Abstract: Memory field-effect transistors and methods of manufacturing the same are disclosed. An example apparatus includes a semiconductor substrate and a ferroelectric gate insulator of a memory field-effect transistor formed within a trench having walls defined by spacers and a base defined by the semiconductor substrate. The apparatus further includes a gate conductor formed on the ferroelectric gate insulator. The ferroelectric gate insulator is to separate a bottom surface of the gate conductor and the substrate.

Abstract: Described herein are anti-ferroelectric (AFE) memory cells and corresponding methods and devices. For example, in some embodiments, an AFE memory cell disclosed herein includes a capacitor employing an AFE material between two capacitor electrodes. Applying a voltage to one electrode of such capacitor allows boosting the charge at the other electrode, where nonlinear behavior of the AFE material between the two electrodes may advantageously manifest itself in that, for a given voltage applied to the first electrode, a factor by which the charge is boosted at the second electrode of the capacitor may be substantially different for different values of charge at that electrode before the boost. Connecting the second capacitor electrode to a storage node of the memory cell may then allow boosting the charge on the storage node so that different logic states of the memory cell become more clearly resolvable, enabling increased retention times.

Abstract: Techniques are disclosed for forming semiconductor integrated circuits including a channel region, a gate dielectric between the gate electrode and the channel region, a first layer between the gate dielectric and the gate electrode, the first layer comprising temperature compensation material. In addition, the integrate circuit includes a source region adjacent to the channel region, a source metal contact on the source region, a drain region adjacent to the channel region, and a drain metal contact on the drain region. The temperature compensation material has a temperature dependent band structure, work-function, or polarization that dynamically adjusts the threshold voltage of the transistor in response to increased operating temperature to maintain the off-state current Ioff stable or otherwise within an acceptable tolerance. The temperature compensation material may be used in conjunction with a work function material to help provide desired performance at lower or non-elevated temperatures.

Abstract: There is provided a near-zero-power wakeup system in which a MEMS sensor for mechanical or acoustic signals is coupled to a very-low-power complementary metal oxide semiconductor (CMOS) application-specific integrated circuit (ASIC). Power consumption can be minimized by operating the ASIC with sub-threshold gate voltages.

Abstract: An embodiment includes a magnetic tunnel junction (MTJ) having a non-elliptical free layer with rounded corners. For example, an embodiment includes a MTJ including a free magnetic layer, a fixed magnetic layer, and a tunnel barrier between the free and fixed layers; wherein the free magnetic layer includes a top surface, a bottom surface, and a sidewall circumnavigating the free magnetic layer and coupling the bottom surface to the top surface; wherein the top surface is rectangular with a plurality of rounded corners. In an embodiment, the aspect ratio of the top surface is between 4:1 and 8:1 (length to width). Such an embodiment provides ease of manufacture along with accept critical switching current (to reverse polarity of the free layer) and stability. Other embodiments are described herein.

Abstract: Described is an apparatus which comprises: an input ferromagnet to receive a first charge current and to produce a corresponding spin current; and a stack of metal layers configured to convert the corresponding spin current to a second charge current, wherein the stack of metal layers is coupled to the input magnet.

Abstract: According to an aspect of the invention, there is provided a mortar bomb, comprising: a main body; a nose; a tail extending from the main body, away from the nose; an obturating ring groove for accommodating, in use, an obturating ring, the ring groove being located in the main body; wherein a maximum diameter of the main body is upstream of the ring groove, toward the nose.

Abstract: An embodiment includes an apparatus comprising: a transistor including an epitaxial source, a channel, and an epitaxial drain; a fin that includes the channel, the channel including a long axis and a short axis; a source contact corresponding to the source; and a drain contact corresponding to the drain; wherein (a) an additional axis intersects each of the source contact, the source, the drain, and the drain contact, and (b) the additional axis is parallel to the long axis. Other embodiments are described herein.

Abstract: Described is an apparatus which comprises a transistor including: a layer of ferroelectric material; a layer of insulating material; and an oxide layer or a metal layer sandwiched between the layer of ferroelectric material and the layer of insulating material, wherein thickness of the ferroelectric material is less than thickness of the layer of insulating material; and a driver coupled to the transistor. Described is an apparatus which comprises: a transistor including: a first oxide layer of High-K material; a second oxide layer; and a layer of nanocrystals sandwiched between the first and second oxide layers, wherein thickness of first oxide layer is greater than thickness of the second oxide layer; and a driver coupled to the transistor.

Abstract: A conductive layer is deposited into a trench in a sacrificial layer on a substrate. An etch stop layer is deposited over the conductive layer. The sacrificial layer is removed to form a gap. In one embodiment, a beam is over a substrate. An interconnect is on the beam. An etch stop layer is over the beam. A gap is between the beam and the etch stop layer.

Abstract: An apparatus is provided which comprises: a first paramagnet; a stack of layers, a portion of which is adjacent to the first paramagnet, wherein the stack of layers is to provide an inverse Rashba-Edelstein effect; a second paramagnet; a magnetoelectric layer adjacent to the second paramagnet; and a conductor coupled to at least a portion of the stack of layers and the magnetoelectric layer.

Abstract: According to an aspect of the invention, there is provided a mortar bomb, comprising: a main body; a nose; a tail extending from the main body, away from the nose; an obturating ring groove for accommodating, in use, an obturating ring, the ring groove being located in the main body; wherein a maximum diameter of the main body is upstream of the ring groove, toward the nose.

Abstract: An apparatus is provided which comprises: a first magnetic junction having a fixed magnetic layer and a 4-state free magnetic layer; a second magnetic junction having a fixed magnetic layer and a 4-state free magnetic layer; and a first layer of spin orbit coupling material adjacent to the first magnetic junction and the second magnetic junction via their respective 4-state free magnetic layers. Described is an apparatus which comprises a 4-state free magnetic layer; a layer of SOC material adjacent to the 4-state free magnetic layer; a first interconnect coupled to the layer of SOC material.

Abstract: Embodiments include circuits, apparatuses, and systems for non-boolean associative processors. In embodiments, an electronic associative processor circuit may include first and second ring oscillators, each having an odd number of inverters, an input terminal, and an output terminal. A first capacitor may have a first terminal coupled with the output terminal of the first ring oscillator and a second capacitor may have a first terminal coupled with the output terminal of the second ring oscillator. Second terminals of the first and second capacitors may be coupled at an oscillator stage output terminal. The inverters of the first and second ring oscillators may be implemented with metal oxide semiconductor transistors. Other embodiments may be described and claimed.

Abstract: An apparatus is provided which comprises: a magnetic junction having a magnet with a magnetization (e.g., a perpendicular magnetization relative to an x-y plane of the apparatus); and an interconnect adjacent to the magnetic junction, wherein the interconnect comprises a chiral antiferromagnetic (AFM) material (e.g., Mn3X, where ‘X’ includes one of: Ge, Sn, Ga, Ir, Rh, or Pt; class-1 kagomi antiferromagnetic material, class-2 hyper kagomi antiferromagnetic material, or metallo-organics).

Abstract: An apparatus is provided which comprises: a magnetic junction having a magnet with a first magnetization (e.g., perpendicular magnetization); a first structure adjacent to the magnetic junction, wherein the first structure comprises metal (e.g., Hf, Ta, W, Ir, Pt, Bi, Cu, Mo, Gf, Ge, Ga, or Au); an interconnect adjacent to the first structure; and a second structure adjacent to the interconnect such that the first structure and the second structure are on opposite surfaces of the interconnect, wherein the second structure comprises a magnet with a second magnetization (e.g., in-plane magnetization) substantially different from the first magnetization.

Abstract: An apparatus is provided which comprises: a magnetic junction having a magnet with a first magnetization; an interconnect adjacent to the magnetic junction, wherein the interconnect comprises an antiferromagnetic (AFM) material which is doped with a doping material (Pt, Ni, Co, or Cr) and a structure adjacent to the interconnect such that the magnetic junction and the structure are on opposite surfaces of the interconnect, wherein the structure comprises a magnet with a second magnetization substantially different from the first magnetization.

Abstract: Embodiments include a test circuit to test one or more magnetic tunnel junctions (MTJs) of a magnetic random access memory (MRAM). The test circuit may measure a 1/f noise of the MTJ in the time domain, and determine a power spectral density (PSD) of the 1/f noise. The test circuit may estimate one or more parameters of the MTJ and/or MRAM based on the PSD. For example, the test circuit may determine a noise parameter, such as a Hooge alpha parameter, based on the PSD, and may estimate the one or more parameters of the MTJ and/or MRAM based on the 1/f parameter. Other embodiments may be described and claimed.

Abstract: Described herein are ferroelectric memory cells and corresponding methods and devices. For example, in some embodiments, a ferroelectric memory cell disclosed herein includes one access transistor and one ferroelectric transistor (1T-1FE-FET cell). The access transistor is coupled to the ferroelectric transistor by sharing its source/drain terminal with that of the ferroelectric transistor and is used for both READ and WRITE access to the ferroelectric transistor.

Abstract: This invention relates to a noise attenuation device and in particular a device which provides an increased performance in the range of a mortar system. A noise attenuation device suitable for use on a munition barrel, said device comprising an barrel extension portion, wherein the barrel extension portion has a length in the range of from 10 cm to 60 cm, at a first end of said barrel extension portion there is a tapered portion which tapers outwardly from said barrel extension portion, wherein said tapered portion, is frustroconical and has a cone angle in the range of from 22° to 28°, at a second end of the barrel extension portion a connector to secure the device onto a munition barrel.