Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (Aa) containing at least one repeating unit (Aa1) derived from monomers of general formula (aa1-1) below and at least one repeating unit (Aa2) derived from monomers of general formula (aa2-1) below and comprising a resin (Ab) that when acted on by an acid, changes its alkali solubility.

Abstract: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation, (C) a resin having one or more groups selected from the specific group as defined in the specification and (D) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.

Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer, wherein the electron beam-sensitive or extreme ultraviolet-sensitive resin composition contains (A) a resin containing (R) a repeating unit having a structural moiety capable of decomposing upon irradiation with an electron beam or an extreme ultraviolet ray to generate an acid, and (B) a solvent.

Abstract: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid and (B) a low molecular weight compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation and decomposing by an action of an acid to decrease a solubility of the low molecular weight compound (B) in an organic solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.

Abstract: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation and (C) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of forming a negative pattern by development of the film with a developer containing an organic solvent after the exposing of the film, wherein a content of the compound (B) is 21% by mass to 70% by mass on the basis of all solids content of the composition.

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula (1) or (2) below.

Abstract: A resist film formed by using a chemical amplification type resist composition containing (A) a high molecular compound having a structure wherein a hydrogen atom of a phenolic hydroxyl group is substituted by a group represented by the following general formula (I), (B) a compound generating an acid upon irradiation with actinic rays or radiation, and an organic solvent, and the film thickness is 10 to 200 nm. wherein, R1 represents a hydrocarbon group, R2 represents a hydrogen atom or a hydrocarbon group, and Ar represents an aryl group. R1 may also bind to Ar to form a ring which may also contain a heteroatom. * represents a binding position with an oxygen atom of the phenolic hydroxyl group.

Abstract: An organic electroluminescent device is provided and includes: a pair of electrodes; an organic layer including a light emitting layer between the electrodes. The organic layer contains a compound represented by formula (I). In formula (I), R11, R12, and R13 each independently represents a C1-6 alkyl group, Q1 represents a carbon atom or a silicon atom, R14 represents a hydrogen atom or -Q2(R16)(R17)R18 in which Q2 represents a carbon atom or a silicon atom and R16, R17, and R18 each independently represents a C1-6 alkyl group, R15 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a cyano group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heteroaryl group, and n stands for 1 or 2.

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) comprising a repeating unit (A) containing a group that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) containing a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and any of compounds (Q) of general formula (1) below.

Abstract: A resist film formed by using a chemical amplification type resist composition containing (A) a high molecular compound having a structure wherein a hydrogen atom of a phenolic hydroxyl group is substituted by a group represented by the following general formula (I), (B) a compound generating an acid upon irradiation with actinic rays or radiation, and an organic solvent, and the film thickness is 10 to 200 nm. wherein, R1 represents a hydrocarbon group, R2 represents a hydrogen atom or a hydrocarbon group, and Ar represents an aryl group. R1 may also bind to Ar to form a ring which may also contain a heteroatom. * represents a binding position with an oxygen atom of the phenolic hydroxyl group.

Abstract: The object of the present invention is to solve the technical problems in the microfabrication of photomasks or semiconductors and is, in particular, to provide a chemical amplification type positive resist film, and a resist film, resist coated mask blanks and a method of forming a resist pattern using the composition, which satisfy at the same time all of high sensitivity, high resolution (for example, high resolving power), good exposure latitude (EL), and good line edge roughness (LER). A chemical amplification type positive resist composition comprising: a high molecular compound (A) having a repeating unit represented by the following general formula (1), a repeating unit represented by the following general formula (2), and a repeating unit represented by the following general formula (3).

Abstract: An organic electroluminescence device, includes: a pair of electrodes; and at least one organic layer including a light emitting layer, the light emitting layer being provided between the pair of electrodes, wherein at least one layer of the at least one organic layer contains a compound represented by formula (1) as defined in the specification.

Abstract: To provide an organic electroluminescence device having high luminous efficiency (for example, external quantum efficiency) and high durability and causing little chromaticity shift after device deterioration. An organic electroluminescence device material comprising a substrate having thereon a pair of electrode and at least one organic layer between the electrodes, the organic layer containing a light emitting layer, wherein any one layer of the organic layer contains, for example, as shown below, a metal complex having a group represented by formula (I).

Abstract: A process for preparing a platinum complex represented by the following formula (1) includes reacting a compound represented by the following formula (B-2) and a compound represented by the following formula (B-2?) with a compound represented by the following formula (A-0) to obtain a compound represented by the following formula (C-0); and reacting the compound represented by the formula (C-0) with a platinum salt:

Abstract: A charge-transporting material contains a compound represented by the following formula (1) in an organic layer, in which the contents of specific halogen-containing compounds are 0.1% or less to the compound represented by formula (1). In formula (1), each of A1 and A2 independently represents N, —CH or —CR; R represents a substituent; L represents a single bond, an arylene group, a cycloalkylene group or an aromatic heterocyclic group; each of R1 to R5 independently represents a substituent; each of n1, n2 and n3 independently represents an integer of 0 to 4; each of n4 and n5 independently represents an integer of 0 to 5; and each of p and q independently represents an integer of 1 to 4.

Abstract: A simultaneous two-photon absorption recording-reproduction method of recording and reproducing a data by inducing changes in the fluorescence intensities in a recorded part and an unrecorded part by simultaneous two-photon absorption, comprising: generating a fluorescence quencher in a two-photon recording part; and inducing quenching by excitation energy transfer between the fluorescence quencher and a fluorescent dye to physically quench the fluorescence by reproduction light from the fluorescent dye and decrease the fluorescence intensity in the recorded part; and a simultaneous two-photon absorption recording material for use in the method capable of generating a fluorescence quencher capable of inducing quenching by excitation energy transfer between the fluorescence quencher and a fluorescent dye by simultaneous two-photon absorption and physically quenching the fluorescence from the fluorescent dye.

Abstract: A two-photon absorbing optical recording material comprising at least one two-photon absorbing compound and a recording component is provided. Recording is made on it by utilizing the two-photon absorption of the two-photon absorbing compound in the material, and then the material is irradiated with light to thereby detect the difference in the reflectance between the recorded area and the unrecorded area thereof, and the recorded information is thereby reproduced from the material, and also provided are a photosensitive polymer composition and a photon-mode recording method for the material.

Abstract: A two-photon absorbing optical recording material comprising at least one two-photon absorbing compound and a recording component is provided. Recording is made on it by utilizing the two-photon absorption of the two-photon absorbing compound in the material, and then the material is irradiated with light to thereby detect the difference in the reflectance between the recorded area and the unrecorded area thereof, and the recorded information is thereby reproduced from the material, and also provided are a photosensitive polymer composition and a photon-mode recording method for the material.

Abstract: An organic electroluminescent device is provided and includes: a pair of electrodes; an organic layer including a light emitting layer between the electrodes. The organic layer contains a compound represented by formula (I). In formula (I), R11, R12, and R13 each independently represents a C1-6 alkyl group, Q1 represents a carbon atom or a silicon atom, R14 represents a hydrogen atom or -Q2(R16)(R17)R18 in which Q2 represents a carbon atom or a silicon atom and R16, R17, and R18 each independently represents a C1-6 alkyl group, R15 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a cyano group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heteroaryl group, and n stands for 1 or 2.

Abstract: There is provided a non-resonant two-photon absorption recording material including (a) a non-resonant two-photon absorption compound; and (b) a recording component capable of changing at least either one of a refractive index and a fluorescent intensity. The non-resonant two-photon absorption compound (a) is represented by the following formula (1): In the formula (1), both of X and Y represent a substituent having a Hammett sigma para value (?p value) of 0 or more and they may be the same as or different from each other; n represents an integer of 1 to 4; R represents a substituent and each R may be the same as or different from every other R; and m represents an integer of 0 to 4.