Abstract: The present invention provides an amplifying repeater, which is constructed in such a manner that a ferrite core is inserted into a coil with a predetermined number of winds to increase an induced electromotive force caused by an increase in flux linkage using a time-varying magnetic field of electromagnetic waves at a position distant from various electromagnetic wave generating sources by a predetermined distance and the induction coil and a variable condenser for inducing resonance are connected to each other to increase current while reducing a resistant component existing in the induction coil to intensify and amplify the magnetic field of electromagnetic waves. Furthermore, the present invention provides a wireless power conversion charging device using the magnetic field of electromagnetic waves, which is located between an electromagnetic wave generating source transmitter and a receiving coil or attached to the transmitter and receiving coil.

Abstract: The present invention relates to a method for genomic DNA rearrangements, and more particularly, to a method for deletion, duplication, inversion, replacement, or rearrangement of genomic DNA using pairs of site-specific nucleases targeting two or more sites in the genome, a cell in which genomic DNA is deleted, duplicated, inverted, replaced, or rearranged by the same method, and a method for expressing the site-specific nucleases in cells. Further, the present invention relates to a method for inserting synthetic DNA molecules into the genome using site-specific nucleases targeting a pre-determined site in the genome, a cell in which DNA insertion occurs by the same method, and a method for expressing the site-specific nucleases in cells.

Abstract: In a method of measuring a critical dimension of a pattern, a pattern image is obtained from an object pattern. A design pattern of the object pattern and the pattern image are matched to determine a detection region on the pattern image. An optimum turning point of the pattern contour is determined in the detection region and a ROI (region of interest) is set within a predetermined range from the optimum turning point. A critical dimension of the pattern is measured in the ROI.

Abstract: Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT.

Abstract: The invention provides a method of processing a wafer using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more measurement procedures, one or more Poly-Etch (P-E) sequences, and one or more metal-gate etch sequences. The MLMIMO process control uses dynamically interacting behavioral modeling between multiple layers and/or multiple process steps. The multiple layers and/or the multiple process steps can be associated with the creation of lines, trenches, vias, spacers, contacts, and gate structures that can be created using isotropic and/or anisotropic etch processes.

Abstract: The present invention provides an amplifying repeater, which is constructed in such a manner that a ferrite core is inserted into a coil with a predetermined number of winds to increase an induced electromotive force caused by an increase in flux linkage using a time-varying magnetic field of electromagnetic waves at a position distant from various electromagnetic wave generating sources by a predetermined distance and the induction coil and a variable condenser for inducing resonance are connected to each other to increase current while reducing a resistant component existing in the induction coil to intensify and amplify the magnetic field of electromagnetic waves. Furthermore, the present invention provides a wireless power conversion charging device using the magnetic field of electromagnetic waves, which is located between an electromagnetic wave generating source transmitter and a receiving coil or attached to the transmitter and receiving coil.

Abstract: The invention provides a method of processing a substrate using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more masking layer creation procedures, one or more pre-processing measurement procedures, one or more Partial-Etch (P-E) procedures, one or more Final-Etch (F-E) procedures, and one or more post-processing measurement procedures.

Abstract: Provided are a movement guide providing method of a video recording device. The method includes: measuring a movement speed according to a movement of the video recording device; comparing the measured movement speed value of the video recording device with a reference value; generating a guide sub screen that represents a result value of the comparing; and displaying the generated sub screen on a display main screen of the video recording device.

Abstract: The invention provides a method of processing a wafer using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more measurement procedures, one or more Poly-Etch (P-E) sequences, and one or more metal-gate etch sequences. The MLMIMO process control uses dynamically interacting behavioral modeling between multiple layers and/or multiple process steps. The multiple layers and/or the multiple process steps can be associated with the creation of lines, trenches, vias, spacers, contacts, and gate structures that can be created using isotropic and/or anisotropic etch processes.

Abstract: The present invention provides an amplifying repeater, which is constructed in such a manner that a ferrite core is inserted into a coil with a pre-determined number of winds to increase an induced electromotive force caused by an increase in flux linkage using a time-varying magnetic field of electromagnetic waves at a position distant from various electromagnetic wave generating sources by a predetermined distance and the induction coil and a variable condenser for inducing resonance are connected to each other to increase current while reducing a resistant component existing in the induction coil to intensify and amplify the magnetic field of electromagnetic waves. Furthermore, the present invention provides a wireless power conversion charging device using the magnetic field of electromagnetic waves, which is located between an electromagnetic wave generating source transmitter and a receiving coil or attached to the transmitter and receiving coil.

Abstract: A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns may be measured to provide a respective measured optical property for each of the reference patterns, and an optical property of the object pattern may be measured to provide a measured optical property of the object pattern. The measured optical property of the object pattern may be compared with the measured optical properties of the reference patterns, and a critical dimension of the object pattern may be determined as being the same as the critical dimension of the reference pattern having the measured optical property that is closest to the measured optical property of the object pattern. Related devices are also discussed.

Abstract: The invention provides a method of processing a wafer using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more measurement procedures, one or more Poly-Etch (P-E) sequences, and one or more metal-gate etch sequences. The MLMIMO process control uses dynamically interacting behavioral modeling between multiple layers and/or multiple process steps. The multiple layers and/or the multiple process steps can be associated with the creation of lines, trenches, vias, spacers, contacts, and gate structures that can be created using isotropic and/or anisotropic etch processes.

Abstract: The invention provides a method of processing a wafer using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more measurement procedures, one or more Poly-Etch (P-E) sequences, and one or more metal-gate etch sequences. The MLMIMO process control uses dynamically interacting behavioral modeling between multiple layers and/or multiple process steps. The multiple layers and/or the multiple process steps can be associated with the creation of lines, trenches, vias, spacers, contacts, and gate structures that can be created using isotropic and/or anisotropic etch processes.

Abstract: The invention provides a method of processing a substrate using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more masking layer creation procedures, one or more pre-processing measurement procedures, one or more Partial-Etch (P-E) procedures, one or more Final-Etch (F-E) procedures, and one or more post-processing measurement procedures.

Abstract: Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT.

Abstract: The present invention relates to an axle assembly of a wheel where a hub and a brake disk are integrally formed. An axle assembly of a wheel according to exemplary embodiments of the present invention may include: a wheel bearing assembly provided with a bearing inner shaft having a first inner raceway at an inner side thereof, an inner ring mounted at an outer side of the bearing inner shaft and having a second inner raceway, an outer ring having first and second outer raceways respectively corresponding to the first and second inner raceways and engaged to a knuckle, and bearings disposed between the first and second inner raceways and the first and second outer raceways; a hub for mounting the wheel, the hub being mounted at the outer side of the bearing inner shaft; and a brake disk integrally formed with the hub, wherein the bearing inner shaft is provided with a first stepped surface for mounting the inner ring and a second stepped surface for mounting the hub.

Abstract: The present invention provides an amplifying repeater, which is constructed in such a manner that a ferrite core is inserted into a coil with a pre-determined number of winds to increase an induced electromotive force caused by an increase in flux linkage using a time-varying magnetic field of electromagnetic waves at a position distant from various electromagnetic wave generating sources by a predetermined distance and the induction coil and a variable condenser for inducing resonance are connected to each other to increase current while reducing a resistant component existing in the induction coil to intensify and amplify the magnetic field of electromagnetic waves. Furthermore, the present invention provides a wireless power conversion charging device using the magnetic field of electromagnetic waves, which is located between an electromagnetic wave generating source transmitter and a receiving coil or attached to the transmitter and receiving coil.

Abstract: A digital video cassette recorder capable of preventing a picture from being distorted during a search, and a method for processing a picture according to the same are provided.

Abstract: Mask pattern matching methods and apparatus are described. A mask pattern matching method comprises: presetting, in a measuring device, distinct tones of line and space of a mask circuit pattern, respectively; positioning a mask including an alignment mark on a stage; positioning the measuring device above the mask so as to be aligned with a position of the alignment mark, and setting a measurement region; distinguishing light and darkness of the line and space of a circuit pattern formed on the mask within the measurement region by the measuring device, based on the distinct tones; and matching a circuit pattern formed on the entire region of the mask by the measuring device, based on the distinct tones.

Abstract: A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns may be measured to provide a respective measured optical property for each of the reference patterns, and an optical property of the object pattern may be measured to provide a measured optical property of the object pattern. The measured optical property of the object pattern may be compared with the measured optical properties of the reference patterns, and a critical dimension of the object pattern may be determined as being the same as the critical dimension of the reference pattern having the measured optical property that is closest to the measured optical property of the object pattern. Related devices are also discussed.