Patents by Inventor Hitoshi Iwata

Hitoshi Iwata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11940281
    Abstract: A learning apparatus includes an input unit configured to input route information indicating a route including one or more paths of a plurality of paths and moving body number information indicating the number of moving bodies for a date and a time on a path to be observed among the plurality of paths, and a learning unit configured to learn a parameter of a model indicating a relationship between the number of moving bodies for each of the plurality of paths and the number of moving bodies for the route and a relationship between the numbers of moving bodies for the route at different dates and times by using the route information and the moving body number information.
    Type: Grant
    Filed: February 12, 2020
    Date of Patent: March 26, 2024
    Assignee: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
    Inventors: Tomoharu Iwata, Hitoshi Shimizu
  • Publication number: 20230361653
    Abstract: Provided is a rotating device having excellent performance of cooling a heat generation source. Included are a shaft member, a rotating body having a tubular shape and rotatable about the shaft member, a bearing supporting the rotating body with respect to the shaft member, and a coupling member disposed between the bearing and the rotating body in a radial direction. The coupling member includes a ventilation channel communicating with an inside and an outside of the rotating body.
    Type: Application
    Filed: August 19, 2021
    Publication date: November 9, 2023
    Inventors: Hitoshi IWATA, Michihiro SHIMIZU, Naoki OHSAWA, Toshiyuki NISHIKATA, Tsuyoshi KANO, Shoma YAMANISHI, Yuta AMAGI, Yuya SENDA
  • Publication number: 20220316487
    Abstract: A rotating body is shorter in radial direction than in axial direction. The inner circumferential surfaces of a first bearing and a second bearing are fixed at an outer circumferential surface of the shaft member. In the axial direction, the outer diameter of the shaft member is substantially the same from a part, of the shaft member, opposing the first bearing to a part, of the shaft member, opposing the second bearing, and the inner and outer diameters of the rotating body are substantially the same from an end part, of the rotating body, on the first bearing side to an end part, of the rotating body, on the second bearing side. In the axial direction, one of stators is disposed at a central part (C1) of the shaft member, one of magnets is disposed at a central part (C2) of the rotating body.
    Type: Application
    Filed: August 6, 2020
    Publication date: October 6, 2022
    Inventors: Hitoshi IWATA, Tsuyoshi KANO, Naoki OHSAWA, Shoma YAMANISHI, Toshiyuki NISHIKATA, Seiji MITAMURA, Michihiro SHIMIZU, Yuta AMAGI
  • Publication number: 20220235775
    Abstract: A rotating device comprising: an axial member; a tubular rotating body rotatable in relation to the axial member; a tubular housing surrounding the rotating body; a bearing supporting the rotating body with respect to the axial member; a stator inside the rotating body; and one or a plurality of rotor blades provided to the rotating body.
    Type: Application
    Filed: June 12, 2020
    Publication date: July 28, 2022
    Inventors: Hitoshi IWATA, Tsuyoshi KANO, Naoki OHSAWA, Shoma YAMANISHI, Toshiyuki NISHIKATA, Michihiro SHIMIZU, Yuta AMAGI
  • Publication number: 20220200392
    Abstract: To provide a motor capable of meeting a demand for size reduction. The motor includes an axial member, a tubular rotating body rotatable in relation to the axial member, a bearing supporting the rotating body with respect to the axial member, and a stator inside the rotating body. The rotating body preferably includes a tubular member formed of a single member, and a magnet.
    Type: Application
    Filed: May 29, 2020
    Publication date: June 23, 2022
    Inventors: Hitoshi IWATA, Naoki OHSAWA, Shoma YAMANISHI, Toshiyuki NISHIKATA, Seiji MITAMURA, Michihiro SHIMIZU, Yuta AMAGI
  • Patent number: 6617191
    Abstract: An epitaxial growth layer, an oxide film, and a passivation film are formed on a silicon substrate. Except for an opening formed on a part of the passivation film, the upper surface of the passivation film is covered with a metal protective film made of tungsten (W). With the silicon substrate immersed in a high-concentration hydrofluoric aqueous solution, anodization is performed with the silicon substrate as an anode and the metal protective film as a counter electrode.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: September 9, 2003
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Hitoshi Iwata, Makoto Murate
  • Patent number: 6539804
    Abstract: A two-axis yaw rate sensor (1) includes a vibration ring (15) and a ring support plate for supporting the vibration ring (15). The vibration ring (15) includes first to fourth vibrating drive surfaces (16a-16d) arranged in turn in a circumferential direction and narrow portions (17) located between the adjacent drive surfaces (16a-16d). The first and the third drive surfaces (16a, 16c) are opposed to one another on the axis Y passing through the center of the vibration ring (15). The second and the fourth drive surfaces (16b, 16d) are opposed to one another on the axis X passing through the center of the vibration ring (15). The axis Y is substantially perpendicular to the axis X. A PZT film (15) is formed on the drive surfaces (16a-16d) and vibrates the drive surfaces (16a-16d) in a radial direction of the vibrating ring (15).
    Type: Grant
    Filed: June 9, 2000
    Date of Patent: April 1, 2003
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventor: Hitoshi Iwata
  • Patent number: 6399410
    Abstract: A method for anodizing silicon substrate includes forming an n-type silicon embedded layer (21) made of n-type silicon on a predetermined area of a first surface of the p-type single crystal silicon substrate (2). N-type silicon layers (4, 6) are formed on the upper surface of the p-type single crystal silicon substrate (2) and on the n-type silicon embedded layer (21). Silicon diffusion layers (5, 7) containing high-concentration p-type impurities are formed on predetermined areas of the n-type silicon layers (4, 6) to contact the n-type silicon embedded layer (21). An electrode layer (13) is formed on the lower surface of the p-type silicon substrate (2). The anode of a DC power source (15) is connected to the electrode layer (13), and the cathode is connected to a counter electrode (23), which is opposed to the p-type silicon substrate (2).
    Type: Grant
    Filed: March 28, 2000
    Date of Patent: June 4, 2002
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Hitoshi Iwata, Makoto Murate
  • Patent number: 6386091
    Abstract: A continuous processing apparatus comprises a tubular assembly that has a carrying path of a constant spatial cross sectional area throughout it and a pressure control unit in the carrying path, a retainer that is provided with throttle pieces of an area slightly smaller than the spatial cross sectional area so as to create labyrinth seal at least one of the upstream and downstream locations from the pressure control unit of the tubular assembly along its carrying path, and a retainer carrying device placed in the tubular assembly for carrying the retainer.
    Type: Grant
    Filed: April 24, 2001
    Date of Patent: May 14, 2002
    Assignee: House Foods Corporation
    Inventors: Hitoshi Iwata, Takaaki Shimizu, Katsuyuki Iwahata
  • Patent number: 6378368
    Abstract: An oscillation gyro (1) including a stainless steel base member (4) which is a quadratic prism, wherein the base member (4) has through holes (10, 7) extending in the directions crossing at right angles at the upper and lower portions thereof respectively, and further includes slide plates (8, 9) constituting a parallel plate portion (2) and slide plates (10, 11) constituting a parallel plate portion (3). Preferably, a titanium film (13) is formed by sputtering on each of the outer side surfaces of the parallel plate portions (2, 3), and a thin PZT film (14) is formed on the entire outer surface of the titanium film (13). Pairs of electrode films (15, 16) of aluminum are formed on the respective thin PZT films (14) up and down. The respective electrode films (15, 16) have a thickness of several um and the same area. Pads (15b, 16b) are formed at the lower ends of the base member (4) serving as fixed ends, and are connected to extension portions (15a, 16a) extending from the electrode film (15).
    Type: Grant
    Filed: August 18, 1999
    Date of Patent: April 30, 2002
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Hitoshi Iwata, Koichi Itoigawa
  • Patent number: 6362079
    Abstract: A first p-type silicon layer (3) is formed as a buried layer in a p-type single crystal silicon substrate (2), and an n-type silicon layer (4) is formed on the upper side of the silicon substrate (2). A second p-type silicon layer (5) for forming an opening is defined in the n-type silicon layer (4), and a metal protecting film (14) is formed on the upper side of the n-type silicon layer (4). An electrode layer (18) is formed on the rear side of the silicon substrate (2) via an oxide film (17). The electrode layer (18) and the silicon substrate (2) are electrically connected to each other via a connecting opening (17a) at portions aligned with the first p-type silicon layer (3). After a positive terminal and a negative terminal of a DC power source (V) are connected to the electrode layer (18) and to a counter electrode (11) respectively, a voltage is applied between the electrode layer (18) and the counter electrode (11) to carry out anodization.
    Type: Grant
    Filed: July 9, 1999
    Date of Patent: March 26, 2002
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Hitoshi Iwata, Makoto Murate
  • Publication number: 20020002912
    Abstract: A continuous processing apparatus comprises a tubular assembly that has a carrying path of a constant spatial cross sectional area throughout it and a pressure control unit in the carrying path, a retainer that is provided with throttle pieces of an area slightly smaller than the spatial cross sectional area so as to create labyrinth seal at least one of the upstream and downstream locations from the pressure control unit of the tubular assembly along its carrying path, and a retainer carrying device placed in the tubular assembly for carrying the retainer.
    Type: Application
    Filed: April 24, 2001
    Publication date: January 10, 2002
    Inventors: Hitoshi Iwata, Takaaki Shimizu, Katsuyuki Iwahata
  • Patent number: 6281648
    Abstract: A device for control of driving a power window automatically holds a switch in its operated state to continuously raise or lower a door glass by continuously rotating a motor. The device stops the motor when a locking current flows through the motor upon complete closure or complete open of the door glass. The device includes a thermistor inserted in a signal line through which current flowing through the motor passes. The thermistor is disposed in the vicinity of the motor. When a locking current flows through the motor, the current also flows through the thermistor so that the thermistor is heated and shuts off the current flowing therethrough so as to stop the supply of electricity to the motor when the temperature of the thermistor exceeds a predetermined value. Also, the thermistor has a function of shutting off current flowing therethrough when receiving heat radiated from the motor due to over current.
    Type: Grant
    Filed: December 13, 1994
    Date of Patent: August 28, 2001
    Assignee: Kabushiki Kaisha Tokai-Rika-Denki-Seisakusho
    Inventors: Hitoshi Iwata, Yasushi Nishibe, Kenichi Kinoshita
  • Patent number: 6271663
    Abstract: A rotation detector that detects rotational position with high precision. The rotation detector includes a rotor having a shaft. Projections are located at predetermined intervals on the periphery of the rotor and extend in an axial direction. The rotation detector further includes magnets and magnetism detecting elements respectively detecting magnetism of the magnets. At least one of the magnets and the detecting elements are arranged between the projections and the shaft at predetermined intervals.
    Type: Grant
    Filed: April 27, 1999
    Date of Patent: August 7, 2001
    Assignee: Kabushki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Masakata Kanbe, Hitoshi Iwata, Katsuhiro Minami, Katsuya Kogiso, Takashi Suzuki, Masahiro Taniguchi
  • Patent number: 6269450
    Abstract: A computer monitoring device is provided which ensures safe operation, even when a power supply voltage supplied to a microcomputer decreases and causes the microcomputer to enter an abnormal state. When the power supply voltage decreases, the power supply circuit is switched to an auxiliary power supply which supplies power to a microcomputer monitoring circuit and signal processing circuit via a diode. The microcomputer monitoring circuit in turn provides a reset signal for the computer so that it can continue to operate, which ensures safe operation of the computer. The computer monitoring device is particularly useful in a power window system for a vehicle.
    Type: Grant
    Filed: March 15, 1999
    Date of Patent: July 31, 2001
    Assignee: Kabushiki Kaisha Tokai-Rika-Denki-Seisakusho
    Inventors: Hitoshi Iwata, Yasushi Nishibe, Yoshiharu Kawarazaki
  • Patent number: 6262516
    Abstract: A parallel plate structure (1) is provided with a pair of bimorph piezoelectric elements (2) and prismatic insulation spacers (3) inserted between the piezoelectric elements (2) at the upper and lower ends thereof for cementing the piezoelectric elements (2) together via the spacers (3). Each piezoelectric element (2) comprises a planar base material (4) of titanium, PZT thin films (5) formed on both sides of the base material (4) by the hydrothermal method, and electrode films (6) formed on the PZT thin films (5). The base material (4) is 20 &mgr;m thick and the PZT thin films (5) are several pm thick, while the aluminum electrode films (6) are several um thick.
    Type: Grant
    Filed: August 23, 1999
    Date of Patent: July 17, 2001
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Toshio Fukuda, Fumihito Arai, Koichi Itoigawa, Hitoshi Iwata
  • Patent number: 6221023
    Abstract: A sensor mounted on the distal end of an intra-corporeal catheter detects pressure applied thereto. The sensor includes a chip that is deformable in accordance with pressure applied thereto, strain gauges mounted on the chip, a sensing plate, a projection, a cap and a tube. A cover covers the chip, the sensing plate, the projection and the cap and gives a smooth tapered shape to the catheter's distal end. The projection and the cap transmit pressure applied to the catheter's distal end to the sensing plate and tilt the sensing plate in accordance with the pressure. The strain gauges issue detection signals according to the degree and the direction of the tilting. The pressure applied to the catheter's distal end is detected based on the issued signals.
    Type: Grant
    Filed: December 2, 1996
    Date of Patent: April 24, 2001
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Tomoyoshi Matsuba, Hitoshi Iwata
  • Patent number: 6201285
    Abstract: An acceleration sensor with a diaphragm sensor chip has lead frames. One of the lead frames has a die pad. The sensor chip is flexibly adhered to the die pad by adhesive. The sensor chip has a diaphragm. The sensor chip outputs signals in accordance with flexure of the diaphragm. The lead frames are molded by a mold member. The mold member define a space about the sensor chip. The coefficient of linear expansion of the mold member is between 1.4×10−5/° C. and 1.8×10−5/° C., and the modulus of elasticity of the mold member is between 100×103 kg/cm2 and 130×103 kg/cm2. Use of the mold member minimizes the ratio of change of sensitivity due to temperature changes, which improves the temperature characteristics of the sensor.
    Type: Grant
    Filed: December 29, 1999
    Date of Patent: March 13, 2001
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Hitoshi Iwata, Masakata Kanbe
  • Patent number: 6196082
    Abstract: A hand lever device for operating a driven member includes a main lever arranged to be pivoted about a first rotational axis, a sub-lever arranged to be pivoted about a second rotational axis and retained in a stationary state at a set pivoted position, a returning member arranged to be rotated about a third rotational axis, and a cable coupled at one end to the driven member and linked at the other end with the main lever and the returning member. When the main lever is pivoted to a set position, it rotates the returning member about the third rotational axis and removes slack from the cable. Pivoting of the sub-lever further rotates the returning member about the third rotational axis to a selected operating position. An accelerating subsidiary lever that is also pivoted about the first rotational axis further pulls, via the returning member, the cable, thereby to further move the driven member.
    Type: Grant
    Filed: February 3, 2000
    Date of Patent: March 6, 2001
    Assignee: Kioritz Corporation
    Inventor: Hitoshi Iwata
  • Patent number: 6140739
    Abstract: An oscillatory gyroscope having an improved detecting sensitivity. The oscillatory gyroscope includes an elastic metal body in the form of a rectangular column having first to fourth surfaces. The elastic metal body includes a distal portion having a distal through hole extending from the second surface to the fourth surface and a proximal portion having a second through hole extending from the first surface to the third surface. Two first ferroelectric substance films are provided on the first and third surfaces in the distal portion. Two second ferroelectric substance films are provided over the second and fourth surfaces in the proximal portion. First and second electrodes are provided on each of the first ferroelectric substance films, and third and fourth electrodes are provided on the respective second ferroelectric substance films. Voltages of reverse polarities are applied to the first and second electrodes.
    Type: Grant
    Filed: May 25, 1999
    Date of Patent: October 31, 2000
    Assignees: Kabushiki Kaisha Tokai Rika Denki Seisakusho, Fumihito Arai, Toshio Fukuda
    Inventors: Fumihito Arai, Toshio Fukuda, Koichi Itoigawa, Hitoshi Iwata