Patents by Inventor Hirokazu Hayashi
Hirokazu Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240070896Abstract: A method of the present disclosure includes (a) generating an input image by imaging a scene containing the M objects by a camera, (b) obtaining a feature map showing feature amounts relating to the N keypoints from the input image using a learned machine learning model with the input image as input and the feature map as output, (c) obtaining three-dimensional coordinates of the N keypoints belonging to each of the M objects using the feature map, and (d) determining positions and attitudes of one or more objects of the M objects using the three-dimensional coordinates of the N keypoints belonging to each of the M objects, wherein (c) includes (c1) obtaining M×N keypoints having undetermined correspondence relationships with the M objects and determining the three-dimensional coordinates of the M×N keypoints, and (c2) grouping the M×N keypoints to the N keypoints belonging to each of the M objects.Type: ApplicationFiled: August 28, 2023Publication date: February 29, 2024Inventors: Masaki HAYASHI, Hirokazu KASAHARA, Guoyi FU, Zhongzhen LUO
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Publication number: 20230264292Abstract: A branching element configured to branch a second laser light into a plurality of beams of branch light along a machining feed direction, and a second condenser lens configured to focus the plurality of beams of branch light branched by a branching element onto a street to be machined are provided, and a time period ? is expressed as ?=L/V, where L is a branch distance, which corresponds to spacing between adjacent leading and trailing spots for each of branch lights focused on the street by the second condenser lens, V is a machining speed, which corresponds to a speed of relative movement, and ? is the time period taken until the trailing spot overlaps a machining position of the leading spot, and ?>?1 is satisfied, where ?1 is a threshold value of the time period when deterioration of the machining quality of the second groove occurs.Type: ApplicationFiled: April 27, 2023Publication date: August 24, 2023Applicant: Tokyo Seimitsu Co., Ltd.Inventors: Chikara AIKAWA, Hirokazu HAYASHI
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Publication number: 20220364277Abstract: A yarn containing a plurality of potential-generating filaments. The yarn is characterized in that the plurality of potential-generating filaments are constructed such that the yarn has a specific permittivity of 4.5 or less. In a specific configuration, the plurality of potential-generating filaments are constructed such that the distance between the potential-generating filaments is about 0 ?m to about 10 ?m. Also provided is a fabric that contains the yarn.Type: ApplicationFiled: July 5, 2022Publication date: November 17, 2022Inventors: Kenichi MORI, Daiji TAMAKURA, Masayuki TSUJI, Kenichiro TAKUMI, Ryo TODO, Hirokazu HAYASHI
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Publication number: 20220235496Abstract: A thread that includes a first fiber having at least one groove extending in a length direction thereof; and at least one second fiber constructed to generate a potential by external energy. The second fiber is disposed in a region corresponding to the groove of the first fiber such that a space is between the groove of the first fiber and the second fiber.Type: ApplicationFiled: April 12, 2022Publication date: July 28, 2022Inventors: Takafumi INOUE, Nobuhito TSUBAKI, Masayuki TSUJI, Eiji TAGUCHI, Hirokazu HAYASHI
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Publication number: 20220228300Abstract: A cylindrical structure including a first cloth including a piezoelectric thread that generates an electric potential from external energy, a second cloth including a piezoelectric thread that generates an electric potential from external energy, and a connection portion connecting the first cloth and the second cloth, wherein the first cloth and the second cloth forms a side face of the cylindrical structure.Type: ApplicationFiled: April 8, 2022Publication date: July 21, 2022Inventors: Takafumi INOUE, Masayuki TSUJI, Eiji TAGUCHI, Hirokazu HAYASHI, Ryosuke EBINA
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Patent number: 11291373Abstract: A temperature sensor (210) measures a temperature inside clothes being a temperature inside the clothes worn by a user. The acceleration sensor (220) detects acceleration applied to the user. A processing device (100) estimates a deep body temperature that is a temperature inside the body of the user based on the temperature inside the clothes measured by the temperature sensor (210) and an acceleration detected by the acceleration sensor (220).Type: GrantFiled: June 15, 2018Date of Patent: April 5, 2022Assignee: TEIJIN LIMITEDInventors: Tasuku Kimura, Hirokazu Hayashi, Ryo Yasumitsu, Hiroshi Nose, Yu Ogawa
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Publication number: 20200367758Abstract: A temperature sensor (210) measures a temperature inside clothes being a temperature inside the clothes worn by a user. The acceleration sensor (220) detects acceleration applied to the user. A processing device (100) estimates a deep body temperature that is a temperature inside the body of the user based on the temperature inside the clothes measured by the temperature sensor (210) and an acceleration detected by the acceleration sensor (220).Type: ApplicationFiled: June 15, 2018Publication date: November 26, 2020Applicant: TEIJIN LIMITEDInventors: Tasuku KIMURA, Hirokazu HAYASHI, Ryo YASUMITSU, Hiroshi NOSE, Yu OGAWA
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Publication number: 20200327612Abstract: [Problem] To provide a currency exchange system and a remittance system which prevent the amount of money received from being less than expected as a result of the remittance of virtual currency. [Solution] A remittance system 1 is provided with a plurality of user terminals 2, a marketplace server 3, and a management server 4.Type: ApplicationFiled: October 1, 2018Publication date: October 15, 2020Inventor: Hirokazu HAYASHI
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Publication number: 20190122517Abstract: The problem to be solved is to provide an article that is capable of detecting position information within a building, and detecting hazards related to life such as heat stroke to issue an alarm, while ensuring safety, workability, and convenience. Means to solve the problem is an article including an alarm system, wherein the alarm system includes, a position information sensor, a three-axes acceleration sensor, a gyro sensor, a geomagnetic sensor, or a combination thereof; and a part configured to autonomously estimate a position from information emitted from the position information sensor, etc.Type: ApplicationFiled: April 10, 2017Publication date: April 25, 2019Applicant: TEIJIN LIMITEDInventors: Tasuku KIMURA, Hirokazu HAYASHI
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Patent number: 9957611Abstract: Provided is a removal device for a semiconductor manufacturing apparatus according to an embodiment including a reservoir being connectable to a reaction chamber where a film is formed on a substrate and storing a byproduct derived from an exhaust gas exhausted from the reaction chamber, a vacuum generator driven by a driving gas, and a suction pipe having one connected to the reservoir and the other connected to the vacuum generator and suctioning the byproduct.Type: GrantFiled: March 15, 2016Date of Patent: May 1, 2018Assignee: Kabushiki Kaisha ToshibaInventor: Hirokazu Hayashi
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Patent number: 9617650Abstract: The present invention provides a cationic electrodeposition coating composition comprising: a specific amino group-containing modified epoxy resin (A); a blocked polyisocyanate curing agent (B); a water-soluble zirconium compound (C); and sulfamic acid, wherein the water-soluble zirconium compound (C) is present in an amount of 10 to 10,000 ppm, calculated as the mass of the elemental zirconium, relative to the mass of the cationic electrodeposition coating composition.Type: GrantFiled: April 4, 2012Date of Patent: April 11, 2017Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, KANSAI PAINT CO., LTD.Inventors: Eisaku Okada, Kouji Takezoe, Hirokazu Hayashi
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Publication number: 20170067152Abstract: Provided is a removal device for a semiconductor manufacturing apparatus according to an embodiment including a reservoir being connectable to a reaction chamber where a film is formed on a substrate and storing a byproduct derived from an exhaust gas exhausted from the reaction chamber, a vacuum generator driven by a driving gas, and a suction pipe having one connected to the reservoir and the other connected to the vacuum generator and suctioning the byproduct.Type: ApplicationFiled: March 15, 2016Publication date: March 9, 2017Inventor: Hirokazu Hayashi
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Patent number: 9543596Abstract: A sealing member to be used for sealing a constituent member of a fuel cell is provided, the sealing member including a cross-linked product of a rubber composition, in which the rubber composition contains the following components (A) and (B). With this, rubber elasticity is maintained without being lost even under extremely low temperature conditions, and in the case where the sealing member is used in a fuel cell sealed body, an excellent sealing property is exhibited. (A) a rubber component including at least one of an ethylene-propylene rubber or ethylene-propylene-diene rubber having a ratio of ethylene-ethylene diad distribution of at most 29 mol %. (B) a cross-linking agent including an organic peroxide.Type: GrantFiled: June 10, 2015Date of Patent: January 10, 2017Assignee: SUMITOMO RIKO COMPANY LIMITEDInventors: Kenji Yamamoto, Hirokazu Hayashi, Kaoru Yasui, Shinji Kita
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Publication number: 20150288004Abstract: A sealing member to be used for sealing a constituent member of a fuel cell is provided, the sealing member including a cross-linked product of a rubber composition, in which the rubber composition contains the following components (A) and (B). With this, rubber elasticity is maintained without being lost even under extremely low temperature conditions, and in the case where the sealing member is used in a fuel cell sealed body, an excellent sealing property is exhibited. (A) a rubber component including at least one of an ethylene-propylene rubber or ethylene-propylene-diene rubber having a ratio of ethylene-ethylene diad distribution of at most 29 mol %. (B) a cross-linking agent including an organic peroxide.Type: ApplicationFiled: June 10, 2015Publication date: October 8, 2015Applicant: SUMITOMO RIKO COMPANY LIMITEDInventors: Kenji Yamamoto, Hirokazu Hayashi, Kaoru Yasui, Shinji Kita
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Publication number: 20140287340Abstract: A rubber composition which does not foul molds, requires low production costs and is excellent in mass productivity, and has high adhesion reliability, can be used in an adhesive layer for bonding a constituting member for a fuel cell and a rubber member for sealing and/or two rubber members together, is any one of (?) a liquid rubber composition containing (B) and (C) together with the following (A1), and (?) a solvent-based rubber composition containing a solvent together with the following (A2), (B) and (C). (A1) is a rubber component containing at least liquid rubber. (A2) is at least one selected from the group consisting of EPM, EPDM, NBR and H-NBR. (B) is a crosslinking agent composed of an organic peroxide. (C) is at least one selected from the group consisting of a resorcinol-based compound, a melamine-based compound, an aluminate-based coupling agent and a silane coupling agent.Type: ApplicationFiled: June 12, 2014Publication date: September 25, 2014Applicant: TOKAI RUBBER INDUSTRIES, LTD.Inventors: Kenji Yamamoto, Hirokazu Hayashi, Shinji Kita
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Publication number: 20140042031Abstract: The present invention provides a cationic electrodeposition coating composition comprising: a specific amino group-containing modified epoxy resin (A); a blocked polyisocyanate curing agent (B); a water-soluble zirconium compound (C); and sulfamic acid, wherein the water-soluble zirconium compound (C) is present in an amount of 10 to 10,000 ppm, calculated as the mass of the elemental zirconium, relative to the mass of the cationic electrodeposition coating composition.Type: ApplicationFiled: April 4, 2012Publication date: February 13, 2014Applicants: Kansai Paint Co., Ltd., Toyota Jidosha Kabushiki KaishaInventors: Eisaku Okada, Kouji Takezoe, Hirokazu Hayashi
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Publication number: 20130221498Abstract: A semiconductor device having a trench gate structure is formed by self alignment. The manufacturing method of the semiconductor device includes: forming a control electrode in an interior of trenches, etching a semiconductor layer between adjacent trenches to form an opening having a depth that is about level with an upper end of the control electrode with a portion of the semiconductor layer remaining between the opening and the control electrode, forming a first semiconductor region of the second conductive type from the surface of the semiconductor layer to a depth above the lower end of the control electrode, forming a single crystallized conductive layer from the first semiconductor region and the portion of the semiconductor layer, and forming a second semiconductor region, the second semiconductor region including the portion of the semiconductor layer and the single crystallized portion of the conductive layer.Type: ApplicationFiled: August 31, 2012Publication date: August 29, 2013Applicant: Kabushiki Kaisha ToshibaInventor: Hirokazu HAYASHI
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Patent number: 8414753Abstract: This invention concerns a method for forming a coating film on a metallic substrate by a multistage energization method at no less than two stages using an electrodeposition bath which comprises a water-based film-forming agent comprising zirconium compound and, as the base resin, an amino group-containing modified epoxy resin which is obtained through reaction of an epoxy resin with an amino group-containing compound, said epoxy resin having been obtained through reaction of a diepoxide compound, a bisphenol epoxy resin and bisphenols; whereby coated articles excelling in corrosion resistance are offered.Type: GrantFiled: May 20, 2009Date of Patent: April 9, 2013Assignees: Toyota Jidosha Kabushiki Kaisha, Kansai Paint Co., Ltd.Inventors: Eisaku Okada, Hirokazu Hayashi, Minoru Hanatani
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Patent number: 8159033Abstract: A junction forming region is formed between a drain region of a MOS structure and a device isolation region which surrounds the MOS structure and is in contact with the drain region, to form a PN junction together with the drain region. As a consequence, it is possible to adjust a breakdown voltage of an ESD protection device which is fabricated in the same process as that for an internal device without varying basic performance of the internal device even at a final stage of an LSI manufacturing process.Type: GrantFiled: March 4, 2009Date of Patent: April 17, 2012Assignee: Lapis Semiconductor Co., Ltd.Inventor: Hirokazu Hayashi
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Publication number: 20110068009Abstract: This invention concerns a method for forming a coating film on a metallic substrate by a multistage energization method at no less than two stages using an electrodeposition bath which comprises a water-based film-forming agent comprising zirconium compound and, as the base resin, an amino group-containing modified epoxy resin which is obtained through reaction of an epoxy resin with an amino group-containing compound, said epoxy resin having been obtained through reaction of a diepoxide compound, a bisphenol epoxy resin and bisphenols; whereby coated articles excelling in corrosion resistance are offered.Type: ApplicationFiled: May 20, 2009Publication date: March 24, 2011Inventors: Eisaku Okada, Hirokazu Hayashi, Minoru Hanatani