diffraction structures for a certain wavelength. These each have a width measured in the plane of the diffractive optical element and a height measured perpendicularly thereto. The widths and the heights of the diffraction structures vary over the area of the diffractive optical element. An optical arrangement comprising such a diffractive optical element has, in addition, a neutral filter. The efficiency of such a diffractive optical element and of such an arrangement can be optimized locally for usable light.Type: GrantFiled: May 10, 2002Date of Patent: April 27, 2004Assignee: Carl Zeiss Semiconductor Manufacturing Technologies AGInventors: Bernd Kleemann, Hans-Jürgen Rostalski, Willi Ulrich
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Publication number: 20030174408Abstract: A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.Type: ApplicationFiled: March 6, 2003Publication date: September 18, 2003Applicant: CARL ZEISS SMT AGInventors: Hans-Juergen Rostalski, Wilhelm Ulrich