Abstract: The application provides a thin film transistor, a method for manufacturing the thin film transistor, and a display panel, the thin film transistor includes a metal electrode, and a step of forming the metal electrode includes: forming a first material layer on a substrate; performing a pattering process on the first material layer to form a groove pattern in the first material layer such that the groove pattern matches with a pattern of the metal electrode to be formed; forming the metal electrode in the groove pattern such that a gap is formed between an edge of the metal electrode and an edge of the groove pattern; forming a protection pattern on the substrate formed with the metal electrode such that the protection pattern covers the metal electrode and its edge. In the application, the protection pattern is formed on the resultant metal electrode and can effectively protect conductive metal.

Abstract: A method for manufacturing a display substrate, a display substrate and a display device are disclosed. The method includes: forming a thin-film transistor (TFT) array on a base substrate to form an array substrate; and forming a pixel define layer (PDL) on a non-pixel region of the array substrate by a patterning process. A photochromic material is uniformly distributed in the PDL; the PDL provided with the photochromic material can be converted from light-transmitting to light-shielding under action of light illumination; and the process that the PDL is converted from light-transmitting to light-shielding is irreversible.

Abstract: The embodiments of the present invention provides an oxide TFT, an array substrate and a display device, an oxide channel layer of the oxide TFT comprises a front channel oxide layer and a back channel oxide layer, a conduction band bottom of the back channel oxide layer being higher than a conduction band bottom of the front channel oxide layer, and a band gap of the back channel oxide layer being larger than a band gap of the front channel oxide layer. In the oxide TFT, the array substrate and the display device provided in the present invention, it is possible to accumulate a large number of electrons through the potential difference formed between oxide channel layers of a multilayer structure so as to increase the carrier concentration in the oxide channel layers to achieve the purpose of improving TFT mobility without damaging TFT stability.

Abstract: The invention provide a flexible substrate and manufacturing method thereof, flexible display panel and flexible display device, wherein the flexible substrate comprises a first film layer and a second film layer, and further comprises a first flexible layer and a second flexible layer; the first film layer and the second film layer are located between the first flexible layer and the second flexible layer; the first film layer and the first flexible layer are bonded with each other, and the second film layer and the second flexible layer are bonded with each other; when the flexible substrate bends towards a first side, the first film layer and the second film layer can contact each other and form electric connection as the first flexible layer and the second flexible layer bend; and when the flexible substrate bends towards a second side or does not bend, the first film layer and the second film layer can be separated from each other and disconnect the electric connection as the first flexible layer and the

Abstract: The present invention provides an array substrate and a manufacturing method thereof, and a display apparatus; and it relates to the field of display. The array substrate includes a first thin film transistor and a first electrode which are formed on a substrate. The first thin film transistor includes a gate, a gate insulating layer, an active layer, and an etch stop layer. The etch stop layer is formed with first via holes, and the etch stop layer and the gate insulating layer are formed with a second via hole at a position corresponding to the first electrode. A maximal diameter of the first via holes is not greater than a minimal diameter of the second via hole.

Abstract: A thin film transistor and a manufacturing method thereof, and an array substrate are disclosed. The thin film transistor includes a gate electrode, an insulating layer, an active layer and a source/drain electrode layer, and further includes a light shielding layer, and the light shielding layer is configured to block light from entering the active layer via the insulating layer, and the light shielding layer and the gate electrode are arranged in a same layer and electrically unconnected with each other. The thin film transistor can reduce the light irradiated to the active layer and thus reduce the adverse impact thus incurred.

Abstract: A light emitting diode display substrate, a method of manufacturing the same, and a display device are provided. The method includes: forming a planarization layer and a photoresist layer in sequence on a substrate on which a thin film transistor is formed, a light sensitivity of the planarization layer being higher than a light sensitivity of the photoresist layer; etching the planarization layer and the photoresist layer simultaneously, such that a pixel defining pattern is formed through a removed portion of the photoresist layer, and an anode via pattern is formed at a position of the planarization layer corresponding to the pixel defining pattern; forming an anode pattern layer on the substrate on which the above steps were performed, wherein the anode pattern layer comprises a plurality of anodes, such that the planarization layer located at edges of the anode via pattern covers edges of the anodes.

Abstract: A thin film transistor and a manufacturing method thereof, an array substrate and a manufacturing thereof are disclosed. The thin film transistor includes a gate electrode, an insulating layer, an active layer and a source/drain electrode layer, and further includes a light shielding layer, and the light shielding layer is configured to block light from entering the active layer via the insulating layer, and the light shielding layer and the gate electrode are arranged in a same layer and electrically unconnected with each other. The thin film transistor can reduce the light irradiated to the active layer and thus reduce the adverse impact thus incurred.

Abstract: A display substrate having a black matrix with a curved surface, a method for manufacturing the same and a display device are provided. The display substrate includes a black matrix disposed between adjacent pixels, wherein a sidewall of the black matrix is a concave curved surface. During the formation of a color film, since the sidewall of the black matrix is formed as a concave curved surface, color film droplets in one sub-pixel may return into the sub-pixel along the curved surface while splashing to the sidewall of the black matrix, thereby the contamination to adjacent pixels caused by the droplets splashing may be avoided, and a yield of the substrate may be ensured.

Abstract: A light emitting diode display substrate, a method of manufacturing the same, and a display device are provided. The method includes: forming a planarization layer and a photoresist layer in sequence on a substrate on which a thin film transistor is formed, a light sensitivity of the planarization layer being higher than a light sensitivity of the photoresist layer; etching the planarization layer and the photoresist layer simultaneously, such that a pixel defining pattern is formed through a removed portion of the photoresist layer, and an anode via pattern is formed at a position of the planarization layer corresponding to the pixel defining pattern; forming an anode pattern layer on the substrate on which the above steps were performed, wherein the anode pattern layer comprises a plurality of anodes, such that the planarization layer located at edges of the anode via pattern covers edges of the anodes.

Abstract: A method for preparing an OLED and an OLED device are provided. The method for preparing an OLED comprises forming an anode metal layer on an organic layer; forming an inorganic layer on the anode metal layer; and forming the anode metal layer into an anode layer comprising a pattern of an anode.

Abstract: A display substrate, a manufacturing method and a driving method thereof, and a display device are provided. The display substrate includes a substrate, a gate layer disposed on the substrate, a gate insulating layer disposed on the gate layer, a pixel defining layer disposed on the gate insulating layer, the pixel defining layer includes a plurality of defining regions, a light emitting layer in the defining regions of the pixel defining layer disposed on the gate insulating layer, wherein the light emitting layer includes an electron excitation layer, a light excitation layer and a hole excitation layer, and a source/drain layer disposed on the light emitting layer.

Abstract: A method for preparing an OLED and an OLED device are provided. The method for preparing an OLED comprises forming an anode metal layer on an organic layer; forming an inorganic layer on the anode metal layer; and forming the anode metal layer into an anode layer comprising a pattern of an anode. (FIG.

Abstract: A method for fabricating a flexible substrate and a flexible substrate prefabricated component are disclosed, the flexible substrate comprises an electronic device and a flexible layer provided with the electronic device. The fabrication method comprises: disposing a single-sided adhesive layer at a central portion of a surface of a support substrate, an adhesive side of the single-sided adhesive layer being in contact with the support substrate; disposing a double-sided adhesive layer at a peripheral region of the support substrate; disposing the flexible layer on surfaces of the single-sided adhesive layer and the double-sided adhesive layer, the flexible layer being bonded to the double-sided adhesive layer; disposing the electronic device in a region of a surface of the flexible layer corresponding to the single-sided adhesive layer; cutting the flexible layer along a boundary of the electronic device and removing the flexible layer from the single-sided adhesive layer.

Abstract: The application provides a thin film transistor, a method for manufacturing the thin film transistor, and a display panel, the thin film transistor includes a metal electrode, and a step of forming the metal electrode includes: forming a first material layer on a substrate; performing a pattering process on the first material layer to form a groove pattern in the first material layer such that the groove pattern matches with a pattern of the metal electrode to be formed; forming the metal electrode in the groove pattern such that a gap is formed between an edge of the metal electrode and an edge of the groove pattern; forming a protection pattern on the substrate formed with the metal electrode such that the protection pattern covers the metal electrode and its edge. In the application, the protection pattern is formed on the resultant metal electrode and can effectively protect conductive metal.

Abstract: A method for manufacturing a display substrate, a display substrate and a display device are disclosed. The method includes: forming a thin-film transistor (TFT) array on a base substrate to form an array substrate; and forming a pixel define layer (PDL) on a non-pixel region of the array substrate by a patterning process. A photochromic material is uniformly distributed in the PDL; the PDL provided with the photochromic material can be converted from light-transmitting to light-shielding under action of light illumination; and the process that the PDL is converted from light-transmitting to light-shielding is irreversible.

Abstract: A thin film transistor and a manufacturing method thereof, an array substrate and a manufacturing thereof are disclosed. The thin film transistor includes a gate electrode, an insulating layer, an active layer and a source/drain electrode layer, and further includes a light shielding layer, and the light shielding layer is configured to block light from entering the active layer via the insulating layer, and the light shielding layer and the gate electrode are arranged in a same layer and electrically unconnected with each other. The thin film transistor can reduce the light irradiated to the active layer and thus reduce the adverse impact thus incurred.

Abstract: A display substrate, a method for manufacturing the same and a display device are provided. The display substrate includes a black matrix disposed between adjacent pixels, and a sidewall of the black matrix is a concave curved surface. Since the sidewall of the black matrix is formed as a concave curved surface, when color film droplets in one sub-pixel splash to the sidewall of the black matrix in forming of a color film, the droplets can return into the sub-pixel along the curved surface, thereby avoiding contamination to adjacent pixels by the droplets splashing, and ensuring substrate yield.

Abstract: A display substrate, a manufacturing method and a driving method thereof, and a display device are provided. The display substrate includes a substrate, a gate layer disposed on the substrate, a gate insulating layer disposed on the gate layer, a pixel defining layer disposed on the gate insulating layer, the pixel defining layer includes a plurality of defining regions, a light emitting layer in the defining regions of the pixel defining layer disposed on the gate insulating layer, wherein the light emitting layer includes an electron excitation layer, a light excitation layer and a hole excitation layer, and a source/drain layer disposed on the light emitting layer.

Abstract: The invention provide a flexible substrate and manufacturing method thereof, flexible display panel and flexible display device, wherein the flexible substrate comprises a first film layer and a second film layer, and further comprises a first flexible layer and a second flexible layer; the first film layer and the second film layer are located between the first flexible layer and the second flexible layer; the first film layer and the first flexible layer are bonded with each other, and the second film layer and the second flexible layer are bonded with each other; when the flexible substrate bends towards a first side, the first film layer and the second film layer can contact each other and form electric connection as the first flexible layer and the second flexible layer bend; and when the flexible substrate bends towards a second side or does not bend, the first film layer and the second film layer can be separated from each other and disconnect the electric connection as the first flexible layer and the