Abstract: A method for manufacturing a thin film transistor, and a thin film transistor are provided. The method includes: forming an active layer on a substrate by a single patterning process; forming a gate insulating layer by deposition on a side of the active layer away from the substrate; forming a first via hole and a second via hole penetrating through the gate insulating layer by a single patterning process, the first and second via holes being located at two ends of the active layer respectively; and forming a first electrode, a gate electrode, and a second electrode on the gate insulating layer by a single patterning process, the first and second electrodes being connected to the active layer through the first and second via holes, respectively, and an orthographic projection of the gate electrode on the substrate at least partially overlapping that of the active layer on the substrate.

Abstract: A display panel includes: a substrate, a pixel-defining layer disposed on the substrate, and a conductive pattern, a light-emitting layer and a cathode layer which are laminated in a direction perpendicular to and away from the substrate. The pixel-defining layer is configured to define a plurality of pixel regions and a non-pixel region outside the pixel regions on the substrate. The conductive pattern includes: an auxiliary electrode layer disposed in the non-pixel region, wherein a groove is formed in a side wall of the auxiliary electrode layer. The cathode layer includes: a first portion disposed in the pixel region and a second portion disposed in the non-pixel region. The second portion of the cathode layer extends into the groove and is in contact with the groove.

Abstract: The present disclosure provides a substrate comprising a printing area, wherein the printing area comprises a flat surface and a plurality of separation structures projecting from the flat surface, wherein the plurality of separation structures divide the printing area into a plurality of micro-areas, and in each of the micro-areas, a circular region containing no separation structure has a maximum diameter between 5 ?m and 10 ?m. The present disclosure further provides a light emitting device comprising the substrate and a method for manufacturing the substrate.

Abstract: A display cover plate, a manufacturing method therefor and a display device are provided, The display cover plate includes: a substrate; and an electrochromic unit on the substrate, the electrochromic unit includes: a first electrode on the substrate; an electrochromic layer on a side of the first electrode away from the substrate; and a second electrode on a side of the electrochromic layer away from the substrate, wherein the first electrode and the second electrode are configured to generate an electric field, and the electrochromic layer allows light of different colors to pass through based on a change of the electric field.

Abstract: A method of manufacturing a display substrate, a display substrate and a display panel are provided. The method of manufacturing a display substrate includes: infiltrating an etching point of a film group with an etching solution, to form an infiltration groove at the etching point of a film group; and patterning a remaining part of the film group at the infiltration groove, to obtain a via hole penetrating the remaining part of the film group.

Abstract: The present disclosure is related to an array substrate. The array substrate may include a base substrate and a pixel defining layer on the base substrate. The pixel defining layer may include a plurality of thickness thinning regions. The thickness thinning regions may have a smaller height than other areas of the pixel define layer on the base substrate. The plurality of the thickness thinning regions may be configured to guide flow of fillers to form an encapsulating layer on the pixel defining layer.

Abstract: A substantially transparent display substrate is provided. The substantially transparent display substrate includes a base substrate; multiple insulating layers on the base substrate and in a display area of the substantially transparent display substrate; and a plurality of grooves in at least a first insulating layer of the multiple insulating layers, wherein at least one of the plurality of grooves at least partially extending into the first insulating layer. The display area includes a plurality of subpixel regions spaced apart from each other by an inter-subpixel region. A respective one of the plurality of subpixel regions includes a light emitting sub-region and a substantially transparent sub-region. At least a portion of a respective one of the plurality of grooves is about an edge of the substantially transparent sub-region of the respective one of the plurality of subpixel regions.

Abstract: An array substrate, a display panel including the array substrate, and a fabrication method of the array substrate are provided. The array substrate includes a base substrate, a light-shielding portion, a thin-film transistor and a capacitor. The light-shielding portion is formed on a first surface of the base substrate. The thin-film transistor is formed on a side of the light-shielding portion away from the base substrate, and includes an active layer. The capacitor is formed on the first surface of the base substrate, and includes a first capacitive electrode and a second capacitive electrode. The first capacitive electrode and the second capacitive electrode are at least partially arranged opposite to each other in a direction perpendicular to the first surface of the base substrate. The first capacitive electrode is provided in a same layer as the light-shielding portion.

Abstract: An array substrate may include a base substrate and a pixel defining layer on the base substrate. The pixel defining layer may include a plurality of thickness thinning regions. The thickness thinning regions may have a smaller height than other areas of the pixel defining layer on the base substrate. The plurality of the thickness thinning regions may be configured to guide flow of fillers to form an encapsulating layer on the pixel defining layer.

Abstract: A thin-film transistor (TFT) array substrate, a preparation method thereof, and a display device are provided. The TFT array substrate includes a source, a drain, and a first gate; wherein a protrusive structure is defined between the source and the drain, and the first gate is disposed inside the protrusive structure; and in a plane where a surface of the first gate is disposed, a sum of an overlapped area of a projection of the source and a projection of the first gate and an overlapped area of a projection of the drain and the projection of the first gate is less than an area threshold.

Abstract: A display panel includes: a substrate, a pixel-defining layer disposed on the substrate, and a conductive pattern, a light-emitting layer and a cathode layer which are laminated in a direction perpendicular to and away from the substrate. The pixel-defining layer is configured to define a plurality of pixel regions and a non-pixel region outside the pixel regions on the substrate. The conductive pattern includes: an auxiliary electrode layer disposed in the non-pixel region, wherein a groove is formed in a side wall of the auxiliary electrode layer. The cathode layer includes: a first portion disposed in the pixel region and a second portion disposed in the non-pixel region. The second portion of the cathode layer extends into the groove and is in contact with the groove.

Abstract: Provided are a display panel (10) and the driving method thereof. The display panel (10) may include a first substrate (110) and a second substrate (120) opposite the first substrate (110). The first substrate (110) may include a pixel unit (100), and the pixel unit (100) may include a light emitting element (101) and a first transistor (112) for driving the light emitting element (101) to emit light. The second substrate (120) may include a second transistor (122). The second transistor (122) may be configured to have a second drift value of a second threshold voltage which has a specific relationship with a first drift value of a first threshold voltage of the first transistor (112) under same ambient condition.

Abstract: The present disclosure provides a substrate, a manufacturing method thereof, and a transparent display device. The substrate comprising: a plurality of pixel units, at least a part of which includes a light-emitting area and a transparent area, and the light-emitting area includes a thin-film transistor; a light blocking member disposed in the light-emitting area and configured to block light that is directed to the thin-film transistor through the transparent area.

Abstract: A display substrate panel includes a substrate and multiple OLED elements disposed on the substrate, and further includes a thin film encapsulation layer disposed on the OLED elements and a light blocking layer disposed on the thin film encapsulation layer and located between two adjacent OLED elements. A display panel includes the above display substrate panel and a cover panel which is aligned and combined into a cell with the display substrate panel, wherein the cover panel includes a color film layer, and the color film layer has a red color film, a green color film and a blue color film which are disposed to correspond to the OLED elements.

Abstract: Provided are a display panel (10) and the driving method thereof. The display panel (10) may include a first substrate (110) and a second substrate (120) opposite the first substrate (110). The first substrate (110) may include a pixel unit (100), and the pixel unit (100) may include a light emitting element (101) and a first transistor (112) for driving the light emitting element (101) to emit light. The second substrate (120) may include a second transistor (122). The second transistor (122) may be configured to have a second drift value of a second threshold voltage which has a specific relationship with a first drift value of a first threshold voltage of the first transistor (112) under same ambient condition.

Abstract: The present disclosure provides a substrate comprising a printing area, wherein the printing area comprises a flat surface and a plurality of separation structures projecting from the flat surface, wherein the plurality of separation structures divide the printing area into a plurality of micro-areas, and in each of the micro-areas, a circular region containing no separation structure has a maximum diameter between 5 ?m and 10 ?m. The present disclosure further provides a light emitting device comprising the substrate and a method for manufacturing the substrate.

Abstract: The present application provides a thin film transistor, a method of fabricating a thin film transistor and an array substrate. The thin film transistor includes: a gate electrode on a substrate and having first and second side surfaces facing each other; and an active layer between the first side surface and the second side surface of the gate electrode and having a third side surface and a fourth side surface. The third side surface of the active layer and the first side surface of the gate electrode face and are spaced apart from each other, the fourth side surface of the active layer and the second side surface of the gate electrode face and are spaced apart from each other, and at least one portion of the gate electrode is in the same range as at least one portion of the active layer in a height direction.

Abstract: A thin film transistor is provided and includes an active layer, a source electrode, a drain electrode, a gate electrode and a gate electrode insulating layer, the active layer includes a source electrode region, a drain electrode region and a channel region, the source electrode region and the drain electrode region include a first metal material, and the channel region includes a semiconductor material made from oxidation of the first metal material.

Abstract: A substantially transparent display substrate is provided. The substantially transparent display substrate includes a base substrate; multiple insulating layers on the base substrate and in a display area of the substantially transparent display substrate; and a plurality of grooves in at least a first insulating layer of the multiple insulating layers, wherein at least one of the plurality of grooves at least partially extending into the first insulating layer. The display area includes a plurality of subpixel regions spaced apart from each other by an inter-subpixel region. A respective one of the plurality of subpixel regions includes a light emitting sub-region and a substantially transparent sub-region. At least a portion of a respective one of the plurality of grooves is about an edge of the substantially transparent sub-region of the respective one of the plurality of subpixel regions.

Abstract: It is related to an array substrate (1). The array substrate (1) may include a base substrate (10) and a pixel define layer (30) on the base substrate (1). The pixel define layer (30) may include a plurality of thickness thinning regions (312). The thickness thinning regions (312) may have a smaller height than other areas of the pixel define layer (30) on the base substrate (1). The plurality of the thickness thinning regions (312) may be configured to guide flow of fillers to form an encapsulating layer (40) on the pixel define layer (30).