Patents by Inventor Ho Cheol Kim
Ho Cheol Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9273415Abstract: A method of preparing a fiber including electro-spinning onto a substrate polymer solutions from a plurality of jets to form a network of filaments, wherein at least one jet sprays onto the substrate a first chemical mixture including a carbon fiber precursor compound, and at least one other jet sprays onto the substrate a second chemical mixture comprising a sacrificial polymer and a precursor compound of a functional material; and processing the filaments on the substrate, thereby forming an arrangement of carbon fibers having the functional material deposited thereon.Type: GrantFiled: September 7, 2012Date of Patent: March 1, 2016Assignee: International Business Machines CorporationInventors: Ho-Cheol Kim, Leslie E. Krupp, Philip M. Rice, Robert M. Shelby, Angela-Kristina Speidel
-
Patent number: 9181426Abstract: A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.Type: GrantFiled: June 12, 2013Date of Patent: November 10, 2015Assignee: GLOBALFOUNDRIES INC.Inventors: Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders, Linda Sundberg
-
Publication number: 20150255767Abstract: A device includes a membrane that is: (i) impermeable to oxygen, and (ii) insoluble in at least one polar solvent; and ion conducting particles in the membrane. At least some of the particles extend from a first side of the membrane to an opposed second side of the membrane. The thickness of the membrane is 15 ?m to 100 ?m.Type: ApplicationFiled: March 6, 2014Publication date: September 10, 2015Applicants: ASAHI KASEI KABUSHIKI KAISHA, INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Naga Phani B. Aetukuri, Mark W. Hart, Ho-Cheol Kim, Shintaro Kitajima, Leslie E. Krupp, Bryan D. McCloskey, Robert D. Miller, John Campbell Scott, Winfried Wilcke
-
Patent number: 8986824Abstract: A structure. The structure includes a substrate and a material adhered to said substrate. The material includes a structural layer and an interfacial layer. The structural layer includes at least one crosslinkable polymer and nanostructures having a predefined morphology. The nanostructures are surrounded by the at least one crosslinkable polymer in the structural layer. The interfacial layer essentially lacks nanostructures and includes essentially the at least one crosslinkable polymer.Type: GrantFiled: July 2, 2013Date of Patent: March 24, 2015Assignee: International Business Machines CorporationInventors: Jennifer N. Cha, James L. Hedrick, Ho-Cheol Kim, Robert D. Miller, Willi Volksen
-
Patent number: 8821978Abstract: A method of forming a layered structure comprising a domain pattern of a self-assembled material utilizes a negative-tone patterned photoresist layer comprising non-crosslinked developed photoresist. The developed photoresist is not soluble in an organic casting solvent for a material capable of self-assembly. The developed photoresist is soluble in an aqueous alkaline developer and/or a second organic solvent. A solution comprising the material capable of self-assembly and the organic casting solvent is casted on the patterned photoresist layer. Upon removal of the organic casting solvent, the material self-assembles, thereby forming the layered structure.Type: GrantFiled: December 18, 2009Date of Patent: September 2, 2014Assignee: International Business Machines CorporationInventors: Joy Cheng, William D. Hinsberg, Ho-Cheol Kim, Young-Hye Na, Daniel Paul Sanders, Linda Karin Sundberg, Hoa D. Truong, Gregory Michael Wallraff, Atsuko Ito
-
Patent number: 8784966Abstract: A method of forming a material. A self-assembling block copolymer that includes a first block species and a second block species respectively characterized by a volume fraction of F1 and F2 with respect to the self-assembling block copolymer is provided. At least one crosslinkable polymer that is miscible with the second block species is provided. The self-assembling block copolymer and the at least one crosslinkable polymer are combined to form a mixture. The mixture having a volume fraction, F3, of the crosslinkable polymer, a volume fraction, F1A, of the first block species, and a volume fraction, F2A, of the second block species is formed. A material having a predefined morphology where the sum of F2A and F3 were preselected is formed.Type: GrantFiled: December 5, 2007Date of Patent: July 22, 2014Assignee: International Business Machines CorporationInventors: Jennifer Nam Cha, James Lupton Hedrick, Ho-Cheol Kim, Robert Dennis Miller, Willi Volksen
-
Patent number: 8771632Abstract: A method of forming a metal oxide nanostructure comprises disposing a chelated oligomeric metal oxide precursor on a solvent-soluble template to form a first structure comprising a deformable chelated oligomeric metal oxide precursor layer; setting the deformable chelated oligomeric metal oxide precursor layer to form a second structure comprising a set metal oxide precursor layer; dissolving the solvent-soluble template with a solvent to form a third structure comprising the set metal oxide precursor layer; and thermally treating the third structure to form the metal oxide nanostructure.Type: GrantFiled: August 10, 2012Date of Patent: July 8, 2014Assignee: International Business Machines CorporationInventors: Ho-Cheol Kim, Robert D. Miller, Oun Ho Park
-
Publication number: 20140178774Abstract: A lithium-oxygen battery may include an anode, a cathode, and an electrolyte between, and in contact with, the anode and the cathode. The anode may include lithium and/or a lithium alloy. In some examples, the cathode defines a surface that is predominantly metal oxide with an electron conductivity of at least 10?1 Siemens per centimeter. In some examples, the cathode defines a surface in contact with oxygen, and includes ruthenium oxide. In some examples, the cathode defines a surface that is substantially covered by ruthenium oxide and is in contact with oxygen.Type: ApplicationFiled: December 20, 2012Publication date: June 26, 2014Applicants: Volkswagen Aktiengesellschaft, INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Ho-Cheol Kim, Bryan D. McCloskey, Rouven Scheffler, Angela-Kristina Speidel, Sally A. Swanson, Gregory M. Wallraff
-
Patent number: 8754400Abstract: A first nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running along a first direction is formed from first self-assembling block copolymers within a first layer. The first layer is filled with a filler material and a second layer is deposited above the first layer containing the first nanoscale nested line structure. A second nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running in a second direction is formed from second self-assembling block copolymers within the second layer. The composite pattern of the first nanoscale nested line structure and the second nanoscale nested line structure is transferred into an underlayer beneath the first layer to form an array of structures containing periodicity in two directions.Type: GrantFiled: March 28, 2012Date of Patent: June 17, 2014Assignee: International Business Machines CorporationInventors: Timothy J. Dalton, Bruce B. Doris, Ho-Cheol Kim, Carl J. Radens
-
Patent number: 8722174Abstract: A method of forming a block copolymer pattern comprises providing a substrate comprising a topographic pre-pattern comprising a ridge surface separated by a height, h, greater than 0 nanometers from a trench surface; disposing a block copolymer comprising two or more block components on the topographic pre-pattern to form a layer having a thickness of more than 0 nanometers over the ridge surface and the trench surface; and annealing the layer to form a block copolymer pattern having a periodicity of the topographic pre-pattern, the block copolymer pattern comprising microdomains of self-assembled block copolymer disposed on the ridge surface and the trench surface, wherein the microdomains disposed on the ridge surface have a different orientation compared to the microdomains disposed on the trench surface. Also disclosed are semiconductor devices.Type: GrantFiled: December 10, 2012Date of Patent: May 13, 2014Assignee: International Business Machines CorporationInventors: Ho-Cheol Kim, Sang-min Park, Charles T. Rettner
-
Patent number: 8703386Abstract: Compositions are disclosed having the formula (3): [C?]k[Ta(O2)x(L?)y]??(3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L?)y has a charge of 0 to ?3, C? is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L? is an oxidatively stable organic ligand having a charge of 0 to ?4, and L? comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.Type: GrantFiled: February 27, 2012Date of Patent: April 22, 2014Assignee: International Business Machines CorporationInventors: John David Bass, Ho-Cheol Kim, Robert Dennis Miller, Qing Song, Linda Karin Sundberg, Gregory Michael Wallraff
-
Publication number: 20140072700Abstract: A method of preparing a fiber including electro-spinning onto a substrate polymer solutions from a plurality of jets to form a network of filaments, wherein at least one jet sprays onto the substrate a first chemical mixture including a carbon fiber precursor compound, and at least one other jet sprays onto the substrate a second chemical mixture comprising a sacrificial polymer and a precursor compound of a functional material; and processing the filaments on the substrate, thereby forming an arrangement of carbon fibers having the functional material deposited thereon.Type: ApplicationFiled: September 7, 2012Publication date: March 13, 2014Applicants: VOLKSWAGEN GROUP OF AMERICA, INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Ho-Cheol Kim, Leslie E. Krupp, Philip M. Rice, Robert M. Shelby, Angela-Kristina Speidel
-
Patent number: 8648324Abstract: Glassy carbon nanostructures are disclosed that can be used as electrode materials in batteries and electrochemical capacitors, or as photoelectrodes in photocatalysis and photoelectrochemistry devices. In some embodiments channels (e.g., substantially cylindrically-shaped pores) are formed in a glassy carbon substrate, whereas in other embodiments, ridges are formed that extend along and over a glassy carbon substrate. In either case, a semiconductor and/or metal oxide may be deposited over the glassy carbon to form a composite material.Type: GrantFiled: March 19, 2010Date of Patent: February 11, 2014Assignee: International Business Machines CorporationInventors: Ho-Cheol Kim, Sang-Min Park
-
Patent number: 8623458Abstract: A layered structure comprising a self-assembled material is formed by a method that includes forming a photochemically, thermally and/or chemically treated patterned photoresist layer disposed on a first surface of a substrate. The treated patterned photoresist layer comprises a non-crosslinked treated photoresist. An orientation control material is cast on the treated patterned photoresist layer, forming a layer containing orientation control material bound to a second surface of the substrate. The treated photoresist and, optionally, any non-bound orientation control material are removed by a development process, resulting in a pre-pattern for self-assembly. A material capable of self-assembly is cast on the pre-pattern. The casted material is allowed to self-assemble with optional heating and/or annealing to produce the layered structure.Type: GrantFiled: December 18, 2009Date of Patent: January 7, 2014Assignee: International Business Machines CorporationInventors: Joy Cheng, Matthew E. Colburn, Stefan Harrer, William D. Hinsberg, Steven J. Holmes, Ho-Cheol Kim, Daniel Paul Sanders
-
Publication number: 20130309466Abstract: A structure. The structure includes a substrate and a material adhered to said substrate. The material includes a structural layer and an interfacial layer. The structural layer includes at least one crosslinkable polymer and nanostructures having a predefined morphology. The nanostructures are surrounded by the at least one crosslinkable polymer in the structural layer. The interfacial layer essentially lacks nanostructures and includes essentially the at least one crosslinkable polymer.Type: ApplicationFiled: July 2, 2013Publication date: November 21, 2013Applicant: International Business Machines CorporationInventors: Jennifer N. Cha, James L. Hedrick, Ho-Cheol Kim, Robert D. Miller, Willi Volksen
-
Publication number: 20130274380Abstract: A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.Type: ApplicationFiled: June 12, 2013Publication date: October 17, 2013Inventors: Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders, Linda Sundberg
-
Patent number: 8529779Abstract: A method for producing surface features and an etch masking method. A combination is provided of a block copolymer and additional material. The block copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. A film is formed of the combination directly onto a surface of a first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film of the combination and the first layer are etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. The film is removed and features remain on the surface of the first layer. Also included is an etch masking method where the nanostructures mask portions of the first layer from said etchant.Type: GrantFiled: March 28, 2008Date of Patent: September 10, 2013Assignee: International Business Machines CorporationInventors: Joy Cheng, Mark W. Hart, Hiroshi Ito, Ho-Cheol Kim, Robert Miller
-
Publication number: 20130224652Abstract: Compositions are disclosed having the formula (3): [C?]k[Ta(O2)x(L?)y]??(3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L?)y has a charge of 0 to ?3, C? is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L? is an oxidatively stable organic ligand having a charge of 0 to ?4, and L? comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.Type: ApplicationFiled: February 27, 2012Publication date: August 29, 2013Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: John David Bass, Ho-Cheol Kim, Robert Dennis Miller, Qing Song, Linda Karin Sundberg, Gregory Michael Wallraff
-
Patent number: 8491965Abstract: A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.Type: GrantFiled: April 1, 2008Date of Patent: July 23, 2013Assignee: International Business Machines CorporationInventors: Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders, Linda Sundberg
-
Patent number: 8491768Abstract: Nanoparticles in a colloid are purified, with the colloid including a fluid, unwanted matter, and the nanoparticles to be purified. An electric field is applied that is substantially spatially uniform over a distance that is at least equal to a characteristic dimension of the nanoparticles, so that at least some of the nanoparticles move towards at least one collection surface as a result of the force arising between their electrical charge and the electric field, whereupon nanoparticles are collected on said at least one collection surface. The collection surface(s) may be one or more electrodes to which a voltage potential is applied. The collected nanoparticles are then removed from the collection surface, e.g., by dispersing them into another fluid.Type: GrantFiled: June 23, 2010Date of Patent: July 23, 2013Assignee: International Business Machines CorporationInventors: Xin Ai, John David Bass, Ho-Cheol Kim, Robert Dennis Miller, John Campbell Scott, Qing Song