Patents by Inventor Hubert Holderer
Hubert Holderer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8363206Abstract: An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.Type: GrantFiled: November 7, 2008Date of Patent: January 29, 2013Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Gellrich, Jens Kugler, Thomas Ittner, Stefan Hembacher, Karl-Heinz Schimitzek, Payam Tayebati, Hubert Holderer
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Patent number: 8342701Abstract: A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.Type: GrantFiled: August 5, 2010Date of Patent: January 1, 2013Assignee: Carl Zeiss Laser Optics GmbHInventors: Holger Kierey, Michel Le Maire, Willi Anderl, Hubert Holderer, Anton Lengel
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Publication number: 20120154935Abstract: A holding arrangement for an optical element, in particular for a cylindrical lens, includes a basic structure surrounding an optical element and a mounting device by which the optical element is supported on the basic structure. The mounting device has two degrees of freedom so that the optical element can be supported by the mounting device in a manner that allows the optical element to rotate about both about an optical axis and an axis perpendicular to the optical axis. If the optical element is a cylindrical lens, the axis perpendicular to the optical axis can be an axis perpendicular to an axial direction of the cylindrical lens. The disclosure further relates to a manipulator unit for an optical system which includes a holding arrangement.Type: ApplicationFiled: January 26, 2012Publication date: June 21, 2012Applicants: CARL ZEISS SMT GMBH, CARL ZEISS LASER OPTICS GMBHInventors: Ulrich Weber, Armin Schoeppach, Hubert Holderer
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Publication number: 20120140341Abstract: A holding arrangement for an optical element includes a basic structure surrounding an optical element and a mounting device by which the optical element can be supported on the basic structure with two degrees of freedom for a rotational movement about an optical axis and a translational movement along a first axis which extends perpendicularly to the optical axis and intersects the optical axis in a center. The mounting device includes four joint locations arranged point-symmetrically with respect to the center and at least one parallel rocker which is displaceable parallel to the first axis. A manipulator unit includes a holding arrangement.Type: ApplicationFiled: January 26, 2012Publication date: June 7, 2012Applicants: Carl Zeiss SMT GmbH, Carl Zeiss Laser Optics GmbHInventors: Ulrich Weber, Hubert Holderer
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Publication number: 20110199597Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: ApplicationFiled: April 28, 2011Publication date: August 18, 2011Applicant: CARL ZEISS SMT GMBHInventors: Wolfgang Hummel, Jurgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schöngart, Markus Neumaier, Bärbel Trossbach, Ulrich Weber, Michael Mühlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Patent number: 7990622Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: GrantFiled: October 1, 2010Date of Patent: August 2, 2011Assignee: Carl Zeiss SMT GmbHInventors: Olaf Conradi, Boris Bittner, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati
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Patent number: 7961294Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: October 8, 2008Date of Patent: June 14, 2011Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Publication number: 20110051267Abstract: A reflective optical element (10) for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.Type: ApplicationFiled: August 5, 2010Publication date: March 3, 2011Applicant: CARL ZEISS LASER OPTICS GMBHInventors: Holger Kierey, Michel Le Maire, Willi Anderl, Hubert Holderer, Anton Lengel
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Publication number: 20110025992Abstract: An optical system, such as an illumination system, includes an optical arrangement having at least one optical element and at least one heat dissipation element configured to at least partially dissipate thermal energy generated in the optical element(s) to the outside environment of the optical system. The heat dissipation element(s) is(are) arranged without direct contact with the optical element(s).Type: ApplicationFiled: July 16, 2010Publication date: February 3, 2011Applicant: CARL ZEISS LASER OPTICS GMBHInventors: Hubert Holderer, Johannes Lippert, Armin Schoeppach
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Publication number: 20110019169Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: ApplicationFiled: October 1, 2010Publication date: January 27, 2011Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Boris Bittner, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati
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Patent number: 7830611Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: GrantFiled: January 9, 2008Date of Patent: November 9, 2010Assignee: Carl Zeiss SMT AGInventors: Olaf Conradi, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati, Boris Bittner
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Patent number: 7816022Abstract: A composite structure for microlithography, in particular a holding device for a wafer, has two or more components, the surfaces of which are bonded together at least at one bond. At least one of the components consists of cordierite (Mg2Al4Si5O18) or of silicon carbide (SiC). Also disclosed is an optical arrangement, in particular a projection illumination apparatus for microlithography, having at least one such composite structure, preferably a wafer stage.Type: GrantFiled: February 9, 2009Date of Patent: October 19, 2010Assignee: Carl Zeiss SMT AGInventors: Claudia Ekstein, Hubert Holderer
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Patent number: 7800849Abstract: In an apparatus for mounting two or more optical elements that are each held in an individual mount or in a support structure, said optical elements are mounted in a common mount. The relative positioning of the optical elements (10, 11) in the common mount (18) can be set.Type: GrantFiled: February 1, 2008Date of Patent: September 21, 2010Assignee: Carl Zeiss SMT AGInventors: Hubert Holderer, Thomas Petasch, Chris Reed, Dragos Pariza, Mike Meehan, Gary Krebs
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Patent number: 7791711Abstract: Processes for producing semiconductor components and/or other finely structured components include providing a projection objective having a mirror that is located within a predetermined proximity to a pupil surface of a projection objective. In one variant, an image of a pattern is projected onto a light-sensitive substrate in multiple exposures, in which a first pupil filter function is set on the mirror during a first exposure and, during a subsequent, second exposure, a different, second pupil filter function is set by local changes of geometric reflective properties of the mirror in a locally resolving manner.Type: GrantFiled: February 25, 2008Date of Patent: September 7, 2010Assignee: Carl Zeiss SMT AGInventors: Hubert Holderer, Christian Hembd-Soellner, Rudolf Von Buenau, Ulrich Haag
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Patent number: 7710542Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: November 7, 2007Date of Patent: May 4, 2010Assignee: Carl Zeiss SMT AGInventors: Wolfgang Hummel, Jürgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schöngart, Markus Neumaier, Bärbel Trossbach, Ulrich Weber, Michael Mühlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Patent number: 7656595Abstract: A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).Type: GrantFiled: September 17, 2008Date of Patent: February 2, 2010Assignee: Carl Zeiss SMT AGInventors: Klaus Beck, Bernhard Gellrich, Hubert Holderer, Thomas Petasch, Cornelia Roesch, Alexander Kohl
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Patent number: 7570343Abstract: A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.Type: GrantFiled: November 23, 2005Date of Patent: August 4, 2009Assignee: Carl Zeis SMT AGInventors: Aurelian Dodoc, Karl Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski, Hubert Holderer, Bernhard Gellrich, Juergen Fischer, Susanne Beder, Andreas Wurmbrand, Ulrich Loering, Albrecht Ranck
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Patent number: 7551375Abstract: The invention relates to processes for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and also relates to an assembly. A process includes the following steps: forming a substance mixture at a processing temperature from at least a first component, which is solid at the processing temperature, and a second component, which is liquid at the processing temperature, the first component being dispersed in the second component, introducing the substance mixture in the unset state between the optical element and the mount, and setting the substance mixture so as to form a diffusion alloy from the first and second components.Type: GrantFiled: March 21, 2006Date of Patent: June 23, 2009Assignee: Carl Zeiss SMT AGInventors: Johannes Rau, Josef Distl, Armin Schoeppach, Hubert Holderer
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Publication number: 20090142615Abstract: A composite structure for microlithography, in particular a holding device for a wafer, has two or more components, the surfaces of which are bonded together at least at one bond. At least one of the components consists of cordierite (Mg2Al4Si5O18) or of silicon carbide (SiC). Also disclosed is an optical arrangement, in particular a projection illumination apparatus for microlithography, having at least one such composite structure, preferably a wafer stage.Type: ApplicationFiled: February 9, 2009Publication date: June 4, 2009Applicant: Carl Zeiss SMT AGInventors: Claudia EKSTEIN, Hubert HOLDERER
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Publication number: 20090141258Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.Type: ApplicationFiled: January 30, 2009Publication date: June 4, 2009Applicant: Carl Zeiss SMT AGInventors: Stephan Back, Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Schwaer, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel