Abstract: An analysis module includes a user sleeping data extracting unit, a standard sleeping data extracting unit, a sleeping data analysis unit, a sleeping score conversion unit and a sleeping score displaying unit. The user sleeping data extracting unit is configured to extract a user sleeping data from an accessing module. The standard sleeping data extracting unit is configured to extract a standard sleeping data from the accessing module. The sleeping data analysis unit is configured to compare the user sleeping data with the standard sleeping data and generate sleeping analysis result. The sleeping score conversion unit is configured to convert the sleeping analysis result into a sleeping index grade, a sleeping quality grade and a sleeping index graphics. The sleeping score displaying unit is configured to display the sleeping index grade, the sleeping quality grade and the sleeping index graphics.

Abstract: The present application discloses a method for converting endoscope images to narrow band images. Firstly, obtaining a reference image data and a narrow band reference image data of a reference object, for obtaining a hyperspectral reference image data, a narrow band conversion parameter and a first light source parameter by operation and then correspondingly obtaining a simulated narrow band image data, which is further compared with the narrow band reference image data to obtain a chromatic aberration data. A second light source parameter is obtained according to the first light source parameter and the chromatic aberration data. An input image data of an endoscope is converted to a narrow band input image data according to the narrow band conversion parameter and the second light source parameter. Thus, the image identification ability and the definition of the input image are improved.

Abstract: A bicycle seat cushion sensing system includes a seat cushion body. Different sensing devices can be installed in different areas of the seat cushion body to detect the vertical force data of different areas, and the vertical force data of different areas are used to calculate a real-time force center position value, and then the real-time force center position value is converted into a trunk angle value to determine the riding posture of the rider.

Abstract: An integrated circuit includes an inductor that includes a first set of conductors in at least a first metal layer, and a guard ring enclosing the inductor. The guard ring includes a first conductor extending in a first direction, a second conductor extending in a second direction, and a first set of staggered conductors coupled to a first end of the first conductor and a first end of the second conductor. The first set of staggered conductors includes a second set of conductors in a second metal layer, a third set of conductors in a third metal layer and a first set of vias coupling the second set of conductors with the third set of conductors. The third metal layer is above the second metal layer. All metal lines in the second metal layer that are part of the guard ring extend in the first direction.

Abstract: A display device includes: a substrate; a first transistor and a second transistor disposed on the substrate; a first electrode and a second electrode, wherein the first electrode is electrically connected to the first transistor through a first via hole, and the second electrode is electrically connected to the second transistor through a second via hole; a first signal line disposed on the substrate and overlapped with the first electrode and the second electrode; and a second signal line disposed on the substrate and adjacent to the first signal line, wherein the first signal line and the second signal line extend along a first direction, wherein a distance between the first via hole and the second via hole along the first direction is greater than a distance between the first signal line and the second signal line along a second direction different the first direction.

Abstract: A method is provided that includes forming a first metal layer of a seal structure over a micro-electromechanical system (MEMS) structure and over a channel formed through the MEMS structure to an integrated circuit of a semiconductor structure. The first metal layer is formed at a first temperature. The method includes forming a second metal layer over the first metal layer. The second metal layer is formed at a second temperature less than the first temperature. The method includes performing a first cooling process to cool the semiconductor structure.

Abstract: An electronic device includes a substrate, a first transistor and a second transistor. The first transistor is disposed on the substrate and has a first terminal electrically connected to a first voltage level, a second terminal and a control terminal. The second transistor is disposed on the substrate and has a first terminal electrically connected to the second terminal of the first transistor, a second terminal electrically connected to a second voltage level, and a control terminal electrically connected to the control terminal of the first transistor. Wherein a voltage value of the first voltage level is greater than a voltage value of the second voltage level.

Abstract: A device for grinding coffee beans includes a housing assembly, a shaft assembly, a fixing member, and a brush assembly. The housing assembly has a housing, a supporting member, and an outer grinding member that are arranged in the housing. The shaft assembly has a shaft and an inner grinding member. The inner grinding member, including a ferromagnetic material, is arranged on the shaft. The shaft penetrates through the supporting member. The fixing member fixes the supporting member and the shaft. The brush assembly has a brush base and at least one brush member thereon. The brush base is provided with at least one magnet. When the brush base is fixed to the bottom of the inner grinding member through the magnet, the rotation of the shaft assembly rotates the brush base to brush away coffee powder remaining between the inner grinding member and the outer grinding member.

Abstract: A method of verifying an integrated circuit stack includes adding a first dummy layer to a first contact pad of a circuit, wherein a location of the first dummy layer is determined based on a location of a second contact pad of a connecting substrate. The method further includes converting the first dummy layer location to the connecting substrate. The method further includes adjusting the first dummy layer location in the circuit in response to a determination that the first dummy layer location is misaligned with the second contact pad. The method further includes performing a first layout versus schematic (LVS) check of the connecting substrate including the first dummy layer in response to a determination that the first dummy layer is aligned with the second contact pad.

Abstract: A chemical mechanical polishing apparatus includes: an inner platen to support an inner polishing pad; an annular outer platen to support an outer polishing pad; a carrier head to hold a substrate; one or more motors to rotate the inner platen about a vertical axis at a first rotation rate and to rotate the outer platen about the vertical axis at a second rotation rate; and a controller configured to select values for multiple control parameters to minimize a difference between a target removal profile and an expected removal profile, the multiple control parameters including a first parameter representing a difference in rotational speeds between the inner and outer platens. The outer polishing pad can coaxially surround the inner platen, and an outer edge of the inner platen and an inner edge of the outer platen can be separated by a gap.

Abstract: A bracket includes a first unit and a second unit. The first unit includes a first body portion and a first assembling portion connected to the first body portion, and an angle is formed between the first body portion and the first assembling portion. The second unit is pivotally connected to the first unit and includes a second body portion and a second assembling portion. The second assembling portion is connected to the second body portion, and another angle is formed between the second body portion and the second assembling portion. When the first unit and the second unit are in s closed state, the first assembling portion and the second assembling portion are configured for assembling an object.

Abstract: A method of forming a semiconductor device is disclosed. The method includes forming a plurality of isolation regions on a semiconductor substrate, forming a protective layer in a resistor region of the semiconductor substrate, after forming the protective layer, etching a gate dielectric layer to form first and second gate dielectric layers of a transistor in a transistor region of the semiconductor substrate, removing the protective layer, forming first and second dummy gate stacks over the first and second gate dielectric layers, respectively, forming a resistor in the resistor region, forming third and fourth dummy gate stacks over the resistor, and replacing each of the first, second, third, and fourth dummy gate stacks with a conductive material.

Abstract: A chemical mechanical polishing apparatus includes an inner platen to support an inner polishing pad, aan annular outer platen to support an outer polishing pad, a carrier head to hold a substrate, a first motor to rotate the inner platen about a vertical axis at a first rotation rate, and a second motor to rotate the outer platen about the vertical axis at a second rotation rate. The outer polishing pad coaxially surrounds the inner platen, and an outer edge of the inner platen and an inner edge of the outer platen are separated by a gap.

Abstract: A carrier head for chemical mechanical polishing includes a housing for attachment to a drive shaft, a membrane assembly arranged beneath the lower carrier body, and a flexure. The membrane assembly includes a membrane support and a flexible membrane secured to the membrane support to defining a plurality of pressurizable lower chambers, with the flexible membrane having a lower surface that provides a substrate mounting surface. A flexible seal forms a pressurizable upper chamber between the housing and the membrane support. The flexure connects the membrane support to the housing, and the flexure extends through the pressurizable upper chamber.

Abstract: Chemical mechanical polishing system and method include a substrate is loaded into a carrier head having a housing having an upper carrier body and a lower carrier body, and a membrane assembly beneath the lower carrier body. A space between the lower carrier body and the membrane assembly defines a pressurizable chamber, a distance from a sensor in the lower carrier body to the membrane assembly is measured, and pressure in the pressurizable chamber is controlled based on the measured distances to maintain a consistent total downforce on the membrane assembly as the distance between the sensor and the membrane assembly changes.

Abstract: A rocker arm structure of a hand-operated bean grinder includes a crank rocker arm and a folding mechanism. The crank rocker arm has first and second sections of rod body, and the folding mechanism is assembled between the first and second sections of rod body. The folding mechanism includes a first and second bodies assembled with each other. A spring is assembled between the first and second rod bodies, and a guide rail seat and a guide pin are respectively arranged on the first and second bodies. The guide rail seat is arranged on the second assembly port, and is arranged with a guide rail, a positioning groove, and at least one assembly notch. The guide rail has a position for guiding the first section of rod body to rotate 180 degrees from the position to be ground.

Abstract: A nebulizer includes a main body (1), a spraying head (2) and an engagement structure (4). The main body (1) includes a body (11). The spraying head (2) includes a spraying seat (21) assembled to the body (11). The engagement structure (4) includes a notch (41) formed on one of the body (11) and the spraying seat (21), a T-shaped trench (42) formed on an inner wall of the notch (41), an engaging trench (43) formed on another one of the body (11) and the spraying seat (21), and a movable member (44) received in the notch (41). The movable member (44) is extended with a handle (441) exposed from the notch (41), a T-shaped block (442) slidably received in the T-shaped trench (42) and an engaging block (443) embedded in or separated from the engaging trench (43).

Abstract: An electronic device includes pixel regions and pixel spacing regions, and includes: a display layer disposed in the pixel regions and the pixel spacing regions, and including a liquid crystal material and a dye material; and reflective layers respectively disposed in the pixel regions, and at one side of the display layer. The display layer is in a scattering state under a non-display state, and light is scattered by the liquid crystal material and absorbed by the dye material when the light passes through the display layer. The display layer in the pixel regions is in a transmissive state and the display layer in the pixel spacing regions is in a scattering state under a display state, and light passes through the liquid crystal material and the dye material in the pixel regions and is reflected by the reflective layers when the light passes through the display layer.

Abstract: An electrically controlled panel including a first electrically controlled device including first and second alignment layers and a first liquid-crystal layer disposed therebetween, a first polarizing layer, and a first compensation film disposed at a side of the first polarizing layer provided with the first electrically controlled device is provided. The first and second alignment layers have first and second alignment directions respectively. An included angle between the first and second alignment directions is between 75 degrees and 105 degrees. A phase retardation of the first liquid-crystal layer is between 400 nm and 600 nm or between 800 nm and 1200 nm. The first polarizing layer is disposed at a side of the first alignment layer away from the first liquid-crystal layer, and has a first absorption axis parallel to or perpendicular to the first alignment direction. A display apparatus adopting the electrically controlled panel is also provided.

Abstract: A plating membrane includes a support structure extending radially outward from a nozzle that is to direct a flow of a plating solution toward a wafer. The plating membrane also includes a frame, supported by the support structure, having an inner wall that is angled outward from the nozzle. The outward angle of the inner wall relative to the nozzle directs a flow of plating solution from the nozzle in a manner that increases uniformity of the flow of the plating solution toward the wafer, reduces the amount of plating solution that is redirected inward toward the center of the plating membrane, reduces plating material voids in trenches of the wafer (e.g., high aspect ratio trenches), and/or the like.