Patents by Inventor Ian D. Melville
Ian D. Melville has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110079907Abstract: Disclosed is a semiconductor device wherein an insulation layer has a copper plug in contact with the last wiring layer of the device. There may also be a barrier layer separating the copper plug from the insulation layer. In a further embodiment, there may also be an aluminum layer between the insulation layer and copper plug. Also disclosed is a process for making the semiconductor device.Type: ApplicationFiled: October 5, 2009Publication date: April 7, 2011Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: MUKTA G. FAROOQ, Emily R. Kinser, Ian D. Melville, Krystyna W. Semkow
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Patent number: 7919356Abstract: A method of assembling a microelectronic flip-chip arrangement includes attaching a chip having a defined length to a supporting substrate, wherein the chip forms a chip shadow line of the defined length on the supporting substrate, creating a first non-wettable zone on an outer portion of the bottom surface of the chip, creating a second non-wettable zone on a portion of the supporting substrate outside the chip shadow line, underfilling the chip and forming a fillet, wherein the fillet does not extend beyond the chip shadow line, and hardening the underfill including the fillet.Type: GrantFiled: July 31, 2007Date of Patent: April 5, 2011Assignee: International Business Machines CorporationInventors: Mukta G. Farooq, Robert Hannon, Dae-Young Jung, Ian D. Melville
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Patent number: 7875502Abstract: A chip fabrication method. A provided structure includes: a transistor on a semiconductor substrate, N interconnect layers on the semiconductor substrate and the transistor (N>0), and a first dielectric layer on the N interconnect layers. The transistor is electrically coupled to the N interconnect layers. P crack stop regions and Q crack stop regions are formed on the first dielectric layer (P, Q>0). The first dielectric layer is sandwiched between the N interconnect layers and a second dielectric layer that is formed on the first dielectric layer. Each P crack stop region is completely surrounded by the first and second dielectric layers. The second dielectric layer is sandwiched between the first dielectric layer and an underfill layer that is formed on the second dielectric layer. Each Q crack stop region is completely surrounded by the first dielectric layer and the underfill layer.Type: GrantFiled: May 27, 2010Date of Patent: January 25, 2011Assignee: International Business Machines CorporationInventors: Peter J. Brofman, Jon Alfred Casey, Ian D. Melville, David L. Questad, Wolfgang Sauter, Thomas Anthony Wassick
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Patent number: 7867887Abstract: The present invention provides bond pads structures between semiconductor integrated circuits and the chip package with enhanced resistance to fracture and improved reliability. Mismatch in the coefficient of temperature expansion (CTE) among the materials used in bond structures induces stress and shear on them that may result in fractures within the back end dielectric stacks and cause reliability problems of the packaging. By placing multiple metal pads which are connected to the bond pad through multiple metal via, the adhesion between the bond pads and the back end dielectric stacks is enhanced.Type: GrantFiled: July 16, 2008Date of Patent: January 11, 2011Assignee: International Business Machines CorporationInventors: Ian D. Melville, Mukta G. Farooq, Dae Young Jung
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Patent number: 7816248Abstract: Disclosed are embodiments of a far back end of the line solder connector and a method of forming the connector that eliminates the use aluminum, protects the integrity of the ball limiting metallurgy (BLM) layers and promotes adhesion of the BLM layers by incorporating a thin conformal conductive liner into the solder connector structure. This conductive liner coats the top of the via filling in any divots in order to create a uniform surface for BLM deposition and to, thereby, protect the integrity of the BLM layers. The liner further coats the dielectric sidewalls of the well in which the BLM layers are formed in order to enhance adhesion of the BLM layers to the well.Type: GrantFiled: June 13, 2008Date of Patent: October 19, 2010Assignee: International Business Machines CorporationInventors: Mukta G. Farooq, Lacrtis Economikos, Ian D. Melville, Kevin S. Petrarca, Richard P. Volant
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Publication number: 20100233872Abstract: A chip fabrication method. A provided structure includes: a transistor on a semiconductor substrate, N interconnect layers on the semiconductor substrate and the transistor (N>0), and a first dielectric layer on the N interconnect layers. The transistor is electrically coupled to the N interconnect layers. P crack stop regions and Q crack stop regions are formed on the first dielectric layer (P, Q>0). The first dielectric layer is sandwiched between the N interconnect layers and a second dielectric layer that is formed on the first dielectric layer. Each P crack stop region is completely surrounded by the first and second dielectric layers. The second dielectric layer is sandwiched between the first dielectric layer and an underfill layer that is formed on the second dielectric layer. Each Q crack stop region is completely surrounded by the first dielectric layer and the underfill layer.Type: ApplicationFiled: May 27, 2010Publication date: September 16, 2010Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Peter J. Brofman, Jon Alfred Casey, Ian D. Melville, David L. Questad, Wolfgang Sauter, Thomas Anthony Wassick
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Patent number: 7732932Abstract: Structures and a method for forming the same. The structure includes a semiconductor substrate, a transistor on the semiconductor substrate, and N interconnect layers on top of the semiconductor substrate, N being a positive integer. The transistor is electrically coupled to the N interconnect layers. The structure further includes a first dielectric layer on top of the N interconnect layers and P crack stop regions on top of the first dielectric layer, P being a positive integer. The structure further includes a second dielectric layer on top of the first dielectric layer. Each crack stop region of the P crack stop regions is completely surrounded by the first dielectric layer and the second dielectric layer. The structure further includes an underfill layer on top of the second dielectric layer. The second dielectric layer is sandwiched between the first dielectric layer and the underfill layer.Type: GrantFiled: August 3, 2007Date of Patent: June 8, 2010Assignee: International Business Machines CorporationInventors: Peter J. Brofman, Jon Alfred Casey, Ian D. Melville, David L. Questad, Wolfgang Sauter, Thomas Anthony Wassick
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Publication number: 20100019354Abstract: The invention is directed to an improved semiconductor chip that reduces crack initiation and propagation into the active area of a semiconductor chip. A semiconductor wafer includes dicing channels that separate semiconductor chips and holes through a portion of a semiconductor chip, which are located at the intersection of the dicing channels. Once diced from the semiconductor wafer, semiconductor chips are created without ninety degree angle corners.Type: ApplicationFiled: October 5, 2009Publication date: January 28, 2010Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Mukta G. Farooq, Dae-Young Jung, Ian D. Melville
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Patent number: 7648891Abstract: The invention is directed to an improved semiconductor chip that reduces crack initiation and propagation into the active area of a semiconductor chip. A semiconductor wafer includes dicing channels that separate semiconductor chips and holes through a portion of a semiconductor chip, which are located at the intersection of the dicing channels. Once diced from the semiconductor wafer, semiconductor chips are created without ninety degree angle corners.Type: GrantFiled: December 22, 2006Date of Patent: January 19, 2010Assignee: International Business Machines CorporationInventors: Mukta G. Farooq, Dae-Young Jung, Ian D. Melville
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Patent number: 7622737Abstract: Test structures for electrically detecting BEOL failures are provided. In an embodiment, the structure comprises: an input/output connection disposed above a primary conductive pad which is embedded in an insulator; a dielectric layer disposed upon the insulator; a primary via extending through the dielectric layer down to the primary conductive pad for providing electrical connection between the input/output connection and the primary conductive pad; and a secondary via filled with a conductive material in electrical connection with the input/output connection, the secondary via extending through the dielectric layer down to a secondary interconnect in electrical connection with a secondary conductive pad that is insulated from the primary conductive pad.Type: GrantFiled: July 11, 2007Date of Patent: November 24, 2009Assignee: International Business Machines CorporationInventors: Mukta G. Farooq, Xiao H. Liu, Ian D. Melville
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Publication number: 20090243098Abstract: A first metallic diffusion barrier layer is formed on a last level metal plate exposed in an opening of a passivation layer. Optionally, a metallic adhesion promotion layer is formed on the first metallic diffusion barrier layer. An elemental metal conductive layer is formed on the metallic adhesion promotion layer, which provides a highly conductive structure that distributes current uniformly due to the higher electrical conductivity of the material than the layers above or below. A stack of the second metallic diffusion barrier layer and a wetting promotion layer is formed, on which a C4 ball is bonded. The elemental metal conductive layer distributes the current uniformly within the underbump metallurgy structure, which induces a more uniform current distribution in the C4 ball and enhanced electromigration resistance of the C4 ball.Type: ApplicationFiled: March 25, 2008Publication date: October 1, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Mukta G. Farooq, Robert Hannon, Emily R. Kinser, Ian D. Melville
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Patent number: 7573115Abstract: The present invention provides bond pads structures between semiconductor integrated circuits and the chip package with enhanced resistance to fracture and improved reliability. Mismatch in the coefficient of temperature expansion (CTE) among the materials used in bond structures induces stress and shear on them that may result in fractures within the back end dielectric stacks and cause reliability problems of the packaging. By placing multiple metal pads which are connected to the bond pad through multiple metal via, the adhesion between the bond pads and the back end dielectric stacks is enhanced.Type: GrantFiled: November 13, 2006Date of Patent: August 11, 2009Assignee: International Business Machines CorporationInventors: Ian D. Melville, Mukta G. Farooq, Dae Young Jung
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Publication number: 20090140420Abstract: A method creates a structure that comprises a carrier connected to an integrated circuit chip by pillars and openings. Thus, in this structure, at least one conductive pillar extends a distance or height from the surface of the integrated circuit chip and a barrier surrounds the lower portion of the conductive pillar such that the barrier covers at least some portion of the height of the pillar that is closest to the chip surface. There is at least one opening in the carrier that is large enough to accommodate the conductive pillar and the barrier, and the conductive pillar and the barrier are positioned in opening. A solder is used in the bottom of the opening to connect the conductive pillar to the bottom of the opening. The barrier prevents the solder from contacting the portion of the conductive pillar protected by the barrier.Type: ApplicationFiled: November 30, 2007Publication date: June 4, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Mukta G. Farooq, Ian D. Melville, Kevin S. Petrarca
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Publication number: 20090039515Abstract: Methods of blocking ionizing radiation to reduce soft errors and resulting IC chips are disclosed. One embodiment includes forming a front end of line (FEOL) for an integrated circuit (IC) chip; and forming at least one back end of line (BEOL) dielectric layer including ionizing radiation blocking material therein. Another embodiment includes forming a front end of line (FEOL) for an integrated circuit (IC) chip; and forming an ionizing radiation blocking layer positioned in a back end of line (BEOL) of the IC chip. The ionizing radiation blocking material or layer absorbs ionizing radiation and reduces soft errors within the IC chip.Type: ApplicationFiled: August 10, 2007Publication date: February 12, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Mukta G. Farooq, Ian D. Melville, Kevin S. Petrarca, Kenneth P. Rodbell
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Publication number: 20090032909Abstract: Structures and a method for forming the same. The structure includes a semiconductor substrate, a transistor on the semiconductor substrate, and N interconnect layers on top of the semiconductor substrate, N being a positive integer. The transistor is electrically coupled to the N interconnect layers. The structure further includes a first dielectric layer on top of the N interconnect layers and P crack stop regions on top of the first dielectric layer, P being a positive integer. The structure further includes a second dielectric layer on top of the first dielectric layer. Each crack stop region of the P crack stop regions is completely surrounded by the first dielectric layer and the second dielectric layer. The structure further includes an underfill layer on top of the second dielectric layer. The second dielectric layer is sandwiched between the first dielectric layer and the underfill layer.Type: ApplicationFiled: August 3, 2007Publication date: February 5, 2009Inventors: Peter J. Brofman, Jon Alfred Casey, Ian D. Melville, David L. Questad, Wolfgang Sauter, Thomas Anthony Wassick
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Publication number: 20090032974Abstract: A method of assembling a microelectronic flip-chip arrangement includes attaching a chip having a defined length to a supporting substrate, wherein the chip forms a chip shadow line of the defined length on the supporting substrate, creating a first non-wettable zone on an outer portion of the bottom surface of the chip, creating a second non-wettable zone on a portion of the supporting substrate outside the chip shadow line, underfilling the chip and forming a fillet, wherein the fillet does not extend beyond the chip shadow line, and hardening the underfill including the fillet.Type: ApplicationFiled: July 31, 2007Publication date: February 5, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Mukta G. Farooq, Robert Hannon, Dae-Young Jung, Ian D. Melville
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Publication number: 20090015285Abstract: Test structures for electrically detecting BEOL failures are provided. In an embodiment, the structure comprises: an input/output connection disposed above a primary conductive pad which is embedded in an insulator; a dielectric layer disposed upon the insulator; a primary via extending through the dielectric layer down to the primary conductive pad for providing electrical connection between the input/output connection and the primary conductive pad; and a secondary via filled with a conductive material in electrical connection with the input/output connection, the secondary via extending through the dielectric layer down to a secondary interconnect in electrical connection with a secondary conductive pad that is insulated from the primary conductive pad.Type: ApplicationFiled: July 11, 2007Publication date: January 15, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Mukta G. Farooq, Xiao H. Liu, Ian D. Melville
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Patent number: 7470985Abstract: Disclosed are embodiments of a far back end of the line solder connector and a method of forming the connector that eliminates the use aluminum, protects the integrity of the ball limiting metallurgy (BLM) layers and promotes adhesion of the BLM layers by incorporating a thin conformal conductive liner into the solder connector structure. This conductive liner coats the top of the via filling in any divots in order to create a uniform surface for BLM deposition and to, thereby, protect the integrity of the BLM layers. The liner further coats the dielectric sidewalls of the well in which the BLM layers are formed in order to enhance adhesion of the BLM layers to the well.Type: GrantFiled: July 31, 2006Date of Patent: December 30, 2008Assignee: International Business Machines CorporationInventors: Mukta G. Farooq, Laertis Economikos, Ian D. Melville, Kevin S. Petrarca, Richard P. Volant
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Publication number: 20080274608Abstract: The present invention provides bond pads structures between semiconductor integrated circuits and the chip package with enhanced resistance to fracture and improved reliability. Mismatch in the coefficient of temperature expansion (CTE) among the materials used in bond structures induces stress and shear on them that may result in fractures within the back end dielectric stacks and cause reliability problems of the packaging. By placing multiple metal pads which are connected to the bond pad through multiple metal via, the adhesion between the bond pads and the back end dielectric stacks is enhanced.Type: ApplicationFiled: July 16, 2008Publication date: November 6, 2008Applicant: International Business Machines CorporationInventors: Ian D. Melville, Mukta G. Farooq, Dae Young Jung
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Publication number: 20080248643Abstract: Disclosed are embodiments of a far back end of the line solder connector and a method of forming the connector that eliminates the use aluminum, protects the integrity of the ball limiting metallurgy (BLM) layers and promotes adhesion of the BLM layers by incorporating a thin conformal conductive liner into the solder connector structure. This conductive liner coats the top of the via filling in any divots in order to create a uniform surface for BLM deposition and to, thereby, protect the integrity of the BLM layers. The liner further coats the dielectric sidewalls of the well in which the BLM layers are formed in order to enhance adhesion of the BLM layers to the well.Type: ApplicationFiled: June 13, 2008Publication date: October 9, 2008Applicant: International Business Machines CorporationInventors: Mukta G. Farooq, Laertis Economikos, Ian D. Melville, Kevin S. Petrarca, Richard P. Volant