Patents by Inventor Harmen Klaas Van Der Schoot
Harmen Klaas Van Der Schoot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7292317Abstract: A lithographic apparatus has an illumination system that conditions a radiation beam and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto a target portion of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, a base frame, where the substrate support drive is configured to generate a force in the at least one direction between the substrate support and the reaction mass, the balance mass, or the support frame.Type: GrantFiled: June 8, 2005Date of Patent: November 6, 2007Assignee: ASML Netherlands B.V.Inventors: Henrikus Herman Marie Cox, Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters
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Patent number: 7256867Abstract: A lithographic method and apparatus comprises an illumination system that supplies a beam of radiation, a patterning device that patterns the beam, and a projection system that projects the patterned beam onto a target portion of a substrate. A metrology system is provided adjacent the projection system for aligning the substrate with the projection system. Two or more movable chucks are each arranged to support a substrate and move between a loading device and the projection system. The chucks are independently movable so that one substrate can be passed through the metrology system and patterned beam while the other substrates are moved between the loading system and projection system.Type: GrantFiled: December 22, 2004Date of Patent: August 14, 2007Assignee: ASML Netherlands B.V.Inventors: Bernardus Antonius Johannes Luttikhuis, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters
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Patent number: 7256866Abstract: To enable high acceleration and high moving speed of a pattern support or a substrate table of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively large displacements, whereas an actuator for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.Type: GrantFiled: October 12, 2004Date of Patent: August 14, 2007Assignee: ASML Netherlands B.V.Inventors: Henrikus Herman Marie Cox, Hans Butler, Ronald Casper Kunst, Harmen Klaas Van Der Schoot, Youssef Karel Maria De Vos
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Patent number: 7250237Abstract: A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.Type: GrantFiled: December 23, 2003Date of Patent: July 31, 2007Assignee: ASML Netherlands B.V.Inventors: Joost Jeroen Ottens, Harmen Klaas Van Der Schoot, Jeroen Pieter Starreveld, Wouterus Johannes Petrus Maria Maas, Willem Jurrianus Venema, Boris Menchtchikov
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Patent number: 7245047Abstract: A lithographic projection apparatus includes a conduit shuttle used to at least partly support conduits which provide utilities to moveable objects. The conduit shuttle has an actuator which is positionable with six degrees of freedom. The actuator comprises a 2-phase or 3-phase motor with one degree of freedom and a Lorentz actuator with five degrees of freedom.Type: GrantFiled: April 29, 2004Date of Patent: July 17, 2007Assignee: ASML Netherlands B.V.Inventors: Patricia Vreugdewater, Henrikus Herman Marie Cox, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot
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Patent number: 7230254Abstract: A movable carriage for moving an article support member in a lithographic apparatus is provided. The article support member is constructed and arranged to move and support an article to be placed in a beam path of the lithographic apparatus. The carriage includes a compartmented composite structure.Type: GrantFiled: September 22, 2005Date of Patent: June 12, 2007Assignee: ASML Netherlands B.V.Inventors: Martinus Arnoldus Henricus Terken, Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters, Koen Jacobus Johannes Maria Zaal
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Patent number: 7088428Abstract: Lorentz actuators generate heat due to electrical dissipation in the field coils. As the field through the coils changes, eddy currents are induced in cooling elements leading to undesirable damping forces and heating. The present invention provides an improved design that reduces eddy currents by incorporating slits in the cooling element. Slits are preferably perpendicular to the induced electric field and parallel to each other, and reduce the magnitude of the eddy currents by forcing them to take paths of higher electrical resistance.Type: GrantFiled: March 11, 2004Date of Patent: August 8, 2006Assignee: ASML Netherlands B.V.Inventors: Sven Antoin Johan Hol, Edwin Johan Buis, Harmen Klaas Van Der Schoot, Patricia Vreugdewater
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Patent number: 7064808Abstract: A carrier for carrying a lithographic substrate or a lithographic patterning means. The carrier comprises a first member provided with an open hollow structure that is open to at least one side of the member. The carrier further comprises a second member connected to the first member, such that a closed hollow internal structure is formed between the carrier members.Type: GrantFiled: April 22, 2004Date of Patent: June 20, 2006Assignee: ASML Netherlands B.V.Inventors: Noud Jan Gilissen, Joost Jeroen Ottens, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters
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Patent number: 7012264Abstract: A lithographic apparatus is provided. The apparatus includes an illumination system that conditions a beam of radiation, an article support member that supports an article to be placed in a beam path of the beam of radiation on the article support, and a movable carriage for moving the article support member. The carriage includes a compartmented composite structure provided with a non-composite mounting interface and/or cooling interface With such an arrangement, conventional interfacing using, for example metal or ceramic materials, can be applied in combination with the advantages of composite structures, such as a low specific weight, a high Young's modulus at places and directions where required, high strength, high stability, and high electrical resistivity.Type: GrantFiled: June 4, 2004Date of Patent: March 14, 2006Assignee: ASML Netherlands B.V.Inventors: Martinus Arnoldus Henricus Terken, Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus M H Vosters, Koen J J M Zaal
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Publication number: 20050269525Abstract: A lithographic apparatus is provided. The apparatus includes an illumination system that conditions a beam of radiation, an article support member that supports an article to be placed in a beam path of the beam of radiation on the article support, and a movable carriage for moving the article support member. The carriage includes a compartmented composite structure provided with a non-composite mounting interface and/or cooling interface With such an arrangement, conventional interfacing using, for example metal or ceramic materials, can be applied in combination with the advantages of composite structures, such as a low specific weight, a high Young's modulus at places and directions where required, high strength, high stability, and high electrical resistivity.Type: ApplicationFiled: June 4, 2004Publication date: December 8, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Martinus Arnoldus Henricus Terken, Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus M. H. Vosters, Koen J. J. M. Zaal
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Patent number: 6970230Abstract: A linear seal seals over a slot formed in a wall of a vacuum chamber of a lithographic projection apparatus. The linear seal includes an elongate sealing member which is locally displaced from the slot at a selectable position such that conduits may pass from outside of the vacuum chamber to the inside of the vacuum chamber at the local displacement of the elongate sealing member.Type: GrantFiled: June 11, 2003Date of Patent: November 29, 2005Assignee: ASML Netherlands B.V.Inventors: Petrus Matthijs Henricus Vosters, Hernes Jacobs, Harmen Klaas Van Der Schoot, Peter Rutgers
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Patent number: 6943464Abstract: A Lorentz actuator provides a force between a first part and a second part of the apparatus, comprising a main magnet system, attached to a first part of the apparatus and providing a first magnetic field; a subsidiary magnet system, attached to the first part and arranged in a Halbach configuration, providing a second magnetic field; and an electrically conductive element attached to a second part of the apparatus and arranged so as to produce a force between the first and second parts of the apparatus by interaction of an electric current carried by the electrically conductive element and the combination of the first and second magnetic fields.Type: GrantFiled: December 22, 2003Date of Patent: September 13, 2005Assignee: ASML Netherlands B.V.Inventors: Sven Antoin Johan Hol, Jan Van Eijk, Angelo Cesar Peter De Klerk, Harmen Klaas Van Der Schoot
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Patent number: 6879377Abstract: A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.Type: GrantFiled: November 27, 2002Date of Patent: April 12, 2005Assignee: ASML Netherlands B.V.Inventors: Hernes Jacobs, Piet Vosters, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Robert Johannes Petrus Van Diesen, David William Callan
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Publication number: 20040263000Abstract: A lithographic projection apparatus includes a conduit shuttle used to at least partly support conduits which provide utilities to moveable objects. The conduit shuttle has an actuator which is positionable with six degrees of freedom. The actuator comprises a 2-phase or 3-phase motor with one degree of freedom and a Lorentz actuator with five degrees of freedom.Type: ApplicationFiled: April 29, 2004Publication date: December 30, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Patricia Vreugdewater, Henrikus Herman Marie Cox, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot
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Patent number: 6815699Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.Type: GrantFiled: December 9, 2002Date of Patent: November 9, 2004Assignee: ASML Netherlands B.V.Inventors: Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters, Ton De Groot
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Publication number: 20040218167Abstract: Lorentz actuators generate heat due to electrical dissipation in the field coils. As the field through the coils changes, eddy currents are induced in cooling elements leading to undesirable damping forces and heating. The present invention provides an improved design that reduces eddy currents by incorporating slits in the cooling element. Slits are preferably perpendicular to the induced electric field and parallel to each other, and reduce the magnitude of the eddy currents by forcing them to take paths of higher electrical resistance.Type: ApplicationFiled: March 11, 2004Publication date: November 4, 2004Applicant: ASML Netherlands B.V.Inventors: Sven Antoin Johan Hol, Edwin Johan Buijs, Harmen Klaas Van Der Schoot, Patricia Vreugdewater
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Patent number: 6717296Abstract: A Lorentz actuator provides a force between a first part and a second part of the apparatus, comprising a main magnet system, attached to a first part of the apparatus and providing a first magnetic field; a subsidiary magnet system, attached to the first part and arranged in a Halbach configuration, providing a second magnetic field; and an electrically conductive element attached to a second part of the apparatus and arranged so as to produce a force between the first and second parts of the apparatus by interaction of an electric current carried by the electrically conductive element and the combination of the first and second magnetic fields.Type: GrantFiled: August 19, 2002Date of Patent: April 6, 2004Assignee: ASML Netherlands B.V.Inventors: Sven Antoin Johan Hol, Jan Van Eijk, Angelo Oscar Peter De Klerk, Harmen Klaas Van Der Schoot
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Publication number: 20040061844Abstract: A linear seal seals over a slot formed in a wall of a vacuum chamber of a lithographic projection apparatus. The linear seal includes an elongate sealing member which is locally displaced from the slot at a selectable position such that conduits may pass from outside of the vacuum chamber to the inside of the vacuum chamber at the local displacement of the elongate sealing member.Type: ApplicationFiled: June 11, 2003Publication date: April 1, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Petrus Matthijs Henricus Vosters, Hernes Jacobs, Harmen Klaas Van Der Schoot, Peter Rutgers
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Publication number: 20030137643Abstract: A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.Type: ApplicationFiled: November 27, 2002Publication date: July 24, 2003Applicant: ASML NETHERLANDS B.V.Inventors: Hernes Jacobs, Piet Vosters, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Robert Johannes Petrus Van Diesen, David William Callan
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Publication number: 20030132400Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.Type: ApplicationFiled: December 9, 2002Publication date: July 17, 2003Applicant: ASML NETHERLANDS, B.V.Inventors: Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters, Ton De Groot