Patents by Inventor Hiroshi Matsumoto

Hiroshi Matsumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10281346
    Abstract: A magnetostrictive sensor capable of obtaining both enhanced productivity and reduced variations in outputs can be obtained. A torque sensor includes a substrate and a plating film disposed on the outer peripheral surface of the substrate. The substrate includes a plating portion, masking portions, and tilt portions and. An outer peripheral surface of the plating portion is a surface parallel to a shaft center of the substrate in a side cross-sectional view. Outer peripheral surfaces of the tilt portions are slopes tilted relative to the shaft center in the side cross-sectional view. The plating film is formed on a plating surface and slopes in such a manner that end portions in the axial direction are located on the slopes. The plating film on the slopes has a thickness smaller than the thickness of the plating film on the plating surface.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: May 7, 2019
    Assignee: YAMAHA HATSUDOKI KABUSHIKI KAISHA
    Inventors: Hiroshi Matsumoto, Satomi Ishikawa
  • Publication number: 20190122857
    Abstract: A charged particle beam writing apparatus includes an area density calculation unit to calculate a pattern area density weighted using a dose modulation value, which has previously been input from an outside and in which an amount of correction of a dimension variation due to a proximity effect has been included, a fogging correction dose coefficient calculation unit to calculate a fogging correction dose coefficient for correcting a dimension variation due to a fogging effect by using the pattern area density weighted using the dose modulation value having been input from the outside, a dose calculation unit to calculates a dose of a charged particle beam by using the fogging correction dose coefficient and the dose modulation value, and a writing unit to write a pattern on a target object with the charged particle beam of the dose.
    Type: Application
    Filed: December 17, 2018
    Publication date: April 25, 2019
    Applicant: NuFlare Technology, Inc.
    Inventors: Yasuo Kato, Hiroshi Matsumoto
  • Patent number: 10269532
    Abstract: A multi charged particle beams exposure method includes assigning, with respect to plural times of shots of multi-beams using a charged particle beam, each shot to one of plural groups, depending on a total current value of beams becoming in an ON condition in a shot concerned in the multi-beams, changing the order of the plural times of shots so that shots assigned to the same group may be continuously emitted for each of the plural groups, correcting, for each group, a focus position of the multi-beams to a focus correction position for a group concerned corresponding to the total current value, and performing the plural times of shots of the multi-beams such that the shots assigned to the same group are continuously emitted in a state where the focus position of the multi-beams has been corrected to the focus correction position for the group concerned.
    Type: Grant
    Filed: May 25, 2017
    Date of Patent: April 23, 2019
    Assignee: NuFlare Technology, Inc
    Inventor: Hiroshi Matsumoto
  • Patent number: 10256070
    Abstract: According to one aspect of the present invention, a stage mechanism includes a movable stage disposed in a vacuum atmosphere and mounting a heat source, a first heat pipe connected to the heat source, a movable mechanism configured to move according to the movement of the first heat pipe caused by the movement of the stage, by using a portion of the first heat pipe, and a cooling mechanism configured to cool the first heat pipe through the movable mechanism.
    Type: Grant
    Filed: April 28, 2017
    Date of Patent: April 9, 2019
    Assignee: NuFlare Technology, Inc.
    Inventors: Hiroshi Matsumoto, Shuji Yoshino
  • Publication number: 20190101457
    Abstract: A sensor substrate includes an insulating substrate, an electrode disposed on a principal face of the insulating substrate, a resistor wiring section in a form of multiple layers located within the insulating substrate, the multiple layers being disposed in a thickness direction of the insulating substrate, and a widened metallic layer disposed so as to overlap the electrode, as seen in a transparent plan view of the sensor substrate.
    Type: Application
    Filed: April 26, 2017
    Publication date: April 4, 2019
    Applicant: KYOCERA Corporation
    Inventor: Hiroshi MATSUMOTO
  • Patent number: 10249183
    Abstract: The present invention relates to a device (roadside relay device 2) configured to generate a traffic index used for traffic signal control. This device includes: a storage unit 24 configured to store therein area information on a coordinate system, the area information forming a predetermined area on a road; a communication unit 21 configured to receive probe information S5 including a vehicle position and temporal information of a traveling vehicle 5; and a control unit 23 configured to generate the traffic index on the basis of the area information and the probe information S5.
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: April 2, 2019
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Shigeki Umehara, Hiroshi Matsumoto, Masafumi Kobayashi, Osamu Hattori
  • Patent number: 10247620
    Abstract: A wiring board includes an insulating substrate composed of a stack of a plurality of insulating layers, the insulating substrate having an upper face, a lower face, and side faces; and a plurality of line conductors formed of platinum or a metallic material comprising platinum as a main component, the plurality of line conductors each including a first end and a second end located on a side opposite to the first end, the plurality of line conductors being respectively disposed in interlayers between the plurality of insulating layers, in the line conductors, a line width of a line conductor located in an interlayer among the interlayers which interlayer is closest to the upper face or the lower face of the insulating substrate being greater than a line width of a line conductor located in each of the other interlayers.
    Type: Grant
    Filed: April 20, 2015
    Date of Patent: April 2, 2019
    Assignee: KYOCERA CORPORATION
    Inventors: Hiroshi Matsumoto, Kengo Morioka, Takahito Hirata
  • Publication number: 20190071581
    Abstract: Provided are a curable composition for inkjet, which not only allows surface curability in formation of a coating film by an inkjet system to be enhanced, but also is not reduced in characteristics conventionally provided, such as solder heat resistance and gold plating resistance, and a cured product and a printed wiring board using the curable composition. The curable composition for inkjet of the present invention includes (A) an alkylene chain-containing bifunctional (meth)acrylate compound, (B) an ?-aminoalkylphenone-based photopolymerization initiator, and (C) an acylphosphine oxide-based photopolymerization initiator, wherein, when the thickness is 10 ?m, the absorbance at a wavelength of 365 nm is 0.08 to 0.8 and the absorbance at a wavelength of 385 nm is 0.05 to 0.3.
    Type: Application
    Filed: February 9, 2017
    Publication date: March 7, 2019
    Applicant: TAIYO INK MFG. CO., LTD.
    Inventors: Rina YOSHIKAWA, Masato YOSHIDA, Masayuki SHIMURA, Hiroshi MATSUMOTO
  • Patent number: 10224171
    Abstract: A blanking device for multi charged particle beams includes a first substrate, in which plural first openings are formed in an array, to form multi-beams, a second substrate in which plural second openings are formed in an array, where a corresponding beam of the multi-beams passes through each of the plural second openings, plural control electrodes, which are on the second substrate and each of which is close to a corresponding one of the plural second openings and arranged not to be directly exposed to other second opening adjacent to the corresponding one of the plural second openings, to be switchably applied with first and second potentials, plural counter electrodes, each of which is facing a corresponding one of the plural control electrodes, to be applied with the second potential, and a shield film provided between the first substrate and the plural control electrodes.
    Type: Grant
    Filed: May 10, 2017
    Date of Patent: March 5, 2019
    Assignee: NuFlare Technology, Inc.
    Inventors: Takanao Touya, Hiroshi Matsumoto, Munehiro Ogasawara, Hirofumi Morita
  • Publication number: 20190066975
    Abstract: A multiple charged particle beam writing apparatus includes a circuitry to calculate, for each of the plurality of combinations, a first distribution coefficient for each of the three beams configuring the combination concerned, for distributing a dose to irradiate the design grid concerned to the three beams such that the gravity center position of each distributed dose coincides with the position of the design grid concerned and the sum of the each distributed dose coincides with the dose to irradiate the design grid concerned; and a circuitry to calculate, for each of the four or more beams, a second distribution coefficient of each of the four or more beams relating to the design grid concerned by dividing the total value of at least one first distribution coefficient corresponding to the beam concerned in the four or more beams by the number of the plurality of combinations.
    Type: Application
    Filed: August 1, 2018
    Publication date: February 28, 2019
    Applicant: NuFlare Technology, Inc.
    Inventor: Hiroshi Matsumoto
  • Patent number: 10211023
    Abstract: In one embodiment, an aperture set for a multi-beam includes a shaping aperture array in which a plurality of first openings are formed, a region including the plurality of first openings is irradiated with a charged particle beam discharged from a discharge unit, and portions of the charged particle beam pass through the plurality of respective first openings to form a multi-beam, a first shield plate in which a plurality of second openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings, passes, and a blanking aperture array in which a plurality of third openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings and the plurality of second openings, passes. The second openings are wider than the first openings.
    Type: Grant
    Filed: December 26, 2017
    Date of Patent: February 19, 2019
    Assignee: NuFlare Technology, Inc.
    Inventors: Hiroshi Matsumoto, Hiroshi Yamashita, Kenichi Kataoka
  • Patent number: 10201879
    Abstract: A silver paste composition comprising silver particles having a particle diameter of 0.1 ?m to 20 ?m, and a solvent, wherein the above-described solvent comprises a solvent having a boiling point of 300° C. or more.
    Type: Grant
    Filed: August 5, 2013
    Date of Patent: February 12, 2019
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Dai Ishikawa, Hiroshi Matsumoto, Michiko Natori, Hideo Nakako, Toshiaki Tanaka
  • Publication number: 20190043693
    Abstract: A multiple charged particle beam writing apparatus includes a distribution coefficient calculation circuitry to calculate, using defective beam information based on which a defective beam can be identified, for each design grid in a plurality of design grids being irradiation positions in design of multiple charged particle beams, a distribution coefficient for each of three or more beams, for distributing a dose to irradiate a design grid concerned in the plurality of design grids to the three or more beams, excluding the defective beam, whose actual irradiation positions are close to or approximately coincident with the design grid concerned, such that the position of the gravity center of each distributed dose coincides with the position of the design grid concerned and the sum of each distributed dose after distribution coincides with the dose to irradiate the design grid concerned.
    Type: Application
    Filed: August 2, 2018
    Publication date: February 7, 2019
    Applicant: NuFlare Technology, Inc.
    Inventor: Hiroshi MATSUMOTO
  • Patent number: 10199200
    Abstract: A charged particle beam writing apparatus includes an area density calculation unit to calculate a pattern area density weighted using a dose modulation value, which has previously been input from an outside and in which an amount of correction of a dimension variation due to a proximity effect has been included, a fogging correction dose coefficient calculation unit to calculate a fogging correction dose coefficient for correcting a dimension variation due to a fogging effect by using the pattern area density weighted using the dose modulation value having been input from the outside, a dose calculation unit to calculates a dose of a charged particle beam by using the fogging correction dose coefficient and the dose modulation value, and a writing unit to write a pattern on a target object with the charged particle beam of the dose.
    Type: Grant
    Filed: October 24, 2017
    Date of Patent: February 5, 2019
    Assignee: NuFlare Technology, Inc.
    Inventors: Yasuo Kato, Hiroshi Matsumoto
  • Patent number: 10184847
    Abstract: A magnetostrictive sensor, including a tubular or columnar substrate extending along an axis, and a magnetostrictive portion disposed on an outer peripheral surface of the substrate and including a plurality of magnetostrictive lines. The plurality of magnetostrictive lines include adjacent first and second magnetostrictive lines that extend along an extension direction, and that are disposed on the outer peripheral surface of the substrate via respectively first and second contact areas. In a cross sectional view of the magnetostrictive portion taken orthogonally to the extension direction, a first length, which is a width of a widest portion of the first magnetostrictive line in a width direction parallel to the outer peripheral surface of the substrate, is larger than a width of the first contact area in the width direction, and than a shortest distance between the first and second contact areas in the width direction.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: January 22, 2019
    Assignee: YAMAHA HATSUDOKI KABUSHIKI KAISHA
    Inventors: Satomi Ishikawa, Hiroshi Matsumoto
  • Patent number: 10174226
    Abstract: An adhesive composition comprising silver particles containing silver atoms and zinc particles containing metallic zinc, wherein the silver atom content is 90 mass % or greater and the zinc atom content is from 0.01 mass % to 0.6 mass %, with respect to the total transition metal atoms in the solid portion of the adhesive composition.
    Type: Grant
    Filed: June 14, 2013
    Date of Patent: January 8, 2019
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Hideo Nakako, Toshiaki Tanaka, Michiko Natori, Dai Ishikawa, Hiroshi Matsumoto
  • Publication number: 20180362052
    Abstract: There is provided a driving assistance device for supporting driving of a vehicle equipped with the driving assistance device such that if a driver starts a driving-related operation in the course of self-driving, switching from self-driving to manual driving is performed. An acquiring unit configured to acquire conditions of the driver. A determining unit configured to determine to invalidate switching to manual driving in the case where the conditions of the driver acquired when the operation was started represents a non-waking state, and determine to continue the invalidation for a predetermined period if the driver changes from the non-waking state to a waking state when the invalidation is being performed.
    Type: Application
    Filed: March 12, 2018
    Publication date: December 20, 2018
    Applicant: DENSO TEN Limited
    Inventor: Hiroshi MATSUMOTO
  • Patent number: 10147580
    Abstract: A multi charged particle beam blanking apparatus includes a substrate, where a plurality of passage holes are formed, to let multi-beams of charged particle beams individually pass through a passage hole concerned; a plurality of reference electrodes, each arranged close to a corresponding passage hole, to be applied with a reference potential, not a ground potential, not via a transistor circuit, in an irradiation region of the whole multi-beams; and a plurality of switching electrodes, arranged at the substrate such that each of the plurality of switching electrodes and a corresponding paired one of the plurality of reference electrodes are opposite each other across a corresponding passage hole, to be applied with the reference potential and a control potential different from the reference potential in a switchable manner.
    Type: Grant
    Filed: March 2, 2017
    Date of Patent: December 4, 2018
    Assignee: NuFlare Technology, Inc.
    Inventor: Hiroshi Matsumoto
  • Patent number: 10134562
    Abstract: A multi charged particle beam writing apparatus includes a modulation rate data calculation processing circuitry to calculate, for each pixel being a unit region, a modulation rate of a beam to a pixel concerned and each modulation rate of a beam to at least one pixel at a periphery of the pixel concerned, and a corrected-dose calculation processing circuitry to calculate, for the each pixel, a corrected dose by adding a multiplied value obtained by multiplying the modulation rate of the pixel concerned in a modulation rate map by beam dose to the pixel concerned, and a multiplied value obtained by multiplying the modulation rate of the pixel concerned which becomes one of the at least one pixel at the periphery with respect to another pixel defined for the position of the pixel concerned by a beam dose to the another pixel.
    Type: Grant
    Filed: December 15, 2015
    Date of Patent: November 20, 2018
    Assignee: NuFlare Technology, Inc.
    Inventors: Yasuo Kato, Hideo Inoue, Hiroshi Matsumoto, Ryoh Kawana
  • Patent number: 10134565
    Abstract: A multi charged particle beam exposure method includes calculating an effective irradiation time, for each of a plurality of control irradiation time periods for controlling an irradiation time of each beam in the multi-beams of a charged particle beam, using a blanking error time of each divided shot of a plurality of divided shots, previously acquired, due to an error of blanking control for each divided shot; generating correlation data representing a relation between the control irradiation time and the effective irradiation time; selecting, using the correlation data, for each irradiation position of a target object, the combination of the divided shots corresponding to the effective irradiation time to be closer to each desired irradiation time; and performing exposure, using the multi-beams, based on the combination of the divided shots selected for each irradiation position of the target object.
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: November 20, 2018
    Assignee: NuFlare Technology, Inc.
    Inventor: Hiroshi Matsumoto