Abstract: A plasma processing apparatus having a vacuum vessel and a supporting means for supporting a processing target in the vacuum vessel, the apparatus comprising means for introducing a gas into a plasma generating space, means for feeding electric energy to the gas in the plasma generating space to generate a plasma, a metal member for forming negative ions which is provided on the downstream side of the plasma generating space in such a way that it comes into contact with particles of the plasma, and means for feeding the negative ions to the processing target. Utilizing the electric charge exchange reaction between plasma particles and metal surfaces, negative ions can be formed continuously and in a high density and also the negative ions can be made incident on a processing target to make ashing, etching or cleaning of the processing target to remove unwanted matter therefrom, so that a high processing rate and less charge-up damage can be achieved.

Abstract: In order to conduct ashing, etching or cleaning of an article to be processed to remove unnecessary matters therefrom and achieve a high processing rate and less charge-up damage by continuously forming negative ions at a high density and making the negative ions incident on the article, a plasma processing apparatus comprises a vacuum vessel, a supporting means for supporting an article to be processed in the vacuum vessel, a means for introducing a first gas into a plasma generating space, a means for feeding electric energy to the first gas in the plasma generating space to generate a plasma, a means for mixing a second gas into the plasma which has been introduced into a negative ion forming space communicating with the plasma generating space, thereby forming negative ions, and a means for drawing out the negative ions therefrom and feeding the negative ions to the article.

Abstract: Tricyclic triazolobenzazepine derivatives in the form or a prodrug are provided. The compounds according to the present invention are those represented by formula (I) and pharmacologically acceptable salts and solvates thereof. The compounds are useful as antiallergic agents and exhibit excellent bioavailability.

Abstract: To provide a production method of a structure with which a degradation of a processing speed is suppressed and plasma processing is performed with using a reliable plasma processing apparatus and which is excellent in repeatability, a plasma processing apparatus, which includes a container whose inside can be exhausted and a gas supply port for supplying a process gas to the container and subjects to plasma processing an object to be processed placed in the container, is characterized in containing a light shielding film that disturbs the incidence of light, which may increase dielectric loss of a permeable window, to this dielectric window on the internal surface of the permeable window permeating high frequency energy for generating the plasma of the above-described gas, and is provided in the above-described container.

Abstract: To provide a dry etching method that attains a high selectivity to a mask and a high etch rate simultaneously, in the steps of forming an intermediate layer and a patterned resist layer on an organic film and etching the organic film using a plasma of a gas containing either of nitrogen and hydrogen, a metal or a metal nitride is used as a part of the intermediate layer.

Abstract: Disclosed is a plasma density measuring method which includes producing a surface wave at an interface between a dielectric member and a plasma, and measuring at least one of a plasma density and a relative change in plasma density, on the basis of the surface wave. Also disclosed is a plasma processing system including a container having a window, and for storing therein a gas introduced thereinto, a dielectric member for closing the window of the container, a plasma voltage source for applying a high frequency voltage through the dielectric member to produce a plasma by use of the gas inside the container, wherein a predetermined process is performed by use of the thus produced plasma, a detecting system for detecting an electric field intensity distribution of a surface wave propagated through the dielectric member, and a feedback system for feeding back the result of detection by the detecting system, to a processing condition for the process.

Abstract: A plasma processing apparatus having a vacuum vessel and a supporting means for supporting a processing target in the vacuum vessel, the apparatus comprising means for introducing a gas into a plasma generating space, means for feeding electric energy to the gas in the plasma generating space to generate a plasma, a metal member for forming negative ions which is provided on the downstream side of the plasma generating space in such a way that it comes into contact with particles of the plasma, and means for feeding the negative ions to the processing target.

Abstract: In order to conduct ashing, etching or cleaning of an article to be processed to remove unnecessary matters therefrom and achieve a high processing rate and less charge-up damage by continuously forming negative ions at a high density and making the negative ions incident on the article, a plasma processing apparatus comprises a vacuum vessel, a supporting means for supporting an article to be processed in the vacuum vessel, a means for introducing a first gas into a plasma generating space, a means for feeding electric energy to the first gas in the plasma generating space to generate a plasma, a means for mixing a second gas into the plasma which has been introduced into a negative ion forming space communicating with the plasma generating space, thereby forming negative ions, and a means for drawing out the negative ions therefrom and feeding the negative ions to the article.

Abstract: For ashing without degradation of film quality of an organic low-dielectric-constant film of a base, there is provided a method of ashing an organic resist pattern formed on an interlayer insulating film, which includes an organic low-dielectric-constant film at least in part over an article, wherein the ashing is carried out using a plasma of a mixed gas of oxygen and nitrogen. The mixing ratio of nitrogen and oxygen is determined such that the content of oxygen is greater than 0 vol % and not more than 10 vol %.

Abstract: A plasma processing apparatus having a vacuum vessel and a supporting means for supporting a processing target in the vacuum vessel, the apparatus comprising means for introducing a gas into a plasma generating space, means for feeding electric energy to the gas in the plasma generating space to generate a plasma, a metal member for forming negative ions which is provided on the downstream side of the plasma generating space in such a way that it comes into contact with particles of the plasma, and means for feeding the negative ions to the processing target. Utilizing the electric charge exchange reaction between plasma particles and metal surfaces, negative ions can be formed continuously and in a high density and also the negative ions can be made incident on a processing target to make ashing, etching or cleaning of the processing target to remove unwanted matter therefrom, so that a high processing rate and less charge-up damage can be achieved.

Abstract: In order to conduct ashing, etching or cleaning of an article to be processed to remove unnecessary matters therefrom and achieve a high processing rate and less charge-up damage by continuously forming negative ions at a high density and making the negative ions incident on the article, a plasma processing apparatus comprises a vacuum vessel, a supporting device for supporting an article to be processed in the vacuum vessel, a device for introducing a first gas into a plasma generating space, a device for feeding electric energy to the first gas in the plasma generating space to generate a plasma, a device for mixing a second gas into the plasma which has been introduced into a negative ion forming space communicating with the plasma generating space, thereby forming negative ions, and a device for drawing out the negative ions therefrom and feeding the negative ions to the article.

Abstract: An ink washing device is disclosed, for use in a printing machine having a deposit roller with a variable luminance outer surface. The washing device includes a blade disposed adjacent to the deposit roller, for removing excess deposit of ink on the outer surface of the deposit roller, thus causing its luminance to vary. A luminance sensor detects changes in the luminance of the outer surface. The washing operation is interrupted or continued based on the detected luminance changes.

Abstract: A printed circuit board is supported at its peripheral portion and is moved and positioned by a drive mechanism. During the drilling of a hole in the circuit board, the thrust of the drill acting upon the circuit board is born by a sliding contact surface on a stand disposed on the side of the board opposite the drill. Ultrasonic vibration is applied to the printed circuit board via the stand during the drilling operation to prevent the occurrence of expoxy smearing.

Abstract: An azo compound of the formula: ##STR1## wherein R is of the formula: ##STR2## R.sub.1 is hydrogen, methyl or --SO.sub.3 M; R.sub.2 is hydrogen or --SO.sub.3 M; R.sub.2 is hydrogen or --SO.sub.3 M; R.sub.3 is C.sub.4 -C.sub.18 alkyl and M is hydrogen, an alkali metal, ammonium or organic ammonium, provided that when R includes --SO.sub.3 M, R.sub.1 l and R.sub.2 are not --SO.sub.3 M, and when R does not include --SO.sub.3 M, either one of R.sub.1 and R.sub.2 is --SO.sub.3 M, which is useful as a black dyestuff for a solvent type ink composition, particularly for ink jet recording.

Abstract: A dye solution composition containing a black dye obtained by the action of at least one acid or its salt:HO(CH.sub.2).sub.n SO.sub.3 H, Cl(CH.sub.2).sub.n COOH, Br(CH.sub.2).sub.n COOH (n=1 or 2)on one or a mixture of dyes of the formula (I): ##STR1## wherein R is phenylene or naphthylene residue; X and X' are each H, sulfonic acid group or sulfonate group; Y and Y' are each H or alkali metal; R' is one of amino group-containing radicals: ##STR2## (the carboxyl group may be carboxylate group and the sulfonic acid group may be sulfonate group), except that when R' has not sulfonic acid group, X and X' are not the same and when R' has sulfonic acid group, X and X' are H. This is highly stable, preservative and water soluble, and is useful as ink composition for ball-point pen and ink jet recording.

Abstract: An ink washing device is disclosed, for use in a printing machine having a deposit roller with a variable luminance outer surface. The washing device includes a blade disposed adjacent to the deposit roller, for removing excess deposit of ink on the outer surface of the deposit roller, thus causing its luminance to vary. A luminance sensor detects changes in the luminance of the outer surface. The washing operation is interrupted or continued based on the detected luminance changes.