Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a plurality of first blankers to respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member, a plurality of second blankers to deflect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member to be in a direction orthogonal to a deflection direction of the plurality of first blankers, a blanking aperture member to block each of beams which were deflected to be in a beam off state by at least one of the plurality of first blankers and the plurality of second blankers, and a detection processing unit to detect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member.

Abstract: A multilayer printed wiring board and a method of manufacturing the same are provided. A multilayer printed wiring board of the present embodiment includes: a core base material formed by laminating a first wiring layer and a first insulating layer in this order on an insulating substrate; and a built-up layer formed by laminating a second wiring layer and a second insulating layer in this order on the core base material. A primer layer is formed between the second wiring layer and the first insulating layer, the second wiring layer has a lower surface at least part of which is in contact with the primer layer, and the second wiring layer has an upper surface and a side surface on both of which a tin-plated layer and a silane coupling layer are formed in this order.

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract: A sensor substrate includes an insulating substrate including a plurality of inorganic particles formed of an insulator in contact with each other and glass, and a wiring conductor disposed on the insulating substrate. The plurality of inorganic particles and the glass are in contact with the wiring conductor, and the glass is disposed at a position between the plurality of inorganic particles and the wiring conductor, and a contact portion between the plurality of inorganic particles and the wiring conductor is larger than a contact portion between the glass and the wiring conductor in a longitudinal sectional view.

Abstract: In an image forming apparatus, an image forming unit forms a first image of a first color and a second image of a second color. An obtaining unit obtains information related to relative positions of a first measurement image, which is formed on an image carrier, of the first color and a second measurement image, which is formed on an image carrier, of the second color. A generation unit generates correlation data based on first information corresponding to a first image forming speed and second information corresponding to a second image forming speed. A controller, in a case where the image forming unit forms an image at the second image forming speed, corrects relative positions of the first image and the second image based on the first information in advance and the correlation data.

Abstract: A multi charged particle beam exposure method includes transmitting ON/OFF control signals each being an ON/OFF control signal for a corresponding beam of multi-beams of charged particle beams in a batch to a blanking apparatus in which there are mounted a substrate where a plurality of passage holes are formed to let a corresponding beam of the multi-beams individually pass therethrough, and a plurality of individual blanking mechanisms arranged in the substrate to individually perform blanking deflection of each beam of the multi-beams, and irradiating the substrate with the multi-beams in accordance with the ON/OFF control signals transmitted in a batch, while shifting an irradiation timing for each group obtained by grouping the multi-beams into a plurality of groups by a plurality of individual blanking mechanisms mounted in the blanking apparatus.

Abstract: This transparent shield device has a windshield that is disposed in the sensing direction of an onboard camera. The windshield has an outer surface that is exposed to the outside. The outer surface has an extended imaging area, which includes the imaging area of the onboard camera, and a surrounding area. Furthermore, the transparent shield device has a water-repellent sticker that is positioned within the extended imaging area and/or a water-attracting coating layer that is positioned within the surrounding area. Liquid droplets deposited on the outer surface can be moved out of the imaging area or prevented from entering the imaging area from the surrounding area.

Abstract: A magnetostrictive sensor capable of obtaining both enhanced productivity and reduced variations in outputs can be obtained. A torque sensor includes a substrate and a plating film disposed on the outer peripheral surface of the substrate. The substrate includes a plating portion, masking portions, and tilt portions and. An outer peripheral surface of the plating portion is a surface parallel to a shaft center of the substrate in a side cross-sectional view. Outer peripheral surfaces of the tilt portions are slopes tilted relative to the shaft center in the side cross-sectional view. The plating film is formed on a plating surface and slopes in such a manner that end portions in the axial direction are located on the slopes. The plating film on the slopes has a thickness smaller than the thickness of the plating film on the plating surface.

Abstract: A low-cost magnetostrictive torque sensor having a high sensitivity is obtained. A torque sensor 10 includes a substrate 12, a magnetostrictive portion 26, a magnetostrictive portion 28, a detection coil 18a, a detection coil 18b, a detection circuit 48, and a detection circuit 50. The substrate 12 has a tubular shape. Each of the magnetostrictive portions 26 and 28 is constituted by a plating film and disposed on the outer peripheral surface of the substrate 12. The detection coil 18a generates a magnetic flux passing through the magnetostrictive portion 26. The detection coil 18b generates a magnetic flux passing through the magnetostrictive portion 28. Each of the detection circuits 48 and 50 detects a potential between the detection coil 18a and the detection coil 18b.

Abstract: An image forming apparatus includes an image forming unit, an adjustment unit to select a type of adjustment processing for the image forming unit, a determination unit to determine a required time of the selected type of adjustment processing, and a display unit counting down and displaying a remaining time of the selected type of adjustment processing. The display unit controls a resolution of the remaining time based on the selected type of adjustment processing. A first type of adjustment processing is executed again if the first type of adjustment processing fails, and a second type of adjustment processing is not executed again if the second type of adjustment processing fails. The resolution includes a first resolution corresponding to the first type of adjustment processing and a second resolution corresponding to the second type of adjustment processing and being finer than the first resolution.

Abstract: An image forming apparatus includes: an image forming unit configured to perform image formation in a first mode, in which image formation is performed by a plurality of image forming stations, or a second mode, in which image formation is performed by a predetermined image forming station among the plurality of image forming stations; and a controller configured to: control the image forming unit to perform a preparation operation in accordance with color mode information; set a restricted operation state in which the controller prohibits the image formation in the first mode and permits the image formation in the second mode when any one image forming station, except for the predetermined image forming station, is incapable of performing image formation; and prevent the image forming unit from performing the preparation operation when the first mode is set as the color mode information and the restricted operation state is set.

Abstract: An image forming apparatus capable of performing color misregistration correction at image forming speeds while reducing downtime. Image forming units form images of different colors. The formed images are transferred to an intermediate transfer belt. A pattern sensor detects color misregistration amounts of color patterns formed on the intermediate transfer belt. A CPU causes the image forming units to form first color patterns at a first speed and the pattern sensor to detect first color misregistration amounts, and causes the former to form second color patterns at a second speed different from the first speed and the latter to detect second color misregistration amounts. The CPU determines third color misregistration amounts at a third speed based on the first and second color misregistration amounts. The third speed is different from the first and second speeds.

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract: A multi charged particle beam writing method includes calculating an offset dose to irradiate all the small regions by multiplying one beam dose equivalent to a maximum irradiation time of multi-beams of each pass in multiple writing by a maximum number of defective beams being always ON to irradiate one of the small regions; calculating an incident dose, in addition to the offset dose, for each of the small regions; and performing multiple writing, using multi-beams including a defective beam being always ON, such that a beam of a total dose, between the incident dose and the offset dose, irradiates a corresponding small region for each small region, while switching a beam for each pass of the multiple writing, and controlling an irradiation time equivalent to the offset dose by a common blanking mechanism collectively blanking-controlling the multi-beams.

Abstract: In one embodiment, an aperture set for a multi-beam includes a shaping aperture array in which a plurality of first openings are formed, a region including the plurality of first openings is irradiated with a charged particle beam discharged from a discharge unit, and portions of the charged particle beam pass through the plurality of respective first openings to form a multi-beam, a first shield plate in which a plurality of second openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings, passes, and a blanking aperture array in which a plurality of third openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings and the plurality of second openings, passes. The second openings are wider than the first openings.

Abstract: A multi charged particle beam exposure method includes calculating an effective irradiation time, for each of a plurality of control irradiation time periods for controlling an irradiation time of each beam in the multi-beams of a charged particle beam, using a blanking error time of each divided shot of a plurality of divided shots, previously acquired, due to an error of blanking control for each divided shot; generating correlation data representing a relation between the control irradiation time and the effective irradiation time; selecting, using the correlation data, for each irradiation position of a target object, the combination of the divided shots corresponding to the effective irradiation time to be closer to each desired irradiation time; and performing exposure, using the multi-beams, based on the combination of the divided shots selected for each irradiation position of the target object.

Abstract: In one embodiment, a supporting case includes a lower case member and an upper case member. The mounting substrate is pinched between a lower cylindrical supporting portion and a upper cylindrical supporting portion. Peripheral regions of the mounting substrate that are on a peripheral side with respect to a part pinched between the lower cylindrical supporting portion and the upper cylindrical supporting portion are positioned in a space defined by a bottom plate portion, a lower peripheral-wall portion, and the lower cylindrical supporting portion of the lower case member and a top lid portion, an upper peripheral-wall portion, and the upper cylindrical supporting portion of the upper case member.

Abstract: A magnetostrictive sensor including a magnetic structure. The magnetic structure has a columnar substrate extending along an axis, and a magnetostrictive portion disposed on an outer peripheral surface of the substrate. The magnetostrictive portion includes a plurality of portions that have different concentrations of at least one of a plurality of elements, the portions being so arranged as to satisfy at least one of a first requirement that in a first cross sectional view of the magnetostrictive portion orthogonal to the axis, the portions are arranged clockwise about the axis, a second requirement that in the first cross sectional view, the portions are arranged in a thickness direction of the magnetostrictive portion, and a third requirement that, in a second cross sectional view of the magnetostrictive portion that is orthogonal to the first cross sectional view and passes through the axis, the portions are arranged along the axis.

Abstract: A magnetostrictive sensor, including a tubular or columnar substrate extending along an axis, and a magnetostrictive portion disposed on an outer peripheral surface of the substrate and including a plurality of magnetostrictive lines. The plurality of magnetostrictive lines include adjacent first and second magnetostrictive lines that extend along an extension direction, and that are disposed on the outer peripheral surface of the substrate via respectively first and second contact areas. In a cross sectional view of the magnetostrictive portion taken orthogonally to the extension direction, a first length, which is a width of a widest portion of the first magnetostrictive line in a width direction parallel to the outer peripheral surface of the substrate, is larger than a width of the first contact area in the width direction, and than a shortest distance between the first and second contact areas in the width direction.

Abstract: A multi charged particle beam writing apparatus includes an irradiation time calculation circuit to calculate an irradiation time of a beam to each pixel, for each of a plurality of pixels which are obtained by dividing a writing region of a target object and each of which serves as an irradiation unit region per beam of multi charged particle beams, a gray-scale value calculation circuit to calculate, for each pixel, a gray-scale value of gradation by gray scale levels by dividing the irradiation time by a quantization unit, and a gray-scale value correction circuit to correct, for each of a plurality of groups each composed of adjacent pixels, dose errors each caused by gradation, by gray scale levels, of the irradiation time which occur in the adjacent pixels in a group concerned, by increasing or decreasing the gray-scale value of at least one pixel in the group concerned by 1.