Abstract: The present invention relates to a polishing apparatus for polishing a workpiece, such as a semiconductor wafer, to a flat mirror finish. The polishing apparatus comprises a polishing table having a polishing surface, and a top ring, and the workpiece is interposed between the polishing table and the top ring and pressed at a predetermined pressure to polish the workpiece. The polishing apparatus comprises at least two dressing units for dressing the polishing surface by being brought into contact with the polishing surface, which is a surface of a polishing cloth.

Abstract: An electronic card includes a printed circuit board which has a nonvolatile semiconductor memory mounted on one surface thereof, a card case covering the one surface of the printed circuit board, signal pins provided in one side on the other surface of the printed circuit board, a circuit pattern provided on the one surface of the printed circuit board, a first ground pattern provided on the one surface of the printed circuit board, the first ground pattern being electrically connected to the signal pin which is supplied with a grounding potential in a case where the electronic card is equipped with a host apparatus and a first insulator film provided on the one surface of the printed circuit board, and the first insulator film having a first opening in which the first ground pattern is exposed.

Abstract: The present invention provides a memory controller which includes a host interface connected to a host apparatus and receives a first data write-in unit of reception data, a memory interface connected to nonvolatile semiconductor memory in which is written a second data write-in unit of data larger than the first data write-in unit of data, and transmits the first data write-in unit of write-in data, and a central processing unit, which writes the reception data in a temporary write-in block of the nonvolatile semiconductor memory via the memory interface, reads out from the temporary write-in block the write-in data corresponding to area data when a total amount of reception data received by the host interface has reached amount of the second data write-in unit of the area data, and writes the area data including the read-out write-in data in a target block different from the temporary write-in block.

Abstract: The present invention relates to a polishing apparatus for polishing a workpiece, such as a semiconductor wafer, to a flat mirror finish. The polishing apparatus comprises a polishing table having a polishing surface, and a top ring, and the workpiece is interposed between the polishing table and the top ring, and pressed at a predetermined pressure to polish the workpiece. The polishing apparatus comprises at least two dressing units for dressing the polishing surface by being brought into contact with the ppolishing surface, which is a surface of a polishing cloth.

Abstract: The present invention relates to a polishing apparatus for polishing a workpiece, such as a semiconductor wafer, to a flat mirror finish. The polishing apparatus comprises a polishing table having a polishing surface, and a top ring, and the workpiece is interposed between the polishing table and the top ring and pressed at a predetermined pressure to polish the workpiece. The polishing apparatus comprises at least two dressing units for dressing the polishing surface by being brought into contact with the ppolishing surface, which is a surface of a polishing cloth.

Abstract: A memory device comprises a data storage section, a section which compares in write processing, for data being target of the write processing, a state before the data is stored in the data storage section with a state of the data which is stored in the data storage section and read out from the data storage section, a section which obtains the number of errors for the write processing on the basis of a comparison result from the comparison section, and a section which returns the number of errors.

Abstract: A polishing apparatus for polishing a workpiece comprises a polishing table having a polishing surface and a top ring for holding the workpiece and pressing the workpiece against the polishing surface. The polishing table and the top ring are rotated independently of each other. The polishing apparatus further comprises a dresser for dressing the polishing surface with certain timing and a sensor for observing a property of the polishing surface on the polishing table when the polishing surface is being dressed by the dresser.

Abstract: A polishing apparatus comprises a polishing table having a polishing surface thereon, a top ring for pressing a workpiece to be polished against the polishing surface, and a dresser for dressing the polishing surface on the polishing table. The dresser comprises a dressing element provided on a surface of the dresser for dressing the polishing surface by sliding contact with the polishing surface, and an ejection nozzle provided on the surface of the dresser for ejecting a fluid supplied from a fluid source toward the polishing surface.

Abstract: A simulation system simulates an operation of a memory. This system includes an error generating step in addition to a memory operation simulating step. An error can easily be generated in a read/write operation of a memory model only by setting a memory address. A set of free bits, which is not used for the simulation of a memory operation, is used as a memory address for indicating the error generation. It is thus unnecessary to prepare a new description of a signal line exclusively for indication of error generation and it is possible to simulate a memory operation containing an error only by the normal descriptions of an address, data, and the like.

Abstract: A polishing apparatus comprises a polishing table having a polishing surface thereon, a top ring for pressing a workpiece to be polished against the polishing surface, and a dresser for dressing the polishing surface on the polishing table. The dresser comprises a dressing element provided on a surface of the dresser for dressing the polishing surface by sliding contact with the polishing surface, and an ejection nozzle provided on the surface of the dresser for ejecting a fluid supplied from a fluid source toward the polishing surface.

Abstract: A polishing apparatus includes a top ring for holding a substrate and a polishing table having a polishing surface. The substrate held by the top ring is brought into contact with the polishing surface, and in this state, the polishing table and the substrate are moved relative to each other to thereby polish the substrate. Expendable replacement components to be bonded to the top ring and the polishing table, such as a backing film, a pressure ring and a polishing cloth, are bonded in such a manner that pieces of heat-sensitive adhesive tape are interposed between the expendable replacement components on the one hand and the top ring and the polishing table on the other. The heat-sensitive adhesive tape is switchable between a non-adhesive state and a adhesive state according to whether the temperature thereof is higher or lower than a predetermined set temperature.

Abstract: A substrate delivery mechanism comprises a top ring 10, a substrate loader 50 for loading a substrate Wf, and a pusher mechanism 20, wherein the substrate loader 50 comprises a top ring guide 53 and the pusher mechanism 20 comprises a top ring guide lifting table 21, in which the top ring guide 53 and the top ring guide lifting table 21 together form a sealed space M below the substrate Wf held by the top ring 10 in a condition where the substrate loader 50 is moved up by the pusher mechanism 20, wherein the substrate Wf is detached from the top ring 10 by exhausting the sealed space M while at the same time injecting a fluid from through-holes provided in a substrate holding surface of the top ring 10.

Abstract: The present invention relates to a polishing apparatus for polishing a workpiece to be polished, such as a semiconductor wafer, to a flat mirror finish. The polishing apparatus comprises a polishing table having a polishing surface, and a top ring, and the workpiece to be polished is interposed between the polishing table and the top ring and pressed at a predetermined pressure to polish the workpiece. The polishing apparatus comprises at least two dressing units for dressing the polishing surface by being brought into contact with a surface of a polishing cloth.

Abstract: Disclosed herein is a card having a controller and a clock control circuit. The controller incorporates a core logic, and the clock control circuit incorporates a PLL. When a card becomes idle to wait for commands, the clock control circuit stops the supply of a clock signal to the core logic. The clock control circuit can operate in two clock control modes. In the first clock control mode, the circuit stops the PLL. In the second clock control mode, the circuit shuts off the clock signal to be supplied from the PLL to the controller.

Abstract: A polishing apparatus comprises a polishing table having a polishing surface thereon, a top ring for pressing a workpiece to be polished against the polishing surface, and a dresser for dressing the polishing surface on the polishing table. The dresser comprises a dressing element provided on a surface of the dresser for dressing the polishing surface by sliding contact with the polishing surface, and an ejection nozzle provided on the surface of the dresser for ejecting a fluid supplied from a fluid source toward the polishing surface.

Abstract: Disclosed herein is a card having a controller and a clock control circuit. The controller incorporates a core logic, and the clock control circuit incorporates a PLL. When a card becomes idle to wait for commands, the clock control circuit stops the supply of a clock signal to the core logic. The clock control circuit can operate in two clock control modes. In the first clock control mode, the circuit stops the PLL. In the second clock control mode, the circuit shuts off the clock signal to be supplied from the PLL to the controller.

Abstract: A polishing apparatus for polishing a workpiece comprises a polishing table having a polishing surface and a top ring for holding the workpiece and pressing the workpiece against the polishing surface. The polishing table and the top ring are rotated independently of each other. The polishing apparatus further comprises a dresser for dressing the polishing surface with certain timing and a sensor for observing a property of the polishing surface on the polishing table when the polishing surface is being dressed by the dresser.

Abstract: A compact polishing apparatus has been developed which can be installed in a relatively small space, and is highly rigid without increasing the weight of the apparatus. The polishing apparatus comprises a polishing table, a top ring head for rotatably holding a substrate, a substrate transfer device for transferring the substrate to and from a substrate storage section, a substrate delivery device for delivery of the substrate between the top ring head and the substrate transfer device at a delivery position outside of the polishing table. A guide rail device is laid between the polishing table and the substrate delivery device, and a carriage device movable along the guide rail device is provided for carrying the top ring device thereon.

Abstract: A polishing apparatus for polishing semiconductor wafers has a space divided into a plurality of rooms cleaned to different degrees. A storage unit for storing semiconductor wafers is disposed in one of the rooms. A polishing unit for chemically and mechanically polishing a semiconductor wafer supplied from the storage unit is disposed in another one of the rooms. A delivery gate is disposed between the storage unit and the polishing unit and has a temporary storage chamber defined therein for temporarily storing a semiconductor wafer therein.

Abstract: An air passage opening/closing system includes a case having a casing opening portion, and a film door having a plurality of door opening portions. The case has a thin portion extending from a peripheral portion of the casing opening portion in a moving direction of the film door. In the system, a distance between the peripheral portion of the casing opening portion and the film door is not smaller than 5 mm, the case has a thick portion connected to the thin portion, and the thick portion contacts the film door to have a predetermined friction therebetween during moving the film door. Therefore, air flowing from a door opening portion collides with an inner surface of the thin portion of the case so that a flow rate of air is reduced, and then expands in a space between the thin portion of the case and the film door so that the flow rate of air is further reduced.