Abstract: An embodiment includes a three dimensional (3D) memory that includes a NOR logic gate, wherein the NOR logic gate includes a ferroelectric based transistor. Other embodiments are addressed herein.

Abstract: A binary CIM circuit enables all memory cells in a memory array to be effectively accessible simultaneously for computation using fixed pulse widths on the wordlines and equal capacitance on the bitlines. The fixed pulse widths and equal capacitance ensure that a minimum voltage drop in the bitline represents one least significant bit (LSB) so that the bitline voltage swing remains safely within the maximum allowable range. The binary CIM circuit maximizes the effective memory bandwidth of a memory array for a given maximum voltage range of bitline voltage.

Abstract: Techniques are provided for efficient matrix multiplication using in-memory analog parallel processing, with applications for neural networks and artificial intelligence processors. A methodology implementing the techniques according to an embodiment includes storing two matrices in-memory. The first matrix is stored in transposed form such that the transposed first matrix has the same number of rows as the second matrix. The method further includes reading columns of the matrices from the memory in parallel, using disclosed bit line functional read operations and cross bit line functional read operations, which are employed to generate analog dot products between the columns. Each of the dot products corresponds to an element of the matrix multiplication product of the two matrices. In some embodiments, one of the matrices may be used to store neural network weighting factors, and the other matrix may be used to store input data to be processed by the neural network.

Abstract: Techniques are provided for implementing a recurrent neuron (RN) using magneto-electric spin orbit (MESO) logic. An RN implementing the techniques according to an embodiment includes a first MESO device to apply a threshold function to an input signal provided at a magnetization port of the MESO device, and scale the result by a first weighting factor supplied at an input port of the MESO device to generate an RN output signal. The RN further includes a second MESO device to receive the RN output signal at a magnetization port of the second MESO device and generate a scaled previous RN state value. The scaled previous state value is a scaled and time delayed version of the RN output signal based on a second weighting factor. The RN input signal is a summation of the scaled previous state value of the RN with weighted synaptic input signals provided to the RN.

Abstract: A loaded capacitance static random-access memory (C-SRAM) is provided. The C-SRAM is configured to prevent full bit line discharge during a functional reads even where the number of bit cells on the bit lines is small. The C-SRAM includes one or more loaded capacitance structures that may take any of a variety of physical configurations designed to provide additional capacitance to the bit lines. For instance, the loaded capacitance structures may take the form of a MIM capacitor in which a ferroelectric layer is formed from one or more high K materials. In addition, the loaded capacitance structures may be positioned in a variety of locations within the C-SRAM, including the back end of line.

Abstract: An apparatus is provided which comprises: a first magnetic junction having a fixed magnetic layer and a 4-state free magnetic layer; a second magnetic junction having a fixed magnetic layer and a 4-state free magnetic layer; and a first layer of spin orbit coupling material adjacent to the first magnetic junction and the second magnetic junction via their respective 4-state free magnetic layers. Described is an apparatus which comprises a 4-state free magnetic layer; a layer of SOC material adjacent to the 4-state free magnetic layer; a first interconnect coupled to the layer of SOC material.

Abstract: One embodiment provides an apparatus. The apparatus includes a first inverter comprising a first pull up transistor and a first pull down transistor; a second inverter cross coupled to the first inverter, the second inverter comprising a second pull up transistor and a second pull down transistor; a first access transistor coupled to the first inverter; and a second access transistor coupled to the second inverter. A gate electrode of one transistor of each inverter comprises a polarization layer.

Abstract: Described is an apparatus which comprises: an input magnet formed of one or more materials with a sufficiently high anisotropy and sufficiently low magnetic saturation to increase injection of spin currents; and a first interface layer coupled to the input magnet, wherein the first interface layer is formed of non-magnetic material such that the first interface layer and the input magnet together have sufficiently matched atomistic crystalline layers.

Abstract: An embodiment includes a three dimensional (3D) memory that includes a NOR logic gate, wherein the NOR logic gate includes a ferroelectric based transistor. Other embodiments are addressed herein.

Abstract: Embodiments may relate to a structure to be used in a neural network. A first column and a second column, both of which are to couple with a substrate. A capacitor structure may be electrically coupled with the first column. An insulator-metal transition (IMT) structure may be coupled with the first column such that the capacitor structure is electrically positioned between the IMT structure and the first column. A resistor structure may further be electrically coupled with the IMT structure and the second column such that the resistor structure is electrically positioned between the second column and the IMT structure. Other embodiments may be described or claimed.

Abstract: A magnetic tunnel junction (MTJ) for use in a magnetic spin orbit torque random access memory device (SOT MRAM) is described. Magnetic tunnel junctions described herein include a multi-magnet free layer over a spin orbit torque electrode. The multi-magnet free layer includes at least three sub-layers: a first magnetic sub-layer in direct contact with the SOT electrode having a first magnetic stability, a second magnetic sub-layer having a second magnetic stability greater than the first magnetic stability, and a magnetic coupling layer between the first and second sub-layers.

Abstract: An embodiment includes a system comprising: first, second, and third word lines on a semiconductor material; first, second, and third channels; first, second, and third capacitors including a ferroelectric material; a bit line; first, second, third, fourth, and fifth semiconductor nodes, wherein the first semiconductor node couples the first capacitor to the first channel, the second semiconductor node couples the bit line to the first channel; the third semiconductor node couples the second capacitor to the second channel, the fourth semiconductor node couples the third capacitor to the third channel, and the fifth semiconductor node couples the bit line to the third channel; wherein the first channel has a long axis and a short axis; wherein the long axis intersects a continuous, uninterrupted portion of the semiconductor material from the first channel to the third channel.

Abstract: A DIMA semiconductor structure is disclosed. The DIMA semiconductor structure includes a frontend including a semiconductor substrate, a transistor switch of a memory cell coupled to the semiconductor substrate and a computation circuit on the periphery of the frontend coupled to the semiconductor substrate. Additionally, the DIMA includes a backend that includes an RRAM component of the memory cell that is coupled to the transistor switch.

Abstract: Embodiments herein describe techniques for a semiconductor device including a memory cell. The memory cell includes a storage cell and a capacitor having a first electrode and a second electrode. The first electrode and the second electrode may be placed in a metal layer below a metal electrode coupled to one or more transistors of the storage cell. The storage cell is to store a digital value, where a voltage value of an output line of the storage cell is to be determined based on the digital value stored in the storage cell. The second electrode of the capacitor is coupled to the output line of the storage cell. The capacitor is to store a charge based on the voltage value of the output line of the storage cell. Other embodiments may be described and/or claimed.

Abstract: An embodiment includes a substrate having a surface; a first layer that includes a metal and is on the substrate; a second layer that includes the metal and is on the first layer; a first switching device between the first and second layers; a second switching device between the first and second layers; a capacitor between the first and second layers, the capacitor including ferroelectric materials; a memory cell that includes the first switching device and the capacitor; an interconnect line that couples the first and second switching devices to each other; wherein: (a) the surface is substantially disposed in a first plane, and (b) a second plane is parallel to the first plane, the second plane intersecting the first and second switching devices. Other embodiments are addressed herein.

Abstract: An integrated circuit structure comprises a substrate having a memory region of and an adjacent logic region. A first N type well (Nwell) is formed in the substrate for the memory region and a second Nwell formed in the substrate for the logic region. A plurality of memory transistors in the memory region and a plurality of logic transistors are in the logic region, wherein ones the memory transistors include a floating gate over a channel, and a source and a drain on opposite sides of the channel. A diode portion is formed over one of the source and the drain of at least one of the memory transistors to conduct charge to the floating-gate of the at least one of the memory transistors for state retention during power gating.

Abstract: Described is an apparatus which comprises: a first non-magnetic conductor; a first spin orbit coupling (SOC) layer coupled to the first non-magnetic conductor; a first ferromagnet (FM) coupled to the SOC layer; a second FM; and an insulating FM sandwiched between the first and second FMs.

Abstract: An apparatus is provided which comprises: a magnetic junction having a magnet with perpendicular magnetic anisotropy (PMA) relative to an x-y plane of a device. In some embodiments, the apparatus comprises an interconnect partially adjacent to the structure of the magnetic junction, wherein the interconnect comprises a spin orbit material, wherein the interconnect has a pocket comprising non-spin orbit material, wherein the pocket is adjacent to the magnet of the magnetic junction. In some embodiments, the non-spin orbit material comprises metal which includes one or more of: Cu, Al, Ag, or Au.

Abstract: Described is an apparatus to reduce or eliminate imprint charge, wherein the apparatus which comprises: a source line; a bit-line; a memory bit-cell coupled to the source line and the bit-line; a first multiplexer coupled to the bit-line; a second multiplexer coupled to the source-line; a first driver coupled to the first multiplexer; a second driver coupled to the second multiplexer; and a current source coupled to the first and second drivers.

Abstract: Embodiments herein describe techniques for a semiconductor device including a RRAM memory cell. The RRAM memory cell includes a FinFET transistor and a RRAM storage cell. The FinFET transistor includes a fin structure on a substrate, where the fin structure includes a channel region, a source region, and a drain region. An epitaxial layer is around the source region or the drain region. A RRAM storage stack is wrapped around a surface of the epitaxial layer. The RRAM storage stack includes a resistive switching material layer in contact and wrapped around the surface of the epitaxial layer, and a contact electrode in contact and wrapped around a surface of the resistive switching material layer. The epitaxial layer, the resistive switching material layer, and the contact electrode form a RRAM storage cell. Other embodiments may be described and/or claimed.