Patents by Inventor Hiroyuki Shimbo

Hiroyuki Shimbo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240021735
    Abstract: Provided is a semiconductor chip including a nanowire field effect transistor (FET) and having a layout configuration effective for making manufacturing the chip easy. A semiconductor chip includes a first block including a standard cell having a nanowire PET and a second block including a nanowire FET. In the first and second blocks, nanowires extending in an X direction have an arrangement pitch in a Y direction of an integer multiple of a pitch P1. Pads have an arrangement pitch in the X direction of an integer multiple of a pitch P2.
    Type: Application
    Filed: July 25, 2023
    Publication date: January 18, 2024
    Inventor: Hiroyuki SHIMBO
  • Publication number: 20230395604
    Abstract: Provided is a semiconductor integrated circuit device including a nanowire field effect transistor (FET) and having a layout configuration effective for making manufacturing the device easy. A standard cell having no logical function is disposed adjacent to a standard cell having a logical function. The standard cell includes nanowire FETs having nanowires and pads. The standard cell further includes dummy pads, which have no contribution to a logical function of a circuit.
    Type: Application
    Filed: August 16, 2023
    Publication date: December 7, 2023
    Inventor: Hiroyuki SHIMBO
  • Publication number: 20230387116
    Abstract: Disclosed herein is a semiconductor integrated circuit device including a standard cell with a fin extending in a first direction. The fin and a gate line extending in a second direction perpendicular to the first direction and provided on the fin constitute an active transistor. The fin and a dummy gate line provided in parallel with the gate line constitute a dummy transistor. The active transistor shares a node as its source or drain with the dummy transistor.
    Type: Application
    Filed: August 15, 2023
    Publication date: November 30, 2023
    Inventor: Hiroyuki SHIMBO
  • Patent number: 11764217
    Abstract: Disclosed herein is a semiconductor integrated circuit device including a standard cell with a fin extending in a first direction. The fin and a gate line extending in a second direction perpendicular to the first direction and provided on the fin constitute an active transistor. The fin and a dummy gate line provided in parallel with the gate line constitute a dummy transistor. The active transistor shares a node as its source or drain with the dummy transistor.
    Type: Grant
    Filed: May 13, 2022
    Date of Patent: September 19, 2023
    Assignee: SOCIONEXT INC.
    Inventor: Hiroyuki Shimbo
  • Patent number: 11764224
    Abstract: Provided is a semiconductor integrated circuit device including a nanowire field effect transistor (FET) and having a layout configuration effective for making manufacturing the device easy. A standard cell having no logical function is disposed adjacent to a standard cell having a logical function. The standard cell includes nanowire FETs having nanowires and pads. The standard cell further includes dummy pads, which have no contribution to a logical function of a circuit.
    Type: Grant
    Filed: August 15, 2022
    Date of Patent: September 19, 2023
    Assignee: SOCIONEXT INC.
    Inventor: Hiroyuki Shimbo
  • Patent number: 11749757
    Abstract: Provided is a semiconductor chip including a nanowire field effect transistor (FET) and having a layout configuration effective for making manufacturing the chip easy. A semiconductor chip includes a first block including a standard cell having a nanowire FET and a second block including a nanowire FET. In the first and second blocks, nanowires extending in an X direction have an arrangement pitch in a Y direction of an integer multiple of a pitch P1. Pads have an arrangement pitch in the X direction of an integer multiple of a pitch P2.
    Type: Grant
    Filed: April 19, 2022
    Date of Patent: September 5, 2023
    Assignee: SOCIONEXT INC.
    Inventor: Hiroyuki Shimbo
  • Publication number: 20230275160
    Abstract: In a standard cell including nanowire FETs, pads connected to nanowires are arranged at a predetermined pitch in X direction along which the nanowires extend. A cell width of the standard cell is an integral multiplication of the pitch. In a case where the standard cell is arranged to constitute the layout of a semiconductor integrated circuit device, the pads are regularly arranged in the X direction.
    Type: Application
    Filed: May 10, 2023
    Publication date: August 31, 2023
    Inventor: Hiroyuki SHIMBO
  • Patent number: 11688814
    Abstract: In a standard cell including nanowire FETs, pads connected to nanowires are arranged at a predetermined pitch in X direction along which the nanowires extend. A cell width of the standard cell is an integral multiplication of the pitch. In a case where the standard cell is arranged to constitute the layout of a semiconductor integrated circuit device, the pads are regularly arranged in the X direction.
    Type: Grant
    Filed: February 17, 2022
    Date of Patent: June 27, 2023
    Assignee: SOCIONEXT INC.
    Inventor: Hiroyuki Shimbo
  • Publication number: 20220392921
    Abstract: Provided is a semiconductor integrated circuit device including a nanowire field effect transistor (FET) and having a layout configuration effective for making manufacturing the device easy. A standard cell having no logical function is disposed adjacent to a standard cell having a logical function. The standard cell includes nanowire FETs having nanowires and pads. The standard cell further includes dummy pads, which have no contribution to a logical function of a circuit.
    Type: Application
    Filed: August 15, 2022
    Publication date: December 8, 2022
    Inventor: Hiroyuki SHIMBO
  • Patent number: 11450688
    Abstract: Provided is a semiconductor integrated circuit device including a nanowire field effect transistor (FET) and having a layout configuration effective for making manufacturing the device easy. A standard cell having no logical function is disposed adjacent to a standard cell having a logical function. The standard cell includes nanowire FETs having nanowires and pads. The standard cell further includes dummy pads, which have no contribution to a logical function of a circuit.
    Type: Grant
    Filed: November 25, 2020
    Date of Patent: September 20, 2022
    Assignee: SOCIONEXT INC.
    Inventor: Hiroyuki Shimbo
  • Publication number: 20220278096
    Abstract: Disclosed herein is a semiconductor integrated circuit device including a standard cell with a fin extending in a first direction. The fin and a gate line extending in a second direction perpendicular to the first direction and provided on the fin constitute an active transistor. The fin and a dummy gate line provided in parallel with the gate line constitute a dummy transistor. The active transistor shares a node as its source or drain with the dummy transistor.
    Type: Application
    Filed: May 13, 2022
    Publication date: September 1, 2022
    Inventor: Hiroyuki SHIMBO
  • Publication number: 20220246769
    Abstract: Provided is a semiconductor chip including a nanowire field effect transistor (FET) and having a layout configuration effective for making manufacturing the chip easy. A semiconductor chip includes a first block including a standard cell having a nanowire FET and a second block including a nanowire FET. In the first and second blocks, nanowires extending in an X direction have an arrangement pitch in a Y direction of an integer multiple of a pitch P1. Pads have an arrangement pitch in the X direction of an integer multiple of a pitch P2.
    Type: Application
    Filed: April 19, 2022
    Publication date: August 4, 2022
    Inventor: Hiroyuki SHIMBO
  • Patent number: 11362088
    Abstract: Disclosed herein is a semiconductor integrated circuit device including a standard cell with a fin extending in a first direction. The fin and a gate line extending in a second direction perpendicular to the first direction and provided on the fin constitute an active transistor. The fin and a dummy gate line provided in parallel with the gate line constitute a dummy transistor. The active transistor shares a node as its source or drain with the dummy transistor.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: June 14, 2022
    Assignee: SOCIONEXT INC.
    Inventor: Hiroyuki Shimbo
  • Publication number: 20220173254
    Abstract: In a standard cell including nanowire FETs, pads connected to nanowires are arranged at a predetermined pitch in X direction along which the nanowires extend. A cell width of the standard cell is an integral multiplication of the pitch. In a case where the standard cell is arranged to constitute the layout of a semiconductor integrated circuit device, the pads are regularly arranged in the X direction.
    Type: Application
    Filed: February 17, 2022
    Publication date: June 2, 2022
    Inventor: Hiroyuki SHIMBO
  • Patent number: 11335814
    Abstract: Provided is a semiconductor chip including a nanowire field effect transistor (FET) and having a layout configuration effective for making manufacturing the chip easy. A semiconductor chip includes a first block including a standard cell having a nanowire FET and a second block including a nanowire FET. In the first and second blocks, nanowires extending in an X direction have an arrangement pitch in a Y direction of an integer multiple of a pitch P1. Pads have an arrangement pitch in the X direction of an integer multiple of a pitch P2.
    Type: Grant
    Filed: November 11, 2020
    Date of Patent: May 17, 2022
    Assignee: SOCIONEXT INC.
    Inventor: Hiroyuki Shimbo
  • Patent number: 11289610
    Abstract: In a standard cell including nanowire FETs, pads connected to nanowires are arranged at a predetermined pitch in X direction along which the nanowires extend. A cell width of the standard cell is an integral multiplication of the pitch. In a case where the standard cell is arranged to constitute the layout of a semiconductor integrated circuit device, the pads are regularly arranged in the X direction.
    Type: Grant
    Filed: December 17, 2020
    Date of Patent: March 29, 2022
    Assignee: SOCIONEXT INC.
    Inventor: Hiroyuki Shimbo
  • Patent number: 11114437
    Abstract: Disclosed herein is a semiconductor device including two standard cells which are arranged adjacent to each other in an X direction. One of the two standard cells includes a plurality of first fins which extend in the X direction, and which are arranged along a boundary between the two standard cells in a Y direction. The other standard cell includes a plurality of second fins which extend in the X direction, and which are arranged along the boundary between the two standard cells in the Y direction. The plurality of second fins includes a dummy fin.
    Type: Grant
    Filed: April 7, 2020
    Date of Patent: September 7, 2021
    Assignee: SOCIONEXT INC.
    Inventor: Hiroyuki Shimbo
  • Patent number: 11056477
    Abstract: Disclosed herein is a semiconductor integrated circuit device which includes a standard cell with a plurality of fins extending in a first direction and arranged in a second direction that is perpendicular to the first direction. An active fin of the fins forms part of an active transistor. A dummy fin of the fins is disposed between the active fin and an end of the standard cell.
    Type: Grant
    Filed: May 13, 2020
    Date of Patent: July 6, 2021
    Assignee: SOCIONEXT INC.
    Inventor: Hiroyuki Shimbo
  • Publication number: 20210104552
    Abstract: Provided is a semiconductor integrated circuit device including a nanowire field effect transistor (FET) and having a layout configuration effective for making manufacturing the device easy. A standard cell having no logical function is disposed adjacent to a standard cell having a logical function. The standard cell includes nanowire FETs having nanowires and pads. The standard cell further includes dummy pads, which have no contribution to a logical function of a circuit.
    Type: Application
    Filed: November 25, 2020
    Publication date: April 8, 2021
    Inventor: Hiroyuki SHIMBO
  • Publication number: 20210104635
    Abstract: In a standard cell including nanowire FETs, pads connected to nanowires are arranged at a predetermined pitch in X direction along which the nanowires extend. A cell width of the standard cell is an integral multiplication of the pitch. In a case where the standard cell is arranged to constitute the layout of a semiconductor integrated circuit device, the pads are regularly arranged in the X direction.
    Type: Application
    Filed: December 17, 2020
    Publication date: April 8, 2021
    Inventor: Hiroyuki SHIMBO