Abstract: A sample rack used to hold a sample container containing a sample and to transport the held sample container, includes a container holding part configured to hold the sample container; and a mark indicating an amount of the sample stored in the sample container held by the container holding part.

Abstract: Provided is a cooling unit to be used in an inspection of a semiconductor device. The cooling unit includes a jacket for dissipating heat of the semiconductor device. The jacket is provided with a light passing portion for passing light from the semiconductor device. The jacket has a space defining surface that faces the semiconductor device and defines a space between the space defining surface and the semiconductor device in a state where the light passing portion faces the semiconductor device. The jacket is provided with a supply flow path through which a fluid to be supplied to the space flows.

Abstract: A plasma processing apparatus includes a cylindrical processing chamber with a sidewall having an opening, to accommodate substrates on respective stages. The plasma processing apparatus includes a plasma compartment wall with an outer surface, the plasma compartment wall being hermetically provided at the sidewall of the processing chamber to close the opening of the sidewall of the processing chamber, and the plasma compartment wall defining a plasma formation space. The plasma processing apparatus includes a first plasma electrode pair consisting of first electrodes, the first electrodes being arranged opposite each other, on opposite sides of the outer surface of the plasma compartment wall. The plasma processing apparatus includes a second plasma electrode pair consisting of second electrodes, the second electrodes being arranged opposite each other, on the opposite sides of the outer surface of the plasma compartment wall.

Abstract: A temperature sensor includes: a thermocouple having a temperature measurement contact in a processing container in which a plasma processing is performed, and configured to measure a temperature inside the processing container; a protective tube configured to accommodate and protect the thermocouple; and an electromagnetic shield provided in the protective tube to cover the thermocouple.

Abstract: Provided is a spunbound nonwoven fabric for use in filters which has excellent rigidty, folding endurance, and uniformity of a weight a unit area, and which also has dust collection perforance and mechanical properties. The spunbond nonwoven fabric for use in filters includes a thermoplastic continuous filament and has a partially fused portion. The nonwoven fabric has a stiffness of 2 mN or more and 100 mN or less, a weight per unit area-CV value 5% or less, and a weight per unit area of 150 g/m2 more and 300 g/m2 or less.

Abstract: A nonwoven fabric for curtain in an embodiment of the present invention is formed from fibers having a thermoplastic resin as a main component, said nonwoven fabric for curtain being characterized in that: in the surface of the nonwoven fabric, the fibers are fused together at points where the fibers intersect, and the fibers are mutually isolated at locations other than the intersecting points; and furthermore, the KES surface roughness SMD of at least one side of the sheet is 1.2 ?m or less, and the longitudinal tearing strength per fabric weight is 0.50 or more.

Abstract: A plasma processing apparatus includes: a processing container extended in a longitudinal direction; a raw material gas supply configured to supply a raw material gas into the processing container; a plasma partition wall provided along the longitudinal direction of the processing container, defining a plasma generation space therein, and having an opening through which the plasma generation space and an inside of the processing container communicate with each other; a reaction gas supply configured to supply a reaction gas that reacts with the raw material gas, into the plasma generation space; and an opening/closing unit configured to open/close the opening.

Abstract: A heat treatment method includes: forming an amorphous silicon film having a hydrogen concentration in a film of 5×1019 atoms/cm3 or more, on a substrate; and irradiating the substrate with microwaves to heat the amorphous silicon film thereby forming a polycrystalline silicon film from the amorphous silicon film.

Abstract: Provided is a driving device for PWM control of voltage pulses for controlling the temperature of a heater in a phase controller, the driving device being capable of increasing the response speed of an optical element such as an optical switch. Phase controllers include first and second heaters for changing the temperatures of first and second optical waveguides extending in parallel. Driving devices include pulse generation circuits that generate voltage pulses to apply to the first and second heaters. To start raising the temperature of the second heater, the pulse generation circuit generates a first voltage pulse and consecutive second voltage pulses to apply to the second heater with zero voltage pulse being applied to the first heater, the first voltage pulse having a long pulse width and the second voltage pulses following the first voltage pulse and having a shorter pulse width than the first voltage pulse.

Abstract: A plasma processing apparatus includes: a processing container having a cylindrical shape; a pair of plasma electrodes arranged along the longitudinal direction of the processing container while facing each other; and a radio-frequency power supply configured to supply a radio-frequency power to the pair of plasma electrodes. In the pair of plasma electrodes, an inter-electrode distance at a position distant from a power feed position to which the radio-frequency power is supplied is longer than an inter-electrode distance at the power feed position.

Abstract: Provided is a driving device for PWM control of voltage pulses for controlling the temperature of a heater in a phase controller, the driving device being capable of increasing the response speed of an optical element such as an optical switch. Phase controllers include first and second heaters for changing the temperatures of first and second optical waveguides extending in parallel. Driving devices include pulse generation circuits that generate voltage pulses to apply to the first and second heaters. To start raising the temperature of the second heater, the pulse generation circuit generates a first voltage pulse and consecutive second voltage pulses to apply to the second heater with zero voltage pulse being applied to the first heater, the first voltage pulse having a long pulse width and the second voltage pulses following the first voltage pulse and having a shorter pulse width than the first voltage pulse.

Abstract: An electrolytic capacitor includes a capacitor element. The capacitor element includes an anode including a dielectric layer thereon and a cathode member including a conductive polymer and in contact with the dielectric layer. The capacitor element is impregnated with a liquid containing at least one of polyalkylene glycol and derivatives of polyalkylene glycol. The liquid further contains an oxidation inhibitor.

Abstract: An electrolytic capacitor includes a capacitor element. The capacitor element includes an anode including a dielectric layer thereon and a cathode member including a conductive polymer and in contact with the dielectric layer. The capacitor element is impregnated with a liquid containing at least one of polyalkylene glycol and derivatives of polyalkylene glycol. The liquid further contains an aromatic compound having a nitro group and at least one of a hydroxyl group and a carboxyl group.

Abstract: An electrolytic capacitor includes a capacitor element. The capacitor element includes an anode including a dielectric layer thereon and a cathode member including a conductive polymer and in contact with the dielectric layer. The capacitor element is impregnated with a liquid containing at least one of polyalkylene glycol and derivatives of polyalkylene glycol. The liquid further contains an aromatic compound having a nitro group and at least one of a hydroxyl group and a carboxyl group.

Abstract: A sample rack used to hold a sample container containing a sample and to transport the held sample container, includes a container holding part configured to hold the sample container; and a mark indicating an amount of the sample stored in the sample container held by the container holding part.

Abstract: An electrolytic capacitor includes a capacitor element. The capacitor element includes: an anode foil having a dielectric layer thereon, and a cathode layer including a conductive polymer and in contact with the dielectric layer. The capacitor element is impregnated with a liquid containing at least one of polyalkylene glycol and derivatives selected from a group consisting of polyethylene glycol glyceryl ether, polyethylene glycol diglyceryl ether, polyethylene glycol sorbitol ether, polypropylene glycol glyceryl ether, polypropylene glycol diglyceryl ether, polypropylene glycol sorbitol ether, copolymers of ethylene glycol and propylene glycol, copolymers of ethylene glycol and butylene glycol, and copolymers of propylene glycol and butylene glycol.

Abstract: A plasma processing apparatus includes a plasma generator provided with a plasma electrode and performs plasma processing on a substrate accommodated in a processing container. At least a region corresponding to the plasma electrode of the plasma generator is formed of synthetic quartz.

Abstract: A heat treatment system includes a heating unit that heats an inside of a processing chamber that accommodates a plurality of workpieces; a pressure adjusting unit that adjusts a pressure in the processing chamber; a heat treatment condition storing unit that stores a heat treatment condition according to a heat treatment content; a heat treatment change model storing unit that stores a heat treatment change model that represents a relationship between a change of the temperature and the pressure in the processing chamber and a change of a heat treatment result; a heat treatment performing unit that performs a heat treatment according to the heat treatment condition stored in the heat treatment condition storing unit; and a calculating unit that calculates a temperature and a pressure from which a target heat treatment result is derived.

Abstract: A bowleg correction device 1 includes a pair of left and right foot mounting units 10 configured to respectively mount user feet from upper surface sides thereof; and rotating portions 20 respectively fixed to the foot mounting units 10, each of which has at least a part protruded from a lower surface side of the corresponding foot mounting unit 10, wherein each of the rotating portions 20 includes: a fixed portion 21 fixed to the corresponding foot mounting unit 10; and a shaft portion 22 rotatably engaged with the fixed portion 21, extending in a vertical direction and having a floor-contacting surface 22a which contacts a floor at a position that is protruded from a bottom surface 12a of the foot mounting unit 10, and when the foot mounting unit 10 is rotated around the shaft portion 22 in a direction, a returning force is generated in the opposite direction.

Abstract: An electrolytic capacitor includes a capacitor element. The capacitor element includes: an anode foil having a dielectric layer thereon, and a cathode layer including a conductive polymer and in contact with the dielectric layer. The capacitor element is impregnated with a liquid containing at least one of polyalkylene glycol and derivatives selected from a group consisting of polyethylene glycol glyceryl ether, polyethylene glycol diglyceryl ether, polyethylene glycol sorbitol ether, polypropylene glycol glyceryl ether, polypropylene glycol diglyceryl ether, polypropylene glycol sorbitol ether, copolymers of ethylene glycol and propylene glycol, copolymers of ethylene glycol and butylene glycol, and copolymers of propylene glycol and butylene glycol.