Patents by Inventor Harmen Klaas Van Der Schoot
Harmen Klaas Van Der Schoot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7760324Abstract: An immersion lithographic projection apparatus includes a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with an element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.Type: GrantFiled: March 20, 2006Date of Patent: July 20, 2010Assignee: ASML Netherlands B.V.Inventors: Jozef Petrus Henricus Benschop, Hans Butler, Nicolaas Rudolf Kemper, Bartholomeus Hendricus Koek, Frits Van Der Meulen, Harmen Klaas Van Der Schoot
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Publication number: 20100165319Abstract: An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.Type: ApplicationFiled: December 18, 2009Publication date: July 1, 2010Applicant: ASML Netherlands B.V.Inventors: Hernes Jacobs, Noud Jan Gilissen, Hans Jansen, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Harmen Klaas Van Der Schoot, Marco Koert Stavenga, Bob Streefkerk, Peter Paul Steijaert, Marcus Martinus Petrus Adrianus Vermeulen, Jan Cornelis Van Der Hoeven
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Publication number: 20100085553Abstract: A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.Type: ApplicationFiled: December 16, 2009Publication date: April 8, 2010Applicant: ASML Netherlands B.V.Inventors: Hernes Jacobs, Bernardus Antonius Johannes Luttikhuis, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters
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Patent number: 7679720Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.Type: GrantFiled: February 1, 2008Date of Patent: March 16, 2010Assignee: ASML Netherlands B.V.Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig-Schmidt, Harmen Klaas Van der Schoot, Rob Jansen
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Patent number: 7667822Abstract: A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator device to exert a force onto the patterning device in a direction of movement of the support. The force actuator device includes a movable part which is pivotably about a pivot axis and thereby connected to the support. The movable part is in the direction of movement of the support substantially balanced with respect to the pivot axis. The force actuator device further includes an actuator to exert via the movable part the force onto the patterning device, to at least partly compensate for the information or a risk of slippage due to acceleration of the support in the direction of movement.Type: GrantFiled: February 14, 2006Date of Patent: February 23, 2010Assignee: ASML Netherlands B.V.Inventors: Fransicus Mathijs Jacobs, Erik Roelof Loopstra, Harmen Klaas Van der Schoot, Arjan Franklin Bakker, Arjan Martin Van der Wel, Krijn Frederik Bustraan, Marcel Koenraad Marie Baggen
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Patent number: 7656506Abstract: A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.Type: GrantFiled: December 29, 2005Date of Patent: February 2, 2010Assignee: ASML Netherlands B.V.Inventors: Hernes Jacobs, Bernardus Antonius Johannes Luttikhuis, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters
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Publication number: 20090284730Abstract: An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.Type: ApplicationFiled: July 30, 2009Publication date: November 19, 2009Applicant: ASML Netherlands B.V.Inventors: Harmen Klaas VAN DER SCHOOT, Hernes Jacobs, Bernardus Antonius Johannes Luttikhuis, Petrus Matthijs Henricus Vosters, Johannes Martinus Andreas Hazenberg, Aart Adrianus Van Beuzekom
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Patent number: 7595496Abstract: A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.Type: GrantFiled: June 21, 2007Date of Patent: September 29, 2009Assignee: ASML Netherlands B.V.Inventors: Joost Jeroen Ottens, Harmen Klaas Van Der Schoot, Jeroen Pieter Starreveld, Wouterus Johannes Petrus Maria Maas, Willem Jurrianus Venema, Boris Menchtchikov
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Patent number: 7576835Abstract: Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.Type: GrantFiled: July 6, 2005Date of Patent: August 18, 2009Assignee: ASML Netherlands B.V.Inventors: Harmen Klaas Van Der Schoot, Hernes Jacobs, Bernardus Antonius Johannes Luttikhuis, Petrus Matthijs Henricus Vosters, Johannes Martinus Andreas Hazenberg, Aart Adrianus Van Beuzekom
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Patent number: 7538857Abstract: A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.Type: GrantFiled: June 21, 2005Date of Patent: May 26, 2009Assignee: ASML Netherlands B.V.Inventors: Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters, Bernardus Antonius Johannes Luttikhuis
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Patent number: 7492440Abstract: A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.Type: GrantFiled: September 9, 2004Date of Patent: February 17, 2009Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Edwin Johan Buis, Henrikus Herman Marie Cox, Noud Jan Gilissen, Harmen Klaas Van Der Schoot
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Patent number: 7483120Abstract: A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.Type: GrantFiled: May 9, 2006Date of Patent: January 27, 2009Assignee: ASML Netherlands B.V.Inventors: Bernardus Antonius Johannes Luttikhuis, Henrikus Herman Marie Cox, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Harmen Klaas Van Der Schoot
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Patent number: 7440081Abstract: A lithographic apparatus includes an illumination system to supply a beam of radiation, a patterning system serving to impart the beam of radiation with a pattern in its cross-section, a substrate table to support a substrate, and a projection system to project the patterned beam onto a target portion of the substrate. The substrate table includes a support member having an upper support surface for supporting at least part of the target portion of the substrate on a fluid cushion. The apparatus further includes a fluid supply system arranged to supply fluid to the upper support surface so as to provide the cushion, and an actuator system arranged to act on the support member. The actuator system is controllable to provide adjustment of a topography of the upper support surface relative to a reference plane. Compensation can thus be made for substrate thickness irregularities, to achieve correct focusing of the beam onto the target surface.Type: GrantFiled: November 5, 2004Date of Patent: October 21, 2008Assignee: ASML Netherlands B.V.Inventors: Cheng-Qun Gui, Harmen Klaas Van Der Schoot
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Patent number: 7408617Abstract: A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a substrate table, a projection system, a position encoder, an imaging device, and an image processing unit. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the cross-section of the radiation beam. The substrate table supports a substrate. The projection system projects the modulated radiation beam onto a target portion of the substrate, thereby applying a pattern to the target portion of the substrate. The pattern comprises a first line and a second line. The first line is offset from the second line. The position encoder determines a position of the substrate table. The position encoder comprises a position sensor and a scale. The scale comprises a plurality of lines intended to be straight and parallel to one another. The imaging device obtains an image of the first line and the second line.Type: GrantFiled: June 24, 2005Date of Patent: August 5, 2008Assignee: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Harmen Klaas Van Der Schoot
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Publication number: 20080174750Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.Type: ApplicationFiled: February 1, 2008Publication date: July 24, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig-Schmidt, Harmen Klaas Van Der Schoot, Rob Jansen
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Patent number: 7359032Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.Type: GrantFiled: August 25, 2004Date of Patent: April 15, 2008Assignee: ASML Netherlands B.V.Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Harmen Klaas Van Der Schoot, Rob Jansen
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Patent number: 7352438Abstract: The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps the substrate in directions parallel to the plane of the patterning device, perpendicular to the plane of the patterning device and rotationally. The second clamping device clamps the patterning device only in directions parallel to the plane of the substrate.Type: GrantFiled: February 14, 2006Date of Patent: April 1, 2008Assignee: ASML Netherlands B.V.Inventors: Bernardus Antonius Johannes Luttikhuis, Erik Roelof Loopsta, Harmen Klaas Van Der Schoot, Fransicus Mathijs Jacobs
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Publication number: 20080073602Abstract: An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.Type: ApplicationFiled: June 22, 2006Publication date: March 27, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Hernes Jacobs, Noud Jan Gilissen, Hans Jansen, Nicolaas Ten Kate, Nicolaas Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Johannes Mulkens, Harmen Klaas Van Der Schoot, Marco Koert Stavenga, Bob Streefkerk, Peter-Paul Steijaert, Marcus Vermeulen, Jacco Van Der Hoeven
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Patent number: 7310132Abstract: A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.Type: GrantFiled: March 17, 2006Date of Patent: December 18, 2007Assignee: ASML Netherlands B.V.Inventors: Harmen Klaas Van Der Schoot, Erik Roelof Loopstra, Fransicus Mathijs Jacobs, Godfried Katharina Hubertus Franciscus Geelen
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Patent number: RE40043Abstract: A positioning device has first and second object holders that are guided over a guiding surface extending parallel to an X-direction and parallel to a Y-direction perpendicular to the X-direction and which are displaceable over the guiding surface from a first position into a second position by means of a displacement system. The displacement system includes a first displacement unit and a second displacement unit to which the object holders can be alternately coupled. The first displacement unit is suitable for carrying out a first series of positioning steps of the first object holder in the first position and for displacing the first object holder from the first position into an intermediate position between the first and second positions.Type: GrantFiled: February 27, 1998Date of Patent: February 5, 2008Assignee: ASML Netherlands B.V.Inventors: Yim-Bun Patrick Kwan, Gerrit Maarten Bonnema, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Gerjan Peter Veldhuis