Abstract: Disclosed are a photosensitive resin composition including (A) a binder resin represented by the following Chemical Formula 1; (B) a reactive unsaturated compound; (C) an initiator; (D) a pigment; and (E) a solvent, and a light blocking layer using the same, wherein, in the following Chemical Formula 1, each substituent is the same as defined in the detailed description.

Abstract: Disclosed is a positive photosensitive resin composition that includes (A) at least one dissolution controlling agent selected from a compound including a repeating unit represented by the following Chemical Formula 1, a compound including a repeating unit represented by the following Chemical Formula 2, or a combination thereof, (B) a polybenzoxazole precursor, (C) a photosensitive diazoquinone compound, and (D) a solvent. An organic insulator film for a display device manufactured using the same and a display device are also disclosed. In Chemical Formulae 1 and 2, each substituent is the same as defined in the detailed description.

Abstract: The present invention relates to a compound represented by Formula 1, wherein in Formula 1, each of R1 to R7 is the same as defined in the specification, a photosensitive resin composition comprising the same, and a color filter prepared using the same. The color filter can realize high contrast and high brightness.

Abstract: Disclosed herein are a thermoplastic copolymer, which is a polymer of a monomer mixture including: a phosphorus (meth)acrylic monomer represented by Formula 1; an aromatic vinyl monomer; and a vinyl cyanide monomer. The thermoplastic copolymer can exhibit excellent flame retardancy with minimal or no deterioration in heat resistance, and is eco-friendly. wherein R1 is hydrogen or methyl; R2 is a substituted or unsubstituted C1 to C20 hydrocarbon group; R3 and R4 are each independently a substituted or unsubstituted C6 to C20 cyclic hydrocarbon group; m is an integer from 1 to 10; and n is an integer from 0 to 5.

Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.

Abstract: A photosensitive resin composition includes (A) a colorant including an organic black pigment or an organic mixed pigment capable of showing black; (B) a binder resin; (C) a photopolymerizable compound; (D) a photopolymerization initiator; (E) an inorganic filler; and (F) a solvent. The composition has an O.D. of greater than or equal to about 2.0 after being coated on a substrate to a thickness of about 4 ?m and being cured, and a transmittance of greater than or equal to about 12% in a 950 nm wavelength region. A black spacer includes the photosensitive resin composition.

Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye represented by the following Chemical Formula 1, (B) an alkali soluble resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent.

Abstract: Disclosed are a photosensitive resin composition for a color filter that includes (A) a squaraine dye including at least one selected from compounds represented by the following Chemical Formulae 1 and 2, (B) an alkali soluble resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent, and a color filter using the same.

Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.

Abstract: A resist underlayer composition, a method of forming patterns, and semiconductor integrated circuit device, the composition including a solvent; and a compound including a moiety represented by the following Chemical Formula 1:

Abstract: Disclosed are a photosensitive resin composition including a composite dye that includes a red fluorescent dye re-emitting light at a 400 to 800 nm fluorescent wavelength; and a metal complex dye including at least one metal ion selected from Mg, Ni, Co, Zn, Cr, Pt, and Pd, and a color filter using the same.

Abstract: Disclosed are an organic solution for surface-treating an indium zinc oxide (IZO) substrate that is used for surface treatment of an indium zinc oxide (IZO) substrate, and includes an organic material, and a method of preparing a display substrate using the same.

Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a dissolution controlling agent including the compound represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, and a photosensitive resin film prepared by using the same.

Abstract: Disclosed are a photosensitive resin composition including (A) a binder resin including a cardo-based resin including a repeating unit represented by the following Chemical Formula 1, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a colorant and (E) a solvent, and a light blocking layer using the same. In the above Chemical Formula 1, each substituent is the same as defined in the detailed description.

Abstract: Disclosed are photosensitive resin composition that includes a dye including a methine-based compound represented by the following Chemical Formula 1, wherein each substituent of Chemical Formula 1 is the same as defined in the detailed description, and a metal complex, and a color filter using the same.

Abstract: Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1, wherein R1, R2, Q, and n are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.

Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye represented by the following Chemical Formula 1, (B) an alkali soluble resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent.

Abstract: A monomer for a hardmask composition represented by the following Chemical Formula 1,

Abstract: An epoxy resin composition includes: an epoxy resin; a curing agent; a curing accelerator; and an inorganic filler, wherein the curing accelerator includes a 4-valent ammonium salt or a 4-valent phosphonium salt represented by Formula 1, wherein A1 is nitrogen or phosphorus; R1, R2, R3 and R4 are each independently a substituted or unsubstituted C1 to C30 hydrocarbon group, or a substituted or unsubstituted C1 to C30 hydrocarbon group including a hetero atom; X1, X2, X3, X4, X5 and X6 are each independently an oxygen atom (O), a sulfur atom (S), or NH; and Y1, Y2 and Y3 are each independently a substituted or unsubstituted C1 to C30 hydrocarbon group, or a substituted or unsubstituted C1 to C30 hydrocarbon group including a hetero atom.

Abstract: A photosensitive resin composition for a light blocking layer includes (A) a colorant including a blue material including a dye represented by the following Chemical Formula 1, and a red material, (B) a binder resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent, and a light blocking layer using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.