Abstract: Disclosed herein is a semiconductor integrated circuit device including a standard cell with a fin extending in a first direction. The fin and a gate line extending in a second direction perpendicular to the first direction and provided on the fin constitute an active transistor. The fin and a dummy gate line provided in parallel with the gate line constitute a dummy transistor. The active transistor shares a node as its source or drain with the dummy transistor.

Abstract: Disclosed herein is a semiconductor device including two standard cells which are arranged adjacent to each other in an X direction. One of the two standard cells includes a plurality of first fins which extend in the X direction, and which are arranged along a boundary between the two standard cells in a Y direction. The other standard cell includes a plurality of second fins which extend in the X direction, and which are arranged along the boundary between the two standard cells in the Y direction. The plurality of second fins includes a dummy fin.

Abstract: Disclosed herein is a semiconductor integrated circuit device which includes a standard cell with a plurality of fins extending in a first direction and arranged in a second direction that is perpendicular to the first direction. An active fin of the fins forms part of an active transistor. A dummy fin of the fins is disposed between the active fin and an end of the standard cell.

Abstract: Provided is a layout configuration that helps facilitate manufacturing a semiconductor integrated circuit device including a nanowire FET. A nanowire FET in a standard cell includes Na (where Na is an integer of 2 or more) nanowires extending in an X direction, and a nanowire FET in a standard cell includes Nb (where Nb is an integer of 1 or more and less than Na) nanowires extending in the X direction. At least one of both ends, in the Y direction, of a pad of the nanowire FET is aligned in the X direction with an associated one of both ends, in the Y direction, of a pad of the nanowire FET.

Abstract: Disclosed herein is a semiconductor integrated circuit device including a standard cell with a fin extending in a first direction. The fin and a gate line extending in a second direction perpendicular to the first direction and provided on the fin constitute an active transistor. The fin and a dummy gate line provided in parallel with the gate line constitute a dummy transistor. The active transistor shares a node as its source or drain with the dummy transistor.

Abstract: In a standard cell including nanowire FETs, pads connected to nanowires are arranged at a predetermined pitch in X direction along which the nanowires extend. A cell width of the standard cell is an integral multiplication of the pitch. In a case where the standard cell is arranged to constitute the layout of a semiconductor integrated circuit device, the pads are regularly arranged in the X direction.

Abstract: Disclosed herein is a driver circuit including first and second n-channel transistors connected together in series between first and second nodes. The first n-channel transistor is comprised of n fin transistor(s) having an identical gate length and an identical gate width where n is equal to or greater than one, and has its gate connected to a first input node. The second n-channel transistor is comprised of m fin transistors having the same gate length and the same gate width where in is greater than n, and has its gate connected to a second input node.

Abstract: Disclosed herein is a semiconductor integrated circuit device which includes a standard cell with a plurality of fins extending in a first direction and arranged in a second direction that is perpendicular to the first direction. An active fin of the fins forms part of an active transistor. A dummy fin of the fins is disposed between the active fin and an end of the standard cell.

Abstract: Disclosed herein is a driver circuit including first and second n-channel transistors connected together in series between first and second nodes. The first n-channel transistor is comprised of n fin transistor(s) having an identical gate length and an identical gate width where n is equal to or greater than one, and has its gate connected to a first input node. The second n-channel transistor is comprised of m fin transistors having the same gate length and the same gate width where m is greater than n, and has its gate connected to a second input node.

Abstract: Disclosed herein is a semiconductor integrated circuit device including a standard cell with a fin extending in a first direction. The fin and a gate line extending in a second direction perpendicular to the first direction and provided on the fin constitute an active transistor. The fin and a dummy gate line provided in parallel with the gate line constitute a dummy transistor. The active transistor shares a node as its source or drain with the dummy transistor.

Abstract: Disclosed herein is a semiconductor integrated circuit device which includes a standard cell with a plurality of fins extending in a first direction and arranged in a second direction that is perpendicular to the first direction. An active fin of the fins forms part of an active transistor. A dummy fin of the fins is disposed between the active fin and an end of the standard cell.

Abstract: Disclosed herein is a semiconductor device including two standard cells which are arranged adjacent to each other in an X direction. One of the two standard cells includes a plurality of first fins which extend in the X direction, and which are arranged along a boundary between the two standard cells in a Y direction. The other standard cell includes a plurality of second fins which extend in the X direction, and which are arranged along the boundary between the two standard cells in the Y direction. The plurality of second fins includes a dummy fin.

Abstract: Disclosed herein is a semiconductor integrated circuit device including a standard cell with a fin extending in a first direction. The fin and a gate line extending in a second direction perpendicular to the first direction and provided on the fin constitute an active transistor. The fin and a dummy gate line provided in parallel with the gate line constitute a dummy transistor. The active transistor shares a node as its source or drain with the dummy transistor.

Abstract: Disclosed herein is a semiconductor device including two standard cells which are arranged adjacent to each other in an X direction. One of the two standard cells includes a plurality of first fins which extend in the X direction, and which are arranged along a boundary between the two standard cells in a Y direction. The other standard cell includes a plurality of second fins which extend in the X direction, and which are arranged along the boundary between the two standard cells in the Y direction. The plurality of second fins includes a dummy fin.

Abstract: Disclosed herein is a driver circuit including first and second n-channel transistors connected together in series between first and second nodes. The first n-channel transistor is comprised of n fin transistor(s) having an identical gate length and an identical gate width where n is equal to or greater than one, and has its gate connected to a first input node. The second n-channel transistor is comprised of m fin transistors having the same gate length and the same gate width where m is greater than n, and has its gate connected to a second input node.

Abstract: In a circuit block, a plurality of standard cells are arranged to form a circuit of silicon-on-insulator (SOI) transistors. Also arranged in the circuit block is a capacitor cell including a capacitor arranged between a power supply line for supplying VDD and a power supply line for supplying VSS. An antenna cell, including an antenna diode formed between either of the two power supply lines and either a substrate or a well, is arranged adjacent to the capacitor cell.

Abstract: Disclosed herein is a driver circuit including first and second n-channel transistors connected together in series between first and second nodes. The first n-channel transistor is comprised of n fin transistor(s) having an identical gate length and an identical gate width where n is equal to or greater than one, and has its gate connected to a first input node. The second n-channel transistor is comprised of m fin transistors having the same gate length and the same gate width where m is greater than n, and has its gate connected to a second input node.

Abstract: In a circuit block, a plurality of cell rows, each being comprised of a plurality of standard cells arranged in a first direction, are arranged in a second direction perpendicular to the first direction, thereby forming a circuit of SOI transistors. The circuit block includes a plurality of antenna cells, each including an antenna diode provided between a power supply line and a substrate or a well. In at least a part of the circuit block, the antenna cells are arranged at constant intervals in at least one of the first and second directions.

Abstract: Disclosed herein is a technique for providing a layout structure for a semiconductor integrated circuit with SOI transistors with an antenna error that could occur in a buried insulator under a source or drain taken into account.

Abstract: Disclosed herein is a driver circuit including first and second n-channel transistors connected together in series between first and second nodes. The first n-channel transistor is comprised of n fin transistor(s) having an identical gate length and an identical gate width where n is equal to or greater than one, and has its gate connected to a first input node. The second n-channel transistor is comprised of m fin transistors having the same gate length and the same gate width where m is greater than n, and has its gate connected to a second input node.