Abstract: The present application relates to an apparatus and method for evaluating XR-based upper limb motion control and motion control ability, the apparatus including a head mount display (HMD) configured to be worn on a user's head part and including a display for providing visual feedback information capable of monitoring a visual cue and a repetitive motion of muscle synergy or a direction and magnitude of a force that are contents for XR (eXtended Reality)-based multi-joint rehabilitation training of an upper limb, a measurement part, a synergy evaluation part, a visual cue control part and a composite biofeedback part.

Abstract: Disclosed is a polishing composition for a semiconductor process, including polishing particles, iron ions, and an iron ion stabilizer, in which the iron ion stabilizer comprises two or more carboxyl groups and the polishing composition has electrical conductivity of 200 ?S/cm to 800 ?S/cm. The polishing composition may polish a substrate surface including a tungsten pattern film having a fine pitch more smoothly.

Abstract: A semiconductor device includes a first active pattern extending lengthwise along a first direction and a second active pattern extending lengthwise along the first direction and spaced apart from the first active pattern in the first direction. The device also includes a field insulating film between the first active pattern and the second active pattern. An upper surface of the field insulating film is lower than or coplanar with upper surfaces of the first and second active patterns. The device further includes an element isolation structure in an isolation trench in the first active pattern and the field insulating film. An upper surface of the element isolation structure is higher than the upper surfaces of the first and second active patterns.

Abstract: This application relates to a surgical data acquisition method. In one aspect, the surgical data acquisition method includes acquiring information about movement of a surgical robot, and dividing a hexahedral block including a maximum movement range of the surgical robot into a plurality of sub-blocks of a specified number. The method may also include storing, for each of the plurality of sub-blocks, information on a sub-block corresponding to a position in which the surgical robot has moved and information about the movement of the surgical robot within the sub-block.

Abstract: Disclosed is a UWB antenna module arranged in the lateral direction of a portable terminal so as to prevent deterioration of communication performance while minimizing a mounting space. The disclosed UWB antenna module comprises: a planar base substrate; a plurality of radiation patterns arranged on the upper surface of the base substrate, and arranged so as to be spaced from each other; a switching element arranged on the lower surface of the base substrate and connected to the plurality of radiation patterns; and a communication chipset arranged to be spaced from the switching element on the lower surface of the base substrate, and connected to one of the plurality of radiation patterns through a switching operation of the switching element.

Abstract: Provided is a ceramic lifting and lowering device for a thermotherapeutic apparatus. The ceramic lifting and lowering device for a thermotherapeutic apparatus according to a first embodiment of the present invention comprises: a base frame; a lifting and lowering member that is hinge-coupled to the base frame; a first driving module provided on the base frame so as to transmit power for the lifting and lowering motion of the lifting and lowering member; a ceramic member provided on one side portion of the lifting and lowering member; a pressing member provided on the other side portion of the lifting and lowering member so as to be movable in an outward direction of the lifting and lowering member; and a second driving module provided on the lifting and lowering member so as to be able to move the pressing member.

Abstract: A blank mask including a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The phase shift film has XRD maximum peak at 20 of 15° to 30° when normal mode XRD analysis is performed on an upper surface of the phase shift film. The transparent substrate has XRD maximum peak at 20 of 15° to 30° when performing normal mode XRD analysis on a lower surface of the transparent substrate. AI1 value of the blank mask expressed by below Equation is 0.9 to 1.1. AI ? 1 = XM ? 1 XQ ? 1 XM1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on upper surface of the phase shift film. XQ1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on the lower surface of the transparent substrate.

Abstract: A method of fabricating a blank mask, the method including: forming a light-shielding film on a light-transmissive substrate; and cleaning the light-shielding film with a cleaning solution, wherein in the cleaning, the light-shielding film has a thickness change of less than 5 nm. The blank mask may include a light-transmissive substrate and a light-shielding film disposed on the light-transmissive substrate. Further, on an entire surface of the blank mask, a content of halogen ions is less than 0.05 ng/cm2, a content of nitrogen-based ions is less than 2 ng/cm2, and a content of sulfur-based ions is less than 0.1 ng/cm2. The blank mask may be a photomask.

Abstract: A method of fabricating a blank mask. The method includes forming a light-shielding film on a light-transmissive substrate to form an optical substrate; forming a photoresist layer on the light-shielding film; and removing droplets, generated in the forming of the photoresist layer, from a side surface of the light-transmissive substrate, wherein the number of droplet-type adsorption, derived from the droplets, on the side surface of the light-transmissive substrate, is less than 3 per cm2.

Abstract: Disclosed is an apparatus for fabricating a blank mask, the apparatus including: a chamber; and a rotatable chuck placed inside the chamber, wherein the rotatable chuck includes: a support part configured to support an optical substrate placed on the support part; a guide part disposed on a side of the optical substrate and connected to the support part; and an air pump for spraying compressed air to a space between a side surface of the optical substrate and the guide part.

Abstract: A blank mask includes a light-transmitting substrate; and a light-shielding film, disposed on the light-transmitting substrate, including a first light-shielding layer and a second light-shielding layer disposed on the first light-shielding layer. The second light-shielding layer includes at least one of a transition metal, oxygen, or nitrogen, or any combination thereof. A reflectance of a surface of the light-shielding film with respect to light having a wavelength of 193 nm is 20% or more and 40% or less. A hardness value of the second light-shielding layer is 0.3 kPa or more and 0.55 kPa or less.

Abstract: A blank mask includes a light transmissive substrate and a multilayer comprising a light shielding layer and a phase shift layer disposed between the light transmissive substrate and the light shielding layer. The phase shift layer includes an upper surface facing the light shielding layer and a side surface connected to the upper surface, such that the light shielding layer is disposed on the upper surface and the side surface of the phase shift layer. When viewed from a top surface of the multilayer, the multilayer includes a central portion and an outer portion surrounding the central portion. The outer portion has a curved upper surface, which greatly suppresses damage to the phase shift layer by a cleaning solution and effectively reduces a frequency of particle generation at edges of the phase shift layer and the light shielding layer.

Abstract: A blank mask includes a light transmissive substrate, and a light-blocking layer, disposed on the light transmissive substrate, comprising a transition metal and either one or both of oxygen and nitrogen. An average value of grain sizes of a surface of the light-blocking layer ranges from 14 nm to 24 nm.

Abstract: An electronic device is provided, which includes a housing; a conductive member forming at least a part of the housing; first to third nonconductive members separating the conductive member, wherein the conductive member includes a first conductive pattern disposed between the first nonconductive member and the second nonconductive member, and a second conductive pattern disposed between the second nonconductive member and the third nonconductive member; a first feeding part connected to the first conductive pattern; a second feeding part connected to the second conductive pattern; a first ground part connected to the first conductive pattern at a point adjacent to the second nonconductive member; and a communication circuit electrically connected with the conductive member.

Abstract: A blank mask includes a transparent substrate and a light shielding film disposed on the transparent substrate. A surface of the light shielding film has a controlled power spectrum density value at a spatial frequency of 1 ?m?1 to 10 ?m?1. The surface of the light shielding film has a controlled minimum power spectrum density value at the spatial frequency of 1 ?m?1 to 10 ?m?1. An Rq value of the surface of the light shielding film is 0.25 nm to 0.55 nm.

Abstract: The method of preparing a laminate includes: preparing a process target, which is a laminate before being processed, where a light-shielding film has been disposed; and preparing a cleaned laminate through a first cleaning including applying UV rays and carbonated water to the process target, wherein the light-shielding film includes a transition metal and an element selected from the group consisting of oxygen, nitrogen, and carbon.

Abstract: A method and apparatus for forming a layer including a light transmitting substrate, and a light shielding film disposed on the light transmitting substrate, and a phase shift film disposed between the light transmitting substrate and the light shielding film. A center measuring area based on the center of the light shielding film and an edge measuring area being distant by 20 mm from the edge of the light shielding film. The center measuring area and the edge measuring area are respectively squares having a side of 20 ?m.

Abstract: The blank mask according to one embodiment of the present disclosure comprises a transparent substrate and a multilayer light shielding film disposed on the transparent substrate. The multilayer light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The multilayer light shielding film comprises a first light shielding film and a second light shielding film disposed on the first light shielding film. The multilayer light shielding film comprises total nine parts that are formed by trisection in a width direction and a length direction of an upper surface of the multilayer light shielding film. Each part of the multilayer light shielding film comprises a measuring range disposed in a side thereof.