Abstract: According to an embodiment, a mask processing apparatus is provided. The mask processing apparatus includes a stage, a laser light source and a rotary mechanism. The stage is configured to hold a mask formed with a pattern to be transferred to a transfer target substrate. The laser light source is configured to output laser light that is radiated into the mask and thereby alters the mask. The rotary mechanism is configured to rotate the stage in an in-plane direction of a pattern formation surface of the mask.

Abstract: A rear imaging device is provided. The rear imaging device is attached to a mobile object such as a vehicle, and is provided with an imaging device for imaging an area rearward of the mobile object, and a housing for housing the imaging device. At a rear end portion of the housing, drainer pieces are formed extending rearward. A plurality of the drainer pieces are formed in a circumferential direction of the housing. Tip end portions of the drainer pieces are formed narrower toward tip points thereof, with base portions of the adjacent drainer pieces being adjacent to each other.

Abstract: A connection portion connects a copper-based first wiring layer with a copper-based second wiring layer arranged on the upper side of a first diffusion barrier film. The first diffusion barrier film includes a first opening region formed in a semiconductor circuit region that is a partial region in a two-dimensional view and a second opening region formed as an opening region different from the first opening region in a two-dimensional view. The opening regions are formed in a region different from an opening region formed to allow the connection portion to pass through the first diffusion barrier film. A mark wiring layer is arranged immediately above the second opening region as the same layer as the second wiring layer. A second diffusion barrier film is arranged in contact with the upper surface of the mark wiring layer.

Abstract: The present invention is a rearward imaging device attached to a moving body such as a vehicle, and is provided with an imaging device for capturing images rearward of the moving body, and a housing for accommodating the imaging device. The imaging device has a barrel for holding a transparent member, and a concave part is formed in the rear part of the housing. The barrel penetrates a bottom part of the concave part and protrudes further rearward than a bottom surface of the concave part.

Abstract: According to one embodiment, a deflection measuring device that irradiates an effective region of a pattern transfer plate on which a pattern is formed, with parallel lights from at least two directions, and detects interference fringes of the parallel lights reflected from the effective region.

Abstract: According to one embodiment, a parameter for laser irradiation is adjusted in correspondence with thickness distribution of a substrate of a pattern transferring plate in which a pattern is formed on the substrate to form an altered portion within the substrate.

Abstract: According to one embodiment, an adjusting unit adjusts a refracting angle of incident light with respect to a substrate, a detector detects reflected light from the substrate, and a calculating unit calculates positional deviation of the pattern based on patterns respectively reflected in reflected lights obtained from the incident light generating N number of refracting angles with respect to the substrate, where N is an integer of two or greater.

Abstract: A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.

Abstract: In an overlay displacement amount measuring method according to an embodiment, a temperature distribution of a substrate during a pattern forming process and a temperature distribution of the substrate during a measuring process for measuring a positional displacement amount between patterns on the substrate by an electron microscope are measured. An expansion/contraction amount of the substrate between two processes is calculated based upon the two temperature distributions, and the positional displacement amount is corrected based upon the expansion/contraction amount. An overlay displacement amount between the pattern and a pattern formed on a layer different from the pattern is measured by an optical measuring apparatus, and the overlay displacement amount is corrected based upon the corrected positional displacement amount.

Abstract: A bodily fluid absorbent pad has a shape symmetric in a longitudinal direction as well as in a transverse direction. A dimension of the pad in the transverse direction is larger in opposite end regions than in an intermediate region. The pad is formed along opposite side edges with first and second compressed lines. Paired compression rolls are used to form the first and second compressed lines, and at least one roll constituting the paired compression rolls is formed on a peripheral surface thereof with compressing units projecting from the peripheral surface. The compressing units are arranged in a circumferential direction to form one row and at least one additional row adjacent to the one row in an axial direction of the roll. There is an offset between the compressing unit in the one row and the compressing units in the other row in the circumferential direction.

Abstract: A connection portion connects a copper-based first wiring layer with a copper-based second wiring layer arranged on the upper side of a first diffusion barrier film. The first diffusion barrier film includes a first opening region formed in a semiconductor circuit region that is a partial region in a two-dimensional view and a second opening region formed as an opening region different from the first opening region in a two-dimensional view. The opening regions are formed in a region different from an opening region formed to allow the connection portion to pass through the first diffusion barrier film. A mark wiring layer is arranged immediately above the second opening region as the same layer as the second wiring layer. A second diffusion barrier film is arranged in contact with the upper surface of the mark wiring layer.

Abstract: According to an embodiment, a mask processing apparatus is provided. The mask processing apparatus includes a stage, a laser light source and a rotary mechanism. The stage is configured to hold a mask formed with a pattern to be transferred to a transfer target substrate. The laser light source is configured to output laser light that is radiated into the mask and thereby alters the mask. The rotary mechanism is configured to rotate the stage in an in-plane direction of a pattern formation surface of the mask.

Abstract: According to one embodiment, an exposure apparatus includes a light blocking unit that blocks an exposure light reflected on a reflective mask at a part other than an aperture; a detection unit that measures a light intensity of the exposure light passed through the light blocking unit; and a calculation unit that calculates, based on the light intensity, a transfer characteristic when a pattern on the reflective mask is transferred to a substrate. In the light blocking unit, a position on an aperture plane and a position in an optical axis direction of the exposure light are adjusted. The calculation unit calculates the transfer characteristic based on the position in the optical axis direction in which the light intensity is maximized.

Abstract: A data transfer device performing data transfer at a high speed if a descriptor chain cannot be entirely transferred by a single activation. In a DMA control device, when a transfer activation signal is asserted, a descriptor information control part sequentially reads descriptor information from a descriptor information storage part. When the count of pieces of descriptor information that have been read becomes equal to a transferable frame count, a backward skip control part outputs a backward skip instruction. When the backward skip instruction is outputted, a descriptor information control part skips reading remaining descriptor information.

Abstract: A method of changing a transporting configuration of a workpiece of an absorbent article includes: for the workpiece having a shape in which a longitudinal central section is narrower in the lateral direction than longitudinal end sections, transporting a plurality of workpieces in longitudinal-direction flowing, the plurality of workpieces being transported in a state where the longitudinal end sections of each workpiece are adjacent to the central section of another workpiece and the plurality of workpieces form N workpiece lines (N is an integer of 2 or more) arranged in a lateral direction; forming each workpiece group including N workpieces by correlating, based on a predetermined correlation pattern; and changing a transporting configuration of the workpieces of the workpiece group from the longitudinal-direction flowing to the lateral-direction flowing. The forming of the workpiece group is performed by correlating workpieces arranged side by side in the lateral direction.

Abstract: According to an embodiment, mask manufacturing equipment includes a detector, an irradiator, a calculator, and a controller. The detector detects positional deviation of a pattern formed on a mask substrate. The irradiator irradiates the mask substrate with laser light to form a heterogeneous layer that is expanded in volume in the mask substrate. The calculator calculates an area periphery irradiation condition under which the irradiator is caused to emit laser light to a peripheral area of the pattern on the basis of the positional deviation detected by the detector so that the pattern area is reduced by forming the heterogeneous layer in the peripheral area of the pattern. The controller controls the irradiator to form the heterogeneous layer in the peripheral area of the pattern according to the area periphery irradiation condition.

Abstract: According to one embodiment, a parameter for laser irradiation is adjusted in correspondence with thickness distribution of a substrate of a pattern transferring plate in which a pattern is formed on the substrate to form an altered portion within the substrate.

Abstract: A gate interconnection portion (GHB) includes a first gate interconnection portion (GHB1), a second gate interconnection portion (GHB2), and a third gate interconnection portion (GHB3). The first gate interconnection portion (GHB1) is formed in parallel to a Y axis direction toward a power supply interconnection and extends to a prescribed position within an element formation region (PER). The second gate interconnection portion (GHB2) is formed in parallel to a direction obliquely bent with respect to the Y-axis direction from the first gate interconnection portion (GHB1) toward the power supply interconnection, and extends across a boundary between the element formation region (PER) and an element isolation insulating film (EB), which is in parallel to an X axis direction. The third gate interconnection portion (GHB3) further extends in parallel to the Y-axis direction from the second gate interconnection portion (GHB2) toward the power supply interconnection.

Abstract: According to one embodiment, a deflection measuring device that irradiates an effective region of a pattern transfer plate on which a pattern is formed, with parallel lights from at least two directions, and detects interference fringes of the parallel lights reflected from the effective region.

Abstract: A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.