Abstract: The present invention relates to a compound represented by Formula 1, wherein in Formula 1, each of R1 to R7 is the same as defined in the specification, a photosensitive resin composition comprising the same, and a color filter prepared using the same. The color filter can realize high contrast and high brightness.

Abstract: A monomer for a hardmask composition represented by the following Chemical Formula 1,

Abstract: Disclosed herein are a thermoplastic copolymer, which is a polymer of a monomer mixture including: a phosphorus (meth)acrylic monomer represented by Formula 1; an aromatic vinyl monomer; and a vinyl cyanide monomer. The thermoplastic copolymer can exhibit excellent flame retardancy with minimal or no deterioration in heat resistance, and is eco-friendly. wherein R1 is hydrogen or methyl; R2 is a substituted or unsubstituted C1 to C20 hydrocarbon group; R3 and R4 are each independently a substituted or unsubstituted C6 to C20 cyclic hydrocarbon group; m is an integer from 1 to 10; and n is an integer from 0 to 5.

Abstract: Disclosed are a photosensitive resin composition including (A) a binder resin represented by the following Chemical Formula 1; (B) a reactive unsaturated compound; (C) an initiator; (D) a pigment; and (E) a solvent, and a light blocking layer using the same, wherein, in the following Chemical Formula 1, each substituent is the same as defined in the detailed description.

Abstract: Provided is a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by Chemical Formula 1 and a repeating unit represented by Chemical Formula 2, and having a thermally polymerizable functional group at least one terminal end; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound; and (E) a solvent. A photosensitive resin film fabricated using the positive photosensitive resin composition is provided.

Abstract: Disclosed is a resist underlayer composition including a compound including a moiety represented by the following Chemical Formula 1 and a solvent. In the above Chemical Formula 1, A1 to A3, X1, X2, L1, L2, Z, and m are the same as defined in the specification.

Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.

Abstract: A resist underlayer composition, a method of forming patterns, and semiconductor integrated circuit device, the composition including a solvent; and a compound including a moiety represented by the following Chemical Formula 1:

Abstract: Disclosed are a photosensitive resin composition for a color filter that includes (A) a squaraine dye including at least one selected from compounds represented by the following Chemical Formulae 1 and 2, (B) an alkali soluble resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent, and a color filter using the same.

Abstract: This disclosure relates to a positive photosensitive resin composition including (A) a resin precursor including a polybenzoxazole precursor, a polyamic acid, or a combination thereof, (B) a dissolution-controlling agent having a boiling point ranging from about 210° C. to about 400° C. and a polarity ranging from about 1 D to about 4 D, (C) an acid generator, (D) a silane-based compound, and (E) a solvent. The polybenzoxazole precursor includes a repeating unit represented by Chemical Formula 1, or both of repeating units represented by Chemical Formulae 1 and 2 and has a thermally polymerizable functional group at at least one end. The polyamic acid includes a repeating unit of Chemical Formulae 50 and 51.

Abstract: A resist underlayer polymer, a resist underlayer composition including the same, and a method of patterning using the same, the resist underlayer polymer including a repeating unit represented by at least one of Chemical Formula 1 and Chemical Formula 2:

Abstract: Disclosed are a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description, a polymer, a colorant including the same, and a photosensitive resin composition including the colorant, and a color filter.

Abstract: Disclosed are a photosensitive resin composition including (A) an acrylic-based binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant including a dye represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; and (E) a solvent, and a color filter using the same.

Abstract: A photosensitive resin composition for a light blocking layer includes (A) a colorant including a blue material including a dye represented by the following Chemical Formula 1, and a red material, (B) a binder resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent, and a light blocking layer using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.

Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a repeating unit represented by the following Chemical Formula 1; (B) a photosensitive diazoquinone compound; and (C) a solvent, and a photosensitive resin film and a display device including the same. In the above Chemical Formula 1, each substituent is the same as defined in the detailed description.

Abstract: A polycarbonate glazing includes a polycarbonate substrate and a silicon oxide-containing hard coating layer formed on one surface of the substrate, wherein the polycarbonate glazing has a haze difference (?Haze) of about 4.5 or less between before and after abrasion, as measured in accordance with ASTM D1003 after 500-cycle testing under conditions of a CS-10F abrasion wheel and a load of 500 g using a Taber Abraser, and has a water contact angle from about 40° to about 60°. The polycarbonate glazing may exhibit excellent abrasion resistance and transparency.

Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a novolac resin including a repeating unit represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, a photosensitive resin film prepared by using the positive photosensitive resin composition, and a semiconductor device including the photosensitive resin film.

Abstract: A hard mask composition includes a solvent and an aromatic ring-containing compound represented by the following Chemical Formula 1:

Abstract: Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor including a functional group at a terminal end thereof, wherein the functional group is dissociated by light of about 400 nm to about 550 nm wavelength region and is acidified; (B) a photosensitive diazoquinone compound; and (C) a solvent, and a photosensitive resin film and a display device using the same.

Abstract: The present invention relates to a phthalocyanine compound represented by Formula 1, a dye including the same, a photosensitive resin composition including the same, and a color filter prepared using the same. In Formula 1, 1 to 8 of Z1 to Z16 are substituted with one of Formulae 2 to 5, as defined in the specification. The phthalocyanine compound can have high luminance, high contrast, and excellent heat resistance. wherein Z1 to Z16 and M1 are the same as in the detailed description of the invention.