Abstract: An electromagnetic disturbance analysis method for analyzing an external noise to a semiconductor integrated circuit includes an impedance extraction step of extracting impedance information on the power wiring in the target semiconductor integrated circuit or the power wiring in the semiconductor integrated circuit and the external power wiring of the semiconductor integrated circuit, an equivalent circuit creating step of creating an equivalent circuit from the impedance information, and an analysis step of supplying a noise waveform externally and analyzing the influence of the noise on the semiconductor integrated circuit.

Abstract: A method for optimizing electromagnetic interference (EMI) comprising: an EMI analyzing step of analyzing a quantity of electromagnetic interference of an LSI by execution of simulation; a step of selecting an instance with a large quantity of noise in said EMI analyzing step; and a step of adjusting a driving capability of said instance so that it is lowered to an extent that a delay does not occur in a signal timing of said instance selected. In order to optimize the analyzed EMI, the portion for which optimizing is required is extracted, and such a measure as increasing the area where the decoupling capacitance is created is implemented for this portion in a necessary degree. Further, by changing the aspect ratio of the block, changing the block position or changing the cell line, the decoupling capacitance can be easily created at the most efficient inserting position.

Abstract: A method of inspecting a photomask for a semiconductor integrated circuit formed based on drawing pattern data, includes the steps of classifying a drawing pattern of the semiconductor integrated circuit into a plurality of ranks in accordance with a predetermined reference and extracting the same, determining inspecting accuracy for each of the ranks, and deciding quality of the photomask depending on whether the determined inspecting accuracy is satisfied.

Abstract: An object of the invention is to discover at the chip level a portion of a high density of contact holes in wires of a large area that becomes a portion where wire defects will occur. In order to achieve this, the area ratio of the total area of wires of the same node to the total area of contact holes in the wires of the same node is limited in a chip layout and wire formation defects are detected by determining whether or not defects exists based on this limitation. Thus, defects are detected wherein the area ratio exceeds the limit at the layout design stage and thereby formation defects such as a disconnection of a wire of a large area, a wire breakdown, a surface peeling due to a hillock or a defective connection between a wire and a contact hole can be avoided.

Abstract: To provide a pattern generating method for a semiconductor device capable of forming a highly reliable semiconductor device, the accuracy of which is high.

Abstract: A method of analyzing an electromagnetic interference amount of an LSI includes an equivalent impedance information calculating step of calculating and estimating equivalent impedance information based on circuit information of an LSI chip and package information of the LSI chip, and an electromagnetic interference noise calculating step of calculating an electromagnetic interference noise based on the equivalent impedance information.

Abstract: To provide a semiconductor device characterized in that: a decoupling capacitor can be increased; noise generated from an electric power supply can be effectively absorbed; and a stable operation of a circuit can be realized.

Abstract: A wiring pattern has been enlarged by mutually different values, thereby forming two enlarged wiring patterns are formed. Then, regions where the two enlarged wiring patterns overlap each other are removed, thereby forming a dummy pattern. Alternatively, a simple-figure pattern made of simple figures is formed and a dummy pattern is formed using the simple-figure pattern. A gap that is not wider than a predetermined value is located in a final wiring pattern made of the wiring pattern and the dummy pattern is defined as an air gap region. Thus, an interconnection structure incorporating air gaps between wiring patterns is formed.

Abstract: With respect to layout data of a semiconductor integrated circuit, a latch-up verifying operation is carried out in high precision. In a latch-up verifying method, a well region, a transistor region, and a substrate contact region are extracted from layout data of a semiconductor integrated circuit formed on a semiconductor substrate; and steps for separately setting over-sizing values are sequentially executed based upon the respective extracted information.

Abstract: A wiring pattern has been enlarged by mutually different values, thereby forming two enlarged wiring patterns are formed. Then, regions where the two enlarged wiring patterns overlap each other are removed, thereby forming a dummy pattern. Alternatively, a simple-figure pattern made of simple figures is formed and a dummy pattern is formed using the simple-figure pattern. A gap that is not wider than a predetermined value is located in a final wiring pattern made of the wiring pattern and the dummy pattern is defined as an air gap region. Thus, an interconnection structure incorporating air gaps between wiring patterns is formed.

Abstract: With respect to layout data of a semiconductor integrated circuit, a latch-up verifying operation is carried out in high precision. In a latch-up verifying method, a well region, a transistor region, and a substrate contact region are extracted from layout data of a semiconductor integrated circuit formed on a semiconductor substrate; and steps for separately setting over-sizing values are sequentially executed based upon the respective extracted information.

Abstract: A method of analyzing an electromagnetic interference amount of an LSI includes an equivalent impedance information calculating step of calculating and estimating equivalent impedance information based on circuit information of an LSI chip and package information of the LSI chip, and an electromagnetic interference noise calculating step of calculating an electromagnetic interference noise based on the equivalent impedance information.

Abstract: A wiring pattern has been enlarged by mutually different values, thereby forming two enlarged wiring patterns are formed. Then, regions where the two enlarged wiring patterns overlap each other are removed, thereby forming a dummy pattern. Alternatively, a simple-figure pattern made of simple figures is formed and a dummy pattern is formed using the simple-figure pattern. A gap that is not wider than a predetermined value is located in a final wiring pattern made of the wiring pattern and the dummy pattern is defined as an air gap region. Thus, an interconnection structure incorporating air gaps between wiring patterns is formed.

Abstract: With respect to layout data of a semiconductor integrated circuit, a latch-up verifying operation is carried out in high precision. In a latch-up verifying method, a well region, a transistor region, and a substrate contact region are extracted from layout data of a semiconductor integrated circuit formed on a semiconductor substrate; and steps for separately setting over-sizing values are sequentially executed based upon the respective extracted information.

Abstract: An electromagnetic disturbance analysis method for analyzing an external noise to a semiconductor integrated circuit includes an impedance extraction step of extracting impedance information on the power wiring in the target semiconductor integrated circuit or the power wiring in the semiconductor integrated circuit and the external power wiring of the semiconductor integrated circuit, an equivalent circuit creating step of creating an equivalent circuit from the impedance information, and an analysis step of supplying a noise waveform externally and analyzing the influence of the noise on the semiconductor integrated circuit.

Abstract: By changing the shape of a bypass capacitor, inserting an inductance cell and using the bypass capacitor for each operating frequency characteristic, power source noise is absorbed to realize the stabilized operation of a circuit.

Abstract: After a layout for a semiconductor device including power and ground lines has been defined, patterns for bypass capacitors, which will be located under the power lines, are created. In this case, a pattern for a semiconductor device, where a bypass capacitor array is inlaid and substrate contacts are located under ground lines, is defined based on design rules input. Next, power lines are extracted and resized. Thereafter, logical operations are performed to place the bypass capacitors and the bypass capacitors are resized. Subsequently, logical operations are performed to define interconnecting diffused layers and the diffused layers are resized. Since the patterns for the power lines have already been defined before the patterns for the bypass capacitors are created, the patterns for the bypass capacitors to be placed under the power lines can be defined automatically. Thus, a pattern for a miniaturized semiconductor device with reduced power supply noise can be created automatically.

Abstract: A method of analyzing electromagnetic interference in which an amount of electromagnetic interference from an LSI is analyzed, wherein the method includes: an equivalent power source current information calculating step of calculating information of an equivalent power source current flowing in a power source current, from circuit information of the LSI chip; an estimating step of considering at least one of power source information of a power source for supplying a current to the LSI chip, package information of a package for the semiconductor chip, and measurement system information of a measurement system for measuring characteristics of the semiconductor chip, as analysis control information, and of estimating total information in which the analysis control information is reflected in the circuit information, as an equivalent circuit; and a total information analyzing step of performing analysis in accordance with the total information which is estimated in the estimating step.

Abstract: A method for optimizing electromagnetic interference (EMI) comprising: an EMI analyzing step of analyzing a quantity of electromagnetic interference of an LSI by execution of simulation; a step of selecting an instance with a large quantity of noise in said EMI analyzing step; and a step of adjusting a driving capability of said instance so that it is lowered to an extent that a delay does not occur in a signal timing of said instance selected. In order to optimize the analyzed EMI, the portion for which optimizing is required is extracted, and such a measure as increasing the area where the decoupling capacitance is created is implemented for this portion in a necessary degree. Further, by changing the aspect ratio of the block, changing the block position or changing the cell line, the decoupling capacitance can be easily created at the most efficient inserting position.

Abstract: This invention is characterized to include a discrete analysis frequency width change specifying process for specifying in a particular frequency range a change in the discrete high-speed Fourier transform (FFT) analysis frequency width and a modeling process for allocating different discrete FFT analysis frequency widths to the specified frequency range and to a frequency range other than the specified frequency range and performing modeling. The EMI analysis method of this invention reflects on the gate level power supply current calculation the influence of decoupling by resistance, capacitance and inductance of the power supply and ground, thereby making it possible to evaluate the EMI of LSIs in simulation in a realistic time and to provide efficient EMI countermeasures through supporting the identifying of the EMI causing locations.