Abstract: A processing apparatus essentially includes a rotatable rotor 21 for carrying semiconductor wafers W, a motor 22 for driving to rotate the rotor 21, a plurality of processing chambers for surrounding the wafers W carried by the rotor 21, for example, an inner chamber 23 and an outer chamber 24, a chemical supplying unit 50, an IPA supplyig unit 60, a rinse supplying unit 70 and a drying fluid supplying unit 80. With this constitution of the apparatus, it is possible to prevent the wafers from being contaminated due to the reaction of treatment liquids of different kinds, with the improvement of processing efficiency and miniaturization of the apparatus.

Abstract: A processing apparatus essentially includes a rotatable rotor 21 for carrying semiconductor wafers W, a motor 22 for driving to rotate the rotor 21, a plurality of processing chambers for surrounding the wafers W carried by the rotor 21, for example, an inner chamber 23 and an outer chamber 24, a chemical supplying unit 50, an IPA supplying unit 60, a rinse supplying unit 70 and a drying fluid supplying unit 80. With this constitution of the apparatus, it is possible to prevent the wafers from being contaminated due to the reaction of treatment liquids of different kinds, with the improvement of processing efficiency and miniaturization of the apparatus.

Abstract: The present invention relates to a method of removing a polymer veil and a metal contamination deposited on a substrate having a metal layer. First, the polymer veils are removed by a chemical liquid in an inert gas atmosphere. Subsequently, the metal contamination are removed by oxidizing the metal contamination into metal oxide contamination by mixing oxygen in a small concentration in the inert gas atmosphere, and dissolving the metal oxide contamination by the chemical liquid.

Abstract: The present invention comprises the steps of performing a reforming process on a surface of a low dielectric constant insulation film formed on a substrate which includes one of a porous low dielectric constant insulation film and a non-porous low dielectric constant insulation film and forming an insulation film as at least one of an etching mask and a Chemical Mechanical Polishing stopper (CMP stopper) on the reformed surface of the low dielectric constant insulation film. For example, plasma is radiated as a reforming process mentioned above, the surface roughness of a low dielectric insulation film is increased and, as a result, adhesion between the films and also between the inter-layer insulation film and other neighboring films can be improved with so-called “anchor effect”.

Abstract: A manufacturing method of a liquid crystal display panel of high display quality is provided, in which any foreign matter or stain on the surface of a substrate can be completely removed and occurrence of irregular orientation or spot is prevented in the cleaning step after rubbing in the manufacturing process of the liquid crystal display panel. A cleaning apparatus for carrying out the manufacturing method is also provided.In the cleaning step after rubbing, as a pre-cleaning treatment, the surface of the glass substrate 1 is sufficiently covered by the mist-like particles 20 sprayed from a binary fluid nozzle 7 to the extent that the water does not move. Then, the glass substrate 1 is subject to a wet cleaning such as supersonic wave cleaning.

Abstract: A polishing treatment called CMP (chemical mechanical polishing) is utilized for filling a contact hole formed in a silicon oxide film with a metallic layer in a manufacturing process of a semiconductor device. After a CMP treatment, a target surface, on which the silicon oxide film and the metallic layer are exposed, is washed with a washing liquid so as to remove residues due to the CMP treatment. The washing liquid comprises a fluorine compound for providing an etchant for the silicon oxide film and the metallic layer, and a protective agent which can be adhered onto a surface of the metallic layer so as to form a protective film. The ratio between the fluorine compound and the protective agent is set such that etching rates of the silicon oxide film and the metallic layer to be effected by the washing liquid fall within ranges of from 0.5 nm/min to 5 nm/min and from 0.5 nm/min to 6 nm/min, respectively, and a ratio between these etching rates falls within a range of from "2:1" to "1:3".

Abstract: A motor 3 having a rotational shaft with a counterweight 4 is held in a vibrator holder 2. The rotational shaft of the motor is inserted at a free end in a circular hole in a bearing-plate of the vibrator holder 2. The vibrator holder 2 with the motor therein is accommodates in a vibrator accommodating section 120 formed in a housing 12 of a portable terminal and fixed with screws 5 to the housing 12. The vibrator holder 120 is then covered with an index cover 17 to thereby complete the vibrator attachment, which reduces a vibrator attaching work load. The inner wall of the vibrator accommodating section 120 faces the motor to thereby prevent the motor 3 from slipping from the holder.

Abstract: A relay lifter comprises a hook switch unit for turning ON/OFF a hook switch in response to a talk switch, a voice switching unit for switching connection of an aural signal in said corded telephone set between a transmitter/receiver of said corded telephone set and a cordless telephone set, and a bell sound detection signal transfer unit, a bell sound is outputted from said cordless telephone set when a bell sound is detected and an incoming call is accepted, a hook switch is turned ON/OFF using a hook switch ON/OFF unit, and connection of an aural signal in said corded telephone set is switched to said cordless telephone set for transmitting and receiving voice using said cordless telephone set.

Abstract: The is provided by the present invention a telephone system with high versatility comprising a corded telephone set, a cordless telephone set, and a relay lifter, wherein said relay lifter comprises a hook switch unit for turning ON/OFF a hook switch of the corded telephone set according to a first control signal responding to the talk switch, and a voice switching unit for switching connection of an aural signal in the corded telephone set according to a second control signal between a transmitter/receiver of the corded telephone set and the cordless telephone set, and switches connection of an aural signal in the corded telephone set to the cordless telephone set using the voice switching unit to transmit or receive voice using the cordless telephone set.

Abstract: An antenna device for a radio transmission-reception apparatus is disclosed which comprises an antenna element which is to be electrically and mechanically connected to a printed-circuit board fixed in a housing of the radio transmission-reception apparatus, an inverted U-shaped hollow reinforcement spacer, an antenna cover and a retaining portion formed on the housing. The reinforcement spacer has a hole formed in the top portion thereof a diameter of which is substantially equal to that of the antenna element to slide therethrough, a slit formed continuously from the hole to a base end thereof through which said antenna element can be entered in the reinforcement spacer, and a flange formed around the outer circumference of the base end. The antenna cover is constituted to accommodate therein the antenna element with the reinforcement spacer, and has a flange formed around the circumference of a base end thereof.

Abstract: A method comprises the steps of applying a gallium alloy in liquid form to the surface of an adherend metallic portion, and forming an alloy layer containing Ga, Sn, In or Zn on the surface of the adherend metallic portion, whereby an excellent adhesive surface having stability and water resistance can be formed on an adherend metallic portion to be contacted to cement or adhesive resin, by a very easy process without the need to use any special apparatus or instruments during the operation of adhesively bonding a resin portion of a denture base to a metallic portion or a dentine to a restorative metallic material such as an inlay, a crown or the like.