Abstract: A transistor of a characteristic checking element has a gate electrode connected to a measurement pad disposed in a dicing line and to an internal measurement pad disposed inside a semiconductor device. In a P/W process, a gate insulating film of the transistor is broken by an electric voltage applied via the internal measurement pad. Since the gate insulating film of the transistor is broken, a new current path is formed. Thus, measurement of accurate characteristics of the characteristic checking element is inhibited.

Abstract: A semiconductor device comprises a first external terminal having a first size, a plurality of second external terminals each having a second size smaller than the first size, an external terminal area in which the first external terminal and the second external terminals are arranged, and a plurality of wires connecting between the second external terminals and a plurality of circuits formed adjacent to the external terminal area and corresponding to the second external terminals. The second external terminals and the wires constitute a plurality of interfaces. Each of the interfaces includes at least one adjustment portion that adjusts a time constant of the wire so that the wires have the same time constant. At least part of the adjustment portions is located in a margin area produced in the external terminal area by a difference between the first size and the second size.

Abstract: A semiconductor device is disclosed which comprises a first wiring layer, a second wiring layer formed over the first wiring layer, data input/output terminals, and a data bus formed in the first and second wiring layers. The data bus includes N data lines transmitting data between a predetermined circuit and the input/output terminals. M first data lines among the N data lines have a length shorter than a predetermined length and residual N-M second data lines have a length longer than the predetermined length. Shield lines adjacent to the N data lines are formed in the first and second layers. The N data lines are arranged at positions at which the data lines do not overlap one another in a stacking direction of the first and second wiring layers.

Abstract: Disclosed herein is a device that includes: first lines formed on a first wiring layer extending in a first direction; second lines formed on a second wiring layer extending in a second direction; and conductor plugs connecting the first lines to the second lines such that the first and second lines form a mesh-structure wiring. The first lines include first enlarged portions at intersection positions where the first and second lines cross to each other, a width in the second direction of the first enlarged portions is wider than a line width of the first lines at other than the intersection position. The second lines include second enlarged portions at the intersection positions, a width in the first direction of the second enlarged portions is wider than a line width of the second lines at other than the intersection position.

Abstract: A semiconductor device includes a first pad, and a sub-trunk line elongated in a first direction; a main-trunk line arranged between the first pad and the sub-trunk line and elongated in the first direction. The semiconductor device further includes a first plug line elongated in a second direction crossing the first direction, the first plug line being connected between the first pad and the main-trunk line without being direct contact with the sub-trunk line. The semiconductor device further includes a second plug line elongated in the second direction, the second plug line being connected between the main-trunk line and the sub-trunk line, and a first element coupled to the sub-trunk line.

Abstract: Disclosed herein is a semiconductor device that includes a signal wiring arranged on a first layer and extending over the circuit block or blocks in the first direction so as to reach the first circuit block and produce a free space above the first circuit block, the signal wiring being electrically connected to the first circuit block, a power-supply wiring arranged on a second layer and extending over the circuit block or blocks in the first direction so as to reach the first circuit block, the power-supply wiring supplying an operating voltage to the first circuit block and an auxiliary power-supply wiring being configured to enhance the operating voltage supplied by the power supply line, and the auxiliary power-supply wiring being formed in the free space produced by the arrangement of the signal wiring.

Abstract: Disclosed herein is a device that includes: first and second memory cell arrays arranged in a first direction; a plurality of first bump electrodes disposed between the first and second memory cell arrays and arranged in line in a second direction crossing the first direction; a plurality of second bump electrodes disposed between the first bump electrodes and the second memory cell arrays and arranged in line in the second direction; a first area being between the first and second bump electrodes; a plurality of third bump electrodes disposed in the first area; and a first capacitor formed in the third area.

Abstract: Disclosed herein is a device that includes first and second memory cell arrays each including a plurality of memory cells, a first power supply line supplying a first voltage to the first memory cell array, a second power supply line supplying the first voltage to the second memory cell array, and a first capacitive element. The first capacitive element is electrically connected to the first power supply line and is electrically disconnected from the second power supply line when the first memory cell array is activated and the second memory cell array is deactivated. The first capacitive element is electrically connected to the second power supply line and is electrically disconnected from the first power supply line when the second memory cell array is activated and the first memory cell array is deactivated.

Abstract: A semiconductor device includes a reduced-power-consumption circuit block which includes first and second power lines, and a first circuit cell. The first circuit cell includes a first functional-element-free region. The first functional-element-free region includes a first driver circuit configured to connect and disconnect the first power line and the second power line.

Abstract: Disclosed herein is a device that includes first and second ports arranged in a first direction and first and second circuits arranged between the first and second ports. The first and second ports are coupled to the first and second circuits, respectively. The first and second circuits include first and second sub circuits that control an operation timing thereof based on a timing signal, respectively. The control signal is transmitted through a control line extending in a second direction. Distances between the control line and the first and second sub circuits in the first direction are the same as each other. A coordinate of the control line in the first direction is different from an intermediate coordinate between coordinates of the first and second ports in the first direction.

Abstract: A semiconductor device comprises a first external terminal having a first size, a plurality of second external terminals each having a second size smaller than the first size, an external terminal area in which the first external terminal and the second external terminals are arranged, and a plurality of wires connecting between the second external terminals and a plurality of circuits formed adjacent to the external terminal area and corresponding to the second external terminals. The second external terminals and the wires constitute a plurality of interfaces. Each of the interfaces includes at least one adjustment portion that adjusts a time constant of the wire so that the wires have the same time constant. At least part of the adjustment portions is located in a margin area produced in the external terminal area by a difference between the first size and the second size.

Abstract: A semiconductor device includes first and second wirings formed in a first wiring layer and extending parallel to an X direction, third and fourth wirings formed in a third wiring layer and extending parallel to a Y direction; fifth and sixth wirings formed in a second wiring layer positioned between the first and second wiring layers, a first contact conductor that connects the first wiring to the third wiring; and a second contact conductor that connects the second wiring to the fourth wiring. The first and second contact conductors are arranged in the X direction. According to the present invention, because the first and second contact conductors that connect wiring layers that are two or more layers apart are arranged in one direction, a prohibited area that is formed in the second wiring layer can be made narrower. Therefore, the flexibility of the layout of the second wiring layer is enhanced and the restriction on the wiring density can be relaxed.

Abstract: A semiconductor device is disclosed, which includes first and second power supply pads supplied with first and second power voltages, respectively, a first protection circuit coupled between the first and second power supply pads, and an internal circuit including a first power line and a plurality of transistors electrically coupled to the first power line. The first power line includes first and second portions, and the first portion is electrically connected to the first power supply pad. The device further includes a second protection circuit coupled between the second portion of the first power line and the second power supply pad.

Abstract: A semiconductor device comprises a first region and a second region. The first region includes a plurality of memory cells each of which holds respective data and a plurality of sense amplifiers that respectively amplify the data in the plurality of memory cells, based on a first voltage. The second region is provided along one side of the first region and includes a first power supply generation circuit that generates the first voltage, based on a second voltage. The second voltage being supplied to the first power supply circuit by a first power supply interconnect extends on the first region in a first direction parallel to the one side of the first region.

Abstract: The semiconductor memory device has a fuse area in which fuse elements for registering addresses of defective memory cells are arranged. A guard ring is formed around the fuse area and is covered by a passivation film. The passivation film above the fuse area has an opening. The guard ring has a first ring in a first layer, a second ring in a second layer and a third ring in a third layer. These rings are connected by a first connecting ring and a second connecting ring. The first ring is positioned at an inward part of the second ring to provide an area unoccupied by the first ring beneath the second ring.

Abstract: A semiconductor device includes a plurality of transistors formed on a semiconductor substrate, a first local wiring which is electrically connected to at least one of the plurality of transistors and extending in a first direction, a second local wiring which is formed above the first local wiring and which electrically connects to at least one of the plurality of transistors and extends in a second direction, a plurality of first wirings which are formed above the second local wiring and which extend in a third direction, at least each of the plurality of first wirings being electrically connected to the first local wiring and the second local wiring, respectively, and a second wiring which is formed above the first wiring and which electrically connects to at least one of the plurality of first wirings and extends in a fourth direction.

Abstract: A semiconductor device with a power wiring system. The device includes a multi-level wiring structure including a lower-level wiring layer and an upper-level wiring layer over the lower-level wiring layer, and the power wiring system includes a first power supply line and a second power supply line provided as the first-level wiring layer and extending in a first direction in substantially parallel to each other, a third power supply line provided as the upper-level wiring layer and extending in the first direction with overlapping the first power supply line, the first and third power supply lines conveying first and second power voltages, respectively, which are different from each other, and a fourth power supply line provided as the upper-level wiring layer and extending in the first direction with overlapping the second power supply line, the second and fourth power supply lines conveying the second and first power voltages, respectively.

Abstract: Disclosed herein is a device that includes a plurality of buffer circuits and data buses coupled to the buffer circuits. Each of the data buses includes first and second portions. The first portions of the data buses are arranged at a first pitch in the second direction, and the second portions of the data buses are arranged at a second pitch in the second direction, the second pitch being smaller than the first pitch.

Abstract: Disclosed herein is a device that includes: first and second memory mats each including a plurality of bit lines; a sense area arranged between the first and second memory mats; a column selection line provided on the first memory mat; and a compensation capacitance provided on the second memory mat. The sense area includes a plurality of sense amplifiers. Each of the sense amplifiers is connected to an associated one or ones of the bit lines. At least one of the sense amplifiers is selected based on a column selection signal supplied via the column selection line. At least a part of the compensation capacitance is formed in a same wiring layer as the column selection line.

Abstract: A semiconductor device is disclosed which comprises a first wiring layer, a second wiring layer formed over the first wiring layer, data input/output terminals, and a data bus formed in the first and second wiring layers. The data bus includes N data lines transmitting data between a predetermined circuit and the input/output terminals. M first data lines among the N data lines have a length shorter than a predetermined length and residual N-M second data lines have a length longer than the predetermined length. Shield lines adjacent to the N data lines are formed in the first and second layers. The N data lines are arranged at positions at which the data lines do not overlap one another in a stacking direction of the first and second wiring layers.