Abstract: Disclosed is a method of treating a substrate, the method including: supplying a liquid to the substrate, emitting a laser to the substrate supplied with the liquid to heat the substrate, and emitting imaging light for capturing the substrate to obtain an image of the substrate including a region to which the laser is emitted, in which the laser and the imaging light are emitted to the substrate through a head lens, and a divergence angle of the laser emitted from the head lens and a divergence angle of the imaging light are matched with each other.

Abstract: The present disclosure relates to an apparatus for treating a substrate. The substrate treatment apparatus includes a support unit that supports a substrate, a liquid supply unit that supplies a liquid to the substrate supported by the support unit, and a laser unit that heats the substrate supported by the support unit, wherein the laser unit includes an oscillation unit that emits a light, and a diffraction unit that separates the light into a plurality of light bundles and irradiates the substrate supported by the support unit with an adjustment light having a profile changed from a profile of the light.

Abstract: The inventive concept provides a mask treating method. The mask treating method includes treating a mask by supplying a liquid to the mask, and irradiating a laser to a region of the mask on which a specific pattern is formed while the liquid remains on the mask; moving an optical module including a laser unit configured to irradiate the laser between a process position for treating the substrate and a standby position deviating from the process position; and adjusting a state of the optical module at an inspection port provided at the standby position to a set condition before the optical module is moved to the process position.

Abstract: A includes an element isolation region, a first active region bounded by the element isolation region and that extends in a first direction and includes first and second parts disposed at a first level, and a third part disposed at a second level located above the first level, and a gate electrode disposed inside each of the element isolation region and the first active region and that extends in a second direction different from the first direction. The second part is spaced apart in the first direction from the first part, and the third part contacts each of the first and second parts. A first width in the second direction of the first part is less than a second width in the second direction of the third part.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing; a support unit positioned within the housing and configured to support a substrate; a liquid supply unit configured to supply a treating liquid to the substrate supported on the support unit; and a laser module configured to irradiate a laser to the substrate to which the treating liquid is supplied; and a vision module for monitoring a point at which the laser is irradiated among the substrate.

Abstract: The present invention provides a substrate treating method of treating a substrate including a plurality of cells, the substrate treating method including: a liquid treating operation of supplying a treatment liquid to the substrate; and a heating operation of heating the substrate by supplying the treatment liquid and irradiating laser light to a specific region located outside a region in which the plurality of cells is provided, in which the laser light is formed to cover the specific region when viewed from the top.

Abstract: Disclosed is a substrate treating apparatus including a support unit that supports and rotates a substrate, a heating unit including a laser irradiator that irradiates laser light in a pattern formed in the substrate, a movement module that changes a location of the laser irradiator by moving the heating unit, and a controller that controls the support unit and the heating unit, the movement module moves the heating unit between a heating location, at which the laser light is irradiated to the substrate, and a standby location that deviates from the substrate, and the movement module rotates and linearly moves the heating unit.

Abstract: The present invention provides a substrate treating apparatus including: a support unit supporting and rotating the substrate in a treatment space; a liquid supply unit supplying a liquid to the substrate supported by the support unit; and an irradiating module irradiating light to the substrate supported by the support unit, in which the irradiating module includes: a housing having an accommodation space; a laser unit located in the accommodation space, and including a laser irradiation unit irradiating laser light, and an irradiation end having one end protruding from the housing and irradiating the laser light irradiated from the laser irradiation unit to the substrate supported by the support unit; and a cooling unit located in the accommodation space and cooling the laser irradiation unit.

Abstract: Disclosed herein is a metal oxide aerogel catalyst for hydrogenation and/or hydrodeoxygenation, a method for preparing the same, and a method for hydrogenation and/or hydrodeoxygenation using the same. The catalyst consists of a metal and an oxide thereof, and the catalyst is in a form of an aerogel produced by supercritical drying. The catalyst has an effect of providing high hydrogenation and/or hydrodeoxygenation efficiency of an oxygen-containing compound.

Abstract: The present invention provides a substrate treating apparatus including: support unit is configured to support and rotate a substrate in a treatment space; a liquid supply unit is configured to supply a liquid to the substrate supported by the support unit; a laser unit including a laser irradiation unit which irradiates laser light to the substrate supported by the support unit; a home port providing a standby position in which the laser unit waits; and a moving unit for moving the laser unit between a process position in which the laser light is irradiated to the substrate and the standby position, in which the home port detects a characteristic of the laser light from the laser light irradiated by the laser unit.

Abstract: Provided is an apparatus for treating a substrate. The substrate treating apparatus may include: a substrate support unit supporting a substrate; a nozzle supplying a liquid to the substrate supported on the substrate support unit; a home port in which the nozzle waits; and an electrostatic measurement member measuring an electrostatic amount of a liquid dispensed from the nozzle in the home port.

Abstract: Disclosed herein are a catalyst for hydrocracking reaction of high molecular weight components in bio-oil, a method for preparing the same and a method for bio-oil upgrading using the same. The catalyst includes a zeolite carrier; and at least one metal selected from the group consisting of nickel (Ni), ruthenium (Ru) and cerium (Ce) supported on the carrier. The catalyst promotes the hydrocracking of high molecular weight compounds contained in the bio-oil, but also inhibits the polymerization reaction of the decomposed product, thereby more effectively enhancing the hydrocracking reaction of the bio-oil.

Abstract: A semiconductor memory device includes a substrate having a first active pattern including first and second source/drain regions, a gate electrode intersecting the first active pattern and disposed between the first and second source/drain regions, a bit line intersecting the first active pattern and electrically connected to the first source/drain region, a spacer disposed on a sidewall of the bit line, a contact electrically connected to the second source/drain region and spaced apart from the bit line with the spacer interposed therebetween, an interface layer disposed between the second source/drain region and the contact, and forming an ohmic contact between the second source/drain region and the contact, and a data storage element disposed on the contact. A bottom of the contact is lower than a top surface of the substrate. The contact is formed of a metal, a conductive metal nitride, and/or a combination thereof.

Abstract: Disclosed is a clock converting circuit, which includes a first switch that is connected between a first input node for receiving a second input clock and a first node and operates in response to a first logic state of a first input clock, the second input clock delayed with respect to the first input clock as much as 90 degrees, a second switch that is connected between a second input node for receiving the first input clock and a second node and operates in response to a second logic state of the second input clock, and a third switch that is connected between the second node and a ground node and operates in response to a first logic state of the second input clock opposite to the second logic state of the second input clock.

Abstract: A wireless communication device can include switch circuitry. The switch circuitry can include stacks having a common gate node and a common body node, wherein a stack includes a metal-oxide-semiconductor field-effect transistor (MOSFET) having a body resistive element coupled to a body terminal of the MOSFET and the common body node a gate resistive element coupled to a gate terminal of the MOSFET and the common gate node. The switch circuitry can further include a self-biased MOSFET coupled to the common gate node and the common body node, a gate of the self-biased MOSFET configured to receive direct current (DC) bias with a low pass filter.

Abstract: Proposed are a home port and a substrate processing apparatus using the same. The home port is installed in the substrate processing apparatus to temporarily mount a nozzle for discharging a process liquid to a substrate, and includes a main body having a space therein, a nozzle holder provided at an upper portion of the main body and configured to mount the nozzle, an inclined surface formed below the nozzle holder in the space, a first supply pipe configured to discharge a rinse liquid to a tip of the nozzle, a second supply pipe configured to inject the rinse liquid into the main body, a conductive wire configured to electrically connect the inclined surface and the first supply pipe, and a first switch installed on the conductive wire.

Abstract: A method for harmonic trapping in a matching network of a power amplifier includes determining primary inductance and secondary inductance of a differential transformer of the matching network, based on a signal operating frequency of the power amplifier. An inductance value for an L-C filter is determined based on the secondary inductance and a harmonic frequency of a local oscillator (LO) signal. A capacitance value for the L-C filter is determined based on the inductance value and the harmonic frequency of the LO signal. The L-C filter is provided on an electric connection between a direct current (DC) bias voltage source and a secondary inductor of the differential transformer. The L-C filter is configured with the determined inductance value and the determined capacitance value.

Abstract: A lens is provided. The lens includes a lens unit, and a serrated layer disposed on at least a portion of a surface of the lens unit, wherein the serrated layer includes a plurality of particles dispersed therein that are injected into the serrated layer. The serrated layer includes a plurality of conical structures having different sizes, accordingly, a refractive index on the surface of the serrated layer may gradually change.

Abstract: A noise filtering circuit, a digital to analog converter and an electronic device are provided. The noise filtering circuit comprises a first amplifier configured to receive a bias voltage at a first input terminal, receive a bias output voltage at a second input terminal though a feedback path, and compensate for a difference between the bias voltage and the bias output voltage; a first transistor connected to an output of the first amplifier and having a gate to which an off-voltage is applied; a first capacitor connected to the first transistor; a second capacitor connected to the output of the first amplifier; a second transistor connected to the second capacitor and having a gate to which an off-voltage is applied, and a second amplifier having an input terminal connected to the first capacitor and a second input terminal connected to the second transistor.

Abstract: The inventive concept provides a mask treating apparatus.