Patents by Inventor Hiromitsu Nakashima
Hiromitsu Nakashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8609318Abstract: A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The polymer (A) preferably includes a structural unit shown by the following formula (1) as the structural unit (I). It is preferable that X in the formula (1) represent a divalent or trivalent chain-like hydrocarbon group or alicyclic hydrocarbon group.Type: GrantFiled: August 5, 2011Date of Patent: December 17, 2013Assignee: JSR CorporationInventors: Kazuo Nakahara, Hiromitsu Nakashima, Reiko Kimura
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Patent number: 8609319Abstract: A radiation-sensitive resin composition that includes (A) a polymer that includes a repeating unit (a1) and a fluorine atom, the repeating unit (a1) including a group shown by the following formula (1) or (2), the radiation-sensitive resin composition including the polymer (A) in an amount of 0.1 mass % or more and less than 20 mass % based on the total amount of polymers included in the radiation-sensitive resin composition.Type: GrantFiled: September 23, 2011Date of Patent: December 17, 2013Assignee: JSR CorporationInventors: Toru Kimura, Hiromitsu Nakashima, Reiko Kimura, Kazuki Kasahara, Masafumi Hori, Masafumi Yoshida
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Patent number: 8609321Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.Type: GrantFiled: March 8, 2013Date of Patent: December 17, 2013Assignee: JSP CorporationInventors: Hiromitsu Nakashima, Reiko Kimura, Kazuo Nakahara, Mitsuo Sato
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Patent number: 8597867Abstract: A radiation-sensitive resin composition excelling in basic properties as a resist such as sensitivity, resolution, and the like, having a wide depth of focus (DOF) to both a line-and-space pattern and an isolated space pattern, and exhibiting a minimal line width change due to fluctuation of a bake temperature, and having a small line width limit in which the line pattern destroying phenomenon does not occur, and a lactone-containing copolymer useful as a resin component of the composition are provided. The lactone-containing copolymer is represented by a copolymer of the following compounds (1-1), (2-1), and (3-1). The radiation-sensitive resin composition comprises (a) the lactone-containing copolymer and (b) a photoacid generator.Type: GrantFiled: May 2, 2005Date of Patent: December 3, 2013Assignee: JSR CorporationInventors: Hiromitsu Nakashima, Tomohiro Utaka, Takashi Chiba, Eiji Yoneda, Atsushi Nakamura
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Publication number: 20130233825Abstract: A composition for forming a resist underlayer film includes a polysiloxane and a solvent. The solvent includes an organic solvent having a standard boiling point of no less than 150.0° C., and water. A content of the organic solvent is no less than 1% by mass and no greater than 50% by mass with respect to a total amount of the solvent. A content of water is no less than 1% by mass and no greater than 30% by mass with respect to the total amount of the solvent.Type: ApplicationFiled: March 6, 2013Publication date: September 12, 2013Applicant: JSR CORPORATIONInventors: Shunsuke KURITA, Kazunori TAKANASHI, Hiromitsu NAKASHIMA, Tooru KIMURA
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Patent number: 8507189Abstract: An upper layer film forming composition for forming an upper layer film on the surface of a photoresist film includes (A) a resin dissolvable in a developer for the photoresist film and (B) a compound having a sulfonic acid residue group, the composition forming an upper layer film with a receding contact angle to water of 70° or more. The upper layer film forming composition of the present invention can form an upper layer film which has a sufficient transparency and is stably maintained without eluting the components into a medium without being intermixed with a photoresist film, can form a resist pattern with high resolution while effectively suppressing a defect, and can suppress a blob defect.Type: GrantFiled: September 21, 2007Date of Patent: August 13, 2013Assignee: JSR CorporationInventors: Daita Kouno, Hiromitsu Nakashima, Yukio Nishimura
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Patent number: 8435718Abstract: An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R1 and R2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group.Type: GrantFiled: October 13, 2011Date of Patent: May 7, 2013Assignee: JSR CorporationInventors: Atsushi Nakamura, Hiroki Nakagawa, Hiromitsu Nakashima, Takayuki Tsuji, Hiroshi Dougauchi, Daita Kouno, Yukio Nishimura
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Publication number: 20120295197Abstract: A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.Type: ApplicationFiled: May 17, 2012Publication date: November 22, 2012Applicant: JSR CorporationInventors: Yuko KIRIDOSHI, Takehiko NARUOKA, Yukio NISHIMURA, Yusuke ASANO, Takanori KAWAKAMI, Hiromitsu NAKASHIMA
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Patent number: 8273521Abstract: A radiation-sensitive resin composition includes a compound shown by a formula (1) in which R1 represents a divalent hydrocarbon group having 1 to 20 carbon atoms and R2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R1 and R2 form a heterocyclic structure having 4 to 20 carbon atoms, R3 represents a monovalent acid-dissociable group, n is an integer from 1 to 6, each of R4A, R4B, and R4C represents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or R4A represents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and R4B and R4C form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms.Type: GrantFiled: July 30, 2010Date of Patent: September 25, 2012Assignee: JSR CorporationInventors: Mitsuo Sato, Kazuo Nakahara, Hiromitsu Nakashima, Takanori Nakano, Makoto Sugiura
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Publication number: 20120237875Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1.Type: ApplicationFiled: March 15, 2012Publication date: September 20, 2012Applicant: JSR CorporationInventors: Yuusuke ASANO, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
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Publication number: 20120219903Abstract: The radiation-sensitive resin composition includes a compound represented by a following formula (1), and a resin. The resin has an acid-dissociable group, is insoluble or hardly soluble in an alkali, and turns to be soluble in an alkali when the acid-dissociable group is dissociated. R represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, R1 represents a hydrocarbon group having 1 to 20 carbon atoms or the like, R2 to R5 each independently represent an alkyl group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or the like, and R6 represents a halogen atom or the like.Type: ApplicationFiled: March 23, 2012Publication date: August 30, 2012Applicant: JSR CorporationInventors: Mitsuo SATO, Kazuo Nakahara, Hiromitsu Nakashima
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Patent number: 8182977Abstract: A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R3 and R3 bonding to each other together with a carbon atom.Type: GrantFiled: March 23, 2010Date of Patent: May 22, 2012Assignee: JSR CorporationInventors: Norihiko Ikeda, Hiromitsu Nakashima, Saki Harada
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Publication number: 20120082935Abstract: [Problem] To provide a resist film that exhibits high surface hydrophobicity during liquid immersion lithography, suppresses occurrence of defects due to development failure, and exhibits excellent lithographic performance [Solution] A radiation-sensitive resin composition that includes (A) a polymer that includes a repeating unit (a1) and a fluorine atom, the repeating unit (a1) including a group shown by the following formula (1) or (2), the radiation-sensitive resin composition including the polymer (A) in an amount of 0.1 mass % or more and less than 20 mass % based on the total amount of polymers included in the radiation-sensitive resin composition.Type: ApplicationFiled: September 23, 2011Publication date: April 5, 2012Applicant: JSR CorporationInventors: Toru Kimura, Hiromitsu Nakashima, Reiko Kimura, Kazuki Kasahara, Masafumi Hori, Masafumi Yoshida
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Publication number: 20120034560Abstract: A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The polymer (A) preferably includes a structural unit shown by the following formula (1) as the structural unit (I). It is preferable that X in the formula (1) represent a divalent or trivalent chain-like hydrocarbon group or alicyclic hydrocarbon group.Type: ApplicationFiled: August 5, 2011Publication date: February 9, 2012Applicant: JSR CorporationInventors: Kazuo NAKAHARA, Hiromitsu Nakashima, Reiko Kimura
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Publication number: 20120028198Abstract: An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R1 and R2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group.Type: ApplicationFiled: October 13, 2011Publication date: February 2, 2012Applicant: JSR CorporationInventors: Atsushi NAKAMURA, Hiroki Nakagawa, Hiromitsu Nakashima, Takayuki Tsuji, Hiroshi Dougauchi, Daita Kouno, Yukio Nishimura
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Patent number: 8076053Abstract: An upper layer-forming composition formed on a photoresist while causing almost no intermixing with the photoresist film and a photoresist patterning method are provided. The upper layer-forming composition is stably maintained without being eluted in a medium such as water during liquid immersion lithography and is easily dissolved in an alkaline developer. The upper layer-forming composition covers a photoresist film for forming a pattern by exposure to radiation. The composition comprises a resin dissolvable in a developer for the photoresist film and a solvent in which the resin is dissolved. The solvent has a viscosity of less than 5.2×10?3 Pa·s at 20° C. In addition, the solvent does not cause intermixing of the photoresist film and the upper layer-forming composition. The solvent contains an ether or a hydrocarbon.Type: GrantFiled: October 25, 2006Date of Patent: December 13, 2011Assignee: JSR CorporationInventors: Atsushi Nakamura, Hiroki Nakagawa, Hiromitsu Nakashima, Takayuki Tsuji, Hiroshi Dougauchi, Daita Kouno, Yukio Nishimura
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Publication number: 20110223537Abstract: A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, wherein each R1 represents a hydrogen atom or the like, R represents a monovalent group shown by an above formula (a?), each R19 represents a chain hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain hydrocarbon group having 1 to 30 carbon atoms or the like, and m and n are integers from 0 to 3 (m+n=1 to 3), wherein each of R2 and R3 represents a monovalent chain hydrocarbon group having 1 to 20 carbon atoms or the like.Type: ApplicationFiled: March 10, 2011Publication date: September 15, 2011Applicant: JSR CorporationInventors: Takuma Ebata, Hiroki Nakagawa, Yasuhiko Matsuda, Kazuki Kasahara, Kenji Hoshiko, Hiromitsu Nakashima, Norihiko Ikeda, Kaori Sakai, Saki Harada
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Publication number: 20110027718Abstract: A radiation-sensitive resin composition includes a compound shown by a formula (1) in which R1 represents a divalent hydrocarbon group having 1 to 20 carbon atoms and R2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R1 and R2 form a heterocyclic structure having 4 to 20 carbon atoms, R3 represents a monovalent acid-dissociable group, n is an integer from 1 to 6, each of R4A, R4B, and R4C represents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or R4A represents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and R4B and R4C form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms.Type: ApplicationFiled: July 30, 2010Publication date: February 3, 2011Applicant: JSR CorporationInventors: Mitsuo SATO, Kazuo NAKAHARA, Hiromitsu NAKASHIMA, Takanori NAKANO, Makoto SUGIURA
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Publication number: 20100239981Abstract: A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R3 and R3 bonding to each other together with a carbon atom.Type: ApplicationFiled: March 23, 2010Publication date: September 23, 2010Applicant: JSR CorporationInventors: Norihiko IKEDA, Hiromitsu Nakashima, Saki Harada
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Publication number: 20100040974Abstract: An upper layer film forming composition for forming an upper layer film on the surface of a photoresist film includes (A) a resin dissolvable in a developer for the photoresist film and (B) a compound having a sulfonic acid residue group, the composition forming an upper layer film with a receding contact angle to water of 70° or more. The upper layer film forming composition of the present invention can form an upper layer film which has a sufficient transparency and is stably maintained without eluting the components into a medium without being intermixed with a photoresist film, can form a resist pattern with high resolution while effectively suppressing a defect, and can suppress a blob defect.Type: ApplicationFiled: September 21, 2007Publication date: February 18, 2010Applicant: JSR CorporationInventors: Daita Kouno, Hiromitsu Nakashima, Yukio Nishimura