Abstract: The invention relates to organometallic compounds which are stabilized intramolecularly and have a cyclic or bicyclic structure and to the use thereof for the preparation of thin films and epitaxial layers by gas phase deposition.

Abstract: A reactor for MOCVD systems, having a reaction vessel through which the reacting gas or gases flow and in which the substrates are arranged in such a manner that a main surface is approximately parallel to the flow direction. The reaction vessel is made of quartz-glass and has, at least in the region in which the reacting gas flows, a rectangular cross-section. A flange element is provided at the gas-entrance-side end of the reaction vessel, while a protective tube surrounds the reaction vessel. The protective tube is provided with a face-end reactant gas inlet connected with a flange element to which the flange element of the reaction vessel can be flanged. The protective tube has a protective gas inlet in its superficies, which permits purging the space between the reaction vessel and the protective tube, and a reactant gas outlet. The reactant gases are deflected in the reaction vessel and exit through the superficies of the reaction vessel.

Abstract: An extraction valve head for a tank for high-purity and/or toxic liquid chemicals has an inlet valve for a filler gas, an outlet valve and a purging valve, which closes a bypass between a gas inlet line and an extraction line. The valves are configured as metal diaphragm valves and are fitted in a common metallic valve housing block. All valve seals of the valves are arranged in close spatial proximity to one another in the valve housing block.

Abstract: In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.