Patents by Inventor Ho Cheol Kim
Ho Cheol Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7999160Abstract: A method. A first copolymer is provided. A substrate is provided having an energetically neutral surface layer with at least one trough integrally disposed thereon with sidewalls. A first film of the first copolymer is coated inside the trough. Line-forming microdomains are assembled of the first copolymer forming first self-assembled structures within the first film normal to the sidewalls and parallel to the surface layer. The first and second polymer blocks are removed from the first film and oriented structures remain in the trough normal to the sidewalls and parallel to the surface layer. A second film of a second copolymer is coated inside the trough. Line-forming microdomains are assembled of the second copolymer, and form second self-assembled structures within the second film oriented normal to the oriented structures and parallel to the sidewalls. The third and fourth polymer blocks are removed, and at least one second oriented structure remains.Type: GrantFiled: March 23, 2007Date of Patent: August 16, 2011Assignee: International Business Machines CorporationInventors: Joy Cheng, Ho-Cheol Kim, Robert D. Miller
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Patent number: 7989026Abstract: Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.Type: GrantFiled: January 12, 2008Date of Patent: August 2, 2011Assignee: International Business Machines CorporationInventors: Joy Cheng, Ho-Cheol Kim, Charles T. Rettner, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda Sundberg
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Publication number: 20110147983Abstract: A method of forming a layered structure comprising a domain pattern of a self-assembled material comprises: disposing on a substrate a photoresist layer comprising a non-crosslinking photoresist; optionally baking the photoresist layer; pattern-wise exposing the photoresist layer to first radiation; optionally baking the exposed photoresist layer; and developing the exposed photoresist layer with a non-alkaline developer to form a negative-tone patterned photoresist layer comprising non-crosslinked developed photoresist; wherein the developed photoresist is not soluble in a given organic solvent suitable for casting a given material capable of self-assembly, and the developed photoresist is soluble in an aqueous alkaline developer and/or a second organic solvent. A solution comprising the given material capable of self-assembly dissolved in the given organic solvent is casted on the patterned photoresist layer, and the given organic solvent is removed.Type: ApplicationFiled: December 18, 2009Publication date: June 23, 2011Inventors: Joy CHENG, William D. HINSBERG, Hiroshi ITO, Atsuko Ito, Ho-Cheol KIM, Young-Hye NA, Daniel P. SANDERS, Linda Karin SUNDBERG, Hoa D. TRUONG, Gregory Michael WALLRAFF
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Publication number: 20110147984Abstract: A method of forming a layered structure comprising a self-assembled material comprises: disposing a non-crosslinking photoresist layer on a substrate; pattern-wise exposing the photoresist layer to first radiation; optionally heating the exposed photoresist layer; developing the exposed photoresist layer in a first development process with an aqueous alkaline developer, forming an initial patterned photoresist layer; treating the initial patterned photoresist layer photochemically, thermally and/or chemically, thereby forming a treated patterned photoresist layer comprising non-crosslinked treated photoresist disposed on a first substrate surface; casting a solution of an orientation control material in a first solvent on the treated patterned photoresist layer, and removing the first solvent, forming an orientation control layer; heating the orientation control layer to effectively bind a portion of the orientation control material to a second substrate surface; removing at least a portion of the treated phoType: ApplicationFiled: December 18, 2009Publication date: June 23, 2011Inventors: Joy CHENG, Matthew E. COLBURN, Stefan HARRER, William D. HINSBERG, Steven J. HOLMES, Ho-Cheol KIM, Daniel Paul SANDERS
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Patent number: 7960442Abstract: Substantially or roughly spherical micellar structures useful in the formation of nanoporous materials by templating are disclosed. A roughly spherical micellar structure is formed by organization of one or more spatially unsymmetric organic amphiphilic molecules. Each of those molecules comprises a branched moiety and a second moiety. The branched moiety can form part of either the core or the surface of the spherical micellar structure, depending on the polarity of the environment. The roughly spherical micellar structures form in a thermosetting polymer matrix. They are employed in a templating process whereby the amphiphilic molecules are dispersed in the polymer matrix, the matrix is cured, and the porogens are then removed, leaving nanoscale pores.Type: GrantFiled: April 20, 2005Date of Patent: June 14, 2011Assignee: International Business Machines CorporationInventors: Jennifer Nam Cha, Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Willi Volksen
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Publication number: 20110111339Abstract: Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.Type: ApplicationFiled: November 6, 2009Publication date: May 12, 2011Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Joy Cheng, Ho-Cheol Kim, Hiroshi Ito, Atsuko Ito, Hoa D. Truong
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Patent number: 7931829Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.Type: GrantFiled: August 17, 2010Date of Patent: April 26, 2011Assignee: International Business Machines CorporationInventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
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Publication number: 20110059299Abstract: A method of forming a block copolymer pattern comprises providing a substrate comprising a topographic pre-pattern comprising a ridge surface separated by a height, h, greater than 0 nanometers from a trench surface; disposing a block copolymer comprising two or more block components on the topographic pre-pattern to form a layer having a thickness of more than 0 nanometers over the ridge surface and the trench surface; and annealing the layer to form a block copolymer pattern having a periodicity of the topographic pre-pattern, the block copolymer pattern comprising microdomains of self-assembled block copolymer disposed on the ridge surface and the trench surface, wherein the microdomains disposed on the ridge surface have a different orientation compared to the microdomains disposed on the trench surface.Type: ApplicationFiled: September 4, 2009Publication date: March 10, 2011Applicant: International Business Machines CorporationInventors: Ho-Cheol Kim, Sang-min Park, Charles T. Rettner
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Publication number: 20110037175Abstract: An interconnection between a sublithographic-pitched structure and a lithographic pitched structure is formed. A plurality of conductive lines having a sublithographic pitch may be lithographically patterned and cut along a line at an angle less than 45 degrees from the lengthwise direction of the plurality of conductive lines. Alternately, a copolymer mixed with homopolymer may be placed into a recessed area and self-aligned to form a plurality of conductive lines having a sublithographic pitch in the constant width region and a lithographic dimension between adjacent lines at a trapezoidal region. Yet alternately, a first plurality of conductive lines with the sublithographic pitch and a second plurality of conductive lines with the lithographic pitch may be formed at the same level or at different.Type: ApplicationFiled: August 13, 2009Publication date: February 17, 2011Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Sarunya Bangsaruntip, Daniel C. Edelstein, William D. Hinsberg, Ho-Cheol Kim, Steven Koester, Paul M. Solomon
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Publication number: 20110002841Abstract: A method of forming a metal oxide nanostructure comprises disposing a chelated oligomeric metal oxide precursor on a solvent-soluble template to form a first structure comprising a deformable chelated oligomeric metal oxide precursor layer; setting the deformable chelated oligomeric metal oxide precursor layer to form a second structure comprising a set metal oxide precursor layer; dissolving the solvent-soluble template with a solvent to form a third structure comprising the set metal oxide precursor layer; and thermally treating the third structure to form the metal oxide nanostructure.Type: ApplicationFiled: July 2, 2009Publication date: January 6, 2011Applicant: International Business Machines CorporationInventors: HO-CHEOL KIM, ROBERT D. MILLER, OUN HO PARK
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Publication number: 20100311895Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.Type: ApplicationFiled: August 17, 2010Publication date: December 9, 2010Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
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Patent number: 7846502Abstract: A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.Type: GrantFiled: June 11, 2009Date of Patent: December 7, 2010Assignee: International Business Machines CorporationInventors: Ho-Cheol Kim, Charles T Rettner, Sang-Min Park
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Patent number: 7828986Abstract: A method. A combination is provided of a block copolymer and additional material. The copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. The first polymer includes polystyrene and the second polymer includes poly(ethylene oxide). A first layer including polydimethylglutarimide is adhered onto a surface of a substrate including a dielectric coated silicon wafer. A film is formed of the combination directly onto a surface of the first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film and the first layer are simultaneously etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. Portions of the film are removed. Features remain on the surface of the first layer.Type: GrantFiled: October 29, 2007Date of Patent: November 9, 2010Assignee: International Business Machines CorporationInventors: Joy Cheng, Mark W. Hart, Hiroshi Ito, Ho-Cheol Kim, Robert Miller
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Patent number: 7820242Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.Type: GrantFiled: March 24, 2008Date of Patent: October 26, 2010Assignee: International Business Machines CorporationInventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
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Patent number: 7763319Abstract: A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.Type: GrantFiled: January 11, 2008Date of Patent: July 27, 2010Assignee: International Business Machines CorporationInventors: Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders, Linda Sundberg
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Patent number: 7740933Abstract: Nanoporous structures are constructed that have hydrophilic regions separated by hydrophobic regions. The porous, hydrophilic regions have reaction sites suitable for use in a bioassay application and have a higher density of reaction sites than that of a non-porous (2-D) surface. The structure may be made by depositing a layer of a matrix material (e.g., an organosilicate) and a porogen, and then crosslinking the matrix material to form a nanohybrid composite structure. The porogen is decomposed to form pores within the matrix material, and a reactive gas phase species (e.g., ozone) is patternwise directed onto a surface of the matrix material. Ultraviolet light (directed through a mask) activates the gas phase species to form a reactive species that then reacts with the matrix material to make it hydrophilic. The porogen may be decomposed thermally or by exposing it to an oxidizing atmosphere in the presence of ultraviolet light.Type: GrantFiled: June 8, 2007Date of Patent: June 22, 2010Assignee: International Business Machines CorporationInventors: Ho-Cheol Kim, Robert Dennis Miller
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Patent number: 7731994Abstract: The present invention relates to a pharmaceutical composition for protecting neurons or for preventing and treating ischemic neuronal diseases comprising the extract of Lithospermum erythrorhizon Sieb. Et Zucc extracted with water, low-alcohols or their mixture or acetylshikonin separated therefrom as an effective ingredient. The extract of Lithospermum erythrorhizon Sieb. Et. Zucc or acetylshikonin separated therefrom of the present invention has neuronal protective effect, so that it not only interrupts the development of ischemic neuronal diseases but also is very safe, indicating that the extract or acetylshikonin can be used as a medicinal drug for prevention and treatment of degenerative brain disease caused by neuronal apoptosis such as stroke, apoplexy, dementia, Alzheimer's disease, Parkinson's disease, Huntington's disease, Pick's disease and Creutzfeldt-Jakob disease and further can be developed as functional health food.Type: GrantFiled: June 13, 2007Date of Patent: June 8, 2010Assignee: Industry Academic Cooperation Foundation of Kyunghee UniversityInventors: Ho Cheol Kim, Ha Young Lee, Ni Na Ha, Min Jung Kong, Seung Ju Roh, Nak Sul Seong, Geum Soog Kim, Yun Tai Kim, Youngmin Bu
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Publication number: 20100120252Abstract: A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.Type: ApplicationFiled: June 11, 2009Publication date: May 13, 2010Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Ho-Cheol Kim, Charles T. Rettner, Sang-Min Park
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Publication number: 20100055307Abstract: A nanoporous material exhibiting a lamellar structure is disclosed. The material comprises three or more substantially parallel sheets of an organosilicate material, separated by highly porous spacer regions. The distance between the centers of the sheets lies between 1 nm and 50 nm. The highly porous spacer regions may be substantially free of condensed material. For the manufacture of such materials, a process is disclosed in which matrix non-amphiphilic polymeric material and templating polymeric material are dispersed in a solvent, where the templating polymeric material includes a polymeric amphiphilic material. The solvent with the polymeric materials is distributed onto a substrate. Organization is induced in the templating polymeric material. The solvent is removed, leaving the polymeric materials in place. The matrix polymeric material is cured, forming a lamellar structure.Type: ApplicationFiled: December 18, 2008Publication date: March 4, 2010Applicant: International Business Machines CorporationInventors: Jennifer Nam Cha, Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Willi Volksen
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Patent number: 7651872Abstract: A biomolecular array includes a substrate across which is distributed an array of discrete regions of a porous substance formed from a porogen-containing organosilicate material. The porous substance is designed to bind chemical targets useful in biotechnology applications, such as gene expression, protein, antibody, and antigen experiments. The regions are preferably optically isolated from each other and may be shaped to enhance detection of optical radiation emanating from the porous substance, e.g., as a result of irradiation of the regions with ultraviolet light. The discrete regions may be configured as microscopic wells within the substrate, or they may reside on top of the substrate in the form of microscopic mesas.Type: GrantFiled: February 8, 2008Date of Patent: January 26, 2010Assignee: International Business Machines CorporationInventors: Mark Whitney Hart, Ho-Cheol Kim, Robert Dennis Miller, Gregory Michael Wallraff