Abstract: An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source (30) as well as at least one optical element, in particular a lens or a mirror. In the region of at least one surface acted upon by the radiation (1) of the light source (30) the optical element is substantially symmetrical in relation to an axis of rotational symmetry (5). The optical element or its housing (6) is rotatably connected to a frame (7) by at least one bearing (8, 9, 10). An actuator (18) sets the optical element (25) or its housing (6) in rotation about the axis of rotational symmetry (5). The actuation cooperates with a control device (23). The latter activates the actuator (18) for rotation of the optical element at least temporarily during the period, when the optical element is exposed to lumination. In such a manner rotationally non-symmetrical image defects are compensated.

Abstract: An optical mounting for an optical component includes an inner, preferably multi-part, portion that abuts the optical component and an outer frame, which are connected together by a plurality of spring hinge beams. The spring hinge beams and other portions of the optical mounting are produced galvanoplastically.

Abstract: An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (1) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of the light source. A compensating light supply device (11, 14 to 19) is optically coupled via the peripheral surface (13) of the optical element (1) to the latter. It supplies compensating light (16, 12) to the optical element (1) in such a way that the temperature distribution in the optical element (1), which arises as a result of cumulative heating of the optical element (1) with projection light (2) and compensating light (12), is at least partially homogenized. In said manner image defects induced by the projection light are corrected.

Abstract: A projection exposure system, in particular for microlithography, serves for the generation of an image in an image plane of an object arranged in an object plane. The system comprises a light source that emits a projection light bundle. The system also comprises a projection optics arranged in the optical path between the object plane and the image plane as well as at least one optical correction component arranged in the projection light optical path in front of the image plane. In order to change the optical image properties this component is coupled to at least one correction manipulator so that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally. In this connection the correction manipulator operates together with a correction sensor device. The correction sensor device comprises a light source that emits at least one measuring light bundle.

Abstract: A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.

Abstract: The invention relates to an apparatus for tilting a carrier for optical elements with two optical faces which are arranged together on a carrier and are fixed at a fixed angle to one another, the carrier being fastened on a base plate via articulated connections. The carrier can be pivoted about three tilting axes, a first tilting axis preferably being located in the plane of the first optical face and extending normal to the plane of the second optical face, the second tilting axis preferably being located in the plane of the second optical face and extending normal to the plane of the first optical face, and the third tilting axis being located parallel to the line of intersection between the two planes of the optical element.

Abstract: An optical arrangement, in particular a projection exposure system for microlithography, has, in particular, a slit-shaped image field or a non-rotational-symmetric illumination. As a result, an optical element (101) is exposed in a non-rotational-symmetric manner to the radiation of the light source (110, 111, 112). The optical element (101) has an absorbing coating (104, 105). The absorption of the coating (104, 105) is distributed in such a manner that it is non-rotation-symmetrical in a manner that is at least approximately complementary to the intensity distribution of the exposure to the radiation (107, 108, 109) of the light source (110, 111, 112). As a result of the energy absorbed in the coating (104, 105), an additional heating of the optical element (101) takes place that results in a better non-rotational-symmetric temperature distribution and, consequently, a compensation for light-induced imaging errors.

Abstract: An optical arrangement, in particular a projection exposure system for microlithography, has, in particular, a slit-shaped image field or a non-rotational-symmetric illumination. As a result, an optical element (101) is exposed in a non-rotational-symmetric manner to the radiation of the light source (110, 111, 112). The optical element (101) has an absorbing coating (104, 105). The absorption of the coating (104, 105) is distributed in such a manner that it is non-rotation-symmetrical in a manner that is at least approximately complementary to the intensity distribution of the exposure to the radiation (107, 108, 109) of the light source (110, 111, 112). As a result of the energy absorbed in the coating (104, 105), an additional heating of the optical element (101) takes place that results in a better non-rotational-symmetric temperature distribution and, consequently, a compensation for light-induced imaging errors.

Abstract: An assembly includes a part made of transparent material, in particular, quartz glass or calcium fluoride, and a metal part soldered. The following layer structure is present in the region of a solder joint: a transparent material of the transparent material part, an adhesion layer, a diffusion barrier layer, a first oxidation protection layer, a second oxidation protection layer, a solder layer, as required, a wetting auxiliary layer, and a metal of the metal part, respectively with transitions between the layers, in particular, in the typical manner for soldering, and possibly with diffusion of the two oxidation protection layers into the solder.

Abstract: An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount (2), and actuators (3) which engage on the optical element (1) at least approximately perpendicularly to the optical axis. The actuators (3) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element (1), for the production of bendings which take place substantially without thickness changes.

Abstract: An assembly comprising an optical element and a mount has a fastening flange 2, an intermediate element 3 in at least approximately the form of a funnel and an inner ring 4. The optical element 1 is mounted in the inner ring 4, which is connected to the fastening flange 2 via the intermediate element 3. The intermediate element 3 is connected on the side with the smaller diameter to the inner ring 4 and on the side with the greater diameter to the fastening flange 2.

Abstract: An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (1) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of the light source. A compensating light supply device (11, 14 to 19) is optically coupled via the peripheral surface (13) of the optical element (1) to the latter. It supplies compensating light (16, 12) to the optical element (1) in such a way that the temperature distribution in the optical element (1), which arises as a result of cumulative heating of the optical element (1) with projection light (2) and compensating light (12), is at least partially homogenized. In said manner image defects induced by the projection light are corrected.

Abstract: In a device for displacing an optical element 2 along the optical axis, in particular a lens of large diameter in an objective, the optical element 2 is supported by a retaining ring 1 acted upon by an adjusting device 8 with a coarse adjusting drive 9 and a fine adjusting drive 10. The retaining ring 1 is connected, via solid joints 4 which have a substantially greater stiffness transverse to the optical axis than along the optical axis, to a supporting ring 3 which is arranged on a mount or which forms a part thereof. The solid joints 4 are arranged between the retaining ring 1 and the supporting ring 3 in such a way that the retaining ring 1 can be displaced along the optical axis upon actuation of the adjusting device 8.

Abstract: An optical element (1) of an optical system has at least one chamber (5) that is sealed against atmospheric pressure and is enclosed by boundary surfaces and that has a fluid filling. At least one of the boundary surfaces of the chamber (5) is exposed at least partially to illumination light. It is configured so that a change in the fluid pressure inside the chamber (5) results in a change in non-rotational-symmetric imaging properties of the optical element (1) having n-fold symmetry. For this purpose, a fluid source has a fluid connection to the chamber via a fluid supply line (17). Furthermore, a control device is provided for the pressure in the fluid filling.

Abstract: An adjustable assembly comprises a base (mount ring 1), an adjustable part (inner ring 3), a lever (tilting lever 5) and a drive (drive element 6). The lever (tilting lever 5) is connected to the base (mount ring 1) and to the adjustable part (inner ring 3) via two elastic solid pivoting joints (7, 8) oriented in parallel. One of the two solid pivoting joints (7) is divided into two pivoting joint parts (7a, 7b), which are arranged such that along their pivoting axis (9) they are offset sideways on either side of the second solid pivoting joint (8).

Abstract: An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (5) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of a light source. To temper the optical element (5), a supply apparatus (11, 19 to 23) for gas is used. The latter comprises at least one supply line (21) and at least one gas directing device (11). The latter is aligned relative to the optical element (5) and controllable in such a way that the gas is directed by the gas directing device (11) towards the optical element (5). The volumetric flow of the exiting gas therefore has a magnitude and spatial distribution (17), which are adapted to the intensity distribution (6) of the radiation. By virtue of such tempering, rotationally non-symmetrical light-induced image defects in the optical element (5) are avoided or compensated.

Abstract: Assembly of an optical element and a mount, in which the optical element is coupled by means of numerous lugs to a rigid intermediate ring, which itself is coupled by adjusting members or passive decouplers to the mount for connection to a housing and/or to a further mount.

Abstract: An optical mounting for an optical component includes an inner, preferably multi-part, portion that abuts the optical component and an outer frame, which are connected together by a plurality of spring hinge beams. The spring hinge beams and other portions of the optical mounting are produced galvanoplastically.

Abstract: The invention is directed to a method for welding a large optical component to a metal fixture. The transparent optical component is held in a vibration damping manner at its edge generally at opposite locations and next to an attachment location. The attachment is placed on the attachment location and the metal attachment is placed on the attachment location at the edge of the expanded optical component and the sonotrode is then placed on the attachment while applying only slight bending torques, if at all, and shearing forces. The ultrasonic welding is then carried out. In this way, the ultrasonic welding of optical components to metal attachments is made available even for large highly sensitive optical components. This is so especially when these components can be subjected only to slight loads because of their high sensitivity and/or high optical quality.

Abstract: An optical element of non-metallic, transparent, material, preferably quartz glass or calcium fluoride, is fastened to a mount or a mount element that is provided with a surface that forms a gap with the optical element. The surface that forms the gap is coated with a metal solder that melts at a temperature below about 100.degree. C. The optical element is placed at the metal solder, and the metal is melted, resulting in a positively locking connection with the optical element.