Patents by Inventor Hongwen Li

Hongwen Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090071758
    Abstract: Provided is an elevator car frame, comprising: an elevator cage, a main elevator car frame comprising a pair of main columns, an upper main beam and a lower main beam, and a pair of diversion sheaves; wherein the main columns are disposed on both sides of the elevator cage; the upper main beam is disposed above the elevator cage; the lower main beam is disposed below the elevator cage; the diversion sheaves are disposed on one side of the upper main beam; and a line connecting centers of the diversion sheaves is parallel to the upper main beam. The invention features increased working space, reduced height of the elevator car roof, and lower cost.
    Type: Application
    Filed: November 18, 2008
    Publication date: March 19, 2009
    Applicant: SHENYANG BRILLIANT ELEVATOR CO., LTD.
    Inventors: Zhigang YU, Yunsong GU, Hetong MAO, Hongwen LI, Junbin LI
  • Publication number: 20060246683
    Abstract: A method is provided that includes (1) receiving information about a substrate processed within a low K dielectric deposition subsystem from an integrated inspection system of the low K dielectric deposition subsystem; (2) determining an etch process to perform within an etch subsystem based at least in part on the information received from the inspection system of the low K dielectric deposition subsystem; and (3) directing the etch subsystem to etch at least one low K dielectric layer on the substrate based on the etch process. Other methods, systems, apparatus, data structures and computer program products are provided.
    Type: Application
    Filed: June 21, 2006
    Publication date: November 2, 2006
    Inventors: Judon Pan, Michael Armacost, Hoiman Hung, Hongwen Li, Arulkumar Shanmugasundram, Moshe Sarfaty, Dimitris Lymberopoulos, Mehul Naik
  • Patent number: 6913715
    Abstract: This invention relates to the preparation of molds for the production of contact lenses and other ophthalmic articles. By using an inorganic material to coat the optical surfaces and sidewalls of mold parts made from clear-resin materials, manufacturers can produce lens molds with greater dimensional stability and chemical resistance. In addition to protecting the clear resin from interaction with otherwise reactive monomers from which the molded article is made, such coatings can also be used to achieve preferential release of the molded article. The resulting mold is especially useful for providing an economical way to improve manufacturing quality of contact lenses.
    Type: Grant
    Filed: March 12, 2003
    Date of Patent: July 5, 2005
    Assignee: Bausch & Lomb Incorporated
    Inventors: Hongwen Li, Dominic V. Ruscio, Yu Chin Lai, Horngyih Huang
  • Publication number: 20040206621
    Abstract: A first system is provided that is configured to pattern a substrate that includes (1) a lithography subsystem configured to form a patterned masking layer on the substrate; and (2) an etch subsystem configured to receive the substrate after the patterned masking layer has been formed thereon and to etch the substrate to form one or more etched features on the substrate, the etch subsystem having an integrated inspection system configured to inspect the substrate; and (3) a controller coupled to the lithography subsystem and the etch subsystem. The controller includes computer program code configured to communicate with each subsystem and to perform the steps of receiving information about the substrate from the integrated inspection system of the etch subsystem; and adjusting a stepper focus of the lithography subsystem during formation of a subsequent patterned masking layer based at least in part on the information received from the etch subsystem.
    Type: Application
    Filed: January 16, 2004
    Publication date: October 21, 2004
    Inventors: Hongwen Li, Lee Luo, Ilias Iliopoulos, Michael D. Armacost
  • Publication number: 20040007325
    Abstract: A method is provided that includes (1) receiving information about a substrate processed within a low K dielectric deposition subsystem from an integrated inspection system of the low K dielectric deposition subsystem; (2) determining an etch process to perform within an etch subsystem based at least in part on the information received from the inspection system of the low K dielectric deposition subsystem; and (3) directing the etch subsystem to etch at least one low K dielectric layer on the substrate based on the etch process. Other methods, systems, apparatus, data structures and computer program products are provided.
    Type: Application
    Filed: June 11, 2003
    Publication date: January 15, 2004
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Judon Tony Pan, Michael D. Armacost, Hoiman Hung, Hongwen Li, Arulkumar Shanmugasundram, Moshe Sarfaty, Dimitris P. Lymberopoulos, Mehul Naik
  • Publication number: 20030164562
    Abstract: This invention relates to the preparation of molds for the production of contact lenses and other ophthalmic articles. By using an inorganic material to coat the optical surfaces and sidewalls of mold parts made from clear-resin materials, manufacturers can produce lens molds with greater dimensional stability and chemical resistance. In addition to protecting the clear resin from interaction with otherwise reactive monomers from which the molded article is made, such coatings can also be used to achieve preferential release of the molded article. The resulting mold is especially useful for providing an economical way to improve manufacturing quality of contact lenses.
    Type: Application
    Filed: March 12, 2003
    Publication date: September 4, 2003
    Applicant: Bausch & Lomb Incorporated
    Inventors: Hongwen Li, Dominic V. Ruscio, Yu Chin Lai, Horngyih Huang
  • Patent number: 6565776
    Abstract: This invention relates to the preparation of molds for the production of contact lenses and other ophthalmic articles. By using an inorganic material to coat the optical surfaces and sidewalls of mold parts made from clear-resin materials, manufacturers can produce lens molds with greater dimensional stability and chemical resistance. In addition to protecting the clear resin from interaction with otherwise reactive monomers from which the molded article is made, such coatings can also be used to achieve preferential release of the molded article. The resulting mold is especially useful for providing an economical way to improve manufacturing quality of contact lenses.
    Type: Grant
    Filed: June 12, 2000
    Date of Patent: May 20, 2003
    Assignee: Bausch & Lomb Incorporated
    Inventors: Hongwen Li, Dominic V. Ruscio, Yu Chin Lai, Horngyih Huang
  • Patent number: 6164777
    Abstract: Colored contact lenses that are colored by means of interference coatings for cosmetically enhancing or changing the color of the eyes are disclosed. In particular, the interference coating is applied to a surface of the lens material and, although transparent to the cornea and iris anatomy, so that the coating reflects pre-selected bands of the light spectrum to cosmetically change or enhance the natural color or hue of the eye.
    Type: Grant
    Filed: December 16, 1998
    Date of Patent: December 26, 2000
    Assignee: Bausch & Lomb Incorporated
    Inventors: Hongwen Li, Dominic V. Ruscio, Joseph C. Salamone
  • Patent number: 5843518
    Abstract: A method for making a tantala/silica interference filter on a vitreous substrate, which filter retains integrity at temperatures in excess of 600.degree. C., includes the steps of depositing by low pressure chemical vapor deposition a first coating of tantala/silica on the substrate, heat treating the first coating, and depositing by low pressure chemical vapor deposition a second coating of tantala/silica, the first and second coatings in combination providing a tantala/silica interference filter with a thickness of at least 3.5 microns on the vitreous substrate. There is further presented an electric lamp having an envelope and an interference filter applied thereto, in accordance with the above method.
    Type: Grant
    Filed: January 9, 1997
    Date of Patent: December 1, 1998
    Assignee: Osram Sylvania Inc.
    Inventors: Hongwen Li, Gautam Bandyopadhyay, Keith A. Klinedinst, Joseph E. Lester
  • Patent number: 5658612
    Abstract: A method for making a tantala/silica interference filter on the surface of a tungsten-halogen incandescent lamp having molybdenum leads includes depositing on the lamp surface by low pressure chemical vapor deposition the interference filter comprising alternating layers of tantala and silica. Thereafter, the filter is heat treated in an atmosphere of humidified inert gas containing less than 1% oxygen.
    Type: Grant
    Filed: September 29, 1995
    Date of Patent: August 19, 1997
    Assignee: Osram Sylvania Inc.
    Inventors: Hongwen Li, Keith A. Klinedinst