Abstract: An object tracing device, an object tracing system and an object tracing method are disclosed, which traces a truly suspicious object even when a new suspicious object comes into an area to be monitored after a suspicious object has been started to be traced. In the object tracing device, an object-identifying part identifies a plurality of objects in a wide-angle picture taken by a first picture-taking device; a chronological-information-creating part creates chronological information of the identified objects; an object-selecting part selects an object having a selecting condition identical with that of the object defined as the object to be traced; and a control part drives a second picture-taking device taking a picture of a narrower angle than a first picture-taking device does and controls the picture-taking device in taking a picture of the selected object.

Abstract: An image display device is configured to cut out and display a moving object within an omnidirectional image. The image display device includes: a moving object position acquisition unit configured to acquire a position of the moving object within the omnidirectional image; a determination unit configured to determine whether to correct an upward direction of a cutout image; a parameter correction unit configured to correct a cutout parameter when the determination unit determines to correct the upward direction of the cutout image; a cutout unit configured to cut images including the moving object out of the omnidirectional image based on the cutout parameter corrected by the parameter correction unit; and a display unit configured to display the images including the moving object, which are cut out by the cutout unit.

Abstract: Disclosed are a method for forming a display image and a display control device for displaying an image in which the position of a target is significantly easier to find. In a display control device (100), a clipped region setting unit (140) sets a clipped region candidate including both a target and a characterized area which characterizes a position in a region to be imaged as the clipped region. When a characterized area is not included in the clipped region candidate, a clipped region candidate modification unit (130) modifies either the size or the position of the clipped region candidate until said clipped region candidate includes both the target and the characterized area.

Abstract: An arc ion plating apparatus comprises a vacuum chamber, a rotary table for moving a substrate within the vacuum chamber vertically relative to its height direction, an arc evaporation source for bombardment for cleaning the surface of the substrate with metal ions, and an arc evaporation source for deposition group for depositing metal ions on the surface of the substrate. The arc evaporation source for deposition group is composed of a plurality of evaporation sources arranged so as to be opposite to the substrate set on the rotary table, and the arc evaporation source for bombardment is arranged so as to be opposite to the substrate, and formed so that its length in the height direction of the vacuum chamber is equal to the length between the upper and lower ends of the arc evaporation source for deposition group. According to such a structure, over temperature rise or abnormal discharge is hardly caused in the substrate at the time of bombardment, and process controllability is consequently enhanced.

Abstract: Specified types of words are extracted from a plurality of radiology reports archived in an archive configured to archive a plurality of radiology reports. The words extracted from a single radiology report are stored in combination. In response to an input operation using an operating part of inputting the specified types of words, combinations including the specified types of words as one part are searched. A list of the specified types of words included as the other part in the searched combinations is generated. In response to an input operation using the operating part of selecting any word from the word list, a list of radiology reports including the inputted word and the selected word is generated. In response to an input operation using the operating part of selecting any report from the radiology report list, the selected radiology report is outputted from the archive to a display.

Abstract: An image processing device comprises a region dividing unit which divides a captured image obtained by a camera unit into a plurality of regions, and an image compressing unit which compresses each of region images obtained by the division by the region dividing unit while changing the compression rate according to the distance from a predetermined point in the captured image to each of the region images and the distance from the camera unit to a target included in each of the regions. For example, the image compressing unit compresses the region image having a larger angle from the optical axis at a larger compression rate, thereby achieving compression in which the amount of data in low-quality regions is greatly reduced and the quality of high-quality regions is maintained.

Abstract: A hard laminated Mm wherein a layer A and a layer B having specific compositions are deposited alternately so that the compositions of layer A and layer B are different. The thickness of layer A per layer is twice or more the thickness of layer B per layer, the thickness of layer B per layer is 5 nm or more, and the thickness of layer A per layer is 200 nm or less.

Abstract: In an arc ion plating method, the target is divided into a central portion and longitudinal end portions at both longitudinal ends of the central portion. A constituent material of the target is evaporated and ionized by vacuum arc discharge using the target as a cathode, wherein the position of an arc spot on a surface of the target is controlled such that the consuming speed of the longitudinal end portions becomes higher than that of the central portion, whereby at least one of the longitudinal end portions will reach its consumption limit before the target central portion reaches its consumption limit. Only the respective longitudinal end portion that has reached its consumption limit is thereafter replaced, and the film forming step is continued.

Abstract: Provided is an arc evaporation source wherein film-forming speed is increased by inducing magnetic lines in the substrate direction. The arc evaporation source is provided with: at least one outer circumferential magnet (3), which is disposed such that the outer circumferential magnet surrounds the outer circumference of a target (2) and that the magnetization direction thereof is in the direction orthogonally intersecting the surface of the target (2); and a rear surface magnet (4) disposed on the rear surface side of the target (2). The rear surface magnet (4) has a non-ring-shaped first permanent magnet (4A) wherein the polarity thereof faces the same direction as the polarity of the outer circumferential magnet (3) and the magnetization direction of the rear surface magnet (4) is in the direction orthogonally intersecting the surface of the target (2).

Abstract: A method of forming a container having a lid and a container body which define an inside space, and a material containing an organic compound provided in the inside space. The method includes forming a groove and a communication member for communicating the groove with an outside space, in at least one of the lid and the container body, providing the material in the inside space, welding the lid and the container body to each other, and exhausting the organic compound vaporized by welding heat to the outside space through the groove and the communication member.

Abstract: A conductor circuit (2) having a predetermined pattern is formed on a base material (1); a photosensitive resin composition layer is formed on a surface of the base material, on which the conductor circuit (2) having the predetermined pattern is formed, by using a photosensitive resin composition; a surface of the photosensitive resin composition layer is irradiated with and exposed to active light rays through a photomask having a predetermined pattern; a solder resist layer (3a) having a predetermined pattern is formed by using a developing solution; and the formed solder resist layer (3a) is irradiated with ultraviolet light by using a low-pressure mercury-vapor lamp.

Abstract: The present invention provides a PVD cylindrical target comprising an evaporation material covering the outer circumferential surface of a cylindrical substrate, the PVD cylindrical target includes a meshing part having at least either of a protruding shape and a recessed shape formed with rounded angular parts at the interface between the substrate and the evaporation material. According to such a structure, peeling or cracking of the evaporation material by a residual stress caused at the interface between the substrate and the evaporation material by a thermal expansion difference between the both can be suppressed, and sufficient adhesiveness between the both can also be ensured.

Abstract: A photosensitive resin composition which is capable of reducing stress occurring due to thermal history, such as a heat treatment, a metal-base-containing circuit board production method which suppresses the warpage of a circuit board by employing the photosensitive resin composition and a metal-base-containing circuit board. The photosensitive resin composition comprises a polyamide acid, a 1,4-dihydropyridine derivative and an amide compound.

Abstract: An arc ion plating apparatus comprises a vacuum chamber, a rotary table for moving a substrate within the vacuum chamber vertically relative to its height direction, an arc evaporation source for bombardment for cleaning the surface of the substrate with metal ions, and an arc evaporation source for deposition group for depositing metal ions on the surface of the substrate. The arc evaporation source for deposition group is composed of a plurality of evaporation sources arranged so as to be opposite to the substrate set on the rotary table, and the arc evaporation source for bombardment is arranged so as to be opposite to the substrate, and formed so that its length in the height direction of the vacuum chamber is equal to the length between the upper and lower ends of the arc evaporation source for deposition group. According to such a structure, over temperature rise or abnormal discharge is hardly caused in the substrate at the time of bombardment, and process controllability is consequently enhanced.

Abstract: A photosensitive resin composition which is excellent in flame resistance, resolution and flexibility, and substantially free from deposition of components thereof to prevent contamination of a product. The photosensitive resin composition comprises: (A) a cyclic phosphazene compound represented by the following general formula (1): wherein at least one of the Rs is an organic group having the urethane(meth)acrylate structure represented by the following general formula (2) and n is a positive number of 2 to 5: wherein R1 is a hydrogen atom or a methyl group; (B) a carboxyl-containing linear polymer obtained by polymerizing an ethylenically unsaturated compound through addition polymerization; (C) an epoxy resin; (D) an ethylenically unsaturated group-containing polymerizable compound; and (E) a photopolymerization initiator; wherein the cyclic phosphazene compound (A) is present in a proportion of 5 to 30 wt % based on the total weight of the composition.

Abstract: An exposure apparatus including a projection optical system and configured to expose a substrate to light via the projection optical system includes a support configured to support the projection optical system, an object supported by the support and movable relative the support, an actuator configured to drive the object, a detector configured to detect a relative position between the object and the support, and a controller configured to perform a control of the actuator based on an output of the detector to cause the object to follow the support. The controller is configured to perform an estimation of a vibration of the support based on an output of the detector in parallel with the control to cause the object to follow the support.

Abstract: A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.

Abstract: A negative photosensitive material is provided which has a lower linear expansion coefficient and a lower hygroscopic expansion coefficient and is excellent in gradational patternability and PI etchability in patterning.

Abstract: A method of manufacturing an optical element used at a second air pressure different from a first air pressure comprises: a measuring step of measuring a surface shape of the optical member at the first air pressure; a calculating step of calculating a deformation amount of the optical member that occurs owing to an air pressure difference between the first air pressure and the second air pressure; and a processing step of processing the optical member at the first air pressure so as to make the surface shape of the optical member match a target shape at the second air pressure, based on the surface shape measured in the measuring step and the deformation amount calculated in the calculating step.

Abstract: A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.