Patents by Inventor Hiroyuki Watanabe

Hiroyuki Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210325793
    Abstract: A method for producing an electrophotographic photosensitive member including: forming a photosensitive layer; and forming a protective layer, wherein the step of forming the photosensitive layer forms a photosensitive layer having an amount of residual solvent of a first solvent in the photosensitive layer of 0.05% to 2.50% and an amount of residual solvent of a second solvent in the photosensitive layer of 0.50% to 2.50%, and the step of forming the protective layer includes step (A) of forming a cured film and step (B) of forming the protective layer having wrinkle shapes, wherein, in step (A), the irradiated coating film is heated at a heating temperature lower than a boiling point of the first solvent and in step (B), the cured film is heated at a heating temperature higher than a boiling point of the first solvent.
    Type: Application
    Filed: April 13, 2021
    Publication date: October 21, 2021
    Inventors: Nobuhiro Nakamura, Tomohito Ishida, Shuhei Iwasaki, Hiroyuki Watanabe, Tatsuya Yamaai, Yuka lshiduka, Yota Ito, Takeshi Murakami
  • Publication number: 20210325814
    Abstract: Provided is an electrophotographic photosensitive drum that achieves both of a reduction in torque of the electrophotographic photosensitive drum at the time of its cleaning and an improvement in image transferability. The electrophotographic photosensitive drum includes: a support; and a photosensitive layer arranged on the support, the electrophotographic photosensitive drum having arranged on an outer surface thereof at least two structure groups having different appearance periods, wherein when, out of the two structure groups, a group including structures having a smaller appearance period is defined as a first structure group, and a group including structures having a larger appearance period is defined as a second structure group, a height of the first structure group is lower than a height of the second structure group.
    Type: Application
    Filed: April 13, 2021
    Publication date: October 21, 2021
    Inventors: Tomohito Ishida, Nobuhiro Nakamura, Shuhei Iwasaki, Hiroyuki Watanabe, Tatsuya Yamaai, Yuka lshiduka, Yota Ito, Takeshi Murakami
  • Patent number: 11136503
    Abstract: Provided is a method for producing a nitride fluorescent material including: preparing a raw material mixture including a hydride containing at least one first alkaline earth metal element, at least one compound containing at least one second alkaline earth metal element and selected from an amide compound and an imide compound, a compound containing europium, a compound containing aluminum, and a compound containing silicon, wherein at least one of the compound containing europium, the compound containing aluminum, and the compound containing silicon is a nitride; and subjecting the raw material mixture to a heat treatment to obtain the nitride fluorescent material.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: October 5, 2021
    Assignee: NICHIA CORPORATION
    Inventors: Takayuki Shinohara, Hiroyuki Watanabe, Shoji Hosokawa
  • Publication number: 20210294366
    Abstract: A reference voltage circuit (1) includes a PTAT voltage generation circuit (20) that generates a voltage with a positive temperature coefficient, a CTAT voltage generation circuit (10) that generates a voltage with a negative temperature coefficient, and a temperature characteristic adjustment circuit (30) that generates a voltage for adjusting temperature characteristics. The reference voltage circuit outputs a reference voltage (VOUT) formed by calculation based on the output of the PTAT voltage generation circuit, output of the CTAT voltage generation circuit, and output of the temperature characteristic adjustment circuit.
    Type: Application
    Filed: August 9, 2019
    Publication date: September 23, 2021
    Inventor: Hiroyuki Watanabe
  • Publication number: 20210211119
    Abstract: A starting circuit capable of further reducing an influence of a variation in the threshold voltage of a transistor is proposed. The starting circuit includes an N-type first MOS transistor whose threshold voltage is near 0 V, a resistor interposed between a source terminal of the first MOS transistor and a ground, and a control circuit controlling a gate voltage of the first MOS transistor. An amount of first current transmitted to a device to be driven and starting the device is controlled according to the control of the gate voltage.
    Type: Application
    Filed: February 22, 2019
    Publication date: July 8, 2021
    Inventor: HIROYUKI WATANABE
  • Publication number: 20210187152
    Abstract: In a photocatalytic device, a photocatalytic filter is formed of a corrugated member and a gas is allowed to flow over front and rear surfaces of the filter from one end toward the other end thereof along a direction in which ridges and valleys extend, and a gas inflow part and a gas outflow part are provided at both end positions of a photocatalytic filter instead of providing a gas inlet-side flow channel and a gas output-side flow channel at positions facing filter surfaces. Thus, a contact area between a gas and the filter surfaces can be maintained, and miniaturization of the device such as reduction in the thickness or diameter can be realized without increasing gas circulation resistance. In addition, enhanced light irradiation efficiency, simplified structure, energy saving, and cost reduction can be realized. Moreover, the problem of heat can be solved.
    Type: Application
    Filed: December 10, 2018
    Publication date: June 24, 2021
    Applicant: APS Japan Co., Ltd.
    Inventors: Teruo WATANABE, Hidemitsu WATANABE, Hiroyuki WATANABE, Takafumi WATANABE
  • Publication number: 20210175447
    Abstract: The yield of a separation process is improved. The mass productivity of a display device which is formed through a separation process is improved. A layer is formed over a substrate with use of a material including a resin or a resin precursor. Next, a resin layer is formed by performing heat treatment on the layer. Next, a layer to be separated is formed over the resin layer. Then, the layer to be separated and the substrate are separated from each other. The heat treatment is performed in an atmosphere containing oxygen or while supplying a gas containing oxygen.
    Type: Application
    Filed: February 17, 2021
    Publication date: June 10, 2021
    Inventors: Masakatsu OHNO, Kayo KUMAKURA, Hiroyuki WATANABE, Seiji YASUMOTO, Satoru IDOJIRI, Hiroki ADACHI
  • Patent number: 11011358
    Abstract: The present embodiment relates to an electron multiplier having a structure configured to suppress and stabilize a variation of a resistance value in a wider temperature range. In the electron multiplier, a resistance layer sandwiched between a substrate and a secondary electron emitting layer formed of an insulating material includes a metal layer in which a plurality of metal particles formed of a metal material whose resistance value has a positive temperature characteristic are two-dimensionally arranged on a layer formation surface, which is coincident with or substantially parallel to a channel formation surface of the substrate, in the state of being adjacent to each other with a part of the first insulating material interposed therebetween, the metal layer having a thickness set to 5 to 40 angstroms.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: May 18, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Daichi Masuko, Hajime Nishimura, Yasumasa Hamana, Hiroyuki Watanabe
  • Patent number: 11003102
    Abstract: Provided are an electrophotographic apparatus and a process cartridge each capable of suppressing the occurrence of a black spot (white background contamination) in an output image under a low-temperature and low-humidity environment. The electrophotographic apparatus includes: an electrophotographic photosensitive member including a support, a photosensitive layer, and a protective layer in the stated order; an exposing device; a developing device; and a cleaning device, wherein the protective layer has a triarylamine structure and a specific structure at a ratio in a specific range, and a toner contains toner particles each containing at least a resin, and an external additive. The toner has a volume-average particle diameter of 7 ?m or more. The external additive contains a compound containing a titanium atom. The ratio of the mass of the compound containing a titanium atom to the total mass of the toner is 0.6 mass % or more.
    Type: Grant
    Filed: March 11, 2020
    Date of Patent: May 11, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yuka Ishiduka, Tsutomu Nishida, Hideharu Shimozawa, Nobuhiro Nakamura, Hiroyuki Watanabe
  • Publication number: 20210134572
    Abstract: The present embodiment relates to an electron multiplier having a structure configured to suppress and stabilize a variation of a resistance value in a wider temperature range. The electron multiplier includes a resistance layer sandwiched between a substrate and a secondary electron emitting layer and configured using a Pt layer two-dimensionally formed on a layer formation surface which is coincident with or substantially parallel to a channel formation surface of the substrate. The resistance layer has a temperature characteristic within a range in which a resistance value at ?60° C. is 10 times or less, and a resistance value at +60° C. is 0.25 times or more, relative to a resistance value at a temperature of 20° C.
    Type: Application
    Filed: April 10, 2018
    Publication date: May 6, 2021
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Daichi MASUKO, Hajime NISHIMURA, Yasumasa HAMANA, Hiroyuki WATANABE
  • Publication number: 20210116833
    Abstract: There is provided a process cartridge detachably attachable to a main body of an electrophotographic apparatus, the process cartridge including an electrophotographic photosensitive member and a charging member, wherein an outer surface of the charging member is composed of at least a matrix and at least a part of domains, a volume resistivity of the matrix is 1.0×105 times or more of a volume resistivity of the domain, an average value Sd of circle equivalent diameters of the domains observed on the outer surface of the charging member is in a predetermined range, the electrophotographic photosensitive member contains a support, a photosensitive layer, and a protective layer in this order and when a surface roughness of the protective layer is measured, each of a protruding valley portion Rvk, a load length ratio Mr2, and Sd/Rvk is in a predetermined range.
    Type: Application
    Filed: October 14, 2020
    Publication date: April 22, 2021
    Inventors: Yuka Ishiduka, Tsutomu Nishida, Hideharu Shimozawa, Nobuhiro Nakamura, Hiroyuki Watanabe, Kenichi Kaku, Kazuhiro Yamauchi, Yuichi Kikuchi, Kazuhisa Shida, Atsushi Okuda
  • Publication number: 20210116826
    Abstract: A process cartridge which allows any spot and stripe as image defects to be suppressed is provided. A process cartridge, in which an electroconductive layer of a charging member has a matrix including a first rubber, and domains dispersed in the matrix, the domains include a second rubber and an electron electroconductive agent, at least some of the domains are exposed on a surface of the charging member, when a volume resistivity of the matrix is 105 times or more a volume resistivity of the domains, a protective layer of an electrophotographic photosensitive member includes a metal oxide particle, and when a number average primary particle size of the metal oxide particle is defined as Sm and an average value of equivalent circle diameters of the domains is defined as Sd, the Sd/Sm satisfies the following expression (1): 0.5<Sd/Sm<100 . . . expression (1).
    Type: Application
    Filed: October 14, 2020
    Publication date: April 22, 2021
    Inventors: Tsutomu Nishida, Yuka Ishiduka, Kenichi Kaku, Nobuhiro Nakamura, Hiroyuki Watanabe, Hideharu Shimozawa, Atsushi Okuda, Yuichi Kikuchi, Kazuhiro Yamauchi
  • Publication number: 20210118655
    Abstract: The present embodiment relates to an electron multiplier having a structure configured to suppress and stabilize a variation of a resistance value in a wider temperature range. In the electron multiplier, a resistance layer sandwiched between a substrate and a secondary electron emitting layer comprised of an insulating material includes a metal layer in which a plurality of metal particles comprised of a metal material whose resistance value has a positive temperature characteristic are two-dimensionally arranged on a layer formation surface, which is coincident with or substantially parallel to a channel formation surface of the substrate, in the state of being adjacent to each other with a part of the first insulating material interposed therebetween, the metal layer having a thickness set to 5 to 40 angstroms.
    Type: Application
    Filed: April 10, 2018
    Publication date: April 22, 2021
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Daichi MASUKO, Hajime NISHIMURA, Yasumasa HAMANA, Hiroyuki WATANABE
  • Publication number: 20210093745
    Abstract: Provided is a photocatalytic device capable of further enhancing an effect by a photocatalyst and also efficiently dissipating heat emitted from a light applying portion, and capable of further enhancing the purification effect by increase of a light amount. In the photocatalytic device, both end portions of a housing in the lateral direction are in contact with an upper face of a photocatalyst filter to support the photocatalyst filter, and form upper-side edge portions for openings. A center portion of the housing is distant from the photocatalyst filter in an upward direction. Tilted portions are positioned in regions between both the end portions and the center portion. A lower-side inner wall of the housing supports the photocatalyst filter, and forms lower-side edge portions for the openings. A light applying portion is disposed on a lower face of the center portion of the upper-side inner wall.
    Type: Application
    Filed: September 18, 2020
    Publication date: April 1, 2021
    Applicant: APS Japan Co., Ltd.
    Inventors: Teruo WATANABE, Hidemitsu WATANABE, Hiroyuki WATANABE, Takafumi WATANABE, Masao YAMAGUCHI
  • Patent number: 10947451
    Abstract: Provided is a method of producing a nitride fluorescent material containing silicon nitride particles containing Eu, at least one alkaline earth metal selected from the group consisting of Mg, Ca, Sr, and Ba, Al, and fluorine in a composition of the silicon nitride particles. The method includes heat treating a raw material mixture containing an Eu source, a source of the alkaline earth metal, an Al source, an Si source, and an alkaline earth metal fluoride containing at least one selected from the group consisting of Mg, Ca, Sr, and Ba, wherein a molar content ratio of fluorine atom to Al is from 0.02 to 0.3.
    Type: Grant
    Filed: February 2, 2020
    Date of Patent: March 16, 2021
    Assignee: NICHIA CORPORATION
    Inventors: Hiroyuki Watanabe, Shoji Hosokawa
  • Patent number: 10930870
    Abstract: The yield of a separation process is improved. The mass productivity of a display device which is formed through a separation process is improved. A layer is formed over a substrate with use of a material including a resin or a resin precursor. Next, a resin layer is formed by performing heat treatment on the layer. Next, a layer to be separated is formed over the resin layer. Then, the layer to be separated and the substrate are separated from each other. The heat treatment is performed in an atmosphere containing oxygen or while supplying a gas containing oxygen.
    Type: Grant
    Filed: April 8, 2020
    Date of Patent: February 23, 2021
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Masakatsu Ohno, Kayo Kumakura, Hiroyuki Watanabe, Seiji Yasumoto, Satoru Idojiri, Hiroki Adachi
  • Patent number: 10927298
    Abstract: A method for producing a nitride fluorescent material having high emission luminance can be provided. The method includes heat-treating a raw material mixture containing silicon nitride, silicon, an aluminium compound, a calcium compound, and a europium compound.
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: February 23, 2021
    Assignee: NICHIA CORPORATION
    Inventors: Kazuya Nishimata, Hiroyuki Watanabe, Shoji Hosokawa
  • Publication number: 20210048837
    Abstract: [Proposed] is an activation circuit which can realize both of area reduction and current consumption reduction by more preferred embodiments. [Solution] An activation circuit has: an N-type MOS transistor having a gate terminal connected to a ground and having a threshold voltage in a vicinity of 0 V; and a resistor interposed between a source terminal of the MOS transistor and a ground, wherein an electric potential of a drain terminal of the MOS transistor is controlled depending on a first signal output from a device serving as a drive target, and transmission of a second signal for activating the device is controlled depending on the electric potential of the drain terminal.
    Type: Application
    Filed: January 30, 2019
    Publication date: February 18, 2021
    Inventor: HIROYUKI WATANABE
  • Patent number: 10922977
    Abstract: A display control device includes: an acquisition section that acquires captured image data items from imaging sections that image a surrounding region of a vehicle; a display control section that displays first bird's-eye view image data representing surroundings of the vehicle from a bird's eye viewpoint above the vehicle, which has been generated on the basis of the captured image data items; and a specification section that specifies a candidate region where the vehicle is to be parked in the surrounding region that is present in a side direction of the vehicle, the surrounding region having been imaged as the captured image data items, wherein the display control section displays second bird's-eye view image data with a wider display range in the side direction in which the candidate region is present as compared with the first bird's-eye view image data.
    Type: Grant
    Filed: July 2, 2018
    Date of Patent: February 16, 2021
    Assignee: AISIN SEIKI KABUSHIKI KAISHA
    Inventor: Hiroyuki Watanabe
  • Publication number: 20210042541
    Abstract: A specific area detection device that detects a specific area in an imaging area based on a captured image includes: an estimation unit configured to estimate a plurality of points and a direction of a straight line connecting two predetermined points among the plurality of points from a captured image using a learning model created by learning about a specific area defined by a predetermined number of the points in an imaging area using a captured image for learning; and a detection unit configured to detect the specific area by classifying the plurality of points for each specific area based on the direction.
    Type: Application
    Filed: July 27, 2020
    Publication date: February 11, 2021
    Applicant: AISIN SEIKI KABUSHIKI KAISHA
    Inventors: Yoshihito KOKUBO, Yoshihisa SUETSUGU, Jun ADACHI, Hiroyuki WATANABE, Koki UEDA