Patents by Inventor Hong-An Shih

Hong-An Shih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7833401
    Abstract: A method of forming a component capable of being exposed to a plasma in a process chamber comprises forming a structure comprising a surface and electroplating yttrium, and optionally aluminum or zirconium, onto the surface. Thereafter, the electroplated layer can be annealed to oxide the yttrium and other electroplated species.
    Type: Grant
    Filed: June 21, 2007
    Date of Patent: November 16, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Nianci Han, Li Xu, Hong Shih, Yang Zhang, Danny Lu, Jennifer Y. Sun
  • Patent number: 7811409
    Abstract: Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.
    Type: Grant
    Filed: November 29, 2007
    Date of Patent: October 12, 2010
    Assignee: Lam Research Corporation
    Inventors: Fred D. Egley, Michael S. Kang, Anthony L. Chen, Jack Kuo, Hong Shih, Duane Outka, Bruno Morel
  • Publication number: 20100154838
    Abstract: A housing device includes a housing, a fan, and a dust removing unit. The housing defines an air passage. The fan is provided in the housing, and is located at a distal end of the air passage for exhausting air from the housing. The dust removing unit includes an airflow interfering member and an adhering member. The airflow interfering member is provided within the housing, and is located upstream of the fan for interfering with flow of air toward the fan. The adhering member is provided downstream of the airflow interfering member and upstream of the fan for adhering dust entrained in the air flowing toward the fan. The dust falling down onto the adhering member when the airflow is interfered by the airflow interfering member.
    Type: Application
    Filed: October 27, 2009
    Publication date: June 24, 2010
    Inventors: Zhi-Hong Shih, Ming-Chih Chen
  • Publication number: 20100144246
    Abstract: A process is provided for polishing a silicon electrode utilizing a polishing turntable and a dual function electrode platen. The dual function electrode platen is secured to the polishing turntable and comprises a plurality of electrode mounts arranged to project from an electrode engaging face of the dual function electrode platen. The electrode mounts complement respective positions of mount receptacles formed in a platen engaging face of the silicon electrode to be polished. The electrode mounts and the mount receptacles are configured to permit non-destructive engagement and disengagement of the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode. The dual function electrode platen further comprises platen adapter abutments positioned radially inward of the electrode mounts. The platen adapter abutments are configured to bring a platen adapter into approximate alignment with the rotary polishing axis.
    Type: Application
    Filed: December 10, 2009
    Publication date: June 10, 2010
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Armen Avoyan, Duane Outka, Catherine Zhou, Hong Shih
  • Publication number: 20100139692
    Abstract: A process for cleaning a silicon electrode is provided where the silicon electrode is soaked in an agitated aqueous detergent solution and rinsed with water following removal from the aqueous detergent solution. The rinsed silicon electrode is then soaked in an agitated isopropyl alcohol (IPA) solution and rinsed. The silicon electrode is then subjected to an ultrasonic cleaning operation in water following removal from the IPA solution. Contaminants are then removed from the silicon electrode by soaking the silicon electrode in an agitated mixed acid solution comprising hydrofluoric acid, nitric acid, acetic acid, and water. The silicon electrode is subjected to an additional ultrasonic cleaning operation following removal from the mixed acid solution and is subsequently rinsed and dried. In other embodiments of the present disclosure, it is contemplated that the silicon electrode can be soaked in either the agitated aqueous detergent solution, the agitated isopropyl alcohol (IPA) solution, or both.
    Type: Application
    Filed: December 10, 2009
    Publication date: June 10, 2010
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Armen Avoyan, Duane Outka, Catherine Zhou, Hong Shih
  • Patent number: 7703926
    Abstract: A briefing system is used to project images onto a projection screen to form a projection picture. The briefing system comprises a pointer, a projector and a computer electrically connected to the projector. The computer outputs an image signal to the projector. The projector projects an image corresponding to the image signal onto the projection screen to form the projection picture. The indicator is used to project an indication point. The projector also captures the image of the projection picture and the indication point and transfers the image to the computer. The computer then calculates a location where the cursor on the computer screen should reach according to the location of the indication point on the projection picture and moves the cursor on the screen to there.
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: April 27, 2010
    Assignee: Everest Display Inc.
    Inventors: Hei-Tai Hong, Yueh-Hong Shih
  • Publication number: 20100090711
    Abstract: The present invention provides a reliable, non-invasive, electrical test method for predicting satisfactory performance of electrostatic chucks (ESCs). In accordance with an aspect of the present invention, a parameter, e.g., impedance, of an ESC is measured over a frequency band to generate a parameter functions. This parameter function may be used to establish predetermined acceptable limits of the parameter within the frequency band.
    Type: Application
    Filed: October 10, 2008
    Publication date: April 15, 2010
    Inventors: Hong Shih, Saurabh Ullal, Tuochuan Huang, Yan Fang, Jon McChesney
  • Publication number: 20100088872
    Abstract: A bipolar electrostatic chuck refurbishing process in accordance with an aspect of the present invention does not require physical separation of the two electrodes of the electrostatic chuck. One aspect of the present invention is drawn to method of treating a bipolar electrostatic chuck having a front surface and a back surface and comprising a first electrode disposed at the front surface, a second electrode at the front surface and an anodized layer disposed on the front surface, the first electrode and the second electrode.
    Type: Application
    Filed: October 10, 2008
    Publication date: April 15, 2010
    Inventor: Hong Shih
  • Publication number: 20100045316
    Abstract: A method of inspecting an electrostatic chuck (ESC) is provided. The ESC has a dielectric support surface for a semiconductor wafer. The dielectric support surface is scanned with a Kelvin probe to obtain a surface potential map. The surface potential map is compared with a reference Kelvin probe surface potential map to determine if the ESC passes inspection.
    Type: Application
    Filed: February 25, 2009
    Publication date: February 25, 2010
    Applicant: Lam Research Corporation
    Inventors: ARMEN AVOYAN, Hong Shih, John Daugherty
  • Publication number: 20090322199
    Abstract: A carrier assembly is provided comprising a backside mounted electrode carrier and electrode mounting hardware. The backside mounted electrode carrier comprises an electrode accommodating aperture, which in turn comprises a sidewall structure that is configured to limit lateral movement of an electrode positioned in the aperture. The electrode accommodating aperture further comprises one or more sidewall projections that support the weight of an electrode positioned in the aperture. The electrode mounting hardware is configured to engage an electrode positioned in the electrode accommodating aperture from the backside of the carrier and urge the electrode against the sidewall projections so as to limit axial movement of the electrode in the electrode accommodating aperture. Additional embodiments of broader and narrower scope are contemplated.
    Type: Application
    Filed: June 30, 2008
    Publication date: December 31, 2009
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Jason Augustino, Armen Avoyan, Yan Fang, Duane Outka, Hong Shih, Stephen Whitten
  • Publication number: 20090321018
    Abstract: In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of reciprocating electrode supports. The multi-component electrode is positioned in the electrode accommodating aperture of the carrier frame. The backing plate of the electrode comprises a plurality of mounting recesses formed about its periphery. The reciprocating electrode supports can be reciprocated into and out of the mounting recesses. Additional embodiments of broader and narrower scope are contemplated.
    Type: Application
    Filed: June 30, 2008
    Publication date: December 31, 2009
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Jason Augustino, Armen Avoyan, Yan Fang, Duane Outka, Hong Shih, Stephen Whitten
  • Publication number: 20090325320
    Abstract: A process for reconditioning a multi-component electrode comprising a silicon electrode bonded to an electrically conductive backing plate is provided. The process comprises: (i) removing metal ions from the multi-component electrode by soaking the multi-component electrode in a substantially alcohol-free DSP solution comprising sulfuric acid, hydrogen peroxide, and water and rinsing the multi-component electrode with de-ionized water; (ii) polishing one or more surfaces of the multi-component electrode following removal of metal ions there from; and (iii) removing contaminants from silicon surfaces of the multi-component electrode by treating the polished multi-component electrode with a mixed acid solution comprising hydrofluoric acid, nitric acid, acetic acid, and water and by rinsing the treated multi-component electrode with de-ionized water. Additional embodiments of broader and narrower scope are contemplated.
    Type: Application
    Filed: June 30, 2008
    Publication date: December 31, 2009
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Armen Avoyan, Yan Fang, Duane Outka, Hong Shih, Stephen Whitten
  • Patent number: 7638004
    Abstract: A method of cleaning a microwave plasma applicator tube as described herein includes preparing a microwave plasma applicator for cleaning. A general cleaning of the plasma applicator tube is performed using an organic solvent wash and an ultrapure water wash. Selective cleanings of the tube are performed to remove selected contaminants. Such cleanings include a third wash with an alkaline cleaning solution, a fourth wash with an acidic cleaning solution and another wash using an ammonia and peroxide solution. The tube is rinsed using a sonicating wash performed in ultrapure water followed by drying. Also, the coil can be cleaned using acidic wash solution.
    Type: Grant
    Filed: May 31, 2006
    Date of Patent: December 29, 2009
    Assignee: Lam Research Corporation
    Inventors: Hong Shih, Harmeet Singh, Raphael Casaes, Duane Outka, Mohammad Kamarehi
  • Publication number: 20090311079
    Abstract: An electrode transporter is provided comprising a transporter frame, a plurality of transitional support elements, and a plurality of flipside support elements. The flipside support elements are configured to immobilize an electrode along a gravitational force vector normal to a major face of an electrode positioned in an electrode accommodating space defined by the transitional support elements and the flipside support elements. The transitional support elements are configured to transition back and forth from a secured state, where the electrode is further immobilized along an opposing force vector opposite the gravitational force vector, to an unsecured state where the electrode is relatively mobile along the opposing force vector. Additional embodiments relate to the use of a transporter tripod and an electrode removal puck and lifting fork to remove an electrode from the transporter frame.
    Type: Application
    Filed: June 11, 2008
    Publication date: December 17, 2009
    Applicant: Lam Research Corporation
    Inventors: Armen Avoyan, Hong Shih, Duane Outka
  • Publication number: 20090261065
    Abstract: Components entirely of ceramic with etched surfaces wherein the etched surface has a surface roughness value or at least about 100 microinches (about 2.54 microns) Ra, and methods of forming such.
    Type: Application
    Filed: April 17, 2009
    Publication date: October 22, 2009
    Applicant: Lam Research Corporation
    Inventors: HARMEET SINGH, John Daugherty, Vahid Vahedi, Hong Shih
  • Patent number: 7578889
    Abstract: Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications and manufacturing yields are enhanced. Pre-cleaning of tools used in the cleaning process helps prevent contamination of the electrode being cleaned.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: August 25, 2009
    Assignee: Lam Research Corporation
    Inventors: Hong Shih, Yaobo Yin, Shun Jackson Wu, Armen Avoyan, John E. Daugherty, Linda Jiang
  • Patent number: 7548909
    Abstract: A computer system that facilitates presentation of data to a user. A search engine component receives and executes queries on behalf of a user. Results of the query are received and analyzed by an analysis component that filters and organizes the results as a function of relevancy of the data to the user and associated context of the query. A user interface component presents the data to the user in a manner that facilitates easy consumption/processing of data by respective users. The user interface component can dynamically modify display settings as a function of content and type of information displayed, user state, user preferences, explicit or implicit learning, user intent, etc.
    Type: Grant
    Filed: June 13, 2007
    Date of Patent: June 16, 2009
    Assignee: Microsoft Corporation
    Inventors: Alain Thierry Rappaport, Daniel Ryan Adamson, Leo Li-Hong Shih, Timothy Byung Choe
  • Publication number: 20090128783
    Abstract: The present invention discloses an ocular-protection projector device, wherein the projector is additionally equipped with an image-capture unit. When the projector projects information onto a screen, the image-capture unit captures the human-shape image of a user. An image-processing unit, which is arranged inside the projector or an external electronic device, receives the human-shape image, creates a human-shape black mask, and outputs the human-shape black mask via the projector onto an area of the screen corresponding to the user's position. Thereby, the present invention can effectively protect the user's eyes from the harm of intense light.
    Type: Application
    Filed: November 15, 2007
    Publication date: May 21, 2009
    Inventors: Yueh-Hong Shih, Hei-Tai Hong, Chun-Yuan Cheng
  • Patent number: 7507670
    Abstract: Methods for cleaning silicon surfaces of electrode assemblies by efficiently removing contaminants from the silicon surfaces without discoloring the silicon surfaces using an acidic solution comprising hydrofluoric acid, nitric acid, acetic acid, and balance deionized water.
    Type: Grant
    Filed: December 23, 2004
    Date of Patent: March 24, 2009
    Assignee: Lam Research Corporation
    Inventors: Hong Shih, Tuochuan Huang, Chunhong Zhou
  • Patent number: 7498269
    Abstract: Silicon electrode assembly decontamination cleaning methods and solutions, which control or eliminate possible chemical attacks of electrode assembly bonding materials, comprise ammonium fluoride, hydrogen peroxide, acetic acid, optionally ammonium acetate, and deionized water.
    Type: Grant
    Filed: June 21, 2007
    Date of Patent: March 3, 2009
    Assignee: Lam Research Corporation
    Inventors: Daxing Ren, Hong Shih