Patents by Inventor Hiroaki Naito

Hiroaki Naito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10896831
    Abstract: A supply part includes a first partition, a second partition under the first partition, a third partition under the second partition, a first flow path between the first partition and the second partition allowing a first gas to be introduced therein, a second flow path between the second partition and the third partition allowing a second gas to be introduced therein, a first piping extending from the second partition to reach below the third partition and being communicated with the first flow path, a second piping extending from the third partition to reach below the third partition and being communicated with the second flow path, and a convex portion provided on an outer circumferential surface of the first piping or an inner circumferential surface of the second piping protruding from one of the outer circumferential surface and the inner circumferential surface toward the other one.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: January 19, 2021
    Assignees: NuFlare Technology, Inc., Showa Denko K.K., Central Research Institute of Electric Power Industry
    Inventors: Kunihiko Suzuki, Naohisa Ikeya, Keisuke Fukada, Masahiko Ito, Isaho Kamata, Hidekazu Tsuchida, Hiroaki Fujibayashi, Hideyuki Uehigashi, Masami Naito, Kazukuni Hara, Hirofumi Aoki, Takahiro Kozawa
  • Publication number: 20200395371
    Abstract: A semiconductor memory device includes multiple first electrode layers stacked in a first direction, multiple second electrode layers stacked in the first direction, a first columnar body extending through the multiple first electrode layers in the first direction, a second columnar body extending through the multiple second electrode layers in the first direction, a connection part connecting the first columnar body and the second columnar body, and a spacer film having an island configuration surrounding the connection part. The multiple first electrode layers and the multiple second electrode layers are arranged in the first direction, and the connection part and the spacer film are provided between the multiple first electrode layers and the multiple second electrode layers.
    Type: Application
    Filed: September 1, 2020
    Publication date: December 17, 2020
    Inventors: Takeshi NAGATOMO, Tatsuo Izumi, Ryota Suzuki, Takuya Nishikawa, Yasuhito Nakajima, Daiki Takayama, Hiroaki Naito, Genki Kawaguchi
  • Patent number: 10845098
    Abstract: An air conditioner is provided, which is capable of accurately determining appropriateness of a refrigerant amount in a refrigerating cycle. A control apparatus is configured to: stop a cooling operation; set an expansion valve to a fully-closed state and, at the same time, switch the selector valve to change the direction, in which a refrigerant flows, to an opposite direction; operate a compressor to perform a refrigerant recovery operation, in which a refrigerant contained in an outdoor heat exchanger is recovered by an indoor heat exchanger; and determine the appropriateness of a refrigerant amount in a refrigerating cycle, based on at least one of a time required for recovering the refrigerant, a pressure change in a refrigerant suctioned by the compressor, and temperature of the refrigerant discharged from the compressor during the refrigerant recovery operation.
    Type: Grant
    Filed: May 18, 2018
    Date of Patent: November 24, 2020
    Assignee: HITACHI-JOHNSON CONTROLS AIR CONDITIONING, INC.
    Inventors: Jun Xue, Koji Naito, Hiroaki Kaneko, Gen Yasuda
  • Patent number: 10731532
    Abstract: The problem of the present invention is to provide an exhaust gas purification catalyst which can exhibit sufficient purification performance under a high Ga condition while having a resistance to stress such as high-temperature and poisonous substances. The present invention relates to an exhaust gas purification catalyst comprising two or more catalyst coating layers on a substrate, wherein a lower catalyst coating layer that is present lower with respect to an uppermost catalyst coating layer has a structure where a large number of voids are included and high-aspect-ratio pores having an aspect ratio of 5 or more account for a certain proportion or more of the whole volume of voids, thereby to improve gas diffusivity in the lower catalyst coating layer.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: August 4, 2020
    Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, CATALER CORPORATION
    Inventors: Hiromasa Suzuki, Masahide Miura, Yoshinori Saito, Satoru Katoh, Toshitaka Tanabe, Tetsuhiro Hirao, Tatsuya Ohashi, Hiroaki Naito, Hirotaka Ori, Michihiko Takeuchi, Keiichi Narita
  • Publication number: 20200083330
    Abstract: A method for producing a SiC epitaxial wafer according to the present embodiment includes: an epitaxial growth step of growing the epitaxial layer on the SiC single crystal substrate by feeding an Si-based raw material gas, a C-based raw material gas, and a gas including a Cl element to a surface of a SiC single crystal substrate, in which the epitaxial growth step is performed under growth conditions that a film deposition pressure is 30 torr or less, a Cl/Si ratio is in a range of 8 to 12, a C/Si ratio is in a range of 0.8 to 1.2, and a growth rate is 50 ?m/h or more from an initial growth stage.
    Type: Application
    Filed: April 19, 2018
    Publication date: March 12, 2020
    Applicants: SHOWA DENKO K.K., Central Research Institute of Electric Power Industry, DENSO CORPORATION
    Inventors: Keisuke FUKADA, Naoto ISHIBASHI, Akira BANDO, Masahiko ITO, Isaho KAMATA, Hidekazu TSUCHIDA, Kazukuni HARA, Masami NAITO, Hideyuki UEHIGASHI, Hiroaki FUJIBAYASHI, Hirofumi AOKI, Toshikazu SUGIURA, Katsumi SUZUKI
  • Patent number: 10584417
    Abstract: A film forming apparatus according to an embodiment of the invention includes: a film forming chamber configured to form a film on a substrate; a susceptor configured to place the substrate thereon; a rotating part configured to rotate the susceptor; a heater configured to heat the substrate; and a gas supplier configured to supply process gases into the film forming chamber, wherein the susceptor includes: a ring-shaped outer circumferential susceptor supported by the rotating part; a holder provided at an inner circumferential portion of the outer circumferential susceptor, the holder configured to hold the substrate; a ring-shaped plate provided over the outer circumferential susceptor; and a cover member configured to cover a top surface and an outer circumferential surface of the plate and an outer circumferential surface of the outer circumferential susceptor.
    Type: Grant
    Filed: July 10, 2015
    Date of Patent: March 10, 2020
    Assignee: NuFlare Technology, Inc.
    Inventors: Hideki Ito, Hidekazu Tsuchida, Isaho Kamata, Masahiko Ito, Masami Naito, Hiroaki Fujibayashi, Katsumi Suzuki, Koichi Nishikawa
  • Publication number: 20200071424
    Abstract: Provided is a humanized monoclonal antibody or an antibody fragment thereof that selectively inhibits the enzymatic activity of vascular endothelial lipase and pharmaceutical compositions containing the same as an active ingredient useful for the treatment of arteriosclerosis or metabolic syndrome.
    Type: Application
    Filed: November 18, 2019
    Publication date: March 5, 2020
    Applicant: Shionogi & Co., Ltd.
    Inventors: Shoichi NAITO, Hiroaki AINO, Etsuo NAKAMURA, Sunao IMAI, Shoji YAMANE
  • Patent number: 10570215
    Abstract: Provided is a humanized monoclonal antibody or an antibody fragment thereof that selectively inhibits the enzymatic activity of vascular endothelial lipase and pharmaceutical compositions containing the same as an active ingredient useful for the treatment of arteriosclerosis or metabolic syndrome.
    Type: Grant
    Filed: March 10, 2017
    Date of Patent: February 25, 2020
    Assignee: SHIONOGI & CO., LTD.
    Inventors: Shoichi Naito, Hiroaki Aino, Etsuo Nakamura, Sunao Imai, Shoji Yamane
  • Patent number: 10539056
    Abstract: An object of the present invention is to provide an exhaust gas purification catalyst which can exhibit high durability and warm-up performance. The present invention relates to an exhaust gas purification catalyst comprising a substrate and a catalyst coating layer formed on the substrate, wherein the catalyst coating layer comprises catalyst particles, the catalyst coating layer having an upstream region extending by 40 to 60% of the entire length of the substrate from an upstream end of the catalyst in the direction of an exhaust gas flow and a downstream region corresponding to the remainder portion of the catalyst coating layer, the composition of the catalyst particle of the upstream region being different from that of the downstream region. The upstream region in the direction of an exhaust gas flow has a structure where a void is included in a large number, and furthermore high-aspect-ratio pores having an aspect ratio of 5 or more account for a certain percentage or more of the whole volume of voids.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: January 21, 2020
    Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, CATALER CORPORATION
    Inventors: Hiromasa Suzuki, Masahide Miura, Yoshinori Saito, Satoru Katoh, Toshitaka Tanabe, Tetsuhiro Hirao, Tatsuya Ohashi, Hiroaki Naito, Hirotaka Ori, Michihiko Takeuchi, Keiichi Narita
  • Publication number: 20190376206
    Abstract: This SiC epitaxial wafer includes: a SiC single crystal substrate of which a main surface has an off-angle of 0.4° to 5° with respect to (0001) plane; and an epitaxial layer provided on the SiC single crystal substrate, wherein the epitaxial layer has a basal plane dislocation density of 0.1 pieces/cm2 or less that is a density of basal plane dislocations extending from the SiC single crystal substrate to an outer surface and an intrinsic 3C triangular defect density of 0.1 pieces/cm2 or less.
    Type: Application
    Filed: December 25, 2017
    Publication date: December 12, 2019
    Applicants: SHOWA DENKO K.K, Central Research Institute of Electric Power Industry, DENSO CORPORATION
    Inventors: Keisuke FUKADA, Naoto ISHIBASHI, Akira BANDO, Masahiko ITO, Isaho KAMATA, Hidekazu TSUCHIDA, Kazukuni HARA, Masami NAITO, Hideyuki UEHIGASHI, Hiroaki FUJIBAYASHI, Hirofumi AOKI, Toshikazu SUGIURA, Katsumi SUZUKI
  • Patent number: 10450917
    Abstract: An object of the present invention is to provide an exhaust gas purification catalyst which can exhibit high durability and warm-up performance. The present invention relates to an exhaust gas purification catalyst comprising a substrate and a catalyst coating layer formed on the substrate, wherein the catalyst coating layer comprises catalyst particles, the catalyst coating layer having an upstream region extending by 40 to 60% of the entire length of the substrate from an upstream end of the catalyst in the direction of an exhaust gas flow and a downstream region corresponding to the remainder portion of the catalyst coating layer, the composition of the catalyst particle of the upstream region being different from that of the downstream region. The upstream region in the direction of an exhaust gas flow has a structure where a void is included in a large number, and furthermore high-aspect-ratio pores having an aspect ratio of 5 or more account for a certain percentage or more of the whole volume of voids.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: October 22, 2019
    Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, CATALER CORPORATION
    Inventors: Hiromasa Suzuki, Masahide Miura, Yoshinori Saito, Satoru Katoh, Toshitaka Tanabe, Tetsuhiro Hirao, Tatsuya Ohashi, Hiroaki Naito, Hirotaka Ori, Michihiko Takeuchi, Keiichi Narita
  • Patent number: 10413895
    Abstract: When the amount of coating is increased in a two-layer catalyst or the like containing two noble metals in respective different layers, gas diffusivity in the catalyst and use efficiency of a catalytic active site are reduced to thereby reduce purification performance. In view of this, an organic fiber having a predetermined shape is used as a pore-forming material in formation of an uppermost catalyst coating layer of a multi-layer catalyst, to thereby form an uppermost catalyst coating layer having a high-aspect-ratio pore excellent in connectivity and therefore excellent gas diffusivity.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: September 17, 2019
    Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, CATALER CORPORATION
    Inventors: Hiromasa Suzuki, Masahide Miura, Yoshinori Saito, Satoru Katoh, Toshitaka Tanabe, Tetsuhiro Hirao, Tatsuya Ohashi, Hiroaki Naito, Hirotaka Ori, Michihiko Takeuchi, Keiichi Narita
  • Publication number: 20190277550
    Abstract: To achieve higher efficiency at a low-load region and to enable power saving throughout a year. The refrigeration cycle apparatus 1 includes a compressor 4 that has a flow in/out port 4d through which a refrigerant is capable of flowing out and flowing in, in fluid communication with a compression room 4c; pipes 21, 22 disposed at a suction side of the compressor 4; a pipe 25 connected to the flow in/out port 4d of the compressor 4; a pipe 27 that has one end connected to the pipe 25 and an opposite end connected to the pipe 21; and a second solenoid valve 13 for opening and closing a fluid passage of the pipe 27.
    Type: Application
    Filed: March 21, 2019
    Publication date: September 12, 2019
    Inventors: Atsuhiko YOKOZEKI, Koji NAITO, Kazuhito SEKIBA, Shoutaro YAMAMOTO, Hiroaki KANEKO, Kazuhiko TANI
  • Patent number: 10323554
    Abstract: The present invention is directed to address the following problem: in an exhaust gas purification catalyst comprising a dual catalyst of a combination of a startup catalyst and an underfloor catalyst, reduction in the gas diffusivity of the underfloor catalyst results in reduction in the use efficiency of a catalytic active site, resulting in reduction in purification performance. The present invention relates to an exhaust gas purification catalyst comprising a dual catalyst of a combination of a startup catalyst and an underfloor catalyst having a catalyst coating where a large number of voids are included, wherein high-aspect-ratio pores having an aspect ratio of 5 or more account for a certain rate or more of the whole volume of the voids, to thereby enhance the purification performance of the catalyst.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: June 18, 2019
    Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, CATALER CORPORATION
    Inventors: Hiromasa Suzuki, Masahide Miura, Yoshinori Saito, Satoru Katoh, Toshitaka Tanabe, Tetsuhiro Hirao, Tatsuya Ohashi, Hiroaki Naito, Hirotaka Ori, Michihiko Takeuchi, Keiichi Narita
  • Patent number: 10304845
    Abstract: In one embodiment, a semiconductor device includes a substrate, and first to fourth interconnects provided on the substrate to be adjacent to one another. The device includes a first pad portion connected with the first or second interconnect, and a second pad portion adjacent to the first pad portion in a first direction. The device includes a third pad portion connected with the third or fourth interconnect, and adjacent to one of the first and second pad portions in a second direction, and a fourth pad portion adjacent to the third pad portion in the first direction, and adjacent to the other of the first and second pad portions in the second direction. The device includes one or more interconnects insulated from the first to fourth interconnects and the first to fourth pad portions, and provided between the first and second interconnects and the third and fourth interconnects.
    Type: Grant
    Filed: March 9, 2015
    Date of Patent: May 28, 2019
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Hiroaki Naito, Satoshi Nagashima
  • Patent number: 10111437
    Abstract: A novel guanidine compound having excellent fungicidal activity is represented by formula [I]. (In the formula, Y represents a divalent group represented by formula [II] (wherein each of R7-R9 independently represents a hydrogen atom or the like) or the like; each of X and Z independently represents an unsubstituted or substituted alkylene group or the like; each of Q1 and Q2 independently represents a single bond or the like; each of A1 and A2 independently represents an unsubstituted or substituted divalent heterocyclic compound residue or the like; and each of R1-R6 independently represents a hydrogen atom or the like.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: October 30, 2018
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Yoichi Ihori, Shuuji Inoue, Kotaro Shibayama, Chang-Kyung Kang, Yasuyuki Shiinoki, Takuya Kamada, Hiroaki Naito, Satoshi Nishimura
  • Patent number: 10112181
    Abstract: A catalyst for purification of exhaust gas, wherein a substrate and a catalyst coat layer which is formed on a surface of the substrate and which comprises catalyst particles, wherein the catalyst coat layer has an average thickness in a range of 25 to 160 ?m, and a void fraction in a range of 50 to 80% by volume as measured by a weight-in-water method, 0.5 to 50% by volume of all voids in the catalyst coat layer consist of high-aspect ratio pores which have equivalent circle diameters in a range of 2 to 50 ?m in a cross-sectional image of a cross-section of the catalyst coat layer which the cross-section is perpendicular to a flow direction of exhaust gas in the substrate, and which have aspect ratios of 5 or higher, and the high-aspect ratio pores have an average aspect ratio in a range of 10 to 50.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: October 30, 2018
    Assignees: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO, TOYOTA JIDOSHA KABUSHIKI KAISHA, CATALER CORPORATION
    Inventors: Satoru Katoh, Toshitaka Tanabe, Masahide Miura, Hiromasa Suzuki, Hiroaki Naito, Hirotaka Ori, Keiichi Narita, Michihiko Takeuchi, Tatsuya Ohashi
  • Publication number: 20180252132
    Abstract: An object of the present invention is to provide an exhaust gas purification catalyst which can exhibit high durability and warm-up performance. The present invention relates to an exhaust gas purification catalyst comprising a substrate and a catalyst coating layer formed on the substrate, wherein the catalyst coating layer comprises catalyst particles, the catalyst coating layer having an upstream region extending by 40 to 60% of the entire length of the substrate from an upstream end of the catalyst in the direction of an exhaust gas flow and a downstream region corresponding to the remainder portion of the catalyst coating layer, the composition of the catalyst particle of the upstream region being different from that of the downstream region. The upstream region in the direction of an exhaust gas flow has a structure where a void is included in a large number, and furthermore high-aspect-ratio pores having an aspect ratio of 5 or more account for a certain percentage or more of the whole volume of voids.
    Type: Application
    Filed: March 24, 2016
    Publication date: September 6, 2018
    Applicants: TOYOTA JIDOSHA KABUSHIKI KAISHA, CATALER CORPORATION
    Inventors: Hiromasa SUZUKI, Masahide MIURA, Yoshinori SAITO, Satoru KATOH, Toshitaka TANABE, Tetsuhiro HIRAO, Tatsuya OHASHI, Hiroaki NAITO, Hirotaka ORI, Michihiko TAKEUCHI, Keiichi NARITA
  • Publication number: 20180243728
    Abstract: A catalyst for purification of exhaust gas, wherein a substrate and a catalyst coat layer which is formed on a surface of the substrate and which comprises catalyst particles, wherein the catalyst coat layer has an average thickness in a range of 25 to 160 ?m, and a void fraction in a range of 50 to 80% by volume as measured by a weight-in-water method, 0.5 to 50% by volume of all voids in the catalyst coat layer consist of high-aspect ratio pores which have equivalent circle diameters in a range of 2 to 50 ?m in a cross-sectional image of a cross-section of the catalyst coat layer which the cross-section is perpendicular to a flow direction of exhaust gas in the substrate, and which have aspect ratios of 5 or higher, and the high-aspect ratio pores have an average aspect ratio in a range of 10 to 50.
    Type: Application
    Filed: February 17, 2016
    Publication date: August 30, 2018
    Applicants: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO, TOYOTA JIDOSHA KABUSHIKI KAISHA, CATALER CORPORATION
    Inventors: Satoru KATOH, Toshitaka TANABE, Masahide MIURA, Hiromasa SUZUKI, Hiroaki NAITO, Hirotaka ORI, Keiichi NARITA, Michihiko TAKEUCHI, Tatsuya OHASHI
  • Patent number: D873229
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: January 21, 2020
    Assignee: SONY CORPORATION
    Inventors: Hiroaki Yokota, Kirio Masui, Takahiro Naito, Miho Yamada, Yusuke Tsujita