Patents by Inventor Hwan-Sung Cheon

Hwan-Sung Cheon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10241250
    Abstract: An adhesive composition for polarizing plates includes a (meth)acrylic copolymer prepared by copolymerization of a monomer mixture and a curing agent. The monomer mixture includes a hydroxyl group-containing (meth)acrylic monomer, a tertiary amine group-containing (meth)acrylic monomer and a monomer having a glass transition temperature (Tg) of about 100° C. or greater. The adhesive composition has a gel fraction of about 50% or greater after aging for 12 hours. An adhesive film is formed from the adhesive composition. An optical display includes the adhesive film.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: March 26, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Irina Nam, Inga Tuzovskaya, Young Jong Kim, Il Jin Kim, Hwan Sung Cheon
  • Patent number: 10240068
    Abstract: An adhesive film of the present invention comprises a (meth)acrylate-based copolymer and a cross-linking agent, and a gel fraction thereof is approximately 50-95%, and a ratio of change G? in storage modulus thereof, represented by the following formula 1, is 20% or less. G?=(G7?G1)/G1×100??[Formula 1] (In formula 1, G1 is a storage modulus at 25° C. when the adhesive film is matured at 23° C. and a relative humidity (RH) of 55% for one day, and G7 represents a storage modulus at 25° C. when the adhesive film is matured at 23° C. and an RH of 55% for seven days.
    Type: Grant
    Filed: June 29, 2015
    Date of Patent: March 26, 2019
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Irina Nam, Young Jong Kim, Hwan Sung Cheon, In Cheon Han
  • Patent number: 10047191
    Abstract: The present invention relates to a compound containing phosphonium ion of a chemical formula 1, an epoxy resin composition containing the same, and a device manufactured by using the same.
    Type: Grant
    Filed: February 27, 2014
    Date of Patent: August 14, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jin Min Cheon, Min Gyum Kim, Jung Seob Kim, Dong Hwan Lee, Hwan Sung Cheon, Seung Han
  • Patent number: 9957348
    Abstract: The present invention relates to a pyridinium-based compound of chemical formula 1, an epoxy resin composition comprising the same, and an apparatus manufactured by using the same.
    Type: Grant
    Filed: May 9, 2014
    Date of Patent: May 1, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Dong Hwan Lee, Min Gyum Kim, Jung Seob Kim, Jin Min Cheon, Hwan Sung Cheon, Seung Han
  • Patent number: 9890238
    Abstract: The present invention relates to a curing catalyst for an epoxy resin composition represented by chemical formula 1, an epoxy resin composition comprising the same, and an apparatus manufactured using the same.
    Type: Grant
    Filed: May 16, 2014
    Date of Patent: February 13, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jung Seob Kim, Min Gyum Kim, Dong Hwan Lee, Jin Min Cheon, Hwan Sung Cheon, Seung Han
  • Publication number: 20170327640
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Application
    Filed: August 3, 2017
    Publication date: November 16, 2017
    Inventors: Yun-Jun KIM, Hwan-Sung CHEON, Youn-Jin CHO, Yong-Woon YOON, Chung-Heon LEE, Hyo-Young KWON, Yoo-Jeong CHOI
  • Publication number: 20170253770
    Abstract: An adhesive film of the present invention comprises a (meth)acrylate-based copolymer and a cross-linking agent, and a gel fraction thereof is approximately 50-95%, and a ratio of change G? in storage modulus thereof, represented by the following formula 1, is 20% or less. [Formula 1] G?=(G7?G1)/G1×100 (In formula 1, G1 is a storage modulus at 25° C. when the adhesive film is matured at 23° C. and a relative humidity (RH) of 55% for one day, and G7 represents a storage modulus at 25° C. when the adhesive film is matured at 23° C. and an RH of 55% for seven days.
    Type: Application
    Filed: June 29, 2015
    Publication date: September 7, 2017
    Applicant: SAMSUNG SDI CO.,LTD
    Inventors: Irina NAM, Young Jong KIM, Hwan Sung CHEON, In Cheon HAN
  • Patent number: 9725389
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: August 8, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hwan-Sung Cheon, Youn-Jin Cho, Yong-Woon Yoon, Chung-Heon Lee, Hyo-Young Kwon, Yoo-Jeong Choi
  • Patent number: 9695294
    Abstract: An epoxy resin composition includes: an epoxy resin; a curing agent; a curing accelerator; and an inorganic filler, wherein the curing accelerator includes a 4-valent ammonium salt or a 4-valent phosphonium salt represented by Formula 1, wherein A1 is nitrogen or phosphorus; R1, R2, R3 and R4 are each independently a substituted or unsubstituted C1 to C30 hydrocarbon group, or a substituted or unsubstituted C1 to C30 hydrocarbon group including a hetero atom; X1, X2, X3, X4, X5 and X6 are each independently an oxygen atom (O), a sulfur atom (S), or NH; and Y1, Y2 and Y3 are each independently a substituted or unsubstituted C1 to C30 hydrocarbon group, or a substituted or unsubstituted C1 to C30 hydrocarbon group including a hetero atom.
    Type: Grant
    Filed: December 26, 2013
    Date of Patent: July 4, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Min Gyum Kim, Seung Han, Hwan Sung Cheon
  • Patent number: 9606438
    Abstract: Disclosed is a resist underlayer composition including a compound including a moiety represented by the following Chemical Formula 1 and a solvent. In the above Chemical Formula 1, A1 to A3, X1, X2, L1, L2, Z, and m are the same as defined in the specification.
    Type: Grant
    Filed: November 5, 2013
    Date of Patent: March 28, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Min-Gyum Kim, Hyo-Young Kwon, Jun-Ho Lee, Hwan-Sung Cheon
  • Patent number: 9535190
    Abstract: Disclosed are a photosensitive resin composition including (A) an acrylic-based binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant including a dye represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; and (E) a solvent, and a color filter using the same.
    Type: Grant
    Filed: August 27, 2014
    Date of Patent: January 3, 2017
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Se-Young Choi, Ju-Ho Jung, Myoung-Youp Shin, Nam-Gwang Kim, Hwan-Sung Cheon, Seung-Jib Choi, Kyung-Hee Hyung
  • Publication number: 20160333136
    Abstract: The present invention relates to a pyridinium-based compound of chemical formula 1, an epoxy resin composition comprising the same, and an apparatus manufactured by using the same.
    Type: Application
    Filed: May 9, 2014
    Publication date: November 17, 2016
    Inventors: Dong Hwan LEE, Min Gyum KIM, Jung Seob KIM, Jin Min CHEON, Hwan Sung CHEON, Seung HAN
  • Publication number: 20160326303
    Abstract: The present invention relates to a curing catalyst for an epoxy resin composition represented by chemical formula 1, an epoxy resin composition comprising the same, and an apparatus manufactured using the same.
    Type: Application
    Filed: May 16, 2014
    Publication date: November 10, 2016
    Inventors: Jung Seob KIM, Min Gyum KIM, Dong Hwan LEE, Jin Min CHEON, Hwan Sung CHEON, Seung HAN
  • Patent number: 9487694
    Abstract: Disclosed are a photosensitive resin composition including a composite dye that includes a red fluorescent dye re-emitting light at a 400 to 800 nm fluorescent wavelength; and a metal complex dye including at least one metal ion selected from Mg, Ni, Co, Zn, Cr, Pt, and Pd, and a color filter using the same.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: November 8, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Youn-Je Ryu, Gyu-Seok Han, Hwan-Sung Cheon, Hyun-Yong Cho
  • Patent number: 9428632
    Abstract: A quaternary phosphonium salt, an epoxy resin composition including the quaternary phosphonium salt, and a semiconductor device encapsulated with the epoxy resin composition, the quaternary phosphonium salt being represented by Formula 1:
    Type: Grant
    Filed: November 1, 2013
    Date of Patent: August 30, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Min Gyum Kim, Seung Han, Hwan Sung Cheon
  • Publication number: 20160159971
    Abstract: The present invention relates to a compound containing phosphonium ion of a chemical formula 1, an epoxy resin composition containing the same, and a device manufactured by using the same.
    Type: Application
    Filed: February 27, 2014
    Publication date: June 9, 2016
    Inventors: Jin Min CHEON, Min Gyum KIM, Jung Seob KIM, Dong Hwan LEE, Hwan Sung CHEON, Seung HAN
  • Publication number: 20160152877
    Abstract: An adhesive composition for polarizing plates includes a (meth)acrylic copolymer prepared by copolymerization of a monomer mixture and a curing agent. The monomer mixture includes a hydroxyl group-containing (meth)acrylic monomer, a tertiary amine group-containing (meth)acrylic monomer and a monomer having a glass transition temperature (Tg) of about 100° C. or greater. The adhesive composition has a gel fraction of about 50% or greater after aging for 12 hours. An adhesive film is formed from the adhesive composition. An optical display includes the adhesive film.
    Type: Application
    Filed: November 24, 2015
    Publication date: June 2, 2016
    Inventors: Irina Nam, Inga Tuzovskaya, Young Jong Kim, Il Jin Kim, Hwan Sung Cheon
  • Patent number: 9341743
    Abstract: The present invention relates to a phthalocyanine compound represented by Formula 1, a dye including the same, a photosensitive resin composition including the same, and a color filter prepared using the same. In Formula 1, Z1 to Z16 and M1 are the same as defined in the specification, wherein 1 to 8 of Z1 to Z16 are substituted with one of Formulae 2 to 5, as also defined in the specification. The phthalocyanine compound can have high luminance, high contrast, and excellent heat resistance.
    Type: Grant
    Filed: June 18, 2014
    Date of Patent: May 17, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Seung Hyun Kim, Dong Hoon Won, Myoung Youp Shin, Hwan Sung Cheon
  • Patent number: 9334399
    Abstract: Disclosed are a photosensitive resin composition including (A) a thermally curing initiator having a half-life of about one hour at a temperature ranging from about 100 to about 150° C.; (B) a photopolymerization initiator; (C) a binder resin; (D) a photopolymerizable compound; (E) a colorant; and (F) a solvent, and a black spacer using the same.
    Type: Grant
    Filed: October 28, 2013
    Date of Patent: May 10, 2016
    Assignee: Cheil Industries Inc.
    Inventors: A-Rum Yu, Ji-Hye Kim, Kyung-Won Ahn, Jae-Bum Yim, Hwan-Sung Cheon, Ju-Ho Jung, Hyun-Moo Choi
  • Patent number: 9329475
    Abstract: Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor including a functional group at a terminal end thereof, wherein the functional group is dissociated by light of about 400 nm to about 550 nm wavelength region and is acidified; (B) a photosensitive diazoquinone compound; and (C) a solvent, and a photosensitive resin film and a display device using the same.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: May 3, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ran Namgung, Hyo-Young Kwon, Hwan-Sung Cheon