Patents by Inventor Hiroshi Makino

Hiroshi Makino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140014836
    Abstract: The charged particle beam apparatus having an opening formation member formed with an opening for passage of a charged particle beam emitted from a charged particle source, and either a detector adapted to detect charged particles having passed through the passage opening or a detector adapted to detect charged particles resulting from bombardment on another member of the charged particles having passed through the opening, comprises an aligner for aligning charged particles discharged from the sample and a control unit for controlling the aligner, wherein the control unit controls the aligner to cause it to shift trajectories of the charged particles discharged from the sample so that length measurement may be executed on the basis of detection signals before and after the alignment by the aligner.
    Type: Application
    Filed: July 11, 2013
    Publication date: January 16, 2014
    Inventors: Miki ISAWA, Minoru YAMAZAKI, Yuzuru MIZUHARA, Hiroshi MAKINO, Hideyuki KAZUMI
  • Patent number: 8630142
    Abstract: Cell power supply lines are arranged for memory cell columns, and adjust impedances or voltage levels of the cell power supply lines according to the voltage levels of bit lines in the corresponding columns, respectively. In the data write operation, the cell power supply line is forced into a floating state according to the bit line potential on a selected column and has the voltage level changed, and a latching capability of a selected memory cell is reduced to write data fast. Even with a low power supply voltage, a static semiconductor memory device that can stably perform write and read of data is implemented.
    Type: Grant
    Filed: June 8, 2012
    Date of Patent: January 14, 2014
    Assignee: Renesas Electronics Corporation
    Inventors: Koji Nii, Shigeki Obayashi, Hiroshi Makino, Koichiro Ishibashi, Hirofumi Shinohara
  • Publication number: 20140001360
    Abstract: Provided is a technique to automatize a synthesis function of signal charged particles having different energies.
    Type: Application
    Filed: January 27, 2012
    Publication date: January 2, 2014
    Applicant: Hitachi-High-Technologies Corporation
    Inventors: Yuji Kasai, Makoto Suzuki, Hiroshi Makino
  • Patent number: 8586920
    Abstract: It has been difficult to obtain pattern contrast required for inspecting a specific layer of a circuit pattern in a charged particle beam apparatus which inspects, by using a charged particle beam, the position and type of a defect on a wafer having a circuit pattern which is in semiconductor manufacturing process. At the time of inspecting the position and type of a defect on a wafer having a circuit pattern which is in semiconductor manufacturing process by using a charged particle beam emitted from a charged particle source (11), the wafer arranged on a holder (20) is irradiated with light in wavelength ranges different from each other from a light irradiation system (9), and at the same time, the wafer is irradiated with a charged particle beam. Thus, contrast of an image is improved and inspection is performed with high sensitivity.
    Type: Grant
    Filed: October 28, 2009
    Date of Patent: November 19, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Natsuki Tsuno, Hiroshi Makino
  • Patent number: 8588916
    Abstract: A hermetic feedthrough for an implantable medical device includes an insulator, a conduit integrated with the insulator, and a pad coupled to an exterior surface of the insulator. The insulator includes a first material and the conduit includes a second material that is electrically conductive. The pad is configured to receive a lead coupled thereto. Further, the pad is electrically conductive and coupled to the conduit. The pad includes a first layer and a second layer overlaying at least a portion of the first layer.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: November 19, 2013
    Assignee: Medtronic, Inc.
    Inventors: Kengo Morioka, Arne Knudsen, Shingo Satou, Hidekazu Otomaru, Hiroshi Makino, Andrew Thom, Markus Reiterer, Gordon Munns, Thomas Miltich, Joyce Yamamoto
  • Publication number: 20130292568
    Abstract: This electron scanning microscope comprises an electron source (102), electron optical systems (109, 110, 111) for exposing a sample (113) to primary electron beams (138), an electron detector (127) for detecting signal electrons (139) emitted from the sample, and a deceleration electrical field-type energy filter (108). The deceleration electrical field-type energy filter has a conductor thin film (304) for distinguishing the energy of signal electrons. With this configuration, it is possible to realize a scanning electron microscope having a deceleration electrical field-type energy filter with which high energy resolution is obtained, even in a case where the scanning electron microscope has a retarding optical system.
    Type: Application
    Filed: December 5, 2011
    Publication date: November 7, 2013
    Inventors: Daisuke Bizen, Hiroshi Makino, Junichi Tanaka, Makoto Ezumi
  • Patent number: 8502141
    Abstract: Because a mirror electron imaging type inspection apparatus for obtaining an inspection object image with mirror electrons has been difficult to optimize inspection conditions, since the image forming principles of the apparatus are different from those of conventional SEM type inspection apparatuses. In order to solve the above conventional problem, the present invention has made it possible for the user to examine such conditions as inspection speed, inspection sensitivity, etc. intuitively by displaying the relationship among the values of inspection speed S, inspection object digital signal image pixel size D, inspection object image size L, and image signal acquisition cycle P with use of a time delay integration method as a graph on an operation screen. The user can thus determine a set of values of a pixel size, an inspection image width, and a TDI sensor operation cycle easily with reference to the displayed graph.
    Type: Grant
    Filed: June 19, 2009
    Date of Patent: August 6, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Masaki Hasegawa, Hisaya Murakoshi, Hiroshi Makino
  • Patent number: 8474574
    Abstract: PROBLEMS The present invention provides a sound absorbing structure that enables a sound absorbing rate thereof to be raised in a low-frequency region or medium-high frequency from around 500 Hz to 10 KHz, and a thickness thereof to be reduced. SOLUTIONS The sound absorbing structure has: a non-air permeable sheet molding object having, on one surface side thereof, a plurality of cavities including recesses formed by bending; and a non-air permeable surface sheet which is layered on the sheet molding object, on a cavity open-top side surface thereof, so as to cover open-top of the plurality of cavities, wherein the surface sheet is fixed at outer peripheral sections of the sheet molding object 11 and is not fixed to the sheet molding object at portions between adjacent cavities.
    Type: Grant
    Filed: July 10, 2012
    Date of Patent: July 2, 2013
    Assignee: Inoac Corporation
    Inventors: Hisaaki Kobayashi, Hiroshi Makino, Yasuhiro Suzuki, Takahiro Ogo
  • Publication number: 20130126733
    Abstract: This charged particle beam microscope is characterized by being provided with selection means (153, 155) for a measurement processing method for detected particles (118) and by this means selecting a different measurement processing method for a scanning region with a large number of secondary electrons (115) emitted from a sample (114) and for a region with a small number of secondary electrons. Thus, in sample scanning using a charged particle beam microscope, an image in which the contrast of bottom holes and channel bottoms with few emitted secondary electrons is emphasized and images that emphasize shadow contrast can be acquired in a short period of time.
    Type: Application
    Filed: August 8, 2011
    Publication date: May 23, 2013
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Muneyuki Fukuda, Naomasa Suzuki, Tomoyasu Shojo, Noritsugu Takahashi, Hiroshi Suzuki, Hiroshi Makino
  • Publication number: 20130119264
    Abstract: Provided is an ion wind generator capable of diversifying either or both of the amount of wind or wind direction. An ion wind generator is provided with a first electrode, a second electrode having a downstream area which is arranged at a position in a plan view shifted from first electrode towards the positive side in the x direction, and a dielectric between the first electrode and the second electrode. In a plane view, the distance (d) in the x-direction from a downstream side edge of the first electrode to the downstream side edge of the downstream area differs in the y-direction which is perpendicular to the x-direction.
    Type: Application
    Filed: October 27, 2011
    Publication date: May 16, 2013
    Applicant: KYOCERA CORPORATION
    Inventors: Takashige Yagi, Tetsuya Tojyo, Hiroshi Makino
  • Patent number: 8420539
    Abstract: The invention relates to an additive for polishing composition, which can ensure stable polishing properties. The additive for polishing composition contains one or more amine compounds and an alcohol. The one or more amine compounds contain a quaternary ammonium salt. When the one or more amine compounds are contained in high concentration, the occurrence of precipitation of the amine compound can be prevented by including the alcohol.
    Type: Grant
    Filed: April 9, 2012
    Date of Patent: April 16, 2013
    Assignee: Nitta Haas Incorporated
    Inventors: Masashi Teramoto, Ryoko Higashigaki, Hiroshi Makino
  • Publication number: 20130088807
    Abstract: Provided is an ion wind generator capable of suitably generating an ion wind along the surface of a dielectric. An ion wind generator has: a dielectric having a first primary surface and a second primary surface at the rear thereof; an inner side electrode arranged in the dielectric; a first electrode arranged on the first primary surface side with respect to the inner side electrode; and a second electrode arranged on the second primary surface side with respect to the inner side electrode. The inner side electrode has a first downstream area located in a first direction (the positive side of x-axis direction) along the first primary surface with respect to the first electrode, and a second downstream area located in a second direction (the positive side of x-axis direction) along the second primary surface with respect to the second electrode.
    Type: Application
    Filed: August 18, 2011
    Publication date: April 11, 2013
    Applicant: KYOCERA CORPORATION
    Inventors: Tetsuya Tojo, Takashige Yagi, Hiroshi Makino
  • Publication number: 20130083446
    Abstract: Provided is an ion wind generator which is able to raise the speed of the ion wind. An ion wind generator (3) has: a first electrode (9) and a second electrode (11) which are supplied with voltage and induce an ion wind by electric discharge, and a third electrode (13) which forms an electric field for accelerating the ion wind in a downstream region of the ion wind relative to the first electrode (9) and the second electrode (11).
    Type: Application
    Filed: March 17, 2011
    Publication date: April 4, 2013
    Applicant: KYOCERA CORPORATION
    Inventors: Takashige Yagi, Tetsuya Tojo, Hiroshi Makino
  • Patent number: 8405025
    Abstract: A scanning electron microscope includes an electron beam source which emits an electron beam, a beam current controller which controls a beam current of the electron beam, an electron beam converger which converges the electron beam on a surface of a sample, an electron beam scanner which scans the electron beam on the surface of the sample, a table which mounts the sample and moves at least in one direction, a detector which detects a secondary electron or a reflected electron emanated from the sample by the scan of the electron beam, an image former which forms an image of the sample based on a detection value of the detector, an image processor which processes the image formed by the image former. The beam current controller controls the beam current of the electron beam by changing transmittance of the electron beam in an irradiation path of the electron beam.
    Type: Grant
    Filed: October 2, 2008
    Date of Patent: March 26, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshifumi Honda, Hiroshi Makino
  • Publication number: 20130032378
    Abstract: A hermetic feedthrough for an implantable medical device includes a sheet having a hole, where the sheet includes a ceramic comprising alumina. The feedthrough also includes a second material substantially filling the hole, where the second material includes a platinum powder mixture and an alumina additive. The platinum powder mixture includes a first platinum powder having a median particle size of between approximately 3 and 10 micrometers and a second platinum powder that is coarser than the first platinum powder and has a median particle size of between approximately 5 and 20 micrometers. The platinum powder mixture includes between approximately 50 and 80 percent by weight of the first platinum powder and between approximately 20 and 50 percent by weight of the second platinum powder. The first and second materials have a co-fired bond therebetween that hermetically seals the hole.
    Type: Application
    Filed: August 1, 2012
    Publication date: February 7, 2013
    Inventors: Kengo Morioka, Arne Knudsen, Shingo Satou, Hidekazu Otomaru, Andrew Thom, Hiroshi Makino, Markus Reiterer, Gordon Munns, Thomas Miltich, Joyce Yamamoto, Takahito Hirata
  • Publication number: 20130032382
    Abstract: A feedthrough includes a sheet having a hole, where the sheet includes a first material that is a ceramic comprising alumina. The feedthrough further includes a second material substantially filling the hole. The second material is different than the first material and includes platinum and an additive that includes alumina. The first and second materials have a co-fired bond therebetween that hermetically seals the hole.
    Type: Application
    Filed: August 2, 2011
    Publication date: February 7, 2013
    Inventors: Kengo Morioka, Arne Knudsen, Shingo Satou, Hidekazu Otomaru, Andrew Thom, Hiroshi Makino, Markus Reiterer, Gordon Munns, Thomas Miltich, Joyce Yamamoto
  • Publication number: 20130032392
    Abstract: A hermetic feedthrough for an implantable medical device includes an insulator, a conduit configured to conduct electricity through the insulator, and a ferrule coupled to the insulator. The insulator is formed from a ceramic material and the conduit and insulator have a co-fired bond therebetween, which hermetically seals the conduit with the insulator. The insulator is elongate and has opposing ends that include flat surfaces and the ferrule includes a frame for receiving the insulator.
    Type: Application
    Filed: August 2, 2011
    Publication date: February 7, 2013
    Inventors: Kengo Morioka, Keiichi Fujii, Arne Knudsen, Shingo Satou, Hidekazu Otomaru, Hiroshi Makino, Andrew Thom, Markus Reiterer, Gordon Munns, Thomas Miltich, Joyce Yamamoto
  • Publication number: 20130032391
    Abstract: A hermetic feedthrough for an implantable medical device includes an insulator, a conduit integrated with the insulator, and a pad coupled to an exterior surface of the insulator. The insulator includes a first material and the conduit includes a second material that is electrically conductive. The pad is configured to receive a lead coupled thereto. Further, the pad is electrically conductive and coupled to the conduit. The pad includes a first layer and a second layer overlaying at least a portion of the first layer.
    Type: Application
    Filed: August 2, 2011
    Publication date: February 7, 2013
    Inventors: Kengo Morioka, Arne Knudsen, Shingo Satou, Hidekazu Otomaru, Hiroshi Makino, Andrew Thom, Markus Reiterer, Gordon Munns, Thomas Miltich, Joyce Yamamoto
  • Publication number: 20120292506
    Abstract: A disclosed method for observing the structure and characteristics of a specimen by an electron microscope realizes high-density charge accumulation on a specimen and improves the quality of voltage contrast images. For structural observation of a specimen and evaluation of its electrical characteristic using an electron beam, charging the specimen is performed. In this charging process, high-density charge accumulation on the specimen is achieved by irradiating the specimen with an electron beam set to have injection energy that falls within an injection energy band for which high charging efficiency is attained during electron beam irradiation and changing irradiation energy, while maintaining the injection energy.
    Type: Application
    Filed: November 8, 2010
    Publication date: November 22, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Natsuki Tsuno, Hiroshi Makino, Makoto Suzuki, Yusuke Ominami
  • Patent number: 8308972
    Abstract: The invention relates to an additive for polishing composition, which can ensure stable polishing properties. The additive for polishing composition contains one or more amine compounds and an alcohol. The one or more amine compounds contain a quaternary ammonium salt. When the one or more amine compounds are contained in high concentration, the occurrence of precipitation of the amine compound can be prevented by including the alcohol.
    Type: Grant
    Filed: September 26, 2007
    Date of Patent: November 13, 2012
    Assignee: Nitta Haas Incorporated
    Inventors: Masashi Teramoto, Ryoko Higashigaki, Hiroshi Makino